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1. 发明申请

US20090021847A1 OPTICAL ELEMENT POSITIONING APPARATUS, PROJECTION OPTICAL SYSTEM AND EXPOSURE APPARATUS 有权
标题翻译：光学元件定位装置，投影光学系统和曝光装置
公开(公告)号：US20090021847A1
公开(公告)日：2009-01-22
申请号：US12171644
申请日：2008-07-11
申请人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
发明人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
IPC分类号： G02B7/00
CPC分类号： G02B7/005 , G02B7/1827 , G03F7/70258 , G03F7/70825
摘要： The apparatus includes a holder holding an optical element, a back plate supporting the optical element via the holder, a mechanism moving the optical element in a six-degree-of-freedom, a base plate supporting the back plate via the mechanism, and six displacement sensors disposed on the base plate and measuring displacement amounts of different points on the optical element. The displacement sensors includes three ones measuring them in a first direction, one measuring it in a second direction, and two ones measuring them in a third direction. The apparatus further includes a transformation processor transforming the six measured displacement amounts into displacement amounts of the optical element in the six-degree-of-freedom, a calibration processor calibrating the transformed displacement amounts, and a controller outputting command values to the displacing mechanism based on differences between the calibrated displacement amounts and target displacement amounts of the optical element.
摘要翻译：该装置包括保持光学元件的保持器，经由保持器支撑光学元件的背板，以六自由度移动光学元件的机构，经由机构支撑背板的基板，以及六个位移传感器设置在基板上并测量光学元件上的不同点的位移量。位移传感器包括在第一方向上测量它们的三个位移传感器，一个在第二方向上测量它们，并且在第三方向上测量它们的两个。该装置还包括变换处理器，将六个测量的位移量变换为六自由度中的光学元件的位移量，校准经变换的位移量的校准处理器，以及基于位移机构输出命令值的控制器在校准位移量和光学元件的目标位移量之间的差异。

2. 发明授权

US07821726B2 Optical element positioning apparatus, projection optical system and exposure apparatus 有权
标题翻译：光学元件定位装置，投影光学系统和曝光装置
公开(公告)号：US07821726B2
公开(公告)日：2010-10-26
申请号：US12171644
申请日：2008-07-11
申请人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
发明人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
IPC分类号： G02B7/02
CPC分类号： G02B7/005 , G02B7/1827 , G03F7/70258 , G03F7/70825
摘要： An optical element is moved in six-degrees-of-freedom. Three first displacement sensors are disposed on a base plate and measure respective displacement amounts of three mutually different points on the optical element in a first direction. A second displacement sensor measures a displacement amount of one point on the optical element in a second direction. Two third displacement sensors measure respective displacement amounts of two mutually different points on the optical element in a third direction. A transformation processor transforms the six measured displacement amounts. A calibration processor calibrates the transformed displacement amounts with a calibration matrix of which coefficients are previously obtained to calibrate the displacement amounts in the six-degrees-of-freedom, which have errors due to measurement errors of the displacement sensors. A controller outputs command values based on differences between the calibrated displacement amounts and target displacement amounts.
摘要翻译：光学元件以6自由度移动。三个第一位移传感器设置在基板上，并且在第一方向上测量光学元件上的三个相互不同的点的相应位移量。第二位移传感器在第二方向上测量光学元件上的一个点的位移量。两个第三位移传感器在第三方向测量光学元件上的两个相互不同的点的相应位移量。变换处理器转换六个测量的位移量。校准处理器使用预先获得系数的校准矩阵校准变换的位移量，以校准六自由度中的位移量，其由于位移传感器的测量误差而具有误差。控制器基于校准的位移量和目标位移量之间的差异输出命令值。

