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1. 发明授权

US09082799B2 System and method for 2D workpiece alignment 有权
标题翻译： 2D工件对齐的系统和方法
公开(公告)号：US09082799B2
公开(公告)日：2015-07-14
申请号：US13623428
申请日：2012-09-20
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： William T. Weaver , Charles T. Carlson , Scott A. Smith , Michael A. Beck , Aaron P. Webb , James D. Strassner , Lawrence R. Gravell , Michael C. Simmons
IPC分类号： H01L21/673 , H01L21/68 , H01L21/687 , C23C14/04 , C23C14/48 , C23C14/50
CPC分类号： H01L21/67333 , C23C14/042 , C23C14/48 , C23C14/50 , H01L21/68728 , H01L21/68735 , H01L21/68778 , Y10T29/49899
摘要： A carrier capable of holding one or more workpieces is disclosed. The carrier includes movable projections located along the sides of each cell in the carrier. This carrier, in conjunction with a separate alignment apparatus, aligns each workpiece within its respective cell against several alignment pins, using a multiple step alignment process to guarantee proper positioning of the workpiece in the cell. First, the workpieces are moved toward one side of the cell. Once the workpieces have been aligned against this side, the workpieces are then moved toward an adjacent orthogonal side such that the workpieces are aligned to two sides of the cell. Once aligned, the workpiece is held in place by the projections located along each side of each cell. In addition, the alignment pins are also used to align the associated mask, thereby guaranteeing that the mask is properly aligned to the workpiece.
摘要翻译：公开了能够容纳一个或多个工件的承载件。载体包括沿着载体中的每个单元的侧面定位的可移动凸起。该载体与单独的对准装置一起使用多步对准工艺将其各自的电池内的每个工件对准几个对准销，以保证工件在电池中的正确定位。首先，将工件朝向电池的一侧移动。一旦工件已经对准该侧面，工件就移动到相邻的正交侧，使得工件与单元的两侧对齐。一旦对准，工件通过位于每个单元的每一侧的凸起保持就位。此外，对准销还用于对准相关联的掩模，从而保证掩模适当地对准工件。

2. 发明申请

US20150028232A1 Multi-Part Mask For Implanting Workpieces 有权
标题翻译：用于植入工件的多部件面罩
公开(公告)号：US20150028232A1
公开(公告)日：2015-01-29
申请号：US14322389
申请日：2014-07-02
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Aaron P. Webb , Charles T. Carlson
IPC分类号： H01J37/317 , B32B37/18 , B32B37/12
CPC分类号： B32B37/18 , H01J2237/31711 , H01L21/266 , Y10T29/49895
摘要： A multi-part mask has a pattern plate, which includes a planar portion that has the desired aperture pattern to be used during workpiece processing. The multi-part mask also has a mounting frame, which is used to hold the pattern plate. Prior to assembly, the pattern plate has an aligning portion, which has one or more holes through which reusable alignment pins are inserted. These alignment pins enter kinematic joints disposed on the mounting frame, which serve to precisely align the pattern plate to the mounting frame. After the pattern plate has been secured to the mounting frame, the aligning portion can be detached from the pattern plate. The alignment pins can be reused at a later time. In some embodiments, the pattern plate can later be removed from the mounting frame, so that the mounting frame may be reused.
摘要翻译：多部分掩模具有图案板，其包括具有在工件加工期间使用的期望孔径图案的平面部分。多部分面罩还具有用于固定图案板的安装框架。在组装之前，图案板具有对准部分，其具有一个或多个孔，可重复使用的对准销插入该孔中。这些对准销进入设置在安装框架上的运动接头，用于将图案板精确地对准安装框架。在图案板已经固定到安装框架之后，对准部分可以从图案板分离。对准引脚可以在以后再次使用。在一些实施例中，可以稍后从安装框架移除图案板，使得安装框架可以重复使用。

3. 发明申请

US20140265392A1 WAFER HANDLING APPARATUS 有权
标题翻译：水处理设备
公开(公告)号：US20140265392A1
公开(公告)日：2014-09-18
申请号：US13800768
申请日：2013-03-13
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人： Paul E. Pergande , Charles T. Carlson
IPC分类号： B25J15/00
CPC分类号： B25J15/0014 , B25J11/0095 , H01L21/67742 , H01L21/67754 , H01L21/68707
摘要： Disclosed is a wafer support and alignment apparatus. The wafer support and alignment apparatus includes a wafer support component adapted to seat, align and support a wafer. The wafer support component includes at least one flat portion to support the wafer, at least one alignment lip portion protruding upward from the at least one flat portion, and at least one recessed pocket carved out of a portion of the at least one base portion. The at least one recessed pocket is adapted to receive at least one pad.
摘要翻译：公开了一种晶片支撑和对准装置。晶片支撑和对准装置包括适于安置，对准和支撑晶片的晶片支撑部件。晶片支撑部件包括至少一个用于支撑晶片的平坦部分，从至少一个平坦部分向上突出的至少一个对准唇部，以及从所述至少一个基部的一部分雕刻出的至少一个凹槽。所述至少一个凹槽适于接收至少一个垫。

