专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08145339B2 Substrate processing apparatus and substrate transfer method adopted therein 有权
标题翻译：基板处理装置及基板转印方法
公开(公告)号：US08145339B2
公开(公告)日：2012-03-27
申请号：US12418869
申请日：2009-04-06
申请人： Kiyohito Iijima , Hiroaki Mochizuki , Masahiro Numakura
发明人： Kiyohito Iijima , Hiroaki Mochizuki , Masahiro Numakura
IPC分类号： G06F19/00
CPC分类号： H01L21/67748 , H01L21/67253 , H01L21/67754
摘要： As an interrupt start button is depressed while control, under which product wafers Wp and dummy wafers Wd are transferred in an order defined in a normal transfer pattern, is repeatedly executed, a decision is made based upon wafer transfer history as to whether or not the most recent transfer pattern cycle has ended. If the cycle is determined to have ended, the operation immediately proceeds to the subsequent cycle to transfer interrupt wafers Wf and Wd in an order defined in the interrupt transfer pattern achieved by replacing Wp in the normal transfer pattern with Wf, whereas if the cycle is determined to be incomplete, the wafer transfer based upon the normal transfer pattern is carried on until the cycle ends and then the operation proceeds to the next cycle to transfer Wf and Wd in the order defined in the interrupt transfer pattern.
摘要翻译：当按照正常传送模式中定义的顺序传送产品晶片Wp和虚拟晶片Wd的控制下按下中断启动按钮时，基于晶片传送历史来决定是否最近的转移模式周期已经结束。如果确定该周期已经结束，则操作立即进行到随后的周期，以按照以Wf代替正常转移模式中的Wp而实现的以中断转移模式中定义的顺序传送中断晶片Wf和Wd，而如果周期为确定为不完全，基于正常转移模式的晶片传送被继续进行，直到循环结束，然后操作进行到下一个周期，以按照中断传送模式中定义的顺序传送Wf和Wd。

2. 发明申请

US20100089423A1 CLEANING METHOD AND STORAGE MEDIUM 审中-公开
标题翻译：清洁方法和储存介质
公开(公告)号：US20100089423A1
公开(公告)日：2010-04-15
申请号：US12577347
申请日：2009-10-12
申请人： Kiyohito IIJIMA , Masahiro Numakura , Hiroaki Mochizuki
发明人： Kiyohito IIJIMA , Masahiro Numakura , Hiroaki Mochizuki
IPC分类号： B08B9/00
CPC分类号： H01L21/67276 , H01J37/32862 , H01J37/32935
摘要： A cleaning method is provided to clean processing chambers of a substrate processing apparatus for transferring substrates included in each of lots to the processing chambers on a lot basis and processing the substrates in the processing chambers simultaneously. The cleaning method includes checking whether a lot is switched to another lot to which different cleaning conditions are applied prior to the processing in the processing chambers, performing a cleaning process on the processing chambers under cleaning conditions of a previous lot by transferring cleaning substrates into the processing chambers when it is determined that a lot is switched to another lot to which different cleaning conditions are applied, and omitting the cleaning process of the processing chambers when it is determined that a lot is switched to another lot to which the same cleaning conditions are applied.
摘要翻译：提供一种清洁方法，用于清洁基板处理装置的处理室，用于将批次中包含的基板批量传送到处理室，同时处理处理室中的基板。清洁方法包括在处理室中的处理之前检查批次是否切换到施加了不同清洁条件的另一批次，通过将清洁基板转移到处理室中的清洁条件下对处理室进行清洁处理当确定批次被切换到施加不同清洁条件的另一批次时，处理室，并且当确定批次被切换到具有相同清洁条件的另一批次时，省略处理室的清洁处理应用。

3. 发明授权

US08382910B2 Cleaning method for substrate processing system, storage medium, and substrate processing system 有权
标题翻译：基板处理系统，存储介质和基板处理系统的清洗方法
公开(公告)号：US08382910B2
公开(公告)日：2013-02-26
申请号：US12398587
申请日：2009-03-05
申请人： Masahiro Numakura , Hiroaki Mochizuki , Kiyohito Iijima
发明人： Masahiro Numakura , Hiroaki Mochizuki , Kiyohito Iijima
IPC分类号： B08B9/08
CPC分类号： H01L21/67207 , H01L21/67028 , H01L21/67253
摘要： A cleaning method for a substrate processing system capable of appropriately cleaning a housing chamber. In the substrate processing system, the number of execution times of product processing is accumulated, if the product processing to be executed next corresponds to first product processing for a subsequent lot, a time interval between preceding and subsequent lots is not longer than a predetermined time period, and a type of the last product processing performed for the preceding lot is the same as that of the first product processing to be performed for the subsequent lot. When the accumulated number of execution times is not less than a predetermined number of times, a cleaning treatment is executed, which corresponds to a chamber indicated in a system recipe set for a lot including a wafer on which the product processing is performed immediately before execution of the cleaning treatment.
摘要翻译：一种能够适当地清洁容纳室的基板处理系统的清洁方法。在基板处理系统中，累积产品处理的执行次数，如果接下来要执行的产品处理对应于后续批次的第一产品处理，则之前和后续批次之间的时间间隔不长于预定时间期间，并且对于前一批次执行的最后一个产品处理的类型与为后续批次执行的第一产品处理的类型相同。当累计执行次数不小于预定次数时，执行清洁处理，其对应于在紧接执行产品处理之前执行的包括晶片的批次设置的系统配方中指示的室的清洁处理。

