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    • 2. 发明授权
    • Method for manufacturing semiconductor optical waveguide device, and semiconductor optical waveguide device
    • 半导体光波导器件的制造方法以及半导体光波导器件
    • US09261649B2
    • 2016-02-16
    • US14657781
    • 2015-03-13
    • SUMITOMO ELECTRIC INDUSTRIES, LTD.
    • Takamitsu KitamuraHideki YagiNaoya Kono
    • G02B6/02G02B6/136G06Q20/20G02B6/122G02B6/12
    • G02B6/136G02B6/1228G02B2006/12173
    • A method for manufacturing a semiconductor optical waveguide device includes the steps of forming a waveguide mesa having first and second portions by etching a stacked semiconductor layer through a first mask; forming a dummy buried region embedding a top surface and side surfaces of the waveguide mesa; forming a second mask on the dummy buried region, the second mask having an opening on the first portion and having a pattern on the second portion; forming a third mask having an opening that reaches a top surface of the first portion, the third mask including a dummy buried mask formed by etching the dummy buried region through the second mask; forming an upper mesa by etching the waveguide mesa through the third mask; and after removing the third mask, forming a lower mesa by etching the stacked semiconductor layer, the lower mesa having a greater width than that of the upper mesa.
    • 一种制造半导体光波导器件的方法包括以下步骤:通过第一掩模蚀刻堆叠的半导体层来形成具有第一和第二部分的波导台面; 形成嵌入波导台面的顶面和侧面的虚拟埋入区域; 在所述伪掩埋区域上形成第二掩模,所述第二掩模在所述第一部分上具有开口,并且在所述第二部分上具有图案; 形成具有到达所述第一部分的顶表面的开口的第三掩模,所述第三掩模包括通过所述第二掩模蚀刻所述伪掩埋区域而形成的伪掩模掩模; 通过蚀刻波导台面通过第三掩模形成上台面; 并且在去除第三掩模之后,通过蚀刻堆叠的半导体层形成下台面,下台面的宽度大于上台面的宽度。
    • 4. 发明授权
    • Method for producing optical semiconductor device
    • 光半导体器件的制造方法
    • US08986560B2
    • 2015-03-24
    • US14057146
    • 2013-10-18
    • Sumitomo Electric Industries, Ltd.
    • Takamitsu KitamuraHideki Yagi
    • B29D11/00G02F1/225G02F1/025
    • G02F1/2257G02B6/136G02B2006/121G02B2006/12173G02F1/025G02F2001/212G06F17/5068H01L21/31116H01L22/12H01L22/20H01L33/44
    • A method for producing an optical semiconductor device includes the steps of determining a wafer size to make a section arrangement including a plurality of sections in each of which the optical semiconductor device including a semiconductor mesa is formed; obtaining an in-plane distribution of a thickness of a resin layer on a wafer; obtaining a correlation between a thickness of a resin layer and a trench width; forming a trench width map using the in-plane distribution of the thickness and the correlation; preparing an epitaxial substrate by forming a stacked semiconductor layer; forming, on the epitaxial substrate, a mask based on the trench width map; forming a trench structure including the semiconductor mesa by etching the stacked semiconductor layer using the mask; forming a resin layer on the trench structure; and forming an opening on the semiconductor mesa by etching the resin layer.
    • 一种光半导体装置的制造方法,其特征在于,包括:确定晶片尺寸,形成包括形成有半导体台面的光半导体装置的多个部分的部分布置的步骤; 获得晶片上的树脂层的厚度的平面内分布; 获得树脂层的厚度和沟槽宽度之间的相关性; 使用厚度的面内分布和相关性形成沟槽宽度图; 通过形成堆叠的半导体层制备外延衬底; 在所述外延衬底上形成基于所述沟槽宽度图的掩模; 通过使用掩模蚀刻堆叠的半导体层来形成包括半导体台面的沟槽结构; 在沟槽结构上形成树脂层; 并通过蚀刻树脂层在半导体台面上形成开口。
    • 6. 发明授权
    • Semiconductor optical modulator and method for manufacturing semiconductor optical modulator
    • 半导体光调制器及制造半导体光调制器的方法
    • US09523871B2
    • 2016-12-20
    • US14796770
    • 2015-07-10
    • SUMITOMO ELECTRIC INDUSTRIES, LTD.
    • Takamitsu KitamuraHideki YagiDaisuke KimuraHirohiko KobayashiMasataka Watanabe
    • G02F1/025G02F1/21G02F1/225
    • G02F1/025G02F1/218G02F1/2255
    • A semiconductor optical modulator includes a substrate having a principal surface; a waveguide disposed on the principal surface of the substrate, the waveguide extending in a first direction; a first electrode disposed on the waveguide, the first electrode being in contact with an upper surface of the waveguide; a first wiring connected to the first electrode, the first wiring extending in a second direction intersecting the first direction; a build-up portion connected to the first wiring; a second wiring connected to the build-up portion, the second wiring extending in a plane parallel to the principal surface of the substrate; and a resin layer disposed on the substrate, the resin layer embedding the first wiring and the build-up portion. The build-up portion extends along a third direction, the third direction intersecting perpendicularly to the principal surface of the substrate. The second wiring is disposed on the resin layer.
    • 半导体光调制器包括具有主表面的基板; 布置在所述基板的主表面上的波导,所述波导沿第一方向延伸; 设置在所述波导上的第一电极,所述第一电极与所述波导的上表面接触; 连接到所述第一电极的第一布线,所述第一布线沿与所述第一方向相交的第二方向延伸; 连接到第一布线的积聚部分; 连接到所述积聚部分的第二布线,所述第二布线在平行于所述基板的主表面的平面中延伸; 以及设置在基板上的树脂层,树脂层嵌入第一布线和积层部。 堆积部分沿着第三方向延伸,第三方向垂直于衬底的主表面相交。 第二布线设置在树脂层上。