4. 发明授权

US09659677B2 Shielding device for substrate edge protection and method of using same 有权
公开(公告)号：US09659677B2
公开(公告)日：2017-05-23
申请号：US14317167
申请日：2014-06-27
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Aaron P. Webb , Charles T. Carlson , William T. Weaver , Timothy J. Miller , James D. Strassner
IPC分类号： G21F3/00 , H01L21/265 , H01L31/18 , H01L21/687
CPC分类号： G21F3/00 , H01L21/265 , H01L21/68707 , H01L21/68728 , H01L31/18
摘要： A shielding device for shielding an edge of a semiconductor substrate can include a multisided frame defining a perimeter of an enclosed area, and a shield coupled to the frame. The shield may be configured to move between a first position where the shield is retracted to the perimeter and a second position where shield advanced into the enclosed area. A method for processing a semiconductor substrate includes placing a semiconductor substrate in position in an implantation chamber, covering edges of the semiconductor substrate by pushing shields into engagement with the edges, performing an ion implantation procedure, and retracting the shields from the edges.

5. 发明申请

US20150279720A1 END EFFECTOR PADS 有权
标题翻译：末端效应垫
公开(公告)号：US20150279720A1
公开(公告)日：2015-10-01
申请号：US14291982
申请日：2014-05-30
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Paul E. Pergande , Charles T. Carlson , Krag R. Senior
IPC分类号： H01L21/687
CPC分类号： H01L21/68707 , H01L21/67742
摘要： An end effector pad including a fence member, a first recessed support member extending from a first side of the fence member, a second recessed support member extending from a second side of the fence member opposite the first side, a first glass plate having a relatively low coefficient of friction disposed on top of the first recessed support member for supporting a substrate thereon, and a second glass plate having a relatively low coefficient of friction disposed on top of the second recessed support member for supporting a substrate thereon.
摘要翻译：一种末端执行器垫，包括挡板构件，从栅栏构件的第一侧延伸的第一凹入支撑构件，从栅栏构件的与第一侧相对的第二侧延伸的第二凹入支撑构件，具有相对的第一玻璃板设置在第一凹槽支撑构件顶部的用于支撑基底的低摩擦系数，以及设置在第二凹入支撑构件顶部上用于支撑基底的相对低摩擦系数的第二玻璃板。

6. 发明申请

US20140076688A1 OPTIMIZATION OF CONVEYOR BELTS USED FOR WORKPIECE PROCESSING 有权
标题翻译：输送带用于工件加工的优化
公开(公告)号：US20140076688A1
公开(公告)日：2014-03-20
申请号：US14018887
申请日：2013-09-05
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Robert Brent Vopat , Malcolm N. Daniel , Luke Bonecutter , Jason M. Schaller , Charles T. Carlson , William T. Weaver
IPC分类号： B65G47/52
CPC分类号： B65G47/52 , B65G43/10 , H01L21/67276 , H01L21/67727
摘要： A system and method for the handling of workpieces in a workpiece processing system is disclosed. The system utilizes three conveyor belts, where one may be a loading belt, feeding unprocessed workpieces from its associated workpiece carrier to a processing system. A second conveyor belt may be an unloading belt, receiving processed workpieces from the processing system and filling its associated workpiece carrier. The third conveyor belt may be exchanging its workpiece carrier during this time, so that it is available to start operating as the loading belt once all of the workpieces have been removed from the workpiece carrier associated with the first conveyor belt.
摘要翻译：公开了一种在工件处理系统中处理工件的系统和方法。该系统使用三个输送带，其中可以是装载带，将未加工的工件从其相关联的工件载体供给到处理系统。第二传送带可以是卸载带，从处理系统接收加工的工件并填充其相关联的工件载体。在此期间，第三传送带可以更换其工件载体，使得一旦所有工件已经从与第一传送带相关联的工件载体移除，就可以开始作为装载带操作。

