专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07026372B2 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof 有权
$Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof$
公开(公告)号：US07026372B2
公开(公告)日：2006-04-11
申请号：US11000997
申请日：2004-12-02
申请人： Kenji Ishii , Hitoshi Okazaki , Mitsuteru Kondo , Masaaki Takasuka , Motoharu Takeuchi
发明人： Kenji Ishii , Hitoshi Okazaki , Mitsuteru Kondo , Masaaki Takasuka , Motoharu Takeuchi
IPC分类号： C07C321/12 , C07C325/02 , C08G75/02 , C08G75/14 , C08F2/46
CPC分类号： C08K5/0025 , C08K5/37
摘要： A composition containing 3,3′-thiobis(propane-1,2-dithiol) and one or more enic compounds which composition is photocurable and can give a cured product having a high refractive index and adequate hardness.

2. 发明授权

US06872333B2 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof 有权
$Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof$
公开(公告)号：US06872333B2
公开(公告)日：2005-03-29
申请号：US10359271
申请日：2003-02-06
申请人： Kenji Ishii , Hitoshi Okazaki , Mitsuteru Kondo , Masaaki Takasuka , Motoharu Takeuchi
发明人： Kenji Ishii , Hitoshi Okazaki , Mitsuteru Kondo , Masaaki Takasuka , Motoharu Takeuchi
IPC分类号： C08K5/00 , C08K5/37 , C08G75/04 , B29D11/00 , G02B1/04
CPC分类号： C08K5/0025 , C08K5/37
摘要： A composition containing 3,3′-thiobis(propane-1,2-dithiol) and one or more enic compounds which composition is photocurable and can give a cured product having a high refractive index and adequate hardness.

3. 发明申请

US20050154073A1 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof 有权
$Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof$
标题翻译：烯化合物，含硫多元素化合物，含硫多硫醇化合物，高折射率光固化性组合物及其固化物
公开(公告)号：US20050154073A1
公开(公告)日：2005-07-14
申请号：US11000997
申请日：2004-12-02
申请人： Kenji Ishii , Hitoshi Okazaki , Mitsuteru Kondo , Masaaki Takasuka , Motoharu Takeuchi
发明人： Kenji Ishii , Hitoshi Okazaki , Mitsuteru Kondo , Masaaki Takasuka , Motoharu Takeuchi
IPC分类号： C08K5/00 , C08K5/37 , C08G2/00
CPC分类号： C08K5/0025 , C08K5/37
摘要： A composition containing 3,3′-thiobis(propane-1,2-dithiol) and one or more enic compounds which composition is photocurable and can give a cured product having a high refractive index and adequate hardness.
摘要翻译：含有3,3'-硫代双（丙烷-1,2-二硫酚）和一种或多种烯化合物的组合物，其组合物是光固化性的并且可以得到具有高折射率和足够硬度的固化产物。

4. 发明申请

US20050187413A1 Method for producing vicinal dithiol 有权
标题翻译：连环二硫醇的制备方法
公开(公告)号：US20050187413A1
公开(公告)日：2005-08-25
申请号：US11058354
申请日：2005-02-16
申请人： Mitsuteru Kondo , Motoharu Takeuchi , Masahiro Johno , Kenji Ishii
发明人： Mitsuteru Kondo , Motoharu Takeuchi , Masahiro Johno , Kenji Ishii
IPC分类号： C07C319/02 , C07C319/20 , C07C321/14 , C07C327/22 , C07C321/00
CPC分类号： C07C327/22 , C07C319/20 , C07C321/14
摘要： A vicinal dithiol is produced by the reaction of an episulfide compound having at least one thiirane ring in its molecule and a thiocarboxylic S-acid.
摘要翻译：通过其分子中具有至少一个硫烷环的环硫化合物与硫代羧酸S-酸的反应产生连位二硫醇。

5. 发明授权

US07183441B2 Method for producing vicinal dithiol 有权
标题翻译：连环二硫醇的制备方法
公开(公告)号：US07183441B2
公开(公告)日：2007-02-27
申请号：US11058354
申请日：2005-02-16
申请人： Mitsuteru Kondo , Motoharu Takeuchi , Masahiro Johno , Kenji Ishii
发明人： Mitsuteru Kondo , Motoharu Takeuchi , Masahiro Johno , Kenji Ishii
IPC分类号： C07C319/02
CPC分类号： C07C327/22 , C07C319/20 , C07C321/14
摘要： A vicinal dithiol is produced by the reaction of an episulfide compound having at least one thiirane ring in its molecule and a thiocarboxylic S-acid.
摘要翻译：通过其分子中具有至少一个硫烷环的环硫化合物与硫代羧酸S-酸的反应产生连位二硫醇。

