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1. 发明授权

US08451540B2 Retardation film 有权
标题翻译：延迟膜
公开(公告)号：US08451540B2
公开(公告)日：2013-05-28
申请号：US12440819
申请日：2007-09-11
申请人： Kenji Kato , Katsushige Hayashi , Noriyuki Kato , Haruaki Eto , Syoichi Nito
发明人： Kenji Kato , Katsushige Hayashi , Noriyuki Kato , Haruaki Eto , Syoichi Nito
IPC分类号： G02B5/02 , G02B5/30
CPC分类号： G02B5/3083 , G02B5/0226
摘要： Disclosed is a film suitable for improvement of luminance, contrast and view angle of a liquid crystal display. Specifically disclosed is a retardation film having a thickness of 30-500 μm, a light transmittance of not less than 85%, and an Nz factor of not less than 10.
摘要翻译：公开了适用于提高液晶显示器的亮度，对比度和视角的膜。具体公开了厚度为30〜500μm，透光率为85％以上，Nz系数为10以上的延迟膜。

2. 发明申请

US20100033825A1 RETARDATION FILM 有权
标题翻译：延迟膜
公开(公告)号：US20100033825A1
公开(公告)日：2010-02-11
申请号：US12440819
申请日：2007-09-11
申请人： Kenji Kato , Katsuhige Hayashi , Noriyuki Kato , Haruaki Eto , Syoichi Nito
发明人： Kenji Kato , Katsuhige Hayashi , Noriyuki Kato , Haruaki Eto , Syoichi Nito
IPC分类号： G02B5/02
CPC分类号： G02B5/3083 , G02B5/0226
摘要： Disclosed is a film suitable for improvement of luminance, contrast and view angle of a liquid crystal display. Specifically disclosed is a retardation film having a thickness of 30-500 μm, a light transmittance of not less than 85%, and an Nz factor of not less than 10.
摘要翻译：公开了适用于提高液晶显示器的亮度，对比度和视角的膜。具体公开了厚度为30〜500μm，透光率为85％以上，Nz系数为10以上的延迟膜。

3. 发明授权

US08790766B2 Polymer film 有权
标题翻译：聚合物膜
公开(公告)号：US08790766B2
公开(公告)日：2014-07-29
申请号：US12520558
申请日：2007-12-21
申请人： Kenji Kato , Katsushige Hayashi , Jun Yokoyama , Mitsuo Miura , Tsutomu Nara
发明人： Kenji Kato , Katsushige Hayashi , Jun Yokoyama , Mitsuo Miura , Tsutomu Nara
IPC分类号： B32B3/10 , G02B5/02 , C08J5/18 , G02F1/1335 , B29C59/04
CPC分类号： C08J5/18 , B29C59/04 , C08J2369/00 , G02B5/0221 , G02B5/0278 , G02F1/133606 , Y10T428/24355
摘要： The present invention can provide a polymer film having an Ra (arithmetic average roughness) of 0.5 μm to 2.5 μm, an Ry (maximum height) of 3 μm to 11 μm, an Rz (ten-point average height) of 3 μm to 8 μm, and a light transmittance of 85% or higher. A preferable embodiment of the present invention can provide, at the same time, an optical diffusion function, an improved luminance, a transmittance and the like which are of a sufficient level not realized conventionally. In a still preferable embodiment, Sm (average concave-concave/convex-convex interval) of 90 μm to 160 μm and the average inter-local peak interval (S) is 5 μm to 15 μm.
摘要翻译：本发明可以提供Ra（算术平均粗糙度）为0.5μm〜2.5μm，Ry（最大高度）为3μm〜11μm，Rz（10点平均高度）为3μm〜8μm的聚合物膜 μm，透光率为85％以上。本发明的优选实施方式可以同时提供通常没有实现的足够水平的光学扩散功能，改善的亮度，透射率等。在一个更优选的实施方式中，90μm〜160μm的Sm（平均凹入/凸凸间隔）和平均局部间间隔间隔（S）为5μm〜15μm。

