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    • 6. 发明授权
    • Pattern inspecting apparatus and inspecting method
    • 模式检查装置和检查方法
    • US06188785B1
    • 2001-02-13
    • US09081099
    • 1998-05-19
    • Toyokazu NakamuraBenjamin Tsai
    • Toyokazu NakamuraBenjamin Tsai
    • G06K900
    • G06T7/001G01N21/95684G06T2207/10056G06T2207/30148
    • An image signal of a large number of patterns of the same shape on an LSI wafer obtained by an image sensor is held in a memory circuit, by using a CMOS image sensor chip incorporating a one-dimensional CMOS photodiode array, an analog-to-digital conversion circuit, a memory circuit and a processing circuit. Then, the image signal and one-cycle and two-cycle displaced image signals cyclically displaced from the image signal by the processing circuit are algebraically processed by a defect detection algorithm in the processing circuit of the CMOS image sensor. By this processing, a defect image is extracted without using a normal inspection pattern. Thus, a high-speed processing, a simplification of a configuration of an apparatus and a miniaturization of the apparatus become possible.
    • 通过图像传感器获得的LSI晶片上相同形状的大量图案的图像信号通过使用包含一维CMOS光电二极管阵列的CMOS图像传感器芯片,模数转换器, 数字转换电路,存储电路和处理电路。 然后,通过CMOS图像传感器的处理电路中的缺陷检测算法对图像信号和由处理电路从图像信号循环移位的一周期和两周期位移图像信号进行代数处理。 通过该处理,不使用正常检查图案来提取缺陷图像。 因此,可以进行高速处理,设备的配置的简化和设备的小型化。