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    • 4. 发明授权
    • Array substrate, liquid crystal display for the same and manufacturing method thereof
    • 阵列基板,液晶显示器及其制造方法
    • US08625041B2
    • 2014-01-07
    • US13355488
    • 2012-01-21
    • Yung-Fu ChenRong-Bing WuPo-Hsiao ChenChien-Hao Wu
    • Yung-Fu ChenRong-Bing WuPo-Hsiao ChenChien-Hao Wu
    • G02F1/1333
    • G02F1/13439G02F1/134363G02F2001/133388G02F2001/136254G02F2001/136295G02F2201/123G02F2201/124
    • An array substrate, liquid crystal display for the same and manufacturing method thereof are described. The array substrate includes a substrate, a plurality of scan lines, a plurality of data lines, a plurality of contact pads, a passivation layer and transparent conducting layer. The substrate has a first display region, a second display region and a first non-display region. The contact pads are disposed in the first non-display region. The transparent conducting layer disposed in the passivation layer includes a first pixel electrode, a second pixel electrode and a plurality of comb electrode. The first pixel electrode and second pixel electrode are disposed in the first display region and the second display region wherein the widths of the first pixel electrodes either are equal to or approximate the widths of the second pixel electrodes. The comb electrodes are disposed in the first non-display region and connected to the contact pads.
    • 对阵列基板,液晶显示器及其制造方法进行说明。 阵列基板包括基板,多条扫描线,多条数据线,多个接触焊盘,钝化层和透明导电层。 衬底具有第一显示区域,第二显示区域和第一非显示区域。 接触垫设置在第一非显示区域中。 设置在钝化层中的透明导电层包括第一像素电极,第二像素电极和多个梳状电极。 第一像素电极和第二像素电极设置在第一显示区域和第二显示区域中,其中第一像素电极的宽度等于或接近第二像素电极的宽度。 梳状电极设置在第一非显示区域中并连接到接触垫。
    • 7. 发明授权
    • Method for improving performance of sputtering target
    • 提高溅射靶性能的方法
    • US06723210B2
    • 2004-04-20
    • US10255298
    • 2002-09-26
    • Tun-Ho TengYung-Fu Chen
    • Tun-Ho TengYung-Fu Chen
    • C23C1435
    • C23C14/35H01J37/3408
    • A method for improving a performance of a sputtering target in a magnetron sputtering system having at least one magnet repetitively and retracingly scanning between two sides thereof and receiving a power input changing with a scanning position of the magnet is provided. The method includes the steps of stepwise reducing the power input while the magnet approaches a specific distance range near a retracing point, so as to reduce an erosion rate of the sputtering target by the magnetron sputtering system, and increasing the power input to a specific value while the magnet leaves the specific distance range, wherein the power input changes with the scanning position of the magnet, so as to improve the performance of the sputtering target.
    • 提供了一种用于改善磁控溅射系统中的溅射靶的性能的方法,该方法具有至少一个磁体,其两面之间重复地并且进行回扫,并接收随磁体的扫描位置变化的电力输入。 该方法包括以下步骤:当磁体接近回扫点附近的特定距离范围时逐步减小功率输入,以便通过磁控溅射系统降低溅射靶的侵蚀速率,并将功率输入增加到特定值 同时磁体离开特定的距离范围,其中功率输入随着磁体的扫描位置而变化,以提高溅射靶的性能。