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1. 发明授权

US09645488B2 Position measuring method, misplacement map generating method, and inspection system 有权
公开(公告)号：US09645488B2
公开(公告)日：2017-05-09
申请号：US14814793
申请日：2015-07-31
申请人： NuFlare Technology, Inc.
发明人： Hiromu Inoue
IPC分类号： G06F17/50 , G03F1/84
CPC分类号： G03F1/84
摘要： In a position measuring method, a mask including first patterns to be transferred and second patterns not to be transferred is prepared. The position coordinates of the second patterns are measured with a position measuring apparatus and an inspection system. First position correction data is generated based on the position coordinates of the second patterns. A difference is obtained between the measured position coordinates of the second patterns and the first position correction data is corrected using the obtained difference. Second position correction data is generated from the corrected first position correction data. An optical image including the position coordinates of the first and second patterns is acquired. The position coordinates of the first patterns of the optical image are corrected using a difference between the position coordinates of the second patterns of the optical image and of the second patterns based on the second position correction data.

2. 发明授权

US09116136B2 Inspection method and system 有权
标题翻译：检验方法和制度
公开(公告)号：US09116136B2
公开(公告)日：2015-08-25
申请号：US13926060
申请日：2013-06-25
申请人： NuFlare Technology, Inc
发明人： Hiromu Inoue , Nobutaka Kikuiri
IPC分类号： G01B11/24 , G01N21/956 , G01N21/95
CPC分类号： G01N21/956 , G01B11/24 , G01N21/9501 , G01N21/9505 , G01N21/95607
摘要： A sample, which has a mesa portion having a pattern thereon, is placed on a Z table. Light is irradiated to the mesa portion through an optical system and light reflected by the mesa portion is received to measure a height of the mesa portion. A height map of the mesa portion is created based on a height of a corner position. A height using the height map is corrected based on a deviation of a measured value from a target value, and a temporal variation of a focal position of light irradiated to the mesa portion. An optical image of the pattern is obtained based on the corrected height of the mesa portion. The optical image is compared with a reference image and a defect is determined when a difference value between the optical image and the reference image is more than a predetermined threshold value.
摘要翻译：将具有其上具有图案的台面部分的样品放置在Z台上。光通过光学系统照射到台面部分，并且接收由台面部分反射的光以测量台面部分的高度。基于角位置的高度来创建台面部分的高度图。基于从目标值的测量值的偏差和照射到台面部分的光的焦点位置的时间变化来校正使用高度图的高度。基于台面部分的校正高度获得图案的光学图像。将光学图像与参考图像进行比较，并且当光学图像和参考图像之间的差值大于预定阈值时确定缺陷。

3. 发明申请

US20150193918A1 INSPECTION SYSTEM AND METHOD FOR INSPECTING LINE WIDTH AND/OR POSITIONAL ERRORS OF A PATTERN 有权
标题翻译：用于检查图案的线宽和/或位置错误的检查系统和方法
公开(公告)号：US20150193918A1
公开(公告)日：2015-07-09
申请号：US14665880
申请日：2015-03-23
申请人： NuFlare Technology, Inc. , KABUSHIKI KAISHA TOSHIBA
发明人： Takanao TOUYA , Shuichi Tamamushi , Hidenori Sato , Hiroyuki Tanizaki , Takeshi Fujiwara , Eiji Sawa , Kentaro Okuda , Hiroyuki Ikeda , Hiromu Inoue , Hiroshi Tsukada
IPC分类号： G06T7/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/9503 , G01N21/956 , G06T7/0004 , G06T7/0006 , G06T7/70 , G06T7/74 , G06T2207/10004 , G06T2207/30141 , G06T2207/30148
摘要： A method and system for imaging an object to be inspected and obtaining an optical image; creating a reference image from design pattern data; preparing an inspection recipe including one or more templates and parameter settings necessary for the inspection; checking the pattern and the template against each other, and selecting the reference image which corresponds to the template; detecting first and second edges in the selected reference image in accordance with the parameter setting using determined coordinates as a reference; detecting first and second edges in the optical image, this optical image corresponds to the selected reference image; and determining an inspection value by acquiring the difference between the line width of the optical image and the reference image using the first edge and second edge of the reference image and the first edge and second edges of the optical image.
摘要翻译：一种用于对待检查对象进行成像并获得光学图像的方法和系统; 从设计模式数据创建参考图像; 准备包括一个或多个模板和检查所需的参数设置的检查配方; 检查图案和模板，并选择与模板对应的参考图像; 根据使用确定的坐标作为参考的参数设置来检测所选参考图像中的第一和第二边缘; 检测光学图像中的第一和第二边缘，该光学图像对应于所选择的参考图像; 以及通过使用参考图像的第一边缘和第二边缘以及光学图像的第一边缘和第二边缘获取光学图像的线宽和参考图像之间的差来确定检查值。

