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1. 发明授权

US07100146B2 Design system of alignment marks for semiconductor manufacture 有权
标题翻译：半导体制造对准标记设计系统
公开(公告)号：US07100146B2
公开(公告)日：2006-08-29
申请号：US10636577
申请日：2003-08-08
申请人： Takashi Sato , Takuya Kouno , Takashi Sakamoto , Yoshiyuki Shioyama , Tatsuhiko Higashiki , Ichiro Mori , Noboru Yokoya
发明人： Takashi Sato , Takuya Kouno , Takashi Sakamoto , Yoshiyuki Shioyama , Tatsuhiko Higashiki , Ichiro Mori , Noboru Yokoya
IPC分类号： G06F17/50
CPC分类号： G03F9/7092
摘要： A design system of an alignment mark for manufacturing a semiconductor device includes a memory which stores at least mark data including pattern information regarding plural kinds of marks and process data including condition information of manufacturing processes, and a first process simulator which simulates a substrate structure before patterning based on the process data, the substrate structure being formed in an identified manufacturing process. Moreover, the design system includes a second process simulator which simulates a processed shape of an identified mark after the patterning based on the simulated substrate structure and the process data, the mark formed in the manufacturing process, a signal waveform simulator which simulates a detection signal waveform of the mark, the waveform being obtained from the simulated processed shape of the mark, and a signal evaluation device which evaluates a suitability of the mark for the identified manufacturing process based on the simulated detection signal waveform.
摘要翻译：用于制造半导体器件的对准标记的设计系统包括：存储器，其至少存储包括关于多种标记的图案信息的标记数据和包括制造过程的条件信息的处理数据;以及第一处理模拟器，其模拟前面的衬底结构基于工艺数据构图，基板结构在识别的制造工艺中形成。此外，设计系统包括第二处理模拟器，其基于模拟的基板结构和处理数据，在制造过程中形成的标记，模拟检测信号的信号波形模拟器，模拟图案化之后的识别标记的处理形状标记的波形，从标记的模拟处理形状获得的波形，以及基于模拟的检测信号波形来评估用于所识别的制造处理的标记的适合性的信号评估装置。

2. 发明申请

US20050112475A1 Photomask, method of lithography, and method for manufacturing the photomask 失效
标题翻译：光掩模，光刻方法和制造光掩模的方法
公开(公告)号：US20050112475A1
公开(公告)日：2005-05-26
申请号：US10927320
申请日：2004-08-27
申请人： Takashi Sato , Takashi Sakamoto
发明人： Takashi Sato , Takashi Sakamoto
IPC分类号： G03B15/00 , B64D47/08 , F16M11/04 , F16M13/02 , G01B11/00 , G01B11/25 , G01M11/02 , G02F1/01 , G03B17/56 , G03C5/00 , G03F1/26 , G03F1/32 , G03F1/42 , G03F1/68 , G03F7/027 , G03F7/20 , G03F7/207 , G03F9/00 , G06K9/00 , G21K5/00 , H01L21/027 , H04N5/222
CPC分类号： G03F7/70641 , B64D47/08 , G03F1/32
摘要： A photomask has a monitoring pattern configured to obtain information required for adjusting optical system of a projection lithography tool. The monitoring pattern encompasses a mask substrate and an asymmetrical diffraction grating delineated on the mask substrate, configured to generate a positive first order diffracted light and a negative first order diffracted light in different diffraction efficiencies. The asymmetrical diffraction grating includes a plurality of probing-phase shifters, disposed periodically on the mask substrate in parallel, and a plurality of opaque strips disposed on light-shielding faces of the probing-phase shifters. An asymmetrically recessed ridge implements each of the probing-phase shifters.
摘要翻译：光掩模具有被配置为获得调整投影光刻工具的光学系统所需的信息的监视图案。监测图案包括掩模基板和掩模基板上描绘的非对称衍射光栅，被配置为产生不同衍射效率的正一级衍射光和负一级衍射光。不对称衍射光栅包括平行地周期性地设置在掩模基板上的多个探测移相器，以及设置在探测移相器的光屏蔽面上的多个不透明条。不对称凹入的脊部实现每个探测移相器。