6. 发明授权

US07691555B2 Photocurable composition and coating composition 有权
标题翻译：可光固化组合物和涂料组合物
公开(公告)号：US07691555B2
公开(公告)日：2010-04-06
申请号：US10563868
申请日：2004-08-04
申请人： Hitoshi Okazaki , Junya Hayakawa , Motoharu Takeuchi , Masahiro Johno , Kenji Ishii
发明人： Hitoshi Okazaki , Junya Hayakawa , Motoharu Takeuchi , Masahiro Johno , Kenji Ishii
IPC分类号： G03F7/004 , G03F7/028
CPC分类号： C09D181/02 , C08G75/08 , C08K5/45 , Y10S430/121
摘要： There are provided a photocurable composition capable of being readily cured by irradiation of ultraviolet rays and a cured product of the photocurable composition, as well as a coating composition and a coating film obtained from the coating composition. The cured product exhibits a high refractive index, a less discoloration and an excellent transparency. The present invention relates to a photocurable composition comprising (A) an episulfide compound containing a thiirane ring; and (B) a photo-base generator represented by the general formula (1): wherein Ar is phenyl, etc.; R is an alkyl group, etc.; —A+ is an ammonium ion; and X− is a borate anion, etc., and a coating composition comprising the photocurable composition and (C) a modified silicone oil, as well as a cured product and a coating film obtained from these compositions.
摘要翻译：提供了能够通过照射紫外线而容易地固化的光固化性组合物和光固化性组合物的固化物，以及由涂料组合物得到的涂料组合物和涂膜。固化产物具有高的折射率，较少的变色和优异的透明度。本发明涉及一种光固化组合物，其包含（A）含有硫杂环戊烯环的环硫化合物; 和（B）由通式（1）表示的光碱发生剂：其中Ar是苯基等; R是烷基等; -A +是铵离子; 和X-是硼酸根阴离子等，以及包含该可光固化组合物和（C）改性硅油的涂料组合物，以及由这些组合物获得的固化产物和涂膜。

7. 发明申请

US20070066702A1 Photocurable composition and coating composition 有权
标题翻译：可光固化组合物和涂料组合物
公开(公告)号：US20070066702A1
公开(公告)日：2007-03-22
申请号：US10563868
申请日：2004-08-04
申请人： Hitoshi Okazaki , Junya Hayakawa , Motoharu Takeuchi , Masahiro Johno , Kenji Ishii
发明人： Hitoshi Okazaki , Junya Hayakawa , Motoharu Takeuchi , Masahiro Johno , Kenji Ishii
IPC分类号： C08J3/28
CPC分类号： C09D181/02 , C08G75/08 , C08K5/45 , Y10S430/121
摘要： There are provided a photocurable composition capable of being readily cured by irradiation of ultraviolet rays and a cured product of the photocurable composition, as well as a coating composition and a coating film obtained from the coating composition. The cured product exhibits a high refractive index, a less discoloration and an excellent transparency. The present invention relates to a photocurable composition comprising (A) an episulfide compound containing a thiirane ring; and (B) a photo-base generator represented by the general formula (1): wherein Ar is phenyl, etc.; R is an alkyl group, etc.; —A+ is an ammonium ion; and X− is a borate anion, etc., and a coating composition comprising the photocurable composition and (C) a modified silicone oil, as well as a cured product and a coating film obtained from these compositions.
摘要翻译：提供能够通过紫外线照射容易地固化的光固化性组合物和光固化性组合物的固化物，以及由涂料组合物得到的涂料组合物和涂膜。固化产物具有高的折射率，较少的变色和优异的透明度。本发明涉及一种光固化组合物，其包含（A）含有硫杂环戊烯环的环硫化合物; 和（B）由通式（1）表示的光碱发生剂：其中Ar是苯基等; R是烷基等; -A + 是铵离子; 和X - 是硼酸根阴离子等，以及包含可光固化组合物和（C）改性硅油的涂料组合物，以及由这些组合物获得的固化产物和涂膜。

