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1. 发明申请

US20110032515A1 METHOD OF APPARATUS FOR DETECTING PARTICLES ON A SPECIMEN 有权
公开(公告)号：US20110032515A1
公开(公告)日：2011-02-10
申请号：US12907895
申请日：2010-10-19
申请人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
发明人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

2. 发明授权

US07859656B2 Defect inspection method and system 有权
标题翻译：缺陷检查方法和系统
公开(公告)号：US07859656B2
公开(公告)日：2010-12-28
申请号：US12366956
申请日：2009-02-06
申请人： Sachio Uto , Hiroyuki Nakano , Yukihiro Shibata , Akira Hamamatsu , Yuta Urano
发明人： Sachio Uto , Hiroyuki Nakano , Yukihiro Shibata , Akira Hamamatsu , Yuta Urano
IPC分类号： G01N21/00 , G01N21/88 , H01L27/00
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/4788 , G01N21/94 , G01N21/956
摘要： An inspection system includes: a facility that uses wide-band illumination light having different wavelengths and single-wavelength light to perform dark-field illumination on an object of inspection, which has the surface thereof coated with a transparent film, in a plurality of illuminating directions at a plurality of illuminating angles; a facility that detects light reflected or scattered from repetitive patterns and light reflected or scattered from non-repetitive patterns with the wavelengths thereof separated from each other; a facility that efficiently detects light reflected or scattered from a foreign matter or defect in the repetitive patterns or non-repetitive patterns or a foreign matter or defect on the surface of the transparent film; and a facility that removes light, which is diffracted by the repetitive patterns, from a diffracted light image of actual patterns or design data representing patterns. Consequently, a more microscopic defect can be detected stably.
摘要翻译：检查系统包括：使用具有不同波长的宽带照明光和单波长光的设备，在具有透明膜的表面上的多个照明中对被检查对象进行暗视场照明多个照明角度的方向; 检测从重复图案反射或散射的光和从彼此分离的波长的非重复图案反射或散射的光的设备; 有效地检测异物反射或散射的光或重复图案或非重复图案中的缺陷或透明膜表面上的异物或缺陷的设备; 以及通过重复图案衍射的光从实际图案的衍射光图像或表示图案的设计数据中去除的设施。因此，能够稳定地检测出更微细的缺陷。

3. 发明授权

US07751037B2 Method and apparatus for detecting defects 失效
标题翻译：检测缺陷的方法和装置
公开(公告)号：US07751037B2
公开(公告)日：2010-07-06
申请号：US12435523
申请日：2009-05-05
申请人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
发明人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
IPC分类号： G01N21/958 , G01N21/88
CPC分类号： G01N21/956 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8822
摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.
摘要翻译：提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。用于检测缺陷的装置包括放置基板样本并可在X-Y-Z-中的每个中任意移动的台部; 方向，用于利用来自倾斜方向的光照射电路图案的照明系统，以及用于从上下方向在检测器上形成照射的检测区域的图像的图像形成光学系统。利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。由检测器从样本接收的散射和反射光被转换成电信号。将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

