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    • 9. 发明申请
    • TRANSPARENT SUPPORTED ELECTRODE FOR AN OLED
    • 用于OLED的透明支持电极
    • US20150001520A1
    • 2015-01-01
    • US14377657
    • 2013-02-07
    • SAINT-GOBAIN GLASS FRANCE
    • Vincent SauvinetFabien LienhartGuillaume Lecamp
    • H01L51/52
    • H01L51/5215H01L51/5209H01L51/5212H01L51/5262H01L51/5271
    • An OLED electrode includes a transparent or translucent non-conductive substrate, with a refractive index between 1.3 and 1.6. A continuous network of lines of a metal or alloy with electrical conductivity at least 5·106 S·m−1 is on a substrate surface. The metal lines have an average width between 0.05 and 3 μm. These metal lines delimit non-metalized fields of average equivalent diameter between 0.1 and 7.0 μm. At least 20% of the metal lines' surface has a tangent forming an angle between 15 and 75° relative to a substrate-electrode plane. A transparent or translucent layer completely covers the metal lines and non-metalized fields. The layer has refractive index between 1.6 and 2.4 and resistivity greater than that of the metal lines and less than 104 Ω·cm. The metal lines and the transparent or translucent layer form a composite layer called an electrode layer.
    • OLED电极包括透明或半透明的非导电衬底,折射率在1.3和1.6之间。 具有至少5·106S·m-1的导电性的金属或合金的线的连续网络位于基板表面上。 金属线的平均宽度为0.05〜3μm。 这些金属线限定了平均当量直径在0.1和7.0μm之间的非金属化场。 至少20%的金属线表面具有相对于基板 - 电极平面形成15至75°角的切线。 透明或半透明的层完全覆盖金属线和非金属场。 该层的折射率在1.6和2.4之间,电阻率大于金属线的折射率,小于104&OHgr。·cm。 金属线和透明或半透明层形成称为电极层的复合层。