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    • 6. 发明授权
    • Semiconductor device
    • 半导体器件
    • US09530894B2
    • 2016-12-27
    • US14615031
    • 2015-02-05
    • SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    • Junichi KoezukaMasami JintyouYukinori ShimaDaisuke KurosakiMasataka NakadaShunpei Yamazaki
    • H01L29/786H01L27/12
    • H01L27/1251H01L27/1225H01L27/1237H01L27/124H01L29/78603H01L29/78645H01L29/78648H01L29/7869H01L29/78696
    • A semiconductor device including an oxide semiconductor in which on-state current is high is provided. The semiconductor device includes a first transistor provided in a driver circuit portion and a second transistor provided in a pixel portion; the first transistor and the second transistor have different structures. Furthermore, the first transistor and the second transistor are transistors having a top-gate structure. In an oxide semiconductor film of each of the transistors, an impurity element is contained in regions which do not overlap with a gate electrode. The regions of the oxide semiconductor film which contain the impurity element function as low-resistance regions. Furthermore, the regions of the oxide semiconductor film which contain the impurity element are in contact with a film containing hydrogen. The first transistor provided in the driver circuit portion includes two gate electrodes between which the oxide semiconductor film is provided.
    • 提供了包括其中导通电流高的氧化物半导体的半导体器件。 该半导体器件包括设置在驱动电路部分中的第一晶体管和设置在像素部分中的第二晶体管; 第一晶体管和第二晶体管具有不同的结构。 此外,第一晶体管和第二晶体管是具有顶栅结构的晶体管。 在每个晶体管的氧化物半导体膜中,杂质元素包含在不与栅电极重叠的区域中。 含有杂质元素的氧化物半导体膜的区域用作低电阻区域。 此外,含有杂质元素的氧化物半导体膜的区域与含有氢的膜接触。 设置在驱动电路部分的第一晶体管包括设置氧化物半导体膜的两个栅电极。