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    • 4. 发明申请
    • METHOD FOR MANUFACTURING A MICROMECHANICAL TIMEPIECE PART AND SAID MICROMECHANICAL TIMEPIECE PART
    • 微生物时间部分的制备方法和微生物时效部分
    • US20170068215A1
    • 2017-03-09
    • US15231951
    • 2016-08-09
    • Nivarox-FAR S.A.
    • Philippe DUBOIS
    • G04B15/14G04B13/02B81C1/00
    • A method for manufacturing a micromechanical timepiece part starting from a silicon-based substrate, including, forming pores on the surface of at least one part of a surface of said silicon-based substrate of a determined depth, entirely filling the pores with a material chosen from diamond, diamond-like carbon, silicon oxide, silicon nitride, ceramics, polymers and mixtures thereof, in order to form, in the pores, a layer of the material of a thickness at least equal to the depth of the pores. A micromechanical timepiece part including a silicon-based substrate which has, on the surface of at least one part of a surface of the silicon-based substrate, pores of a determined depth, the pores being filled entirely with a layer of a material chosen from diamond, diamond-like carbon, silicon oxide, silicon nitride, ceramics, polymers and mixtures thereof, of a thickness at least equal to the depth of the pores.
    • 一种用于制造从硅基衬底开始的微机械钟表部件的方法,包括在所确定的深度的所述硅基衬底的表面的至少一部分的表面的表面上形成孔,用选择的材料完全填充孔 来自金刚石,类金刚石碳,氧化硅,氮化硅,陶瓷,聚合物及其混合物,以在孔中形成至少等于孔深度的厚度的材料层。 一种微机械钟表部件,其包括硅基基板,所述硅基基板在所述硅基基板的表面的至少一部分的表面上具有确定深度的孔,所述孔被完全填充有选自以下的材料层: 金刚石,类金刚石碳,氧化硅,氮化硅,陶瓷,聚合物及其混合物,其厚度至少等于孔的深度。
    • 10. 发明申请
    • METHOD FOR MANUFACTURING A MICROMECHANICAL TIMEPIECE PART AND SAID MICROMECHANICAL TIMEPIECE PART
    • 微生物时间部分的制备方法和微生物时效部分
    • US20170068219A1
    • 2017-03-09
    • US15234147
    • 2016-08-11
    • Nivarox-FAR S.A.
    • Philippe DUBOIS
    • G04B31/08C23C16/455C23C14/22
    • A method for manufacturing a micromechanical timepiece part starting from a silicon-based substrate, including, providing a silicon-based substrate, forming pores on the surface of at least one part of a surface of the silicon-based substrate of a depth of at least 10 μm, preferably of at least 50 μm, and more preferably of at least 100 μm, the pores being designed in order to open out at the external surface of the micromechanical timepiece part. A micromechanical timepiece part including a silicon-based substrate which has, on the surface of at least one part of a surface of the silicon-based substrate, pores of a depth of at least 10 μm, preferably of at least 50 μm, and more preferably of at least 100 μm, the pores being designed in order to open out at the external surface of the micromechanical timepiece part.
    • 一种从硅基基板开始制造微机械钟表部件的方法,包括:提供硅基基板,至少在所述硅基基板表面的至少一部分的表面上形成孔,所述表面的深度至少为 10μm,优选为50μm以上,更优选为100μm以上,为了在微机械钟表部的外表面开口而设计孔。 一种微机械钟表部件,其包括硅基基板,所述硅基基板在所述硅基基板的表面的至少一部分的表面上具有至少10μm,优选至少50μm的深度的孔,以及更多 优选为至少100μm,所述孔设计成在微机械钟表部分的外表面处开口。