4. 发明申请

US20140055774A1 DEFECT DETECTION METHOD 有权
标题翻译：缺陷检测方法
公开(公告)号：US20140055774A1
公开(公告)日：2014-02-27
申请号：US13968816
申请日：2013-08-16
申请人： NuFlare Technology, Inc.
发明人： Shinji SUGIHARA , Riki Ogawa , Hiromu Inoue
IPC分类号： G01N21/956
CPC分类号： G01N21/95623 , G01N21/9501
摘要： A defect detection method comprising, irradiating light from a light source in an optical system and obtaining a plurality of optical images of a sample having a repeated pattern of a size smaller than a resolution of the optical system; while changing the conditions of the optical system, performing correction processing for the optical images with the use of at least one of a noise filter and a convolution filter; shifting a position of the other optical images based on any of the plurality of optical images, obtaining a relationship between shift amounts of the other optical images and a change of correlation of a gray scale value between the plurality of optical images, and performing positional alignment of the optical images based on the shift amount obtained when the correlation is highest, performing defect detection of the sample with the use of the optical images after the positional alignment.
摘要翻译：一种缺陷检测方法，包括：在光学系统中照射来自光源的光，并获得具有小于所述光学系统的分辨率的重复图案的样本的多个光学图像; 在改变光学系统的条件的同时，利用噪声滤波器和卷积滤波器中的至少一个对光学图像执行校正处理; 基于多个光学图像中的任一个移动其他光学图像的位置，获得其他光学图像的移位量与多个光学图像之间的灰度值的相关性的变化之间的关系，并且执行位置对准基于当相关性最高时获得的移位量的光学图像，在位置对准之后使用光学图像执行样本的缺陷检测。

5. 发明授权

US10197507B2 Inspection apparatus 有权
公开(公告)号：US10197507B2
公开(公告)日：2019-02-05
申请号：US14153199
申请日：2014-01-13
申请人： NuFlare Technology, Inc.
发明人： Riki Ogawa , Hiromu Inoue , Masatoshi Hirono
IPC分类号： G01R31/309 , G01N21/956 , G01N21/95 , B82Y40/00 , G01N21/88
摘要： An inspection apparatus comprising, an optical system emitting light having a predetermined wavelength, illuminating a sample while the light is converted into light having a polarization plane not in the range of −5 degrees to 5 degrees and 85 degrees to 95 degrees with respect to a direction of a repetitive pattern on the sample, an optical system for acquiring an image and forming said image on an image sensor using a lens, a half-wave plate, a first image sensor, a second image sensor, an inspection analyzer, wherein these differ in a transmission axis direction, a processor that obtains an average gray level and a standard deviation in each predetermined unit region of the image, and a defect detector, wherein a resolution limit defined by a wavelength of the light source and a numerical aperture of the lens is a value in which the pattern is not resolved.

6. 发明申请

US20180232873A1 INSPECTION METHOD AND INSPECTION APPARATUS 审中-公开
公开(公告)号：US20180232873A1
公开(公告)日：2018-08-16
申请号：US15947090
申请日：2018-04-06
申请人： NuFlare Technology, Inc.
发明人： Hiromu Inoue , Nobutaka Kikuiri
IPC分类号： G06T7/00 , G03F1/84 , G01N21/956
CPC分类号： G06T7/001 , G01N21/956 , G01N21/95607 , G01N2021/95676 , G03F1/84 , G06T2207/30148
摘要： A high resolution optical image is acquired by irradiating a mask with light emitted by a light source via a high resolution optical system. A low resolution optical image is acquired by irradiating the same mask with the light via a low resolution optical system. The design data of the mask pattern is corrected in light of shapes and dimensions determined according to at least one of a manufacturing process of the mask and a manufacturing process of a semiconductor device to be manufactured by transferring the mask pattern to a semiconductor wafer. Reference image data are generated corresponding to the high resolution optical image and the low resolution optical image. Whether the defect detected in the high resolution optical image is true or false is determined according to information of the defect detected in the low resolution optical image.

7. 发明授权

US09691143B2 Inspection apparatus and inspection apparatus system 有权
公开(公告)号：US09691143B2
公开(公告)日：2017-06-27
申请号：US14049040
申请日：2013-10-08
申请人： NUFLARE TECHNOLOGY, INC.
发明人： Hiromu Inoue , Nobutaka Kikuiri
IPC分类号： G06T7/00 , H04N7/18
CPC分类号： G06T7/0004 , G06T7/001 , G06T2207/10061 , G06T2207/30148 , H04N7/183
摘要： A first output value evaluation device obtains an average value of output values of optical image data for each of unit regions and creates a distribution map of an average value in an inspected region. A first defect history management device creates a distribution map related with the shape of the pattern from the distribution map of the average value and holds the created distribution map. A second output value evaluation device obtains at least one of a variation value and deviation of the output value of each pixel in the unit region. A defect determination device compares the obtained value with a threshold value. A second defect history management device holds information of the output value determined as a defect in the defect determination device. A defect/defect history analysis device analyzes, and checks the information from the first defect history management device and the second defect history management device.

