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1. 发明授权

US06569216B1 Abrasive fluid compositions 有权
标题翻译：研磨液组成
公开(公告)号：US06569216B1
公开(公告)日：2003-05-27
申请号：US09856713
申请日：2001-05-25
申请人： Koji Taira , Shigeo Fujii , Yoshiaki Oshima , Koichi Naito
发明人： Koji Taira , Shigeo Fujii , Yoshiaki Oshima , Koichi Naito
IPC分类号： C09G102
CPC分类号： C09K3/1463 , C09G1/02 , C09K3/1409
摘要： A polishing composition comprising a chelating compound or a salt thereof; a partially esterified product and/or partially etherified product of a polyhydric alcohol compound; and water; a polishing composition comprising water, an abrasive, an intermediate alumina, and a chelating compound or a salt thereof, wherein the content of the intermediate alumina is from 1 to 50 parts by weight, based on 100 parts by weight of the abrasive; and a polishing composition comprising water, an abrasive, an intermediate alumina, a chelating compound or a salt thereof, and a partially esterified product and/or partially etherified product of a polyhydric alcohol compound, wherein the content of the intermediate alumina is from 1 to 50 parts by weight, based on 100 parts by weight of the abrasive. By using the polishing composition, the polishing rate can be increased, and the surface roughness can be lowered, without causing defects such as scratches and pits on the surface of an object to be polished.
摘要翻译：一种抛光组合物，其包含螯合化合物或其盐; 多元醇化合物的部分酯化产物和/或部分醚化产物; 和水; 抛光组合物，其包含水，研磨剂，中间体氧化铝和螯合化合物或其盐，其中基于100重量份的所述研磨剂，所述中间氧化铝的含量为1至50重量份; 以及包含水，研磨剂，中间体氧化铝，螯合化合物或其盐以及多元醇化合物的部分酯化产物和/或部分醚化产物的抛光组合物，其中中间体氧化铝的含量为1〜 50重量份，基于100重量份的研磨剂。通过使用抛光组合物，可以提高抛光速率，并且可以降低表面粗糙度，而不会在被抛光物体的表面上产生划痕和凹痕等缺陷。

2. 发明授权

US07955517B2 Polishing fluid composition 有权
标题翻译：抛光液组成
公开(公告)号：US07955517B2
公开(公告)日：2011-06-07
申请号：US12415548
申请日：2009-03-31
申请人： Shigeo Fujii , Yoshiaki Oshima , Koichi Naito
发明人： Shigeo Fujii , Yoshiaki Oshima , Koichi Naito
IPC分类号： C03C15/00 , B44C1/22 , H01L21/302
CPC分类号： C09G1/02 , B24B37/044
摘要： To provide a polishing composition capable of increasing polishing rate and reducing surface roughness, without causing surface defects on a surface of an object to be polished; and a polishing process for a substrate to be polished. [1] a polishing composition comprising water, an abrasive, an intermediate alumina, and a polycarboxylic acid having 4 or more carbon atoms with no OH groups or a salt thereof, wherein a content of the intermediate alumina is from 1 to 90 parts by weight, based on 100 parts by weight of the abrasive; and [2] a polishing process for a substrate to be polished, comprising polishing a substrate to be polished under conditions that a composition of a polishing liquid during polishing is the composition as defined in item [1] above.
摘要翻译：提供能够提高抛光速度并降低表面粗糙度的抛光组合物，而不会在被抛光物体的表面上引起表面缺陷; 以及用于待抛光的基底的抛光工艺。 [1]一种抛光组合物，其包含水，研磨剂，中间体氧化铝和具有4个以上没有OH基团的碳原子的多元羧酸或其盐，其中所述中间体氧化铝的含量为1〜90重量份，基于100重量份的研磨剂; 以及[2]一种抛光用基材的研磨方法，其特征在于，在抛光中的研磨液的成分为上述[1]所述的组成的条件下，研磨抛光用基板。