4. 发明申请

US20100136287A1 POLYMER FILM 有权
标题翻译：聚合物胶片
公开(公告)号：US20100136287A1
公开(公告)日：2010-06-03
申请号：US12520558
申请日：2007-12-21
申请人： Kenji Kato , Katsushige Hayashi , Jun Yokoyama
发明人： Kenji Kato , Katsushige Hayashi , Jun Yokoyama
IPC分类号： B32B3/10
CPC分类号： C08J5/18 , B29C59/04 , C08J2369/00 , G02B5/0221 , G02B5/0278 , G02F1/133606 , Y10T428/24355
摘要： The present invention can provide a polymer film having an Ra (arithmetic average roughness) of 0.5 μm to 2.5 μm, an Ry (maximum height) of 3 μm to 11 μm, an Rz (ten-point average height) of 3 μm to 8 μm, and a light transmittance of 85% or higher. A preferable embodiment of the present invention can provide, at the same time, an optical diffusion function, an improved luminance, a transmittance and the like which are of a sufficient level not realized conventionally. In a still preferable embodiment, Sm (average concave-concave/convex-convex interval) of 90 μm to 160 μm and the average inter-local peak interval (S) is 5 μm to 15 μm.
摘要翻译：本发明可以提供Ra（算术平均粗糙度）为0.5μm〜2.5μm，Ry（最大高度）为3μm〜11μm，Rz（10点平均高度）为3μm〜8μm的聚合物膜 μm，透光率为85％以上。本发明的优选实施方式可以同时提供通常没有实现的足够水平的光学扩散功能，改进的亮度，透射率等。在一个更优选的实施方式中，90μm〜160μm的Sm（平均凹入/凸凸间隔）和平均局部间间隔间隔（S）为5μm〜15μm。

5. 发明申请

US20150079505A1 ALKALINE-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED ARTICLE, AND PRINTED WIRING BOARD 审中-公开
标题翻译：碱性可开发的感光树脂组合物，干膜，固化物和印刷线路板
公开(公告)号：US20150079505A1
公开(公告)日：2015-03-19
申请号：US14394179
申请日：2012-08-15
申请人： Kenji Kato
发明人： Kenji Kato
IPC分类号： G03F7/038
CPC分类号： G03F7/0385 , G03F7/027 , G03F7/032 , G03F7/0388 , G03F7/322 , H05K3/281 , H05K3/287 , H05K3/3452
摘要： Provided is an alkaline developable photosensitive resin composition which does not contain crude particles, has excellent storage stability, can avoid the deterioration of working environments, and contains few substances toxic to human bodies. The alkaline developable photosensitive resin composition is characterized by comprising (A) a resin containing a carboxyl group, (B) a photopolymerization initiator, (C) a compound having at least two ethylenically unsaturated groups per molecule, and (D) a dibasic acid ester.
摘要翻译：本发明提供一种不含粗粒子的碱性显影性感光性树脂组合物，具有优良的储存稳定性，能够避免工作环境恶化，并且含有少量对人体有毒的物质。碱性显影性感光性树脂组合物的特征在于，包含（A）含有羧基的树脂，（B）光聚合引发剂，（C）每分子具有至少2个烯属不饱和基团的化合物，（D）二元酸酯。

6. 发明申请

US20140302341A1 HOT PRESS MOLDING METHOD, ARTICLE MOLDED BY HOT PRESS MOLDING, AND MOLD FOR HOT PRESSING 审中-公开
标题翻译：热压成型方法，通过热压成型制成的模具和热压模具
公开(公告)号：US20140302341A1
公开(公告)日：2014-10-09
申请号：US14353624
申请日：2011-12-26
申请人： Tetsuji Egawa , Takanobu Suzuki , Hidetoshi Kimura , Hideaki Ikezawa , Kenji Kato , Masaki Furuhashi
发明人： Tetsuji Egawa , Takanobu Suzuki , Hidetoshi Kimura , Hideaki Ikezawa , Kenji Kato , Masaki Furuhashi
IPC分类号： B21J5/02
CPC分类号： B21J5/02 , B21D22/022 , B21D22/208 , B21D37/16 , B21D53/88 , Y10T428/12389
摘要： In a hot press molding method for press-molding a heated material and cooling the material while holding the material in a mold, during press molding of the material, shape changes including a portion that curves with respect to a longitudinal direction of the material are molded at longitudinal opposite end portions of the material and resistance to thermal contraction force of the material in the longitudinal direction during cooling is imparted. In one embodiment of the present invention, the shape changes molded on the material during the press molding are minute protrusions provided on surfaces of the longitudinal opposite end portions of the material. The invention makes it possible to suppress thermal contraction of the material during cooling in hot press molding to thereby prevent defects associated therewith.
摘要翻译：在加热材料的压制成型并将材料保持在模具中的同时冷却材料的热压成型方法中，在材料的压制成型期间，包括相对于材料的纵向方向弯曲的部分的形状变化在材料的纵向相对端部处，并且赋予材料在冷却期间在纵向方向上的热收缩力的能力。在本发明的一个实施例中，在压制成型期间模制在材料上的形状变化是在材料的纵向相对端部的表面上设置的微小突起。本发明可以抑制热压成型时的冷却过程中材料的热收缩，从而防止与其相关的缺陷。