3. 发明授权

US08068213B2 Photomask, method of lithography, and method for manufacturing the photomask 失效
标题翻译：光掩模，光刻方法和制造光掩模的方法
公开(公告)号：US08068213B2
公开(公告)日：2011-11-29
申请号：US12314404
申请日：2008-12-10
申请人： Takashi Sato , Takashi Sakamoto
发明人： Takashi Sato , Takashi Sakamoto
IPC分类号： G03B27/32 , G03C5/00
CPC分类号： G03F7/70641 , B64D47/08 , G03F1/32
摘要： A photomask has a monitoring pattern configured to obtain information required for adjusting optical system of a projection lithography tool. The monitoring pattern encompasses a mask substrate and an asymmetrical diffraction grating delineated on the mask substrate, configured to generate a positive first order diffracted light and a negative first order diffracted light in different diffraction efficiencies. The asymmetrical diffraction grating includes a plurality of probing-phase shifters, disposed periodically on the mask substrate in parallel, and a plurality of opaque strips disposed on light-shielding faces of the probing-phase shifters. An asymmetrically recessed ridge implements each of the probing-phase shifters.
摘要翻译：光掩模具有被配置为获得调整投影光刻工具的光学系统所需的信息的监视图案。监测图案包括掩模基板和掩模基板上描绘的非对称衍射光栅，被配置为产生不同衍射效率的正一级衍射光和负一级衍射光。不对称衍射光栅包括平行地周期性地设置在掩模基板上的多个探测移相器，以及设置在探测移相器的光屏蔽面上的多个不透明条。不对称凹入的脊部实现每个探测移相器。

4. 发明授权

US06701512B2 Focus monitoring method, exposure apparatus, and exposure mask 失效
标题翻译：聚焦监测方法，曝光装置和曝光掩模
公开(公告)号：US06701512B2
公开(公告)日：2004-03-02
申请号：US10052527
申请日：2002-01-23
申请人： Takumichi Sutani , Tadahito Fujisawa , Takashi Sato , Takashi Sakamoto , Masafumi Asano , Soichi Inoue
发明人： Takumichi Sutani , Tadahito Fujisawa , Takashi Sato , Takashi Sakamoto , Masafumi Asano , Soichi Inoue
IPC分类号： G06F1750
CPC分类号： G03F7/70641
摘要： According to a focus monitoring method, an exposure mask on which a focus monitor pattern comprising at least two types of pattern groups is formed is prepared. A pattern group A of the at least two pattern groups is illuminated with illumination light while a barycenter of an illumination light source of illumination optics is in an off-axis state. At least a pattern group B of the at least two pattern groups is illuminated with illumination light while the barycenter of the illumination light source is in an on-axis state. A positional deviation between the pattern groups A and B transferred onto a substrate is measured. An effective focus position can be monitored from this positional deviation.
摘要翻译：根据聚焦监视方法，准备形成包括至少两种图案组的聚焦监视器图案的曝光掩模。所述至少两个图案组中的图案组A被照明光照射，而照明光学器件的照明光源的重心处于离轴状态。至少两个图案组中的图案组B至少被照明光照射，同时照明光源的重心处于轴上状态。测量转印到基板上的图案组A和B之间的位置偏差。可以从该位置偏差来监视有效的对焦位置。

5. 发明授权

US07482102B2 Photomask having a monitoring pattern with an asymmetrical diffraction grating that includes semi-transparent probing-phase shifters 失效
$Photomask having a monitoring pattern with an asymmetrical diffraction grating that includes semi-transparent probing-phase shifters$
标题翻译：具有包含半透明探测移相器的不对称衍射光栅的监视图案的光掩模
公开(公告)号：US07482102B2
公开(公告)日：2009-01-27
申请号：US10927320
申请日：2004-08-27
申请人： Takashi Sato , Takashi Sakamoto
发明人： Takashi Sato , Takashi Sakamoto
IPC分类号： G03F1/00 , G03F1/14
CPC分类号： G03F7/70641 , B64D47/08 , G03F1/32
摘要： A photomask having a monitoring pattern configured to obtain information required for adjusting an optical system of a projection lithography tool. The monitoring pattern encompasses a mask substrate and an asymmetrical diffraction grating delineated on the mask substrate, configured to generate a positive first order diffracted light and a negative first order diffracted light in different diffraction efficiencies. The asymmetrical diffraction grating includes a plurality of probing-phase shifters formed of semi-transparent material, disposed periodically on the mask substrate in parallel, and a plurality of opaque strips disposed on light-shielding faces of the probing-phase shifters. An asymmetrically recessed ridge implements each of the probing-phase shifters.
摘要翻译：具有被配置为获得调整投影光刻工具的光学系统所需的信息的监视图案的光掩模。监测图案包括掩模基板和掩模基板上描绘的非对称衍射光栅，被配置为产生不同衍射效率的正一级衍射光和负一级衍射光。不对称衍射光栅包括多个由半透明材料形成的探测移相器，其平行设置在掩模基板上周期性地设置，并且多个不透明条带设置在探测移相器的遮光面上。不对称凹入的脊部实现每个探测移相器。

