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1. 发明授权

US07648814B2 Black paste composition, method of forming black matrix pattern by using the same, and the black matrix pattern formed 有权
标题翻译：黑色糊剂组合物，通过使用它们形成黑色矩阵图案的方法和形成的黑色矩阵图案
公开(公告)号：US07648814B2
公开(公告)日：2010-01-19
申请号：US12013009
申请日：2008-01-11
申请人： Masaki Sasaki , Kenji Kato , Masao Arima
发明人： Masaki Sasaki , Kenji Kato , Masao Arima
IPC分类号： G03F7/004 , H01J9/227 , H01J17/49
CPC分类号： G03F7/0047 , C08F2/50 , G03F7/0007 , G03F7/029 , G03F7/031 , Y10S430/146
摘要： An object of the present invention is to provide a black paste composition suitable for use in laser direct imaging devices employing a light source emitting a laser having a maximum wavelength of 350 to 420 nm, useful in forming a high-definition black matrix pattern efficiently, and superior in storage stability, a black matrix pattern formed by using the composition, a plasma display having the pattern, and a method of forming the black matrix pattern by using the composition. An alkali development-type black paste composition of the present invention comprises (A) a carboxyl group-containing resin, (B) a glass frit, (C) a black pigment, (D) a compound having at least one radically polymerizable unsaturated group in its molecule, and (E-1) an oxime-based photopolymerization initiator represented by the following general formula (I).
摘要翻译：本发明的目的是提供一种适用于激光直接成像装置的黑色浆料组合物，该装置采用发射具有350至420nm最大波长的激光的光源，用于有效地形成高分辨率黑矩阵图案，并且存储稳定性优异，通过使用该组合物形成的黑矩阵图案，具有图案的等离子体显示器以及通过使用该组合物形成黑矩阵图案的方法。本发明的碱显影型黑糊剂组合物包含（A）含羧基的树脂，（B）玻璃料，（C）黑色颜料，（D）具有至少一个可自由基聚合的不饱和基团和（E-1）由以下通式（I）表示的肟基光聚合引发剂。

2. 发明授权

US07517632B2 Silver paste composition, method of forming conductive pattern by using the same, and the conductive pattern formed 失效
标题翻译：银膏组合物，通过使用它们形成导电图案的方法和形成的导电图案
公开(公告)号：US07517632B2
公开(公告)日：2009-04-14
申请号：US12013028
申请日：2008-01-11
申请人： Masaki Sasaki , Kenji Kato , Masao Arima
发明人： Masaki Sasaki , Kenji Kato , Masao Arima
IPC分类号： G03C11/00 , G03C1/492 , G03C1/494 , G03C1/76 , G03C5/00
CPC分类号： G03F7/029 , C08F2/50 , G03F7/0047 , G03F7/031 , H05K1/092 , H05K3/02 , H05K2203/0514
摘要： An object of the present invention is to provide a silver paste composition suitable for use in laser direct imaging devices employing a light source emitting a laser having a maximum wavelength of 350 to 420 nm, useful in forming a high-definition conductive pattern efficiently, and superior in storage stability, a conductive pattern formed by using the composition, a plasma display having the pattern, and a method of forming the conductive pattern by using the composition. An alkali development-type silver paste composition of the present invention comprises (A) a carboxyl group-containing resin, (B) a glass frit, (C) a silver powder, (D) a compound having at least one radically polymerizable unsaturated group in its molecule, and (E-1) an oxime-based photopolymerization initiator represented by the following general formula (I).
摘要翻译：本发明的一个目的是提供一种适用于激光直接成像装置的银膏组合物，该装置采用发射具有350至420nm最大波长的激光的光源，用于有效地形成高分辨率导电图案，以及存储稳定性优异，通过使用该组合物形成的导电图案，具有图案的等离子体显示器，以及通过使用该组合物形成导电图案的方法。本发明的碱显影型银糊剂组合物包含（A）含羧基树脂，（B）玻璃料，（C）银粉，（D）具有至少一个自由基聚合性不饱和基团和（E-1）由以下通式（I）表示的肟基光聚合引发剂。

