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1. 发明授权

US11869752B2 System and method for transferring a focus ring into processing apparatus 有权
公开(公告)号：US11869752B2
公开(公告)日：2024-01-09
申请号：US17111679
申请日：2020-12-04
申请人： Tokyo Electron Limited
发明人： Kippei Sugita , Kenji Nagai
IPC分类号： H01J37/32 , H01J37/22 , H01J37/244
CPC分类号： H01J37/32642 , H01J37/226 , H01J37/244 , H01J2237/2446
摘要： A transfer system configured to transfer a focus ring includes a processing system and a position detection system. The processing system includes a processing apparatus including a chamber main body and a placing table having a substrate placing region and a focus ring placing region; and a transfer device configured to transfer the focus ring. The position detection system includes a light source; multiple optical elements configured to output light and receive reflected light; a driving unit configured to move each optical element to allow each optical element to scan a scanning range; and a controller configured to calculate, based on the reflected light in the scanning range, a positional relationship between the placing table and the focus ring for each optical element. The transfer device is configured to adjust a transfer position of the focus ring onto the focus ring placing region based on the calculated positional relationship.

2. 发明申请

US20210074564A1 METHOD AND SYSTEM FOR INSPECTING PROCESSING APPARATUS 有权
公开(公告)号：US20210074564A1
公开(公告)日：2021-03-11
申请号：US17010885
申请日：2020-09-03
申请人： Tokyo Electron Limited
发明人： Kippei Sugita , Kenji Nagai
IPC分类号： H01L21/67 , G01N21/95 , G01N21/45 , G01N21/25
摘要： A system configured to inspect a processing apparatus includes a temperature adjusting device configured to adjust a temperature of a component within a processing chamber of the processing apparatus; a light source configured to emit measurement light; multiple optical elements configured to output the measurement light emitted from the light source to the component within the processing chamber of the processing apparatus as output light and configured to receive reflected light from the component during a temperature adjustment of the component by the temperature adjusting device; and a controller configured to measure temperatures of the component at measurement points respectively corresponding to the multiple optical elements based on the reflected light, and make a determination upon abnormality of the processing apparatus based on comparisons of the temperatures of the component at the respective measurement points.

3. 发明授权

US11817335B2 Method and system for inspecting processing apparatus 有权
公开(公告)号：US11817335B2
公开(公告)日：2023-11-14
申请号：US17010885
申请日：2020-09-03
申请人： Tokyo Electron Limited
发明人： Kippei Sugita , Kenji Nagai
IPC分类号： G01N21/25 , G01N21/45 , H01L21/67 , G01N21/95 , G01B5/00 , G01K11/125
CPC分类号： H01L21/67253 , G01B5/0014 , G01K11/125 , G01N21/25 , G01N21/45 , G01N21/9501 , H01L21/67248 , H01L21/67288
摘要： A system configured to inspect a processing apparatus includes a temperature adjusting device configured to adjust a temperature of a component within a processing chamber of the processing apparatus; a light source configured to emit measurement light; multiple optical elements configured to output the measurement light emitted from the light source to the component within the processing chamber of the processing apparatus as output light and configured to receive reflected light from the component during a temperature adjustment of the component by the temperature adjusting device; and a controller configured to measure temperatures of the component at measurement points respectively corresponding to the multiple optical elements based on the reflected light, and make a determination upon abnormality of the processing apparatus based on comparisons of the temperatures of the component at the respective measurement points.

4. 发明申请

US20210183628A1 TRANSFER SYSTEM AND TRANSFER METHOD 有权
公开(公告)号：US20210183628A1
公开(公告)日：2021-06-17
申请号：US17111679
申请日：2020-12-04
申请人： Tokyo Electron Limited
发明人： Kippei Sugita , Kenji Nagai
IPC分类号： H01J37/32 , H01J37/22 , H01J37/244
摘要： A transfer system configured to transfer a focus ring includes a processing system and a position detection system. The processing system includes a processing apparatus including a chamber main body and a placing table having a substrate placing region and a focus ring placing region; and a transfer device configured to transfer the focus ring. The position detection system includes a light source; multiple optical elements configured to output light and receive reflected light; a driving unit configured to move each optical element to allow each optical element to scan a scanning range; and a controller configured to calculate, based on the reflected light in the scanning range, a positional relationship between the placing table and the focus ring for each optical element. The transfer device is configured to adjust a transfer position of the focus ring onto the focus ring placing region based on the calculated positional relationship.