3. 发明授权

US07948695B2 Optical element positioning apparatus, projection optical system and exposure apparatus 有权
标题翻译：光学元件定位装置，投影光学系统和曝光装置
公开(公告)号：US07948695B2
公开(公告)日：2011-05-24
申请号：US12870877
申请日：2010-08-30
申请人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
发明人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
IPC分类号： G02B7/02
CPC分类号： G02B7/005 , G02B7/1827 , G03F7/70258 , G03F7/70825
摘要： An optical element is moved in six-degrees-of-freedom. Three first displacement sensors are disposed on a base plate and measure respective displacement amounts of three mutually different points on the optical element in a first direction. A second displacement sensor measures a displacement amount of one point on the optical element in a second direction. Two third displacement sensors measure respective displacement amounts of two mutually different points on the optical element in a third direction. A transformation processor transforms the six measured displacement amounts. A calibration processor calibrates the transformed displacement amounts with a calibration matrix of which coefficients are previously obtained to calibrate the displacement amounts in the six-degrees-of-freedom, which have errors due to measurement errors of the displacement sensors. A controller outputs command values based on differences between the calibrated displacement amounts and target displacement amounts.
摘要翻译：光学元件以6自由度移动。三个第一位移传感器设置在基板上，并且在第一方向上测量光学元件上的三个相互不同的点的相应位移量。第二位移传感器在第二方向上测量光学元件上的一个点的位移量。两个第三位移传感器在第三方向测量光学元件上的两个相互不同的点的相应位移量。变换处理器转换六个测量的位移量。校准处理器使用预先获得系数的校准矩阵校准变换的位移量，以校准六自由度中的位移量，其由于位移传感器的测量误差而具有误差。控制器基于校准的位移量和目标位移量之间的差异输出命令值。

4. 发明申请

US20100321803A1 Optical Element Positioning Apparatus, Projection Optical System and Exposure Apparatus 有权
标题翻译：光学元件定位装置，投影光学系统和曝光装置
公开(公告)号：US20100321803A1
公开(公告)日：2010-12-23
申请号：US12870877
申请日：2010-08-30
申请人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
发明人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
IPC分类号： G02B7/00
CPC分类号： G02B7/005 , G02B7/1827 , G03F7/70258 , G03F7/70825
摘要： An optical element is moved in six-degrees-of-freedom. Three first displacement sensors are disposed on a base plate and measure respective displacement amounts of three mutually different points on the optical element in a first direction. A second displacement sensor measures a displacement amount of one point on the optical element in a second direction. Two third displacement sensors measure respective displacement amounts of two mutually different points on the optical element in a third direction. A transformation processor transforms the six measured displacement amounts A calibration processor calibrates the transformed displacement amounts with a calibration matrix of which coefficients are previously obtained to calibrate the displacement amounts in the six-degrees-of-freedom, which have errors due to measurement errors of the displacement sensors. A controller outputs command values based on differences between the calibrated displacement amounts and target displacement amounts.
摘要翻译：光学元件以6自由度移动。三个第一位移传感器设置在基板上，并且在第一方向上测量光学元件上的三个相互不同的点的相应位移量。第二位移传感器在第二方向上测量光学元件上的一个点的位移量。两个第三位移传感器在第三方向测量光学元件上的两个相互不同的点的相应位移量。变换处理器转换六个测量的位移量A校准处理器用先前获得的系数的校准矩阵校准变换的位移量，以校准六自由度中的位移量，其由于测量误差而发生错误位移传感器。控制器基于校准的位移量和目标位移量之间的差异输出命令值。

5. 发明授权

US06534777B2 Surface position detecting system and method having a sensor selection 失效
标题翻译：具有传感器选择的表面位置检测系统和方法
公开(公告)号：US06534777B2
公开(公告)日：2003-03-18
申请号：US09793078
申请日：2001-02-27
申请人： Yuichi Yamada , Shigeyuki Uzawa
发明人： Yuichi Yamada , Shigeyuki Uzawa
IPC分类号： G01N2186
CPC分类号： G03F9/7026 , G03F7/70358
摘要： A surface position detecting system for detecting a surface position of a substrate. The system includes a plurality of sensors for measuring surface position at plural locations on the substrate, while relatively scanning the substrate, a discriminating device for discriminating and memorizing, beforehand, effectiveness/ineffectiveness of each sensor at each measurement point during scanning measurement, on the basis of information related to the substrate processing, and a calculating device for selecting, during scan measurement, one or those of the sensors of effective measured value on the basis of the discrimination information and for calculating the surface information of the substrate on the basis of a measurement output of the one or those sensors.
摘要翻译：一种用于检测基板的表面位置的表面位置检测系统。该系统包括用于在扫描基板的同时在基板上的多个位置处测量表面位置的多个传感器，用于在扫描测量期间在每个测量点处预先识别和记忆每个传感器在每个测量点处的有效性/无效性的识别装置，基板处理的信息的基础，以及计算装置，用于在扫描测量期间根据识别信息选择有效测量值中的一个或那些传感器，并且基于基于一个或那些传感器的测量输出。

