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    • 9. 发明申请
    • Real-time detection of wafer shift/slide in a chamber
    • 实时检测室内晶片位移/滑动
    • US20090249880A1
    • 2009-10-08
    • US12080893
    • 2008-04-07
    • Khoon Peng Lim
    • Khoon Peng Lim
    • G01M7/02
    • G01M7/025
    • Methods and systems for detecting wafer shift/slide in a semiconductor process chamber have been disclosed. The vibration amplitude is measured in terms of acceleration because an increase in vibrational acceleration correlates with an increase of displacement of a wafer. The vibration of a chamber is measured. External vibratory forces acting on the chamber may be transmitted to the wafer inside the chamber. The methods/systems determine if there is a net resultant force that may cause an unconstrained wafer to move from its original position in a chamber by measuring the relative chamber vibrations in three orthogonal directions. A tri-axial or three uni-axial accelerometers are mounted on a preferably exterior wall of the chamber to measure its vibration amplitude. The signal obtained as a function of time is then compared against a predetermined alarm amplitude to provide notification for corrective action.
    • 已经公开了用于检测半导体处理室中的晶片移位/滑动的方法和系统。 由于振动加速度的增加与晶片的位移增大有关,因此以加速度来测量振动幅度。 测量室的振动。 作用在室上的外部振动力可以传递到室内的晶片。 方法/系统确定是否存在可能通过测量三个正交方向上的相对室振动而导致无约束晶片从其原始位置移动到室中的净合力。 三轴或三个单向加速度计安装在室的优选外壁上以测量其振幅。 然后将作为时间的函数获得的信号与预定的报警幅度进行比较,以提供纠正措施的通知。
    • 10. 发明授权
    • Real-time detection of wafer shift/slide in a chamber
    • 实时检测室内晶片位移/滑动
    • US07750819B2
    • 2010-07-06
    • US12080893
    • 2008-04-07
    • Khoon Peng Lim
    • Khoon Peng Lim
    • G08B21/00
    • G01M7/025
    • Methods and systems for detecting wafer shift/slide in a semiconductor process chamber have been disclosed. The vibration amplitude is measured in terms of acceleration because an increase in vibrational acceleration correlates with an increase of displacement of a wafer. The vibration of a chamber is measured. External vibratory forces acting on the chamber may be transmitted to the wafer inside the chamber. The methods/systems determine if there is a net resultant force that may cause an unconstrained wafer to move from its original position in a chamber by measuring the relative chamber vibrations in three orthogonal directions. A tri-axial or three uni-axial accelerometers are mounted on a preferably exterior wall of the chamber to measure its vibration amplitude. The signal obtained as a function of time is then compared against a predetermined alarm amplitude to provide notification for corrective action.
    • 已经公开了用于检测半导体处理室中的晶片移位/滑动的方法和系统。 由于振动加速度的增加与晶片的位移增大有关,因此以加速度来测量振动幅度。 测量室的振动。 作用在室上的外部振动力可以传递到室内的晶片。 方法/系统确定是否存在可能通过测量三个正交方向上的相对室振动而导致无约束晶片从其原始位置移动到室中的净合力。 三轴或三个单向加速度计安装在室的优选外壁上以测量其振幅。 然后将作为时间的函数获得的信号与预定的报警幅度进行比较,以提供纠正措施的通知。