4. 发明申请

US20090079973A1 METHOD AND APPARATUS FOR INSPECTING FOREIGN PARTICLE DEFECTS 有权
标题翻译：检查外来颗粒缺陷的方法和装置
公开(公告)号：US20090079973A1
公开(公告)日：2009-03-26
申请号：US12273174
申请日：2008-11-18
申请人： Sachio UTO , Hiroyuki Nakano
发明人： Sachio UTO , Hiroyuki Nakano
IPC分类号： G01N21/00
CPC分类号： G01N21/94 , G01N21/47 , G01N21/9501
摘要： The invention relates to a device production process for forming a circuit pattern on a substrate such as semiconductor device. To enable a stable inspection of a minute foreign particle and a pattern defect occurring in manufacture of a device at a high speed and with a high sensitivity, an object to be inspected on which a transparent film is formed, is irradiated with a beam which is emitted from an illuminator whose illumination direction and illumination angle are selected from a plurality of choices to be optimum, so that scattered reflected light from a minute foreign particle defect on the object or the transparent film is effectively detected by eliminating a noise from the pattern formed on the object, and a detection optical system is optimized by evaluating and adjusting, with an image forming performance checker, an image forming performance of the detection optical system included in an inspecting apparatus.
摘要翻译：本发明涉及用于在诸如半导体器件的衬底上形成电路图案的器件制造工艺。为了能够在高速，高灵敏度的装置的制造中能够稳定地检查微小的外来粒子和图案缺陷，对要形成透明膜的检查对象进行照射，从照明方向和照明角度从多个选择中选择为最佳的发光体发射，从而通过从形成的图案中消除噪声来有效地检测来自物体或透明膜上的微小异物缺陷的散射反射光并且通过利用图像形成性能检查器评估和调整包括在检查装置中的检测光学系统的图像形成性能来优化检测光学系统。

5. 发明申请

US20070177136A1 Apparatus and method for inspecting defects 有权
标题翻译：用于检查缺陷的装置和方法
公开(公告)号：US20070177136A1
公开(公告)日：2007-08-02
申请号：US11653322
申请日：2007-01-16
申请人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
发明人： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
IPC分类号： G01N21/88
CPC分类号： G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
摘要： A defect inspection apparatus includes an irradiation optical system 20, a detection optical system 30, and an image processor 40. In the irradiation optical system, a mirror 2603 is disposed to reflect downward a beam flux that has been guided to a first or second optical path, and a cylindrical lens 251 and an inclined mirror 2604 are disposed to focus the beam flux that has been directed downward by the mirror, at an inclination angle from a required oblique direction extending horizontally, onto a substrate 1 to be inspected, as a slit-shaped beam 90.
摘要翻译：缺陷检查装置包括照射光学系统20，检测光学系统30和图像处理器40。在照射光学系统中，设置反射镜2603以向下反射已经被引导到第一或第二光路的光束，并且设置柱面透镜251和倾斜镜2604以聚焦已导向的光束作为狭缝状光束90，通过反射镜向下倾斜，从与水平方向延伸的所需倾斜方向倾斜的角度，到被检查的基板1上。

6. 发明申请

US20060163503A1 Method for inspecting pattern defect and device for realizing the same 失效
标题翻译：检查图案缺陷的方法及其实现方法
公开(公告)号：US20060163503A1
公开(公告)日：2006-07-27
申请号：US11325550
申请日：2006-01-05
申请人： Yuta Urano , Hiroyuki Nakano , Shunji Maeda , Sachio Uto
发明人： Yuta Urano , Hiroyuki Nakano , Shunji Maeda , Sachio Uto
IPC分类号： G01N21/86
CPC分类号： G01N21/9501 , G01N21/47 , G01N21/4788 , G01N21/94 , G01N21/956
摘要： When using a CCD sensor as a photo-detector in a device for inspecting foreign matters and defects, it has a problem of causing electric noise while converting the signal charge, produced inside by photoelectric conversion, into voltage and reading it. Therefore, the weak detected signal obtained by detecting reflected and scattered light from small foreign matters and defects is buried in the electric noise, which has been an obstacle in detecting small foreign matters and defects. In order to solve the above problem, according to the present invention, an electron multiplying CCD sensor is used as a photo-detector. The electron multiplying CCD sensor is capable of enlarging signals brought about by inputted light relatively to the electric noise by multiplying the electrons produced through photoelectric conversion and reading them. Accordingly, compared to a conventional CCD sensor, it can detect weaker light and, therefore, smaller foreign matters and defects.
摘要翻译：当在用于检查异物和缺陷的装置中使用CCD传感器作为光检测器时，存在在将由光电转换产生的信号电荷转换成电压并读取的同时将电噪声引起的问题。因此，通过检测来自小异物和缺陷的反射和散射光获得的弱检测信号被埋在电噪声中，这是检测小异物和缺陷的障碍。为了解决上述问题，根据本发明，使用电子倍增CCD传感器作为光检测器。电子倍增CCD传感器能够通过将通过光电转换产生的电子与其进行读取而相对于电噪声放大由输入光产生的信号。因此，与常规CCD传感器相比，它可以检测较弱的光，因此可以检测较小的异物和缺陷。