4. 发明申请

US20090269171A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANSFER METHOD ADOPTED THEREIN 有权
标题翻译：基板处理装置和基板传输方法
公开(公告)号：US20090269171A1
公开(公告)日：2009-10-29
申请号：US12418869
申请日：2009-04-06
申请人： Kiyohito IIJIMA , Hiroaki Mochizuki , Masahiro Numakura
发明人： Kiyohito IIJIMA , Hiroaki Mochizuki , Masahiro Numakura
IPC分类号： H01L21/67
CPC分类号： H01L21/67748 , H01L21/67253 , H01L21/67754
摘要： As an interrupt start button is depressed while control, under which product wafers Wp and dummy wafers Wd are transferred in an order defined in a normal transfer pattern, is repeatedly executed, a decision is made based upon wafer transfer history as to whether or not the most recent transfer pattern cycle has ended. If the cycle is determined to have ended, the operation immediately proceeds to the subsequent cycle to transfer interrupt wafers Wf and Wd in an order defined in the interrupt transfer pattern achieved by replacing Wp in the normal transfer pattern with Wf, whereas if the cycle is determined to be incomplete, the wafer transfer based upon the normal transfer pattern is carried on until the cycle ends and then the operation proceeds to the next cycle to transfer Wf and Wd in the order defined in the interrupt transfer pattern.
摘要翻译：当按照正常传送模式中定义的顺序传送产品晶片Wp和虚拟晶片Wd的控制下按下中断启动按钮时，基于晶片传送历史来决定是否最近的转移模式周期已经结束。如果确定该周期已经结束，则操作立即进行到随后的周期，以按照以Wf代替正常转移模式中的Wp而实现的以中断转移模式中定义的顺序传送中断晶片Wf和Wd，而如果周期为确定为不完全，基于正常转移模式的晶片传送被继续进行，直到循环结束，然后操作进行到下一个周期，以按照中断传送模式中定义的顺序传送Wf和Wd。

5. 发明申请

US20090229635A1 CLEANING METHOD FOR SUBSTRATE PROCESSING SYSTEM, STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM 有权
标题翻译：基板处理系统清洗方法，储存介质和基板处理系统
公开(公告)号：US20090229635A1
公开(公告)日：2009-09-17
申请号：US12398587
申请日：2009-03-05
申请人： Masahiro NUMAKURA , Hiroaki Mochizuki , Kiyohito Iijima
发明人： Masahiro NUMAKURA , Hiroaki Mochizuki , Kiyohito Iijima
IPC分类号： B08B9/08
CPC分类号： H01L21/67207 , H01L21/67028 , H01L21/67253
摘要： A cleaning method for a substrate processing system capable of appropriately cleaning a housing chamber. In the substrate processing system, the number of execution times of product processing is accumulated, if the product processing to be executed next corresponds to first product processing for a subsequent lot, a time interval between preceding and subsequent lots is not longer than a predetermined time period, and a type of the last product processing performed for the preceding lot is the same as that of the first product processing to be performed for the subsequent lot. When the accumulated number of execution times is not less than a predetermined number of times, a cleaning treatment is executed, which corresponds to a chamber indicated in a system recipe set for a lot including a wafer on which the product processing is performed immediately before execution of the cleaning treatment.
摘要翻译：一种能够适当地清洁容纳室的基板处理系统的清洁方法。在基板处理系统中，累积产品处理的执行次数，如果接下来要执行的产品处理对应于后续批次的第一产品处理，则之前和后续批次之间的时间间隔不长于预定时间期间，并且对于前一批次执行的最后一个产品处理的类型与为后续批次执行的第一产品处理的类型相同。当累计执行次数不小于预定次数时，执行清洁处理，其对应于在紧接执行产品处理之前执行的包括晶片的批次设置的系统配方中指示的室的清洁处理。