3. 发明授权

US07220676B2 Roll-off reducing agent 有权
标题翻译：滚降还原剂
公开(公告)号：US07220676B2
公开(公告)日：2007-05-22
申请号：US09842769
申请日：2001-04-27
申请人： Toshiya Hagihara , Shigeo Fujii , Yoshiaki Oshima
发明人： Toshiya Hagihara , Shigeo Fujii , Yoshiaki Oshima
IPC分类号： H01L21/461 , C09K13/00 , C09K13/04
CPC分类号： C09G1/02
摘要： A roll-off reducing agent comprising one or more compounds selected from the group consisting of carboxylic acids having 2 to 20 carbon atoms having either OH group or groups or SH group or groups, monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon atoms, and salts thereof; and a roll-off reducing agent composition comprising a roll off-reducing agent comprising one or more compounds selected from the group consisting of carboxylic acids having 2 to 20 carbon atoms having either OH group or groups or SH group or groups, monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon atoms, and salts thereof; an abrasive; and water.
摘要翻译：包含一种或多种选自由具有OH基或具有OH基团或基团的基团的碳原子数为2〜20的羧酸的化合物的降低还原剂，或具有1〜20个碳原子的单羧酸，以及具有 2至3个碳原子，及其盐; 以及包含一种或多种选自具有OH基团或基团或SH基团的碳原子数为2〜20的羧酸的一种或多种化合物的脱脂还原剂的滚降还原剂组合物，具有1个 20个碳原子的碳原子数为2〜3的二羧酸及其盐，研磨剂和水。

4. 发明申请

US20070130839A1 ROLL-OFF REDUCING AGENT 审中-公开
标题翻译：滚筒式减速机
公开(公告)号：US20070130839A1
公开(公告)日：2007-06-14
申请号：US11625097
申请日：2007-01-19
申请人： Toshiya Hagihara , Shigeo Fujii , Yoshiaki Oshima
发明人： Toshiya Hagihara , Shigeo Fujii , Yoshiaki Oshima
IPC分类号： B24D3/02
CPC分类号： C09G1/02
摘要： A roll-off reducing agent comprising one or more compounds selected from the group consisting of carboxylic acids having 2 to 20 carbon atoms having either OH group or groups or SH group or groups, monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon atoms, and salts thereof; and a roll-off reducing agent composition comprising a roll off-reducing agent comprising one or more compounds selected from the group consisting of carboxylic acids having 2 to 20 carbon atoms having either OH group or groups or SH group or groups, monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon atoms, and salts thereof; an abrasive; and water.
摘要翻译：包含一种或多种选自由具有OH基或具有OH基团或基团的基团的碳原子数为2〜20的羧酸的化合物的降低还原剂，或具有1〜20个碳原子的单羧酸，以及具有 2至3个碳原子，及其盐; 以及包含一种或多种选自具有OH基团或基团或SH基团的碳原子数为2〜20的羧酸的一种或多种化合物的脱脂还原剂的滚降还原剂组合物，具有1个 20个碳原子的碳原子数为2〜3的二羧酸及其盐，研磨剂和水。

5. 发明授权

US06902591B2 Polishing composition 失效
标题翻译：抛光组成
公开(公告)号：US06902591B2
公开(公告)日：2005-06-07
申请号：US10625593
申请日：2003-07-24
申请人： Hiroaki Kitayama , Shigeo Fujii , Yoshiaki Oshima , Toshiya Hagihara
发明人： Hiroaki Kitayama , Shigeo Fujii , Yoshiaki Oshima , Toshiya Hagihara
IPC分类号： C09G1/02 , B24B1/00 , C09G1/04
CPC分类号： C09G1/02 , B24B37/044 , C09K3/1463 , Y10T428/32
摘要： A polishing composition comprising an abrasive, water and an organic acid or a salt thereof, wherein the composition has a specified viscosity of from 1.0 to 2.0 mPa·s at a shearing rate of 1500 s−1 and 25° C.; a roll-off reducing agent comprising a Brönsted acid or a salt thereof, having an action of lowering viscosity so that the amount of viscosity lowered is 0.01 mPa·s or more, wherein the amount of viscosity lowered is expressed by the following equation: (Amount of Viscosity Lowered)=(Viscosity of Standard Polishing Composition)−(Viscosity of Roll-Off Reducing Agent-Containing Polishing Composition), wherein the standard polishing composition is prepared which comprises 20 parts by weight of an abrasive, said abrasive being high-purity alumina having Al2O3 purity of 98.0% by weight or more composed of α-type co-random crystal, 1 part by weight of citric acid, and 79 parts by weight of water; the roll-off reducing agent-containing polishing composition is prepared which comprises 20 parts by weight of an abrasive, said abrasive being high-purity alumina having Al2O3 purity of 98.0% by weight or more composed of α-type co-random crystal, 1 part by weight of citric acid, 78.9 parts by weight of water and 0.1 parts by weight of a roll-off reducing agent; and the viscosity is a viscosity at a shearing rate of 1500 s−1 and 25° C. The polishing composition can be favorably used in polishing the substrate for precision parts.
摘要翻译：一种抛光组合物，其包含磨料，水和有机酸或其盐，其中所述组合物在剪切速率为1500s -1和25℃时具有1.0至2.0mPa.s的特定粘度 C。; 包含布朗斯台德酸或其盐的滚降还原剂，具有降低粘度的作用，使粘度降低量为0.01mPa.s以上，其中降低粘度的量由下式表示：（在线公式）end =“lead”？>（粘度降低）=（标准抛光组合物的粘度） - （含有折射率的还原剂的抛光组合物的粘度） <？in-line-formula description =“In-line Formulas”end =“tail”？>其中制备的标准抛光组合物包含20重量份的研磨剂，所述磨料是具有Al _{2O 3 O 3纯度为98.0重量％或更多，由α型共无规晶体组成，1重量份柠檬酸和79重量份水; 制备含滚降还原剂的抛光组合物，其包含20重量份的研磨剂，所述磨料是具有Al 2 O 3 O 3 3纯度的高纯度氧化铝 98.0重量％以上，由α型协同随机晶体组成，1重量份柠檬酸，78.9重量份水和0.1重量份的滚降还原剂; 粘度为剪切速率为1500秒-1和25℃时的粘度。抛光组合物可有利地用于抛光基板用于精密零件。}