3. 发明申请

US20080118865A1 SILVER PASTE COMPOSITION, METHOD OF FORMING CONDUCTIVE PATTERN BY USING THE SAME, AND THE CONDUCTIVE PATTERN FORMED 失效
标题翻译：银浆组合物，使用它们形成导电图案的方法和形成的导电图案
公开(公告)号：US20080118865A1
公开(公告)日：2008-05-22
申请号：US12013028
申请日：2008-01-11
申请人： Masaki SASAKI , Kenji Kato , Masao Arima
发明人： Masaki SASAKI , Kenji Kato , Masao Arima
IPC分类号： C08F2/50 , G03F7/004 , H01B1/00
CPC分类号： G03F7/029 , C08F2/50 , G03F7/0047 , G03F7/031 , H05K1/092 , H05K3/02 , H05K2203/0514
摘要： An object of the present invention is to provide a silver paste composition suitable for use in laser direct imaging devices employing a light source emitting a laser having a maximum wavelength of 350 to 420 nm, useful in forming a high-definition conductive pattern efficiently, and superior in storage stability, a conductive pattern formed by using the composition, a plasma display having the pattern, and a method of forming the conductive pattern by using the composition. An alkali development-type silver paste composition of the present invention comprises (A) a carboxyl group-containing resin, (B) a glass frit, (C) a silver powder, (D) a compound having at least one radically polymerizable unsaturated group in its molecule, and (E-1) an oxime-based photopolymerization initiator represented by the following general formula (I).
摘要翻译：本发明的一个目的是提供一种适用于激光直接成像装置的银膏组合物，该装置采用发射具有350至420nm最大波长的激光的光源，用于有效地形成高分辨率导电图案，以及存储稳定性优异，通过使用该组合物形成的导电图案，具有图案的等离子体显示器，以及通过使用该组合物形成导电图案的方法。本发明的碱显影型银糊剂组合物包含（A）含羧基树脂，（B）玻璃料，（C）银粉，（D）具有至少一个自由基聚合性不饱和基团和（E-1）由以下通式（I）表示的肟基光聚合引发剂。

4. 发明授权

US08101336B2 Photocurable and thermosetting resin composition, cured product thereof, and printed circuit board 有权
标题翻译：光固化性和热固性树脂组合物，其固化产物和印刷电路板
公开(公告)号：US08101336B2
公开(公告)日：2012-01-24
申请号：US12195793
申请日：2008-08-21
申请人： Nobuhito Itoh , Yoko Shibasaki , Kenji Kato , Masao Arima
发明人： Nobuhito Itoh , Yoko Shibasaki , Kenji Kato , Masao Arima
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028 , G03F7/027
CPC分类号： C08F2/50 , G03F7/029 , G03F7/031 , H05K3/287 , H05K3/389 , Y10S430/114
摘要： The present invention provides a photocurable and thermosetting resin composition having excellent surface curability and deep curability, allowing pattern formation with a laser beam having a wavelength of 350 to 410 nm, and being useful as a solder resist for laser direct imaging, the composition including a carboxylic resin (A), an oxime ester-based photopolymerization initiator (B) such as 2-(acetyloxyiminomethyl)thioxanthene-9-one, and another photopolymerization initiator than (B) such as 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide, and a sulfur compound (E) such as 2-mercaptobenzothiazole.
摘要翻译：本发明提供了具有优异的表面固化性和深度固化性的光固化性和热固性树脂组合物，其允许使用波长为350〜410nm的激光束进行图案形成，并且可用作激光直接成像的阻焊剂，该组合物包含羧酸树脂（A），诸如2-（乙酰氧基亚氨基甲基）噻吨-9酮的肟酯类光聚合引发剂（B）和比（B）的另外的光聚合引发剂如2,4,6-三甲基苯甲酰基 - 二苯基膦氧化物和硫化合物（E）如2-巯基苯并噻唑。