6. 发明授权

US08055368B2 Control device and control method of plasma processing system, and storage medium storing control program 有权
标题翻译：等离子体处理系统的控制装置和控制方法以及存储控制程序的存储介质
公开(公告)号：US08055368B2
公开(公告)日：2011-11-08
申请号：US12496137
申请日：2009-07-01
申请人： Kiyohito Iijima , Hiroaki Mochizuki
发明人： Kiyohito Iijima , Hiroaki Mochizuki
IPC分类号： G06F19/00
CPC分类号： G05B19/41865 , G05B2219/31443 , G05B2219/32097 , Y02P90/20
摘要： In a control device of a plasma processing system, a storage unit is configured to store a reference recipe indicating an order of the plasma processing. An operation unit calculates a state variation value of each of the plasma processing devices by a predetermined timing at a plurality of processing lot intervals. A table generation unit generates an adjusting table for adjusting the reference recipe from the calculated state variation value of each of the plasma processing devices. In addition, a process executing control unit adjusts the reference recipe by using one of the generated adjusting tables for the plasma processing devices by the table generation unit and performs the plasma processing on the target object in the corresponding plasma processing device according to an order of the adjusted reference recipe.
摘要翻译：在等离子体处理系统的控制装置中，存储单元被配置为存储指示等离子体处理的顺序的参考配方。操作单元以多个处理批间隔计算每个等离子体处理装置的预定定时的状态变化值。表生成单元从计算出的各等离子体处理装置的状态变化值生成用于调整基准食谱的调整表。此外，处理执行控制单元通过使用生成的生成的等离子体处理装置的调整表之一通过表生成单元来调整参考配方，并且对相应的等离子体处理装置中的目标对象执行等离子体处理调整后的参考食谱。

7. 发明授权

US08452455B2 Control device and control method of plasma processing system, and storage medium storing control program 有权
标题翻译：等离子体处理系统的控制装置和控制方法以及存储控制程序的存储介质
公开(公告)号：US08452455B2
公开(公告)日：2013-05-28
申请号：US12496117
申请日：2009-07-01
申请人： Hiroaki Mochizuki , Masahiro Numakura
发明人： Hiroaki Mochizuki , Masahiro Numakura
IPC分类号： G05B24/04
CPC分类号： G05B19/41865 , Y02P90/20
摘要： In a control device of a plasma processing system, a communication unit is configured to receive processing information related to a carrier of a next processing lot. A determination unit is configured to determine whether the processing information received by the communication unit has pre-treatment information related to one of the plasma processing devices. When it is determined that the processing information has the pre-treatment information by the determination unit, a generation unit is configured to generate an object for declaring execution of the pre-treatment for the carrier of a next processing lot if a desired condition of transferring of the carrier is satisfied. In addition, if the object is generated by the generation unit, a process executing control unit is configured to start the pre-treatment for the target object in the carrier of a next processing lot without any notification that the carrier reaches a destination plasma processing device.
摘要翻译：在等离子体处理系统的控制装置中，通信单元被配置为接收与下一个处理批次的载体有关的处理信息。确定单元被配置为确定由通信单元接收的处理信息是否具有与等离子体处理设备之一相关的预处理信息。当确定处理信息具有确定单元的预处理信息时，生成单元被配置为产生用于宣告执行下一个处理批次的载体的预处理的对象，如果期望的转移条件的承运人满意。此外，如果对象由生成单元生成，则处理执行控制单元被配置为开始对下一个处理批次的载体中的目标对象的预处理，而不通知载体到达目的地等离子体处理装置。

8. 发明授权

US09447855B2 Electric actuator with shock absorbing mechanism 有权
标题翻译：具有减震机构的电动执行机构
公开(公告)号：US09447855B2
公开(公告)日：2016-09-20
申请号：US13991558
申请日：2011-12-19
申请人： Hiroaki Mochizuki , Hiroomi Kuribayashi
发明人： Hiroaki Mochizuki , Hiroomi Kuribayashi
IPC分类号： F16H25/20 , H02K7/06 , B63H20/10 , F16F9/32
CPC分类号： F16H25/20 , B63H20/10 , F16F9/32 , F16H25/2021 , H02K7/06 , Y10T74/18576
摘要： An electric actuator is capable of easily achieving reduction in weight and size when compared to a hydraulic cylinder device, capable of being used in place of the hydraulic cylinder device, and capable of freely extending in response to a suddenly-applied impact load. An electric actuator converts rotation of an electric motor into advancing/retracting motion of an output rod using a screw shaft and a nut member mounted to the screw shaft. The output rod includes: a drive cylinder, to which the nut member is provided, the drive cylinder being arranged around the screw shaft; and a movable cylinder arranged to overlap the drive cylinder around the screw shaft and freely advancing and retreating with respect to the drive cylinder. The electric actuator further includes a releasing mechanism provided between the drive cylinder and the movable cylinder, for engaging the movable cylinder with the drive cylinder.
摘要翻译：与液压缸装置相比，电动执行器能够容易地实现重量和尺寸的减小，液压缸装置能够代替液压缸装置，并且能够响应于突然施加的冲击载荷而自由延伸。电动执行器使用螺钉轴和安装到螺杆轴上的螺母构件将电动机的旋转转换成输出杆的前进/后退运动。所述输出杆包括：驱动缸，所述螺母构件设置在所述驱动缸上，所述驱动缸围绕所述螺杆轴布置; 以及可动缸，其布置成围绕所述螺杆轴重叠所述驱动缸并相对于所述驱动缸自由地前进和后退。电致动器还包括设置在驱动气缸和可动气缸之间的释放机构，用于将可动气缸与驱动气缸接合。