6. 发明申请

US20090098473A1 Photomask, method of lithography, and method for manufacturing the photomask 失效
标题翻译：光掩模，光刻方法和制造光掩模的方法
公开(公告)号：US20090098473A1
公开(公告)日：2009-04-16
申请号：US12314404
申请日：2008-12-10
申请人： Takashi Sato , Takashi Sakamoto
发明人： Takashi Sato , Takashi Sakamoto
IPC分类号： G03F7/20
CPC分类号： G03F7/70641 , B64D47/08 , G03F1/32
摘要： A photomask has a monitoring pattern configured to obtain information required for adjusting optical system of a projection lithography tool. The monitoring pattern encompasses a mask substrate and an asymmetrical diffraction grating delineated on the mask substrate, configured to generate a positive first order diffracted light and a negative first order diffracted light in different diffraction efficiencies. The asymmetrical diffraction grating includes a plurality of probing-phase shifters, disposed periodically on the mask substrate in parallel, and a plurality of opaque strips disposed on light-shielding faces of the probing-phase shifters. An asymmetrically recessed ridge implements each of the probing-phase shifters.
摘要翻译：光掩模具有被配置为获得调整投影光刻工具的光学系统所需的信息的监视图案。监测图案包括掩模基板和掩模基板上描绘的非对称衍射光栅，被配置为产生不同衍射效率的正一级衍射光和负一级衍射光。不对称衍射光栅包括平行地周期性地设置在掩模基板上的多个探测移相器，以及设置在探测移相器的光屏蔽面上的多个不透明条。不对称凹入的脊部实现每个探测移相器。

7. 发明授权

US09372339B2 Wavelength swept light source 有权
标题翻译：波长扫描光源
公开(公告)号：US09372339B2
公开(公告)日：2016-06-21
申请号：US13978122
申请日：2012-01-04
申请人： Seiji Toyoda , Kazunori Naganuma , Yuichi Okabe , Shogo Yagi , Kazutoshi Kato , Masahiro Ueno , Takashi Sakamoto , Tadayuki Imai , Jun Miyazu , Kazuto Noguchi , Shigeo Ishibashi
发明人： Seiji Toyoda , Kazunori Naganuma , Yuichi Okabe , Shogo Yagi , Kazutoshi Kato , Masahiro Ueno , Takashi Sakamoto , Tadayuki Imai , Jun Miyazu , Kazuto Noguchi , Shigeo Ishibashi
IPC分类号： G02F1/01 , G02F1/03 , G02F1/07 , G02B26/06 , H01S5/14 , H01S3/107 , H01S3/08 , H01S3/105
CPC分类号： G02B26/06 , H01S3/08027 , H01S3/105 , H01S3/107 , H01S5/141 , H01S5/142 , H01S5/143
摘要： A wavelength swept light source includes a sawtooth waveform as a main waveform and an exponential component of the sawtooth waveform to the controlled voltage of the electro-optic deflector. The controlled voltage is controlled so that, as an oscillation wavelength to be swept is swept towards a longer wavelength side, a change rate of the oscillation wavelength is increased.
摘要翻译：波长扫描光源包括作为主波形的锯齿波形和锯齿波形的指数分量与电光偏转器的受控电压。受控电压被控制为使得随着扫描的振荡波长向较长波长侧扫过，振荡波长的变化率增加。

8. 发明授权

US08983319B2 Image forming apparatus 有权
标题翻译：图像形成装置
公开(公告)号：US08983319B2
公开(公告)日：2015-03-17
申请号：US13589722
申请日：2012-08-20
申请人： Takashi Sakamoto , Hiroaki Okuma , Daisuke Nakai
发明人： Takashi Sakamoto , Hiroaki Okuma , Daisuke Nakai
IPC分类号： G03G15/09 , G03G15/01
CPC分类号： G03G15/09 , G03G15/0121 , G03G15/0879
摘要： An image forming apparatus includes an image carrier that carries an electrostatic latent image; a developer supplying unit that supplies developer by being driven at a predetermined speed; a developing unit that develops the electrostatic latent image, while a transporting member transports the developer, a transport speed of the transporting member being switched to a plurality of speeds; a determining unit that determines whether or not an operation where a supply capacity of the developer supplying unit is greater than a transport capacity of the developing unit exceeds a predetermined threshold value and is continued; and a controller that performs control so that, when the determining unit determines that the operation exceeds the predetermined threshold value and is continued, an operation that was being executed immediately prior to the determination is stopped to forcefully drive the transporting member of the developing unit for a predetermined driving time.
摘要翻译：图像形成装置包括承载静电潜像的图像载体; 显影剂供应单元，其通过以预定速度被驱动来供应显影剂; 显影单元，其显影静电潜像，同时传送构件输送显影剂，传送构件的传送速度切换到多个速度; 确定单元，确定显影剂供应单元的供应容量大于显影单元的输送能力的操作是否超过预定阈值并继续; 以及控制器，其执行控制，使得当所述确定单元确定所述操作超过所述预定阈值并继续时，停止在所述确定之前正在执行的操作，以强制驱动所述显影单元的传送构件预定行驶时间。