7. 发明申请

US20130081798A1 HEAT SINK, AND METHOD FOR PRODUCING SAME 有权
标题翻译：散热器及其制造方法
公开(公告)号：US20130081798A1
公开(公告)日：2013-04-04
申请号：US13700566
申请日：2011-03-25
申请人： Kenji Kato , Shigetoshi Ipposhi , Toshiki Tanaka , Shinya Motokawa , Toshio Nakayama , Masafumi Ibushi
发明人： Kenji Kato , Shigetoshi Ipposhi , Toshiki Tanaka , Shinya Motokawa , Toshio Nakayama , Masafumi Ibushi
IPC分类号： F28F3/04
CPC分类号： F28F3/04 , F28D2021/0029 , H01L23/467 , H01L2924/0002 , H05K7/20163 , H01L2924/00
摘要： A heat sink including a base section, connection fins, and parallel fins. The base section includes: a first base plate configured to be mounted with a heat generating component on its outer surface; a second base plate disposed to face the first base plate in a parallel manner, configured to be mounted with a heat generating component on its outer surface; and a third base plate disposed perpendicular to the first base plate and the second base plate, which secures the first base plate and the second base plate along a junction line. The base section includes first and second regions arranged in the direction of the junction line. The connection fins are disposed on the first region to connect inner surfaces of the first and second base plates and to be parallel to the third base plate, and the parallel fins are disposed on the second region from an inner surface of the third base plate to be parallel to the first base plate.
摘要翻译：散热器，包括基部，连接翅片和平行翅片。基部包括：构造成在其外表面上安装有发热部件的第一基板; 以平行方式设置为与所述第一基板相对地配置的第二基板，构造成在其外表面上安装有发热部件; 以及垂直于第一基板和第二基板设置的第三基板，其将第一基板和第二基板沿着接合线固定。基部包括在接合线的方向上布置的第一和第二区域。连接翅片设置在第一区域上以连接第一和第二基板的内表面并平行于第三基板，并且平行翅片从第三基板的内表面设置在第二区域上平行于第一基板。

8. 发明授权

US08377274B2 Gas sensor and method for manufacturing the same 有权
标题翻译：气体传感器及其制造方法
公开(公告)号：US08377274B2
公开(公告)日：2013-02-19
申请号：US12463625
申请日：2009-05-11
申请人： Seiji Ohya , Tomohiro Wakazono , Kenji Kato , Koji Shiotani
发明人： Seiji Ohya , Tomohiro Wakazono , Kenji Kato , Koji Shiotani
IPC分类号： G01N27/407
CPC分类号： G01N27/4075
摘要： A gas sensor including a gas sensor element having a first measurement chamber (16); a first pumping cell (11); a second measurement chamber (18) into which a gas to be measured having a controlled oxygen partial pressure is introduced; and a second pumping cell (13) having a second inner pump electrode (13b) and a second counterpart electrode (13c) pump electrode configured to detect a specific gas component. The second inner pump electrode is made of a material that contains, as a principal ingredient, two kinds of Pt particles having different particle sizes and whose particle size ratio measured by a sedimentation particle-size distribution ranges from 1.75 to 14.2. A mixing ratio between large Pt particles and small Pt particles has a mass ratio of 10/90 to 50/50. A 10 kHz-1 Hz resistance value across the second pumping cell at 600° C. is 150Ω or less.
摘要翻译：一种气体传感器，包括具有第一测量室（16）的气体传感器元件; 第一泵送单元（11）; 引入具有受控氧分压的待测气体的第二测量室（18）; 以及具有第二内泵电极（13b）和配置成检测特定气体成分的第二配对电极（13c）泵浦电极的第二泵浦电池（13）。第二内泵电极由含有不同粒径的两种Pt颗粒作为主要成分的材料制成，其沉降粒度分布测定的粒径比为1.75〜14.2。大Pt颗粒和小Pt颗粒之间的混合比的质量比为10/90至50/50。在600℃下跨越第二抽滤单元的10kHz-1Hz电阻值为150＆OHgr; 或更少。

