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    • 7. 发明授权
    • Atmospheric pressure plasma, generating method, plasma processing method and component mounting method using same, and device using these methods
    • 大气压等离子体,生成方法,等离子体处理方法和使用其的部件安装方法以及使用这些方法的装置
    • US08399794B2
    • 2013-03-19
    • US12299174
    • 2007-05-28
    • Hiroyuki TsujiKazuhiro Inoue
    • Hiroyuki TsujiKazuhiro Inoue
    • B23K10/00
    • H01J37/32825H01J37/32366H05H1/30H05H1/42H05H1/46H05H2001/4667
    • A first inert gas (5) is supplied into a reaction space (1) and a high-frequency power supply (4) applies a high-frequency electric field so that a primary plasma (6) composed of the first inert gas which has been made into the plasma is ejected from the reaction space. A mixed gas area (10) in which a mixed gas (8) having a second inert gas (12) as a main ingredient and a proper amount of a reactive gas (13) mixed is formed. The primary plasma collides into the mixed gas area to generate a secondary plasma (11) composed of the mixed gas which has been made into the plasma, and the secondary plasma is sprayed on a processed object (S) to carry out a plasma processing. Accordingly, the plasma processing is carried out in a wide range by an atmospheric pressure plasma generated by a small input power.
    • 将第一惰性气体(5)供应到反应空间(1)中,并且高频电源(4)施加高频电场,使得由已经被第一惰性气体组成的初级等离子体(6) 制成等离子体的物质从反应空间喷出。 形成混合气体区域(10),其中混合有第二惰性气体(12)作为主要成分的混合气体(8)和适量的反应性气体(13)混合。 初级等离子体与混合气体区域碰撞,生成由等离子体制成的混合气体构成的二次等离子体(11),将二次等离子体喷射到被处理物(S)上进行等离子体处理。 因此,通过由小的输入功率产生的大气压等离子体等离子体处理在宽范围内进行。