9. 发明授权

US09213207B2 Electro-optical device and electronic apparatus 有权
标题翻译：电光装置和电子设备
公开(公告)号：US09213207B2
公开(公告)日：2015-12-15
申请号：US13083933
申请日：2011-04-11
申请人： Minoru Moriwaki , Hiroaki Mochizuki
发明人： Minoru Moriwaki , Hiroaki Mochizuki
IPC分类号： G02F1/1343 , G02F1/1362
CPC分类号： G02F1/136213 , G02F1/136227 , G02F1/136286
摘要： In at least one embodiment of the disclosure, an electro-optical device comprises a pixel electrode and a transistor corresponding to the pixel electrode. A data line is electrically connected to the transistor. A storage capacitor is provided between the pixel electrode and the transistor. The storage capacitor has a first capacitance electrode and a second capacitance electrode facing each other. A capacitance isolation film is interposed therebetween. An additional capacitor is electrically connected to the data line. The additional capacitor has a first additional capacitance electrode and a second additional capacitance electrode facing each other. An additional capacitance isolation film is interposed therebetween. The first additional capacitance electrode is provided on a same layer as the first capacitance electrode. The second additional capacitance electrode is provided on a layer different from the layers of the first and second capacitance electrodes.
摘要翻译：在本公开的至少一个实施例中，电光装置包括像素电极和对应于像素电极的晶体管。数据线电连接到晶体管。在像素电极和晶体管之间提供存储电容器。存储电容器具有彼此面对的第一电容电极和第二电容电极。插入电容隔离膜。附加的电容器电连接到数据线。附加电容器具有彼此面对的第一附加电容电极和第二附加电容电极。在其间插入附加的电容隔离膜。第一附加电容电极设置在与第一电容电极相同的层上。第二附加电容电极设置在与第一和第二电容电极的层不同的层上。

10. 发明申请

US20130247700A1 ELECTRIC ACTUATOR WITH SHOCK ABSORBING MECHANISM 有权
标题翻译：具有减震机构的电动执行机构
公开(公告)号：US20130247700A1
公开(公告)日：2013-09-26
申请号：US13991558
申请日：2011-12-19
申请人： Hiroaki Mochizuki , Hiroomi Kuribayashi
发明人： Hiroaki Mochizuki , Hiroomi Kuribayashi
IPC分类号： F16H25/20 , F16F9/32
CPC分类号： F16H25/20 , B63H20/10 , F16F9/32 , F16H25/2021 , H02K7/06 , Y10T74/18576
摘要： An electric actuator is capable of easily achieving reduction in weight and size when compared to a hydraulic cylinder device, capable of being used in place of the hydraulic cylinder device, and capable of freely extending in response to a suddenly-applied impact load. An electric actuator converts rotation of an electric motor into advancing/retracting motion of an output rod using a screw shaft and a nut member mounted to the screw shaft. The output rod includes: a drive cylinder, to which the nut member is provided, the drive cylinder being arranged around the screw shaft; and a movable cylinder arranged to overlap the drive cylinder around the screw shaft and freely advancing and retreating with respect to the drive cylinder. The electric actuator further includes a releasing mechanism provided between the drive cylinder and the movable cylinder, for engaging the movable cylinder with the drive cylinder.
摘要翻译：与液压缸装置相比，电动执行器能够容易地实现重量和尺寸的减小，液压缸装置能够代替液压缸装置，并且能够响应于突然施加的冲击载荷而自由延伸。电动执行器使用螺钉轴和安装到螺杆轴上的螺母构件将电动机的旋转转换成输出杆的前进/后退运动。所述输出杆包括：驱动缸，所述螺母构件设置在所述驱动缸上，所述驱动缸围绕所述螺杆轴布置; 以及可动缸，其布置成围绕所述螺杆轴重叠所述驱动缸并相对于所述驱动缸自由地前进和后退。电致动器还包括设置在驱动气缸和可动气缸之间的释放机构，用于将可动气缸与驱动气缸接合。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式