8. 发明授权

US09207189B2 Sample support apparatus 有权
标题翻译：样品支持装置
公开(公告)号：US09207189B2
公开(公告)日：2015-12-08
申请号：US14185333
申请日：2014-02-20
申请人： NuFlare Technology, Inc.
发明人： Riki Ogawa , Hiromu Inoue
IPC分类号： G01N21/01 , G01N21/956
CPC分类号： G01N21/956 , G01N21/01
摘要： A sample support apparatus is provided in which a XY-table and a Z-table moving along a height direction are disposed in a Z-reference surface as a height reference, and in which a sample is disposed at a predetermined height position while supported by the Z-table, the sample support apparatus comprising, a height correction unit that controls movement of the Z-table, and a Z-sensor that is provided on the Z-reference surface to measure the height from the Z-reference surface, wherein a measuring surface is aligned along the same axis with respect to a measuring position of the sample, the height of the measuring surface from the Z-reference surface is measured by the Z-sensor, the height correction unit moves the Z-table according to the measured value of the height so that the sample is disposed at the predetermined height position.
摘要翻译：提供了一种样品支持装置，其中沿着高度方向移动的XY工作台和Z工作台作为高度参考设置在Z参考表面中，并且其中将样品设置在预定的高度位置，同时由所述Z台，所述样本支撑装置包括：控制所述Z表的移动的高度校正单元;以及设置在所述Z基准面上的Z传感器，以测量与所述Z基准面的高度，测量表面相对于样品的测量位置沿着相同的轴线对齐，通过Z传感器测量测量表面与Z参考表面的高度，高度校正单元根据高度的测量值，使得样品设置在预定高度位置。

9. 发明授权

US09194817B2 Defect detection method 有权
标题翻译：缺陷检测方法
公开(公告)号：US09194817B2
公开(公告)日：2015-11-24
申请号：US13968816
申请日：2013-08-16
申请人： NuFlare Technology, Inc.
发明人： Shinji Sugihara , Riki Ogawa , Hiromu Inoue
IPC分类号： G01N21/00 , G01N21/956 , G01N21/95
CPC分类号： G01N21/95623 , G01N21/9501
摘要： A defect detection method comprising, irradiating light from a light source in an optical system and obtaining a plurality of optical images of a sample having a repeated pattern of a size smaller than a resolution of the optical system; while changing the conditions of the optical system, performing correction processing for the optical images with the use of at least one of a noise filter and a convolution filter; shifting a position of the other optical images based on any of the plurality of optical images, obtaining a relationship between shift amounts of the other optical images and a change of correlation of a gray scale value between the plurality of optical images, and performing positional alignment of the optical images based on the shift amount obtained when the correlation is highest, performing defect detection of the sample with the use of the optical images after the positional alignment.
摘要翻译：一种缺陷检测方法，包括：在光学系统中照射来自光源的光，并获得具有小于所述光学系统的分辨率的重复图案的样本的多个光学图像; 在改变光学系统的条件的同时，利用噪声滤波器和卷积滤波器中的至少一个对光学图像执行校正处理; 基于多个光学图像中的任一个移动其他光学图像的位置，获得其他光学图像的移位量与多个光学图像之间的灰度值的相关性的变化之间的关系，并且执行位置对准基于当相关性最高时获得的移位量的光学图像，在位置对准之后使用光学图像执行样本的缺陷检测。

10. 发明授权

US10984978B2 Multiple electron beam inspection apparatus and multiple electron beam inspection method 有权
公开(公告)号：US10984978B2
公开(公告)日：2021-04-20
申请号：US16601901
申请日：2019-10-15
申请人： NuFlare Technology, Inc.
发明人： Hiromu Inoue , Ryoichi Hirano , Masataka Shiratsuchi , Riki Ogawa
IPC分类号： H01J37/22 , H01J37/244 , H01J37/28
摘要： According to one aspect of the present invention, a multiple electron beam inspection apparatus includes a reference image generation circuit generating reference images corresponding to the secondary electron images, in accordance with an image generation characteristic of a secondary electron image by irradiation of one beam; and a correction circuit generating corrected reference images in which, on the basis of deviation information between a figure pattern of the secondary electron image by irradiation of the one beam of the multiple primary electron beams and a figure pattern of a secondary electron image by irradiation of another beam different from the one beam of the multiple primary electron beams, a shape of a figure pattern of a reference image corresponding to the figure pattern of the secondary electron image by the irradiation of the another beam in the reference images is corrected.

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