会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Supporting membranes on nanometer-scale self-assembled films
    • 在纳米级自组装膜上支撑膜
    • US08206601B2
    • 2012-06-26
    • US12641782
    • 2009-12-18
    • Joan K. BosworthElizabeth A. DobiszRicardo RuizFranck D. Rose dit Rose
    • Joan K. BosworthElizabeth A. DobiszRicardo RuizFranck D. Rose dit Rose
    • B44C1/22
    • B82Y10/00B82Y25/00B82Y30/00B82Y40/00G11B5/746G11B5/82Y10T428/24355Y10T428/24504Y10T428/249953
    • Block copolymer lithography has emerged as an alternative lithographic method to achieve large-area, high-density patterns at resolutions near or beyond the limit of conventional lithographic techniques for the formation of bit patterned media and discrete track media. In one embodiment, a structure comprises a plurality of nanostructures extending upwardly from a substrate and a porous membrane extending across upper ends of the plurality of nanostructures. A method, according to another embodiment, comprises forming a block copolymer layer on a substrate, inducing self assembly of the block copolymer layer, selectively degrading a block polymer from the block copolymer layer, forming a porous membrane over the block copolymer layer, and removing a portion of the block copolymer layer for defining a plurality of nanostructures extending upwardly from the substrate after forming the porous membrane over the block copolymer layer. Other systems and methods are disclosed as well.
    • 已经出现嵌段共聚物光刻作为替代的光刻方法,以在分辨率接近或超过用于形成位图案化介质和离散轨道介质的常规平版印刷技术的极限之下实现大面积,高密度图案。 在一个实施例中,结构包括从衬底向上延伸的多个纳米结构和延伸穿过多个纳米结构的上端的多孔膜。 根据另一个实施方案的方法包括在基材上形成嵌段共聚物层,诱导嵌段共聚物层的自组装,从嵌段共聚物层选择性降解嵌段聚合物,在嵌段共聚物层上形成多孔膜,并除去 所述嵌段共聚物层的一部分用于限定在所述嵌段共聚物层上形成所述多孔膜之后从所述基材向上延伸的多个纳米结构。 还公开了其它系统和方法。
    • 9. 发明申请
    • SUPPORTING MEMBRANES ON NANOMETER-SCALE SELF-ASSEMBLED FILMS
    • 在纳米尺寸自组装膜上支撑膜
    • US20110151236A1
    • 2011-06-23
    • US12641782
    • 2009-12-18
    • Joan K. BosworthElizabeth A. DobiszRicardo RuizFranck D. Rose dit Rose
    • Joan K. BosworthElizabeth A. DobiszRicardo RuizFranck D. Rose dit Rose
    • B32B3/26B44C1/22
    • B82Y10/00B82Y25/00B82Y30/00B82Y40/00G11B5/746G11B5/82Y10T428/24355Y10T428/24504Y10T428/249953
    • Block copolymer lithography has emerged as an alternative lithographic method to achieve large-area, high-density patterns at resolutions near or beyond the limit of conventional lithographic techniques for the formation of bit patterned media and discrete track media. In one embodiment, a structure comprises a plurality of nanostructures extending upwardly from a substrate and a porous membrane extending across upper ends of the plurality of nanostructures. A method, according to another embodiment, comprises forming a block copolymer layer on a substrate, inducing self assembly of the block copolymer layer, selectively degrading a block polymer from the block copolymer layer, forming a porous membrane over the block copolymer layer, and removing a portion of the block copolymer layer for defining a plurality of nanostructures extending upwardly from the substrate after forming the porous membrane over the block copolymer layer. Other systems and methods are disclosed as well.
    • 已经出现嵌段共聚物光刻作为替代的光刻方法,以在分辨率接近或超过用于形成位图案化介质和离散轨道介质的常规平版印刷技术的极限之下实现大面积,高密度图案。 在一个实施例中,结构包括从衬底向上延伸的多个纳米结构和延伸穿过多个纳米结构的上端的多孔膜。 根据另一个实施方案的方法包括在基材上形成嵌段共聚物层,诱导嵌段共聚物层的自组装,从嵌段共聚物层选择性降解嵌段聚合物,在嵌段共聚物层上形成多孔膜,并除去 所述嵌段共聚物层的一部分用于限定在所述嵌段共聚物层上形成所述多孔膜之后从所述基材向上延伸的多个纳米结构。 还公开了其它系统和方法。