5. 发明授权

US10903100B2 Method of obtaining amount of deviation of a measuring device, and method of calibrating transfer position data in a processing system 有权
公开(公告)号：US10903100B2
公开(公告)日：2021-01-26
申请号：US16198924
申请日：2018-11-23
申请人： TOKYO ELECTRON LIMITED
发明人： Kippei Sugita , Daisuke Kawano
IPC分类号： G01R27/26 , H01L21/67 , G01D5/241 , H01L21/68 , H01L21/683 , H01L21/677 , H01J37/32 , H01L21/687
摘要： A measuring device includes sensor electrodes provided along a periphery of a base substrate such that a sum A of shortest distances from the sensor electrodes to an inner peripheral surface of a focus ring becomes a constant value, the sum A satisfying ∑ i = 1 N ⁢ a C i = A the number of the sensor electrodes, Ci: measurement values and “a”: constant). A method of obtaining the amount of deviation of the central position of the measuring device in a region surrounded by the focus ring from the center of the region, includes: calculating the measurement values Ci using the measuring device; calculating the constant “a” using the measurement values Ci; calculating distances from the sensor electrodes to the inner peripheral surface of the focus ring using the constant “a” and the measurement values Ci; and calculating the amount of deviation of the central position of the measuring device based on the calculated distances.

6. 发明授权

US10837991B2 Electrostatic capacitance measuring device 有权
公开(公告)号：US10837991B2
公开(公告)日：2020-11-17
申请号：US15938662
申请日：2018-03-28
申请人： TOKYO ELECTRON LIMITED
发明人： Kippei Sugita , Tomohide Minami , Satoru Nishio
IPC分类号： G01R27/26 , H01L21/67 , H01L21/683 , G01R31/28 , H01J37/32 , H01L21/677 , H05K1/02
CPC分类号： G01R27/2605 , G01R31/2831 , H01L21/67259 , H01L21/6831 , H01L21/6833 , G01R31/2849 , G01R31/2865 , G01R31/2875 , G01R31/2881 , H01J37/32091 , H01J2237/334 , H01L21/67069 , H01L21/67167 , H01L21/67742 , H05K1/0237 , H05K2201/10151
摘要： An electrostatic capacitance measuring device includes: a base substrate; a first sensor having a first electrode, one or more second sensors each having a second electrode, and a circuit board mounted on the base substrate. The first sensor is provided along an edge of the base substrate. The second sensors are fixed on the base substrate. The circuit board is connected to the first sensor and the second sensors, and configured to output high frequency signals to the first electrode and the one or more second electrodes and obtain a first measurement value indicating an electrostatic capacitance from a voltage amplitude at the first electrode and one or more second measurement values indicating electrostatic capacitances obtained from voltage amplitudes at the one or more second electrodes. The measuring device has one or more reference surfaces fixed on the measuring device and facing the one or more second electrodes.

7. 发明授权

US10634479B2 Measuring instrument for measuring electrostatic capacity and method of calibrating transfer position data in processing system by using measuring instrument 有权
公开(公告)号：US10634479B2
公开(公告)日：2020-04-28
申请号：US15623109
申请日：2017-06-14
申请人： TOKYO ELECTRON LIMITED
发明人： Kippei Sugita , Tomohide Minami
IPC分类号： G01B7/00 , H01L21/67 , G01R29/12 , H01L21/683 , H01L21/687 , H01L21/677 , H01L21/68 , G01R27/26
CPC分类号： G01B7/003 , H01L21/67253 , H01L21/67259 , H01L21/67742 , H01L21/681 , H01L21/6831 , H01L21/68742 , G01R27/2605 , G01R29/12 , H01L21/67069 , H01L21/67167
摘要： Provided is a measuring instrument for measuring an electrostatic capacity. The measuring instrument includes a base substrate having a disk shape, a plurality of first sensors arranged along an edge of the base substrate and respectively provide a plurality of side electrodes, one or more second sensors each of which has a bottom electrode provided along a bottom surface of the base substrate, and a circuit board. The circuit board is configured to apply a high frequency signal to the plurality of side electrodes and the bottom electrode, to generate a plurality of first measurement values respectively indicating electrostatic capacities based on voltage amplitudes in the plurality of side electrodes, and to generate a second measurement value indicating an electrostatic capacity based on a voltage amplitude in the bottom electrode.