9. 发明授权

US07988835B2 Silicon dot forming method and silicon dot forming apparatus 失效
标题翻译：硅点形成方法和硅点形成装置
公开(公告)号：US07988835B2
公开(公告)日：2011-08-02
申请号：US11519154
申请日：2006-09-12
申请人： Eiji Takahashi , Takashi Mikami , Shigeaki Kishida , Kenji Kato , Atsushi Tomyo , Tsukasa Hayashi , Kiyoshi Ogata , Yuichi Setsuhara
发明人： Eiji Takahashi , Takashi Mikami , Shigeaki Kishida , Kenji Kato , Atsushi Tomyo , Tsukasa Hayashi , Kiyoshi Ogata , Yuichi Setsuhara
IPC分类号： C23C14/00 , C23C14/32 , C23C16/00 , C23C16/50
CPC分类号： C23C16/24 , H01L21/02381 , H01L21/02488 , H01L21/02532 , H01L21/02601 , H01L21/02631
摘要： There are provided a method and an apparatus which form silicon dots having substantially uniform particle diameters and exhibiting a substantially uniform density distribution directly on a substrate at a low temperature. A hydrogen gas (or a hydrogen gas and a silane-containing gas) is supplied into a vacuum chamber (1) provided with a silicon sputter target (e.g., target 30), or the hydrogen gas and the silane-containing gas are supplied into the chamber (1) without arranging the silicon sputter target therein, a high-frequency power is applied to the gas(es) so that plasma is generated such that a ratio (Si(288 nm)/Hβ) between an emission intensity Si(288 nm) of silicon atoms at a wavelength of 288 nm and an emission intensity Hβ of hydrogen atoms at a wavelength of 484 nm in plasma emission is 10.0 or lower, and preferably 3.0 or lower, or 0.5 or lower, and silicon dots (SiD) having particle diameters of 20 nm or lower, or 10 nm or lower are formed directly on the substrate (S) at a low temperature of 500 deg. C. or lower in the plasma (and with chemical sputtering if a silicon sputter target is present).
摘要翻译：提供了形成具有基本上均匀的粒径并且在低温下直接在基底上表现出基本均匀的密度分布的硅点的方法和装置。将氢气（或氢气和含硅烷气体）供给到设置有硅溅射靶（例如，靶30）的真空室（1）中，或者将氢气和含硅烷的气体供应到在不将硅溅射靶设置在其中的腔室（1）中，向气体施加高频功率，从而产生等离子体，使得发射强度Si（288nm）的比率（Si（288nm）/ H＆bgr））（288nm）的波长288nm的硅原子和发光强度H＆bgr; 的等离子体发射波长为484nm的氢原子为10.0以下，优选为3.0以下，或0.5以下，形成粒径为20nm以下或10nm以下的硅点（SiD）在500度的低温下直接在基板（S）上。在等离子体中（如果存在硅溅射靶，则具有化学溅射）。

10. 发明授权

US07880392B2 Plasma producing method and apparatus as well as plasma processing apparatus 有权
标题翻译：等离子体制造方法和装置以及等离子体处理装置
公开(公告)号：US07880392B2
公开(公告)日：2011-02-01
申请号：US11586583
申请日：2006-10-26
申请人： Kenji Kato , Hiroshige Deguchi , Hitoshi Yoneda , Kiyoshi Kubota , Akinori Ebe , Yuichi Setsuhara
发明人： Kenji Kato , Hiroshige Deguchi , Hitoshi Yoneda , Kiyoshi Kubota , Akinori Ebe , Yuichi Setsuhara
IPC分类号： C23C16/00
CPC分类号： H01J37/32954 , H01J37/321 , H01J37/32174
摘要： Plasma producing method and apparatus wherein a plurality of high-frequency antennas are arranged in a plasma producing chamber, and a high-frequency power supplied from a high-frequency power supply device (including a power source, a phase controller and the like) is applied to a gas in the chamber from the antennas to produce inductively coupled plasma. At least some of the plurality of high-frequency antennas are arranged in a fashion of such parallel arrangement that the antennas successively neighbor to each other and each of the antennas is opposed to the neighboring antenna. The high-frequency power supply device controls a phase of a high-frequency voltage applied to each antenna, and thereby controls an electron temperature of the inductively coupled plasma.
摘要翻译：等离子体制造方法和装置，其中多个高频天线布置在等离子体产生室中，并且从高频电源装置（包括电源，相位控制器等）提供的高频电力是从天线施加到腔室中的气体以产生电感耦合等离子体。多个高频天线中的至少一些以这样的并行布置的方式布置，使得天线彼此相邻并且每个天线与相邻天线相对。高频电源装置控制施加到每个天线的高频电压的相位，从而控制感应耦合等离子体的电子温度。

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