8. 发明申请

US20050181300A1 Photobase generator and curable composition 有权
标题翻译：光碱发生剂和可固化组合物
公开(公告)号：US20050181300A1
公开(公告)日：2005-08-18
申请号：US11050740
申请日：2005-02-07
申请人： Hitoshi Okazaki , Junya Hayakawa , Motoharu Takeuchi , Masahiro Jono , Kenji Ishii
发明人： Hitoshi Okazaki , Junya Hayakawa , Motoharu Takeuchi , Masahiro Jono , Kenji Ishii
IPC分类号： C07D331/02 , C07D487/04 , C07D487/08 , C08G75/06 , C08G75/08 , C08G75/14 , C08L81/04 , G02B1/04 , G03F7/004 , G03F7/038 , G03C1/76
CPC分类号： C07D487/08 , C07D487/04 , C08G75/08 , C08L81/04 , G03F7/0045 , G03F7/038 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/124 , C08L2666/24
摘要： The photobase generator of the invention is represented by the following formula 1: wherein Ar, R, A+ and X− are as defined in the specification. Since the photobase generator of the formula 1 absorbs ultraviolet lights of relatively long wavelength and is photolyzed to generate a strong base efficiently, a composition containing the photobase generator and an episulfide compound is easily cured by polymerization under ultraviolet irradiation.
摘要翻译：本发明的光碱产生剂由下式1表示：其中Ar，R，A +和/或O - 如说明书中所定义。由于式1的光碱产生剂吸收相对长波长的紫外光，并被光解以产生强碱，所以含有光碱产生剂和环硫化合物的组合物在紫外线照射下容易固化。

9. 发明授权

US07300747B2 Photobase generator and curable composition 有权
标题翻译：光碱发生剂和可固化组合物
公开(公告)号：US07300747B2
公开(公告)日：2007-11-27
申请号：US11050740
申请日：2005-02-07
申请人： Hitoshi Okazaki , Junya Hayakawa , Motoharu Takeuchi , Masahiro Jono , Kenji Ishii
发明人： Hitoshi Okazaki , Junya Hayakawa , Motoharu Takeuchi , Masahiro Jono , Kenji Ishii
IPC分类号： G03C1/73 , C08G59/40 , C08G75/06 , C08G75/14 , C08L81/04 , C07D331/02 , G02B1/04
CPC分类号： C07D487/08 , C07D487/04 , C08G75/08 , C08L81/04 , G03F7/0045 , G03F7/038 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/124 , C08L2666/24
摘要： The photobase generator of the invention is represented by the following formula 1: wherein Ar, R, A+ and X− are as defined in the specification. Since the photobase generator of the formula 1 absorbs ultraviolet lights of relatively long wavelength and is photolyzed to generate a strong base efficiently, a composition containing the photobase generator and an episulfide compound is easily cured by polymerization under ultraviolet irradiation.
摘要翻译：本发明的光碱产生剂由下式1表示：其中Ar，R，A +和/或O - 如说明书中所定义。由于式1的光碱产生剂吸收相对长波长的紫外光，并被光解以产生强碱，所以含有光碱产生剂和环硫化合物的组合物在紫外线照射下容易固化。

10. 发明授权

US06534589B1 Process for producing a resin having a large refractive index 有权
$Process for producing a resin having a large refractive index$
标题翻译：制造折射率大的树脂的方法
公开(公告)号：US06534589B1
公开(公告)日：2003-03-18
申请号：US09450762
申请日：1999-11-30
申请人： Yuichi Yoshimura , Motoharu Takeuchi , Atsuki Niimi , Hiroshi Horikoshi , Masaaki Takasuka
发明人： Yuichi Yoshimura , Motoharu Takeuchi , Atsuki Niimi , Hiroshi Horikoshi , Masaaki Takasuka
IPC分类号： C08L8100
CPC分类号： C08G75/08 , G02B1/04 , C08L81/00
摘要： A process for producing a resin having a large refractive index which comprises curing an episulfide compound having one or more epithio structures represented by formula (1) in one molecule by polymerization in the presence of a polymerization catalyst and 0.001 to 3.0 parts by weight of a phenol derivative per 100 parts by weight of the episulfide compound. (R1 represents a hydrocarbon group having 1 to 10 carbon atoms, R2, R3 and R4 each represents hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, Y represents S, O, Se or Te and m and n each represents 0 or 1).
摘要翻译：一种具有大折射率的树脂的制造方法，其特征在于，在聚合催化剂的存在下，通过在聚合催化剂的存在下进行聚合，在一分子中固化具有式（1）所示的一个以上的环硫结构的环硫化合物，以及0.001〜3.0重量份的苯酚衍生物相对于环硫化合物100重量份（R1表示碳原子数1〜10的烃基，R2，R3和R4各自表示氢原子或碳原子数1〜10的烃基，Y表示S，O ，Se或Te，m和n各自表示0或1）。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式