7. 发明授权

US10446710B2 Transfer chamber and method of using a transfer chamber 有权
公开(公告)号：US10446710B2
公开(公告)日：2019-10-15
申请号：US14101945
申请日：2013-12-10
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Aaron P. Webb , Charles T. Carlson , Paul Forderhase , William T. Weaver , Robert Brent Vopat
IPC分类号： H01L31/18 , H01J37/317 , H01L21/67 , H01J37/18 , H01J37/32
摘要： An ion implanter and method for facilitating expeditious performance of maintenance on a component of the ion implanter in a manner that reduces downtime while increasing throughput of the ion implanter. The ion implanter includes a process chamber, a transfer chamber connected to the process chamber, a first isolation gate configured to controllably seal the transfer chamber from the process chamber, and a second isolation gate configured to controllably seal the transfer chamber from an atmospheric environment, wherein a component of the ion implanter can be transferred between the process chamber and the transfer chamber for performing maintenance on the component outside of the process chamber. Performing maintenance on a component of the ion implanter includes the steps of transferring the component from the process chamber to the transfer chamber, sealing the transfer chamber, venting the transfer chamber to atmospheric pressure, an opening the transfer chamber to an atmospheric environment.

8. 发明授权

US10217657B2 Active substrate alignment system and method 有权
公开(公告)号：US10217657B2
公开(公告)日：2019-02-26
申请号：US15511542
申请日：2015-09-04
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Aaron P. Webb , Timothy J. Miller , Tammy Jo Pride , Christopher N. Grant , James D. Strassner , Charles T. Carlson
IPC分类号： H01L21/68 , H01J37/304 , H01J37/317 , G06T7/73 , C23C14/48 , G06K9/62 , G06T7/00 , H01J37/20 , H01J37/22
摘要： An active substrate alignment system for an ion implanter, the system including a platen, a registration device adapted to selectively move a substrate engagement surface disposed adjacent the platen for limiting movement of a substrate disposed on the platen, a camera configured to capture an image of the substrate before the substrate is disposed on the platen, and a controller in communication with the camera and the registration device, the controller configured to command the registration device to move the substrate engagement surface based on the image to limit movement of the substrate in a predetermined manner.

9. 发明授权

US09570309B2 Mask alignment system for semiconductor processing 有权
标题翻译：半导体处理掩模对准系统
公开(公告)号：US09570309B2
公开(公告)日：2017-02-14
申请号：US14101974
申请日：2013-12-10
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Aaron P. Webb , Charles T. Carlson , William T. Weaver , Christopher N. Grant
IPC分类号： H01L21/266 , H01L21/68
CPC分类号： H01L21/266 , H01L21/682
摘要： A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.
摘要翻译：掩模对准系统，用于在离子注入掩模和工件之间提供精确和可重复的对准。该系统包括具有松散地连接到其上的多个离子注入掩模的掩模框架。掩模框架设置有多个框架对准空腔，并且每个掩模设置有多个掩模对准空腔。该系统还包括用于保持工件的压板。压板可以设置有多个掩模对准销和框架对准销，其被配置为分别接合掩模对准空腔和框架对准空腔。面罩框架可以下降到台板上，框架对准空腔与框架定位销对齐，以在面罩和工件之间提供粗略对准。然后将掩模对准空腔移动到与掩模对准销对准，从而将每个单独的掩模移动到与相应的工件精确对准。

10. 发明授权

US09490153B2 Mechanical alignment of substrates to a mask 有权
标题翻译：基板与面罩的机械对准
公开(公告)号：US09490153B2
公开(公告)日：2016-11-08
申请号：US14323088
申请日：2014-07-03
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Aaron P. Webb , Charles T. Carlson , Michael Honan , Luigi G. Amato , Christopher Neil Grant , James D. Strassner
IPC分类号： C23C14/04 , H01L21/68
CPC分类号： H01L21/682 , C23C14/04 , Y10T29/49895
摘要： A plurality of masks is attached to the underside of a mask frame. This attachment is made such that each mask can independently move relative to the mask frame in three directions. This relative movement allows each mask to adjust its position to align with respective alignment pins disposed on a working surface. In one embodiment, each mask is attached to the mask frame using fasteners, where the fasteners have a shaft with a diameter smaller than the diameter of the mounting hole disposed on the mask. A bias element may be used to allow relative movement between the mask and the mask frame in the vertical direction. Each mask may also have kinematic features to mate with the respective alignment pins on the working surface.
摘要翻译：多个掩模附着到荫罩框架的下侧。该附件被制成使得每个掩模可以在三个方向上相对于掩模框架独立地移动。该相对移动允许每个掩模调整其位置以与设置在工作表面上的相应对准销对准。在一个实施例中，每个掩模使用紧固件附接到掩模框架，其中紧固件具有直径小于设置在掩模上的安装孔的直径的轴。可以使用偏置元件来允许掩模和掩模框架在垂直方向上的相对移动。每个掩模还可以具有与工作表面上的相应对准销匹配的运动特征。

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