5. 发明申请

US20090194319A1 PHOTOCURABLE RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND PRINTED CIRCUIT BOARD 审中-公开
标题翻译：光电树脂组合物，干膜，固化产品和印刷电路板
公开(公告)号：US20090194319A1
公开(公告)日：2009-08-06
申请号：US12389987
申请日：2009-02-20
申请人： Nobuhito ITOH , Yoko Shibasaki , Kenji Kato , Masao Arima
发明人： Nobuhito ITOH , Yoko Shibasaki , Kenji Kato , Masao Arima
IPC分类号： H05K1/00 , G03F7/004
CPC分类号： G03F7/105 , G03F7/031 , H05K1/0269 , H05K3/287
摘要： Provided is a photocurable resin composition developable with a rare alkali solution, including a carboxylic acid-containing resin (A), a coloring agent (B) composed of a compound having an aminoantraquinone skeleton, a photopolymerization initiator (C), and a compound (D) having two or more ethylenically unsaturated groups within one molecule thereof, the composition being sufficiently colored while controlling absorption in the ultraviolet region using the coloring agent composed of a compound having an aminoantraquinone skeleton, having high sensitivity to ultraviolet and laser exposure, and providing good dry tack in a state of a dry coating film.
摘要翻译：提供一种可稀释的碱溶液显影的可光固化树脂组合物，其包含含羧酸的树脂（A），由具有氨基蒽醌骨架的化合物，光聚合引发剂（C）和化合物（C）组成的着色剂 D）在其一分子内具有两个或更多个烯键式不饱和基团，该组合物充分着色，同时使用由具有氨基蒽醌骨架的化合物构成的着色剂控制紫外线区域的吸收，对紫外线和激光曝光具有高灵敏度，并提供在干涂膜的状态下具有良好的干粘性。

6. 发明申请

US20080308301A1 PHOTOCURABLE AND THERMOSETTING RESIN COMPOSITION, CURED PRODUCT THEREOF, AND PRINTED CIRCUIT BOARD 有权
标题翻译：光固化和热固化树脂组合物，其固化产品和印刷电路板
公开(公告)号：US20080308301A1
公开(公告)日：2008-12-18
申请号：US12195793
申请日：2008-08-21
申请人： Nobuhito Itoh , Yoko Shibasaki , Kenji Kato , Masao Arima
发明人： Nobuhito Itoh , Yoko Shibasaki , Kenji Kato , Masao Arima
IPC分类号： H05K1/00 , C08F4/32
CPC分类号： C08F2/50 , G03F7/029 , G03F7/031 , H05K3/287 , H05K3/389 , Y10S430/114
摘要： The present invention provides a photocurable and thermosetting resin composition having excellent surface curability and deep curability, allowing pattern formation with a laser beam having a wavelength of 350 to 410 nm, and being useful as a solder resist for laser direct imaging, the composition including a carboxylic resin (A), an oxime ester-based photopolymerization initiator (B) such as 2-(acetyloxyiminomethyl)thioxanthene-9-one, and another photopolymerization initiator than (B) such as 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide, and a sulfur compound (E) such as 2-mercaptobenzothiazole.
摘要翻译：本发明提供了具有优异的表面固化性和深度固化性的光固化性和热固性树脂组合物，其允许使用波长为350〜410nm的激光束进行图案形成，并且可用作激光直接成像的阻焊剂，该组合物包含羧酸树脂（A），诸如2-（乙酰氧基亚氨基甲基）噻吨-9酮的肟酯类光聚合引发剂（B）和比（B）的另外的光聚合引发剂如2,4,6-三甲基苯甲酰基 - 二苯基膦氧化物和硫化合物（E）如2-巯基苯并噻唑。

