会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Real time monitoring of particulate contamination in a wafer processing chamber
    • 实时监测晶圆处理室中的微粒污染
    • US07248975B2
    • 2007-07-24
    • US11230386
    • 2005-09-20
    • Khoon Peng LimLai Seng Foo
    • Khoon Peng LimLai Seng Foo
    • G06F19/00
    • H01L21/67115H01L21/67253H01L21/67288
    • An apparatus and method for use is described which permits real time monitoring of build-up of particulate contamination in a wafer processing chamber. The apparatus is capable of monitoring particle build up in regions of a processing chamber which are not accessible by traditional optical particle scanners. An accelerometer is fastened to a body in the chamber upon which particulates deposit. The body is subjected to vibrations and produces a vibration signal which is detected by the accelerometer. The signal is processed to form a frequency spectrum of vibration amplitudes. Frequencies in a selected band are directly proportional to the particulate build up on the body. The invention is applied to a wafer annealing tool with a rotatable platform wherein particles deposit on a support body under the wafer. The method and apparatus have been shown to be reliable and accurate as well as cost effective and easily implemented.
    • 描述了一种使用的装置和方法,其允许对晶片处理室中的颗粒污染物的累积进行实时监测。 该装置能够监测处理室的不能被传统光学粒子扫描仪访问的区域中的颗粒积聚。 一个加速度传感器被固定在腔室内的一个物体上,颗粒沉积在其上。 身体受到振动并产生由加速度计检测到的振动信号。 信号被处理以形成振幅的频谱。 所选频带中的频率与身体上的颗粒积聚成正比。 本发明应用于具有可旋转平台的晶片退火工具,其中颗粒沉积在晶片下方的支撑体上。 该方法和装置已经被证明是可靠和准确的以及成本有效且容易实现的。
    • 5. 发明申请
    • METHOD FOR PERFORMING CONDITION MONITORING IN A WIND FARM
    • 在风力发电机中进行状态监测的方法
    • US20130261988A1
    • 2013-10-03
    • US13807426
    • 2011-06-27
    • Khoon Peng LimYu ZhouWanying Chen
    • Khoon Peng LimYu ZhouWanying Chen
    • G01M15/14
    • G01M15/14F03D7/048F03D17/00F05B2240/96F05B2260/80F05B2270/327F05B2270/334G05B23/0237G05B23/0283G05B2219/2619Y02E10/723
    • A method for performing condition monitoring on a plurality of wind turbines arranged in a wind farm is disclosed. The method comprises the steps of: for each wind turbine, obtaining at least one vibration signal, each vibration signal representing vibrations of one or more monitored components of the wind turbine, e.g. moving gear parts or bearings; generating a plurality of faulty frequency indexes, each faulty frequency index corresponding to a monitored component, each faulty frequency index being generated on the basis of one or more of the obtained vibration signals, and each faulty frequency index being generated in such a manner that variations in the vibration signals introduced by variations in rotational speed of one or more rotating shafts of the wind turbine are filtered out; comparing faulty frequency indexes originating from different wind turbines of the wind farm; and based on the comparing step, evaluating the condition of each of the monitored components of the plurality of wind turbines. The method allows vibration levels of components to be easily compared on wind farm level, and faulty or failing components are easily and reliably detected.
    • 公开了一种在布置在风电场中的多个风力涡轮机上执行状态监测的方法。 该方法包括以下步骤:对于每个风力涡轮机,获得至少一个振动信号,每个振动信号表示风力涡轮机的一个或多个受监视部件的振动,例如, 移动齿轮零件或轴承; 产生多个故障频率指标,每个故障频率指数对应于被监视的分量,每个故障频率指数是根据所获得的振动信号中的一个或多个产生的,并且每个故障频率指数以这样的方式产生: 在由风力涡轮机的一个或多个旋转轴的转速的变化引起的振动信号中被滤出; 比较源自风电场不同风力发电机组的故障频率指标; 并且基于所述比较步骤,评估所述多个风力涡轮机中的每个所监视的部件的状态。 该方法允许在风电场水平上轻松比较组件的振动水平,并且容易且可靠地检测故障或故障组件。
    • 9. 发明申请
    • Real-time detection of wafer shift/slide in a chamber
    • 实时检测室内晶片位移/滑动
    • US20090249880A1
    • 2009-10-08
    • US12080893
    • 2008-04-07
    • Khoon Peng Lim
    • Khoon Peng Lim
    • G01M7/02
    • G01M7/025
    • Methods and systems for detecting wafer shift/slide in a semiconductor process chamber have been disclosed. The vibration amplitude is measured in terms of acceleration because an increase in vibrational acceleration correlates with an increase of displacement of a wafer. The vibration of a chamber is measured. External vibratory forces acting on the chamber may be transmitted to the wafer inside the chamber. The methods/systems determine if there is a net resultant force that may cause an unconstrained wafer to move from its original position in a chamber by measuring the relative chamber vibrations in three orthogonal directions. A tri-axial or three uni-axial accelerometers are mounted on a preferably exterior wall of the chamber to measure its vibration amplitude. The signal obtained as a function of time is then compared against a predetermined alarm amplitude to provide notification for corrective action.
    • 已经公开了用于检测半导体处理室中的晶片移位/滑动的方法和系统。 由于振动加速度的增加与晶片的位移增大有关,因此以加速度来测量振动幅度。 测量室的振动。 作用在室上的外部振动力可以传递到室内的晶片。 方法/系统确定是否存在可能通过测量三个正交方向上的相对室振动而导致无约束晶片从其原始位置移动到室中的净合力。 三轴或三个单向加速度计安装在室的优选外壁上以测量其振幅。 然后将作为时间的函数获得的信号与预定的报警幅度进行比较,以提供纠正措施的通知。
    • 10. 发明授权
    • Real-time detection of wafer shift/slide in a chamber
    • 实时检测室内晶片位移/滑动
    • US07750819B2
    • 2010-07-06
    • US12080893
    • 2008-04-07
    • Khoon Peng Lim
    • Khoon Peng Lim
    • G08B21/00
    • G01M7/025
    • Methods and systems for detecting wafer shift/slide in a semiconductor process chamber have been disclosed. The vibration amplitude is measured in terms of acceleration because an increase in vibrational acceleration correlates with an increase of displacement of a wafer. The vibration of a chamber is measured. External vibratory forces acting on the chamber may be transmitted to the wafer inside the chamber. The methods/systems determine if there is a net resultant force that may cause an unconstrained wafer to move from its original position in a chamber by measuring the relative chamber vibrations in three orthogonal directions. A tri-axial or three uni-axial accelerometers are mounted on a preferably exterior wall of the chamber to measure its vibration amplitude. The signal obtained as a function of time is then compared against a predetermined alarm amplitude to provide notification for corrective action.
    • 已经公开了用于检测半导体处理室中的晶片移位/滑动的方法和系统。 由于振动加速度的增加与晶片的位移增大有关,因此以加速度来测量振动幅度。 测量室的振动。 作用在室上的外部振动力可以传递到室内的晶片。 方法/系统确定是否存在可能通过测量三个正交方向上的相对室振动而导致无约束晶片从其原始位置移动到室中的净合力。 三轴或三个单向加速度计安装在室的优选外壁上以测量其振幅。 然后将作为时间的函数获得的信号与预定的报警幅度进行比较,以提供纠正措施的通知。