7. 发明授权

US08748795B2 Method for inspecting pattern defect and device for realizing the same 失效
标题翻译：检查图案缺陷的方法及其实现方法
公开(公告)号：US08748795B2
公开(公告)日：2014-06-10
申请号：US12329274
申请日：2008-12-05
申请人： Yuta Urano , Hiroyuki Nakano , Shunji Maeda , Sachio Uto
发明人： Yuta Urano , Hiroyuki Nakano , Shunji Maeda , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/47 , G01N21/4788 , G01N21/94 , G01N21/956
摘要： When using a CCD sensor as a photo-detector in a device for inspecting foreign matters and defects, it has a problem of causing electric noise while converting the signal charge, produced inside by photoelectric conversion, into voltage and reading it. Therefore, the weak detected signal obtained by detecting reflected and scattered light from small foreign matters and defects is buried in the electric noise, which has been an obstacle in detecting small foreign matters and defects. In order to solve the above problem, according to the present invention, an electron multiplying CCD sensor is used as a photo-detector. The electron multiplying CCD sensor is capable of enlarging signals brought about by inputted light relatively to the electric noise by multiplying the electrons produced through photoelectric conversion and reading them. Accordingly, compared to a conventional CCD sensor, it can detect weaker light and, therefore, smaller foreign matters and defects.
摘要翻译：当在用于检查异物和缺陷的装置中使用CCD传感器作为光检测器时，存在在将由光电转换产生的信号电荷转换成电压并读取的同时将电噪声引起的问题。因此，通过检测来自小异物和缺陷的反射和散射光获得的弱检测信号被埋在电噪声中，这是检测小异物和缺陷的障碍。为了解决上述问题，根据本发明，使用电子倍增CCD传感器作为光检测器。电子倍增CCD传感器能够通过将通过光电转换产生的电子与其进行读取而相对于电噪声放大由输入的光产生的信号。因此，与常规CCD传感器相比，它可以检测较弱的光，因此可以检测较小的异物和缺陷。

8. 发明授权

US07952700B2 Method of apparatus for detecting particles on a specimen 有权
标题翻译：用于检测样品上的颗粒的装置的方法
公开(公告)号：US07952700B2
公开(公告)日：2011-05-31
申请号：US12907895
申请日：2010-10-19
申请人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
发明人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
摘要翻译：通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射，根据要检测的缺陷的种类从照明光源发射的光束。通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率形状光通量。通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

9. 发明授权

US07817261B2 Method of apparatus for detecting particles on a specimen 有权
标题翻译：用于检测样品上的颗粒的装置的方法
公开(公告)号：US07817261B2
公开(公告)日：2010-10-19
申请号：US12114139
申请日：2008-05-02
申请人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
发明人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
摘要翻译：通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射，根据要检测的缺陷的种类从照明光源发射的光束。通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率形状光通量。通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

10. 发明授权

US07528942B2 Method and apparatus for detecting defects 失效
标题翻译：检测缺陷的方法和装置
公开(公告)号：US07528942B2
公开(公告)日：2009-05-05
申请号：US11472426
申请日：2006-06-22
申请人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
发明人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8822
摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.
摘要翻译：提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。用于检测缺陷的装置包括：载置基板试样的载台部分，其可以在XYZ-θ方向中任意移动;照射系统，用于利用来自倾斜方向的光照射电路图案;以及图像形成光学系统，用于从上下方向在检测器上形成照射的检测区域的图像。利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。由检测器从样本接收的散射和反射光被转换成电信号。将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

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