6. 发明授权

US06454820B2 Polishing composition 有权
标题翻译：抛光组成
公开(公告)号：US06454820B2
公开(公告)日：2002-09-24
申请号：US09772906
申请日：2001-01-31
申请人： Toshiya Hagihara , Koichi Naito , Shigeo Fujii
发明人： Toshiya Hagihara , Koichi Naito , Shigeo Fujii
IPC分类号： C09K314
CPC分类号： G11B23/505 , B24B37/044 , C09G1/02 , G11B5/8404
摘要： A polishing composition comprising silica particles, water, and Fe salt and/or Al salt of a polyaminocarboxylic acid; a polishing process comprising applying the polishing composition; a process for manufacturing a magnetic disk substrate, comprising the step of polishing a substrate with the polishing composition; a magnetic disk substrate manufactured by applying the polishing composition.
摘要翻译：一种抛光组合物，其包含二氧化硅颗粒，水，以及聚氨基羧酸的Fe盐和/或Al盐; 抛光工艺，包括施加抛光组合物; 一种制造磁盘基片的方法，包括用抛光组合物抛光基片的步骤; 通过应用抛光组合物制造的磁盘基片。

7. 发明授权

US10338102B2 Voltage detection device for transforming apparatus 有权
公开(公告)号：US10338102B2
公开(公告)日：2019-07-02
申请号：US14398255
申请日：2012-06-01
申请人： Daigo Matsumoto , Shigeo Fujii
发明人： Daigo Matsumoto , Shigeo Fujii
IPC分类号： G01R1/30 , G01R15/06 , G01R31/327 , G01R1/20 , G01R19/00
摘要： In a voltage detection device for a transforming apparatus, a voltage divider is constituted by providing an intermediate electrode between a central conductor and a tank of the transforming apparatus, to detect a voltage E1 of the central conductor based on a voltage E2 of the voltage divider. The voltage detection device for a transforming apparatus includes an incomplete integration circuit having a reverse characteristic to an input/output voltage amplitude ratio-frequency characteristic of a high-pass filter formed by a floating electrostatic capacitance between the central conductor and the intermediate electrode, an earth electrostatic capacitance between the intermediate electrode and the tank, and a voltage dividing resistor connected in parallel to the earth electrostatic capacitance, and a signal processing circuit that outputs a value based on an output voltage E3 of the incomplete integration circuit as the voltage E1 of the central conductor.

