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    • 4. 发明申请
    • OXIDE SUPERCONDUCTOR AND METHOD OF FABRICATING SAME
    • 氧化物超导体及其制造方法
    • US20090247413A1
    • 2009-10-01
    • US12243087
    • 2008-10-01
    • Mariko HayashiTakeshi Araki
    • Mariko HayashiTakeshi Araki
    • H01L39/12H01L39/24
    • H01L39/143H01L39/2425H01L39/2451
    • An oxide superconductor with superconduction properties being improved by effectively introducing a pinning center thereinto and its fabrication method are disclosed. The superconductor has a high-crystallinity oxide superconductor film which is formed on a substrate with a direction of crystal grain being oriented almost perpendicularly to the substrate and with (100) planes of neighboring crystal grains being oriented to form an oblique angle ranging from 0 to 4 degrees or 86 to 90 degrees. The film has a multilayer structure including a plurality of high-density magnetic field trap layers stacked in almost parallel to the substrate and a low-density magnetic field trap layer sandwiched therebetween. An average grain boundary width of the high-density trap layers in a cross-section horizontal to the substrate is 80 nm or less. The width is less than an average grain boundary width of the low-density trap layer in its cross-section horizontal to the substrate.
    • 公开了一种通过有效地引入钉扎中心来提高超导性能的氧化物超导体及其制造方法。 超导体具有形成在基板上的高结晶度氧化物超导体膜,其中晶体的<001>方向几乎垂直于衬底取向,并且相邻晶粒的(100)面被定向以形成倾斜角度范围 从0到4度或86到90度。 膜具有多层结构,其包括与基板几乎平行堆叠的多个高密度磁场陷阱层和夹在其间的低密度磁场陷阱层。 与衬底水平的横截面中的高密度陷阱层的平均晶界宽度为80nm以下。 该宽度小于在垂直于衬底的横截面中的低密度陷阱层的平均晶界宽度。
    • 5. 发明授权
    • Oxide superconductor and method of fabricating same
    • 氧化物超导体及其制造方法
    • US08124568B2
    • 2012-02-28
    • US12243087
    • 2008-10-01
    • Mariko HayashiTakeshi Araki
    • Mariko HayashiTakeshi Araki
    • H01L39/12H01B12/00
    • H01L39/143H01L39/2425H01L39/2451
    • An oxide superconductor with superconduction properties being improved by effectively introducing a pinning center thereinto and its fabrication method are disclosed. The superconductor has a high-crystallinity oxide superconductor film which is formed on a substrate with a direction of crystal grain being oriented almost perpendicularly to the substrate and with (100) planes of neighboring crystal grains being oriented to form an oblique angle ranging from 0 to 4 degrees or 86 to 90 degrees. The film has a multilayer structure including a plurality of high-density magnetic field trap layers stacked in almost parallel to the substrate and a low-density magnetic field trap layer sandwiched therebetween. An average grain boundary width of the high-density trap layers in a cross-section horizontal to the substrate is 80 nm or less. The width is less than an average grain boundary width of the low-density trap layer in its cross-section horizontal to the substrate.
    • 公开了一种通过有效地引入钉扎中心来提高超导性能的氧化物超导体及其制造方法。 超导体具有形成在基板上的高结晶度氧化物超导体膜,其中晶体的<001>方向几乎垂直于衬底取向,并且相邻晶粒的(100)面被定向以形成倾斜角度范围 从0到4度或86到90度。 膜具有多层结构,其包括与基板几乎平行堆叠的多个高密度磁场陷阱层和夹在其间的低密度磁场陷阱层。 与衬底水平的横截面中的高密度陷阱层的平均晶界宽度为80nm以下。 该宽度小于在垂直于衬底的横截面中的低密度陷阱层的平均晶界宽度。
    • 8. 发明申请
    • OXIDE SUPERCONDUCTOR AND METHOD FOR PRODUCING THE SAME
    • 氧化物超导体及其制造方法
    • US20110172103A1
    • 2011-07-14
    • US12900024
    • 2010-10-07
    • Takeshi Araki
    • Takeshi Araki
    • H01L39/12H01L39/24B32B15/00
    • H01L39/2425C23C18/1216C23C18/1254C23C18/1295Y10T29/49014Y10T428/24975Y10T428/26
    • An oxide superconductor film formed on a substrate includes an oxide containing at least one metal M selected from the group consisting of yttrium and lanthanoid metals, provided that cerium, praseodymium, promethium and ruthenium are excluded, and barium and copper, in which the film has an average thickness of 350 nm or more, an average amount of residual carbon of 3×1019 atoms/cc or more, and an amount of residual fluorine in a range of 5×1017 to 1×1019 atoms/cc, and in which, when divided the film into a plurality of regions from a surface of the film or from an interface between the film and the substrate, each region having a thickness of 10 nm, atomic ratios of copper, fluorine, oxygen and carbon between two adjacent regions are in a range of ⅕ times to 5 times.
    • 形成在基板上的氧化物超导体膜包括含有选自钇和镧系金属中的至少一种选自金属M的氧化物的氧化物,条件是除去铈,镨,ium和钌,以及其中所述膜具有的钡和铜 350nm以上的平均厚度,3×1019个原子/ cc以上的残存碳的平均量和5×1017〜1×1019个原子/ cc范围内的残留氟量,其中, 当将薄膜从薄膜的表面或薄膜与基片之间的界面分成多个区域时,两个相邻区域之间的厚度为10nm,铜,氟,氧和碳原子比的区域为 在⅕倍至5倍的范围内。