8. 发明授权

US10074549B2 Method for acquiring data indicating electrostatic capacitance 有权
公开(公告)号：US10074549B2
公开(公告)日：2018-09-11
申请号：US15465056
申请日：2017-03-21
申请人： TOKYO ELECTRON LIMITED
发明人： Kippei Sugita , Tomohide Minami
IPC分类号： G01R27/26 , H01L21/67 , H01L21/677 , H01L21/683 , G01D5/24
CPC分类号： H01L21/67253 , G01D5/24 , H01L21/67748 , H01L21/6833
摘要： In a method for acquiring data indicating an electrostatic capacitance between a focus ring and a measuring device includes a disc-shaped base substrate, sensor units arranged along an edge of the base substrate and a circuit substrate mounted on the base substrate, a processor acquires one or more first data sets respectively including a plurality of digital values indicating an electrostatic capacitance of a corresponding sensor unit. The measuring device is transferred to a region on the mounting table surrounded by the focus ring. The processor acquires second data sets when one or more digital values or an average of the digital values included in each of said one or more first data sets exceeds a first threshold. The processor stores measurement data including the respective second data sets or averages of the digital values of each of the second data sets. The measuring device is unloaded from the chamber.

9. 发明授权

US10018484B2 Sensor chip for electrostatic capacitance measurement and measuring device having the same 有权
公开(公告)号：US10018484B2
公开(公告)日：2018-07-10
申请号：US15869298
申请日：2018-01-12
申请人： Tokyo Electron Limited
发明人： Kippei Sugita , Tomohide Minami
IPC分类号： G01R27/26 , G01D5/241 , G01D5/24 , G06F3/044 , G06K9/00
CPC分类号： G01D5/2417 , G01D5/24 , G01R27/2605 , G06F3/044 , G06K9/0002
摘要： Electrostatic capacitance can be measured with high directivity in a specific direction. A sensor chip that measures the electrostatic capacitance includes a first electrode, a second electrode and a third electrode. The first electrode has a first portion. The second electrode has a second portion extended on the first portion of the first electrode, and is insulated from the first electrode within the sensor chip. The third electrode has a front face extended in a direction which intersects with the first portion of the first electrode and the second portion of the second electrode, and is provided on the first portion and the second portion. The third electrode is insulated from the first electrode and the second electrode within the sensor chip. No portion is extended from the first electrode to be positioned above the first portion.

10. 发明申请

US20160363556A1 SYSTEM OF INSPECTING FOCUS RING AND METHOD OF INSPECTING FOCUS RING 有权
标题翻译：检查聚焦环的系统和检查聚焦环的方法
公开(公告)号：US20160363556A1
公开(公告)日：2016-12-15
申请号：US15179306
申请日：2016-06-10
申请人： TOKYO ELECTRON LIMITED
发明人： Kippei Sugita , Tomohide Minami
IPC分类号： G01N27/24
CPC分类号： G01N27/24 , G01R27/2605 , G01R31/265 , G01R31/2831 , G01R31/318511 , H01J37/32009 , H01J37/321 , H01J37/32211
摘要： A system of inspecting a focus ring is provided. The system includes a measuring device, a transfer device and an operation unit. The measuring device includes a base substrate, a sensor chip and a circuit board. The sensor chip has a sensor electrode and is provided along an edge of the base substrate. The circuit board is configured to output a high frequency signal to the sensor electrode and acquire a digital value indicating electrostatic capacitance based on a voltage amplitude in the sensor electrode. The transfer device is configured to scan the measuring device. The operation unit is configured to obtain difference values by performing a difference operation with respect to the digital values acquired by the measuring device at multiple positions along a direction which intersects with an inner periphery of the focus ring.
摘要翻译：提供了一种检查对焦环的系统。该系统包括测量装置，传送装置和操作单元。测量装置包括基底，传感器芯片和电路板。传感器芯片具有传感器电极并且沿着基底基板的边缘设置。电路板被配置为向传感器电极输出高频信号，并且基于传感器电极中的电压振幅获取表示静电电容的数字值。传送装置被配置为扫描测量装置。操作单元被配置为通过对与测量装置在与聚焦环的内周相交的方向的多个位置处获取的数字值执行差分运算来获得差值。

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