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    • 7. 发明授权
    • Pre-colored methodology of multiple patterning
    • 多色图案的预色方法
    • US09183341B2
    • 2015-11-10
    • US14218001
    • 2014-03-18
    • Taiwan Semiconductor Manufacturing Co., Ltd.
    • Yen-Huei ChenHung-Jen LiaoJonathan Tsung-Yung Chang
    • G06F17/50
    • G06F17/5072G06F17/5068G06F2217/12Y02P90/265
    • Some embodiments relate to a system that pre-colors word lines and control lines within a memory cell to avoid timing delays that result from processing variations introduced through multiple patterning lithography processes. The system has a memory element that stores a graphical IC layout with a memory circuit having layout features including a plurality of word lines and a plurality of Y-control lines. A pre-coloring element pre-colors one or more of the plurality of word lines and Y-control lines, to indicate that pre-colored word lines and Y-control lines are to be formed on a same mask of a multiple mask set used for a multiple patterning lithography process. A decomposition element assigns different colors to uncolored layout features of the memory circuit, to indicate that different colored memory features are to be formed on different masks of the multiple mask set.
    • 一些实施例涉及对存储器单元内的字线和控制线进行预色彩以避免由通过多次图案化光刻工艺引入的处理变化而产生的定时延迟的系统。 该系统具有存储图形IC布局的存储元件,其具有包括多个字线和多个Y控制线的布局特征的存储器电路。 预着色元件对多个字线和Y控制线中的一个或多个进行预色,以指示预先着色的字线和Y控制线将被形成在所使用的多个掩模集的相同掩模上 用于多重图案化光刻工艺。 分解元素将不同的颜色分配给存储器电路的未着色布局特征,以指示将在多个掩模集合的不同掩模上形成不同的彩色存储器特征。