7. 发明申请

US20080113297A1 PHOTOSENSITIVE COMPOSITION 有权
标题翻译：光敏组合物
公开(公告)号：US20080113297A1
公开(公告)日：2008-05-15
申请号：US11939933
申请日：2007-11-14
申请人： Yoko SHIBASAKI , Kenji Kato , Masao Arima
发明人： Yoko SHIBASAKI , Kenji Kato , Masao Arima
IPC分类号： G03F7/039
CPC分类号： G03F7/0388 , G03F7/029 , G03F7/031
摘要： There are provided a photosensitive composition used in one-shot exposure of exposing it via a photomask to light from a UV lamp or in direct writing with light from a UV lamp or laser light to form a patterned latent image to be developed with an alkaline aqueous solution, wherein a difference between maximum absorbance and minimum absorbance, in a wavelength range of 355 to 405 nm, of a dry coating thereof before light exposure is within 0.3 per 25 μm film thickness of the dry coating, and a dry film obtained by applying the photosensitive composition onto a carrier film and then drying it.
摘要翻译：提供一种用于单次曝光的光敏组合物，其通过光掩模曝光到来自UV灯的光或者用来自UV灯或激光的光直接写入以形成图案化潜像以用碱性水溶液溶液，其中在曝光前的干涂层在355〜405nm的波长范围内的最大吸光度和最小吸光度之差在干涂层的每25μm膜厚度以内为0.3以下，通过涂布得到的干膜将感光性组合物涂布在载体膜上，然后干燥。

8. 发明申请

US20090038834A1 ALKALI DEVELOPMENT-TYPE SOLDER RESIST, CURED PRODUCT THEREOF, AND PRINTED WIRING BOARD PREPARED BY USING THE SAME 有权
标题翻译： ALKALI开发型焊接电阻，其固化产品和使用其制备的印刷电路板
公开(公告)号：US20090038834A1
公开(公告)日：2009-02-12
申请号：US12249981
申请日：2008-10-13
申请人： Nobuhito ITOH , Yoko Shibasaki , Kenji Kato , Masao Arima
发明人： Nobuhito ITOH , Yoko Shibasaki , Kenji Kato , Masao Arima
IPC分类号： H05K1/03 , G03F7/029 , B32B15/01
CPC分类号： C08F290/06 , C08F283/00 , C08F290/061 , C08F290/062 , C08G59/1466 , C08G59/4215 , G03F7/032 , H05K3/287 , Y10S430/117 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/123 , Y10S430/124 , Y10S430/125 , Y10S430/127 , Y10S522/913 , Y10T428/12729
摘要： An alkali development-type solder resist includes (A) a carboxyl group-containing photosensitive resin obtained by reacting (a) a compound having two or more cyclic ether or thioether groups in the molecule with (b) an unsaturated monocarboxylic acid, reacting the product with (c) a polybasic acid anhydride, reacting the resulting resin with (d) a compound having a cyclic ether group and an ethylenic unsaturated group in the molecule, and reacting the product additionally with (c) a polybasic acid anhydride, (B) an oxime ester-based photopolymerization initiator containing a specific oxime ester group, (C) a compound having two or more ethylenic unsaturated groups in the molecule, and (D) a thermosetting component, wherein the dry film obtained by applying the composition has an absorbance of 0.3 to 1.2 per 25 μm of the film thickness at a wavelength of 350 to 375 nm.
摘要翻译：碱显影型阻焊剂包括（A）通过（a）在分子中具有两个以上环醚或硫醚基的化合物与（b）不饱和一元羧酸反应得到的含羧基的感光树脂，使产物与（c）多元酸酐，使得到的树脂与（d）分子中具有环状醚基和烯键式不饱和基团的化合物反应，并将产物另外与（c）多元酸酐反应，（B）含有特定肟酯基的肟酯类光聚合引发剂，（C）分子中具有2个以上烯键式不饱和基团的化合物和（D）热固性成分，其中，通过涂布该组合物得到的干膜具有吸光度在350〜375nm的波长下，每25μm的膜厚度为0.3〜1.2μm。