6. 发明授权

US6142660A Semiconductor manufacturing apparatus and command setting method 失效
标题翻译：半导体制造装置及指令设定方法
公开(公告)号：US6142660A
公开(公告)日：2000-11-07
申请号：US870546
申请日：1997-06-06
申请人： Norihiko Utsunomiya , Shigeyuki Uzawa
发明人： Norihiko Utsunomiya , Shigeyuki Uzawa
IPC分类号： G03F7/20 , G05B19/042 , G05B19/418 , H01L21/027 , G06F19/00
CPC分类号： G05B19/41875 , G05B19/0426 , G05B2219/24001 , Y02P90/14 , Y02P90/22
摘要： A semiconductor manufacturing method and apparatus using a plurality of maintenance commands for automatically measuring errors caused by the apparatus or caused by a wafer treatment process, by using measuring functions of the apparatus. The apparatus includes a display device for displaying a list of the plurality of maintenance commands, a console-side control device for enabling an operator to select some of the plurality of maintenance commands displayed by the display device, to generate a maintenance menu in which some of the plurality of maintenance commands are combined as desired by the operator and to edit the maintenance menu, a storage device for storing the maintenance menu generated and edited using the console-side control device and an apparatus-side control device for successively executing the maintenance commands in the maintenance menu stored in the storage device when the apparatus-side control device receives an instruction to execute the maintenance menu.
摘要翻译：一种使用多个维护命令的半导体制造方法和装置，其通过使用该装置的测量功能来自动测量由该装置引起或由晶片处理过程引起的误差。该装置包括用于显示多个维护命令的列表的显示装置，用于使操作者能够选择由显示装置显示的多个维护命令中的一些的控制台侧控制装置，以生成维护菜单，其中一些多个维护命令的组合根据操作者的需要进行组合并编辑维护菜单，存储装置，用于存储使用控制台侧控制装置生成和编辑的维护菜单以及用于连续执行维护的装置侧控制装置当设备侧控制设备接收到执行维护菜单的指令时，存储在存储设备中的维护菜单中的命令。

7. 发明授权

US5920398A Surface position detecting method and scanning exposure method using the same 失效
标题翻译：表面位置检测方法及使用其的扫描曝光方法
公开(公告)号：US5920398A
公开(公告)日：1999-07-06
申请号：US805749
申请日：1997-02-25
申请人： Takehiko Iwanaga , Yuichi Yamada , Shigeyuki Uzawa
发明人： Takehiko Iwanaga , Yuichi Yamada , Shigeyuki Uzawa
IPC分类号： G01B11/03 , G03F7/20 , G03F7/207 , G03F9/00 , G01B11/00
CPC分类号： G03F9/7026 , G03F7/70358 , G03F7/70458 , G03F9/7034
摘要： A surface position detecting method for detecting a surface position of a surface to be examined, having surface height irregularity, while relatively scanning the surface, is disclosed. The method includes detecting characteristic data related to a surface state at plural measurement positions on the surface, while relatively scanning the surface, and processing the detected characteristic data related to the measurement positions to determine a measurement position for measurement of the surface position in a subsequent surface position detecting process.
摘要翻译：公开了一种表面位置检测方法，用于在相对扫描表面的同时检测具有表面高度不规则性的待检查表面的表面位置。该方法包括在相对扫描表面的同时检测与表面上的多个测量位置处的表面状态有关的特征数据，以及处理与测量位置有关的检测到的特征数据，以确定用于后续测量中的表面位置的测量位置表面位置检测过程。