8. 发明申请

US20090068228A1 METHOD OF SEPARATING PROTECTIVE COMPONENTS OF BORDETELLA PERTUSSIS 审中-公开
标题翻译：分离BORDETELLA PERTUSSIS的保护成分的方法
公开(公告)号：US20090068228A1
公开(公告)日：2009-03-12
申请号：US11877789
申请日：2007-10-24
申请人： Akihiro Suehara , Eiji Yamamoto , Shigeo Fujii
发明人： Akihiro Suehara , Eiji Yamamoto , Shigeo Fujii
IPC分类号： A61K39/10
CPC分类号： C07K14/235 , A61K39/00
摘要： To provide a method of efficiently separate protective components of Bordetella pertussis. On the basis of differences in adsorbability to calcium phosphate gel formed by adding calcium ions to a Bordetella pertussis culture in the presence of excess phosphate ions, protective components of Bordetella pertussis are separated from the Bordetella pertussis culture. Traditionally, protective components of Bordetella pertussis have been separated using different purification methods for the respective components. According to the present invention, the use of the same means of purification for all subject components makes it possible to purify each component with high efficiency and high recovery rate, an aspect very advantageous for industrial production. It is also possible to efficiently produce an improved purified pertussis component vaccine comprising an effective combination of pertussis filamentous hemagglutinin (FHA), pertactin (PRN, 69K-OMP), pertussis fimbriae (FIM) and pertussis toxin (PT).
摘要翻译：提供一种有效分离百日咳博德特氏菌保护成分的方法。基于在过量磷酸根离子存在下向百日咳博德特氏菌培养物中加入钙离子而形成的磷酸钙凝胶的吸附性差异的基础上，将百日咳博德特氏菌的保护成分与百日咳杆菌培养物分离。传统上，百日咳博德特氏菌的保护性成分已经使用各种成分的不同纯化方法进行分离。根据本发明，对于所有被摄体成分使用相同的纯化方法使得可以以高效率和高回收率净化每种组分，这对于工业生产非常有利。还可以有效地制备改进的纯化的百日咳组分疫苗，其包括百日咳丝状血凝素（FHA），百日咳杆菌（PRN，69K-OMP），百日咳菌毛（FIM）和百日咳毒素（PT））的有效组合。

9. 发明申请

US20070144307A1 FINE COMPOSITE METAL PARTICLES AND THEIR PRODUCTION METHOD, MICRO-BODIES, AND MAGNETIC BEADS 有权
公开(公告)号：US20070144307A1
公开(公告)日：2007-06-28
申请号：US11681059
申请日：2007-03-01
申请人： Yasushi KANEKO , Shigeo Fujii , Hisato Tokoro , Takeo Oku
发明人： Yasushi KANEKO , Shigeo Fujii , Hisato Tokoro , Takeo Oku
IPC分类号： H01F41/22
CPC分类号： B82Y25/00 , B22F1/0062 , B22F1/02 , B22F1/025 , B22F9/20 , B22F2001/0029 , B22F2998/00 , B22F2999/00 , C22C33/0257 , G11B5/70615 , G11B5/712 , G11B5/714 , H01F1/0054 , H01F1/061 , H01F1/065 , H01F1/20 , H01F1/26 , H01F1/33 , Y10T428/12181 , Y10T428/265 , Y10T428/2991 , Y10T428/2998 , B22F1/0018 , B22F1/0059 , B22F2201/02 , B22F2201/11 , B22F2201/30 , B22F1/0051
摘要： Fine composite metal particle comprising a metal core and a coating layer of carbon, and being obtained by reducing metal oxide powder with carbon powder.

10. 发明授权

US07204936B2 Polishing composition 有权
标题翻译：抛光组成
公开(公告)号：US07204936B2
公开(公告)日：2007-04-17
申请号：US10625610
申请日：2003-07-24
申请人： Hiroaki Kitayama , Shigeo Fujii , Toshiya Hagihara
发明人： Hiroaki Kitayama , Shigeo Fujii , Toshiya Hagihara
IPC分类号： C09K13/00 , C09K13/06 , H01L21/302
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463
摘要： A polishing composition comprising 0.03 to 0.5% by weight of an organic acid or a salt thereof, an abrasive and water, wherein the abrasive has a surface potential of from −140 to 200 mV; a roll-off reducing agent comprising an inorganic compound having a property of controlling a surface potential of an abrasive in a polishing composition, wherein a surface potential of the abrasive in a standard polishing composition is controlled to −110 to 250 mV by the presence of the inorganic compound, wherein the standard polishing composition is prepared which comprises 20 parts by weight of an abrasive, the abrasive being high-purity alumina having Al2O3 purity of 98.0% by weight or more composed of α-type corundum crystal, 1 part by weight of citric acid, 78 parts by weight of water and 1 part by weight of an inorganic compound. The polishing composition or the roll-off reducing agent composition can be favorably used in polishing the substrate for precision parts.
摘要翻译：一种抛光组合物，其包含0.03至0.5重量％的有机酸或其盐，研磨剂和水，其中所述研磨剂具有-140至200mV的表面电位; 包括具有控制抛光组合物中研磨剂的表面电位的性质的无机化合物的滚降还原剂，其中通过存在下述方法将标准抛光组合物中的研磨剂的表面电位控制在-110至250mV 无机化合物，其中制备包含20重量份研磨剂的标准抛光组合物，所述研磨剂是具有98.0的纯度的高纯度氧化铝由α型刚玉晶体，1重量份柠檬酸，78重量份水和1重量份无机化合物组成的重量％以上。抛光组合物或滚降还原剂组合物可有利地用于抛光精密零件用基板。

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