9. 发明授权

US07838197B2 Photosensitive composition 有权
标题翻译：感光组合物
公开(公告)号：US07838197B2
公开(公告)日：2010-11-23
申请号：US11939933
申请日：2007-11-14
申请人： Yoko Shibasaki , Kenji Kato , Masao Arima
发明人： Yoko Shibasaki , Kenji Kato , Masao Arima
IPC分类号： G03F7/26
CPC分类号： G03F7/0388 , G03F7/029 , G03F7/031
摘要： There are provided a photosensitive composition used in one-shot exposure of exposing it via a photomask to light from a UV lamp or in direct writing with light from a UV lamp or laser light to form a patterned latent image to be developed with an alkaline aqueous solution, wherein a difference between maximum absorbance and minimum absorbance, in a wavelength range of 355 to 405 nm, of a dry coating thereof before light exposure is within 0.3 per 25 μm film thickness of the dry coating, and a dry film obtained by applying the photosensitive composition onto a carrier film and then drying it.
摘要翻译：提供一种用于单次曝光的光敏组合物，其通过光掩模曝光到来自UV灯的光或者用来自UV灯或激光的光直接写入以形成图案化潜像以用碱性水溶液溶液，其中在曝光前的干涂层在355nm至405nm的波长范围内的最大吸光度和最小吸光度之间的差异在干涂层的每25μm膜厚度的0.3内，以及通过施加将感光性组合物涂布在载体膜上，然后干燥。

10. 发明授权

US08048613B2 Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same 有权
标题翻译：碱显影型阻焊剂，其固化产物和使用其制备的印刷线路板
公开(公告)号：US08048613B2
公开(公告)日：2011-11-01
申请号：US12249981
申请日：2008-10-13
申请人： Nobuhito Itoh , Yoko Shibasaki , Kenji Kato , Masao Arima
发明人： Nobuhito Itoh , Yoko Shibasaki , Kenji Kato , Masao Arima
IPC分类号： G03F7/038 , G03F7/30
CPC分类号： C08F290/06 , C08F283/00 , C08F290/061 , C08F290/062 , C08G59/1466 , C08G59/4215 , G03F7/032 , H05K3/287 , Y10S430/117 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/123 , Y10S430/124 , Y10S430/125 , Y10S430/127 , Y10S522/913 , Y10T428/12729
摘要： An alkali development-type solder resist includes (A) a carboxyl group-containing photosensitive resin obtained by reacting (a) a compound having two or more cyclic ether or thioether groups in the molecule with (b) an unsaturated monocarboxylic acid, reacting the product with (c) a polybasic acid anhydride, reacting the resulting resin with (d) a compound having a cyclic ether group and an ethylenic unsaturated group in the molecule, and reacting the product additionally with (c) a polybasic acid anhydride, (B) an oxime ester-based photopolymerization initiator containing a specific oxime ester group, (C) a compound having two or more ethylenic unsaturated groups in the molecule, and (D) a thermosetting component, wherein the dry film obtained by applying the composition has an absorbance of 0.3 to 1.2 per 25 μm of the film thickness at a wavelength of 350 to 375 nm.
摘要翻译：碱显影型阻焊剂包括（A）通过（a）在分子中具有两个以上环醚或硫醚基的化合物与（b）不饱和一元羧酸反应得到的含羧基的感光树脂，使产物与（c）多元酸酐，使得到的树脂与（d）分子中具有环状醚基和烯键式不饱和基团的化合物反应，并将产物另外与（c）多元酸酐反应，（B）含有特定肟酯基的肟酯类光聚合引发剂，（C）分子中具有2个以上烯键式不饱和基团的化合物和（D）热固性成分，其中，通过涂布该组合物得到的干膜具有吸光度在350至375nm的波长下每25μm的膜厚度为0.3至1.2。

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