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    • 6. 发明授权
    • Multi-stage heterodyne control circuit
    • 多级外差控制电路
    • US09591739B2
    • 2017-03-07
    • US14702863
    • 2015-05-04
    • Reno Technologies, Inc.
    • Imran Ahmed Bhutta
    • H01J7/24H05H1/46H04B10/00H01J37/32
    • H05H1/46H01J37/32174H01J37/32183H04B10/142H05H2001/4645H05H2001/4682
    • A circuit for controlling an RF generator, the circuit including first and second heterodyne stages. The first heterodyne stage receives an input signal, which is based on a characteristic of an RF signal generated by the RF generator, and is configured to: mix the input signal with a first mix signal to generate a first heterodyne signal and to filter the first heterodyne signal through a low pass filter. The second heterodyne stage receives the filtered first heterodyne signal and is configured to: mix the filtered first heterodyne signal with a second mix signal to generate a second heterodyne signal and to filter the second heterodyne signal through a band pass filter. A detection stage converts the filtered second heterodyne signal to a DC signal, and a power control stage receives the DC signal and controls the RF signal in response to the DC signal.
    • 一种用于控制RF发生器的电路,该电路包括第一和第二外差级。 第一外差级接收基于由RF发生器产生的RF信号的特性的输入信号,并且被配置为:将输入信号与第一混合信号进行混合,以产生第一外差信号并对第一外差信号进行滤波 外差信号通过低通滤波器。 第二外差级接收经滤波的第一外差信号,并且被配置为:将经滤波的第一外差信号与第二混合信号混合以产生第二外差信号,并通过带通滤波器对第二外差信号进行滤波。 检测级将滤波后的第二外差信号转换为DC信号,功率控制级接收直流信号并根据直流信号控制RF信号。
    • 7. 发明申请
    • RF IMPEDANCE MATCHING NETWORK
    • 射频阻抗匹配网络
    • US20150200079A1
    • 2015-07-16
    • US14669568
    • 2015-03-26
    • Reno Technologies, Inc.
    • Imran Ahmed Bhutta
    • H01J37/32H01L21/67H01J37/244H01J37/248H01J37/24
    • H01J37/32183H01J37/241H01J37/244H01J37/248H01L21/67253H03H7/40H03H11/30
    • An RF impedance matching network includes an RF input; an RF output configured to operably couple to a plasma chamber; a series electronically variable capacitor (“series EVC”), the series EVC electrically coupled in series between the RF input and the RF output; and a shunt electronically variable capacitor (“shunt EVC”), the shunt EVC electrically coupled in parallel between a ground and one of the RF input and the RF output; a control circuit to control the series variable capacitance and the shunt variable capacitance, wherein the control circuit is configured to determine the variable plasma impedance of the plasma chamber, determine a series capacitance value and a shunt capacitance value, and generate a control signal to alter at least one of the series variable capacitance and the shunt variable capacitance; wherein the alteration is caused by at least one of a plurality of switching circuits.
    • RF阻抗匹配网络包括RF输入; 被配置为可操作地耦合到等离子体室的RF输出; 串联电可变电容器(“EVC”系列),串联EVC串联在RF输入和RF输出之间; 和分流电可变电容器(“并联EVC”),并联电气并联在地与RF输入和RF输出中的一个之间的并联EVC; 用于控制串联可变电容和分流可变电容的控制电路,其中控制电路被配置为确定等离子体室的可变等离子体阻抗,确定串联电容值和并联电容值,并产生控制信号以改变 串联可变电容和分流可变电容中的至少一个; 其中所述改变由多个开关电路中的至少一个引起。