会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明授权
    • Gas control apparatus
    • 气体控制装置
    • US09482221B2
    • 2016-11-01
    • US14296568
    • 2014-06-05
    • Murata Manufacturing Co., Ltd.
    • Gaku KamitaniAtsuhiko Hirata
    • F04B23/04F04B49/00F04B39/10F04B39/12F04B43/04F04B49/22
    • F04B49/007F04B39/10F04B39/12F04B43/046F04B49/22
    • A gas control apparatus includes an upper housing to which a second piezoelectric pump is joined, a lower housing to which a first piezoelectric pump is joined, and a diaphragm. The upper housing includes a discharge hole through which gas is discharged. The lower housing includes introduction holes through which gas is introduced, an opening, a first valve seat, a second valve seat, and a third valve seat. The diaphragm is sandwiched between the upper housing and the lower housing, and is fixed to the upper housing and the lower housing so that the diaphragm contacts the first valve seat, the second valve seat, and the third valve seat. The diaphragm divides an inner space of the upper housing and the lower housing to define valve chests together with the upper housing and the lower housing.
    • 一种气体控制装置,包括连接有第二压电泵的上壳体,与第一压电泵接合的下壳体和隔膜。 上壳体包括排出孔,排出气体。 下壳体包括引入气体的引入孔,开口,第一阀座,第二阀座和第三阀座。 隔膜夹在上壳体和下壳体之间,并且固定到上壳体和下壳体,使得隔膜接触第一阀座,第二阀座和第三阀座。 隔膜将上壳体和下壳体的内部空间分开以与上壳体和下壳体一起限定阀箱。