8. 发明授权

US5499099A Alignment method and alignment system 失效
标题翻译：对准方法和对准系统
公开(公告)号：US5499099A
公开(公告)日：1996-03-12
申请号：US202064
申请日：1994-02-25
申请人： Makoto Sato , Shigeyuki Uzawa
发明人： Makoto Sato , Shigeyuki Uzawa
IPC分类号： G03F7/20 , G03F9/00 , G06Q50/00 , G06Q50/04 , H01L21/027 , H01L21/30 , G01B11/00
CPC分类号： G03F7/70425 , G03F9/70
摘要： An alignment method and system in which substrates having zones, to be aligned and being disposed in a predetermined array, are supplied sequentially and in which in each substrate the zones are brought into alignment with a predetermined reference position sequentially. Deviations in the positions of the zones of a first substrate with respect to positions determined in accordance with the predetermined array, are measured in sequence, and the actual array of the zones through the measurement is detected. The relationship between the predetermined array and the actual array detected in the first step is determined in terms of a predetermined transformation parameter, and a transformation parameter for the first substrate effective to minimize an error, is determined. An error between the actual array and an array determined in accordance with the transformation parameter of the first substrate, is determined and stored, and with respect to the predetermined reference position, a second substrate having zones of substantially the same array as the first substrate is aligned by using the stored error as an alignment correction value.
摘要翻译：对准方法和系统，其中顺序地提供要被排列并且以预定阵列布置的区域的基板，并且其中在每个基板中，这些区域顺序地与预定的参考位置对齐。相对于根据预定阵列确定的位置的第一基板的区域的位置的偏差被依次测量，并且检测通过测量的区域的实际阵列。根据预定的变换参数来确定在第一步骤中检测到的预定阵列和实际阵列之间的关系，并且确定用于使误差最小化的第一衬底的变换参数。确定并存储根据第一衬底的变换参数确定的实际阵列和阵列之间的误差，并且相对于预定参考位置，具有与第一衬底基本相同的阵列区域的第二衬底是通过使用存储的错误作为对准校正值对齐。

9. 发明授权

US06614503B1 Projection exposure apparatus, and device manufacturing method which compensate for a change in optical performance of a projection optical system 有权
标题翻译：投影曝光装置和补偿投影光学系统的光学性能变化的装置制造方法
公开(公告)号：US06614503B1
公开(公告)日：2003-09-02
申请号：US09658464
申请日：2000-09-08
申请人： Shigeyuki Uzawa
发明人： Shigeyuki Uzawa
IPC分类号： G03B2752
CPC分类号： G03F7/70241 , G03F7/70258 , G03F7/70883
摘要： A projection exposure apparatus includes a projection optical system with a barrel, a pressure measuring device disposed inside and/or outside the barrel, and a device for estimating a change in pressure in accordance with an output of the pressure measuring device and for compensating for a change in optical performance of the projection optical system due to the change in pressure, in accordance with the estimation.
摘要翻译：投影曝光装置包括具有镜筒的投影光学系统，设置在镜筒内部和/或外部的压力测量装置，以及用于根据压力测量装置的输出来估计压力变化的装置，根据估计，由于压力的变化导致的投影光学系统的光学性能的变化。

10. 发明授权

US06307620B1 Substrate holding apparatus, substrate transfer system, exposure apparatus, coating apparatus, method for making a device, and method for cleaning a substrate holding section 有权
标题翻译：基板保持装置，基板输送系统，曝光装置，涂布装置，制造装置的方法以及清洗基板保持部的方法
公开(公告)号：US06307620B1
公开(公告)日：2001-10-23
申请号：US09557972
申请日：2000-04-25
申请人： Yukio Takabayashi , Shigeyuki Uzawa
发明人： Yukio Takabayashi , Shigeyuki Uzawa
IPC分类号： G03B2758
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70916 , G03F7/70925 , H01L21/6875
摘要： An exposure holding apparatus includes a substrate holding section for holding a substrate. The substrate holding section includes a thin film, which causes a photocatalytic reaction upon irradiation with light. This substrate holding apparatus prevents adhesion of foreign materials, which causes a decrease in yield of device production, and provides a system for rapidly removing the foreign materials.
摘要翻译：曝光保持装置包括用于保持基板的基板保持部。基板保持部包括在照射光时引起光催化反应的薄膜。该基板保持装置防止异物粘附，导致器件制造成品率下降，并提供快速除去异物的系统。

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