9. 发明申请

US20130177918A1 INHIBITION METHOD OF NUCLEIC ACID AMPLIFICATION BY PHOTOIRRADIATION AND METHOD OF SELECTIVE NUCLEIC ACID AMPLIFICATION WITH HIGH SENSITIVITY 有权
标题翻译：通过光离子抑制核酸放大的抑制方法和高灵敏度的选择性核酸放大方法
公开(公告)号：US20130177918A1
公开(公告)日：2013-07-11
申请号：US13821968
申请日：2011-09-09
申请人： Hiroshi Terasaki , Tsunetada Konno , Mitsunobu Shimadzu , Kenzo Fujimoto , Takashi Sakamoto
发明人： Hiroshi Terasaki , Tsunetada Konno , Mitsunobu Shimadzu , Kenzo Fujimoto , Takashi Sakamoto
IPC分类号： C12Q1/68
CPC分类号： C12Q1/686 , C12Q1/6858 , C12Q2523/313 , C12Q2537/163
摘要： Provided is a method for rapidly and easily detecting a mutated nucleic acid, which is contained in a small amount in a nucleic acid sample together with wild-type nucleic acids, with high specificity and high sensitivity. In the method of the present invention, amplification of a detection region comprising a target site by a nucleic acid amplification method is inhibited, by the steps of allowing a nucleic acid having a target site to coexist with a clamp probe comprising a photo-crosslinking nucleic acid and having a sequence complementary to the target site, and photo-crosslinking the nucleic acid having the target site with the clamp probe by photo-irradiation.
摘要翻译：本发明提供了一种用于以高特异性和高灵敏度快速且容易地检测与野生型核酸一起少量包含在核酸样品中的突变核酸的方法。在本发明的方法中，通过核酸扩增方法扩增包含靶位点的检测区域，通过以下步骤来抑制具有靶位点的核酸与包含光交联核酸的夹持探针共存酸，并具有与靶位点互补的序列，并通过光照射将具有靶位点的核酸用夹具探针进行光交联。

10. 发明申请

US20120003013A1 DEVELOPER CONTAINER AND IMAGE FORMING APPARATUS USING THE SAME 有权
标题翻译：使用它的开发者容器和图像形成装置
公开(公告)号：US20120003013A1
公开(公告)日：2012-01-05
申请号：US12961971
申请日：2010-12-07
申请人： Takashi Sakamoto , Ryuji Hattori , Toshikazu Tsumita
发明人： Takashi Sakamoto , Ryuji Hattori , Toshikazu Tsumita
IPC分类号： G03G15/08
CPC分类号： G03G15/0886 , G03G15/0875 , G03G15/0877 , G03G15/0879 , G03G2215/0129 , G03G2215/0692
摘要： A developer container is provided with a container body. An opening is formed through the container body. An opening/closing lid closes the opening. A lid holding frame holds the opening/closing lid in such a manner that the opening/closing lid can move between an open position and a closed position. A stopper stops the opening/closing lid and thereby preventing it from moving toward the open position in a state that the opening/closing lid is located at the closed position. A contact portion comes into contact with a hook portion provided in a container receiving portion when the developer container is inserted into the container receiving portion. A deformable portion deforms the stopper to such an extent that the stopping of the opening/closing lid by the stopper is canceled when the developer container is inserted into the container receiving portion and the contact portion comes into contact with the hook portion.
摘要翻译：显影剂容器设置有容器主体。通过容器主体形成开口。开/关盖关闭开口。盖保持框架以使开/关盖能够在打开位置和关闭位置之间移动的方式保持打开/关闭盖。止动器在打开/关闭盖位于关闭位置的状态下停止打开/关闭盖，从而防止其向打开位置移动。当显影剂容器插入容器接收部分时，接触部分与设置在容器接收部分中的钩部接触。可变形部分使止动件变形到当显影剂容器插入到容器容纳部分中并且接触部分与钩部接触时，通过止动件停止打开/关闭盖的程度。

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