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1. 发明申请

US20140342225A1 ELECTRODE FOR ELECTROCHEMICAL DEVICE 审中-公开
标题翻译：电化学装置用电极
公开(公告)号：US20140342225A1
公开(公告)日：2014-11-20
申请号：US14344711
申请日：2012-09-13
申请人： Yasuhiro Isshiki , Tsutomu Fujii , Takuya Ishii , Taku Matsumura , Yuko Otani , Yuji Shibata , Kazuyuki Ohnishi
发明人： Yasuhiro Isshiki , Tsutomu Fujii , Takuya Ishii , Taku Matsumura , Yuko Otani , Yuji Shibata , Kazuyuki Ohnishi
IPC分类号： H01M4/62 , H01M4/36
CPC分类号： H01M4/622 , H01G11/06 , H01G11/24 , H01G11/28 , H01G11/38 , H01G11/86 , H01M4/139 , H01M4/366 , H01M4/621 , Y02E60/13 , Y02T10/7022
摘要： An electrode for electrochemical device which is provided with an electrode active material layer containing an electrode active material and a binder, comprising binder-covered parts 220 comprised of a binder which covers at least parts of the surfaces of particles of an electrode active material 210 and binder-connecting parts 230 comprised of a binder which is present in space parts 240 formed between pluralities of particles of the electrode active material 210 and which connects the binder-covered parts 220 formed at the surfaces of the pluralities of particles of the electrode active material 210 which form the space parts can be provided.
摘要翻译：一种电化学装置用电极，其具有含有电极活性物质和粘合剂的电极活性物质层，该电极活性物质层包含由覆盖电极活性物质210的粒子的至少一部分表面的粘合剂构成的粘合剂覆盖部220，粘合剂连接部件230由粘合剂构成，该粘结剂存在于形成于电极活性物质210的多个颗粒之间的空间部分240中，并且连接形成在电极活性物质的多个颗粒表面的粘合剂覆盖部分220 210可形成空间部分。

2. 发明申请

US20140170486A1 COMPOSITE PARTICLES FOR ELECTROCHEMICAL DEVICE ELECTRODE, MATERIAL FOR ELECTROCHEMICAL DEVICE ELECTRODE, AND ELECTROCHEMICAL DEVICE ELECTRODE 有权
标题翻译：电化学装置电极用复合颗粒，电化学装置电极用材料及电化学装置电极
公开(公告)号：US20140170486A1
公开(公告)日：2014-06-19
申请号：US14232838
申请日：2012-07-13
申请人： Taku Matsumura , Yuko Otani
发明人： Taku Matsumura , Yuko Otani
IPC分类号： H01M4/36 , H01M4/04
CPC分类号： H01M4/362 , H01M4/0419 , H01M4/0435 , H01M4/13 , H01M4/139 , H01M4/525 , H01M4/587 , H01M4/622 , Y02P70/54
摘要： Composite particles for electrochemical device electrode which contain an electrode active material, a non-water soluble particle-shaped polymer, and a water-soluble polymer having a sulfonic acid group are provided. According to the present invention, composite particles for electrochemical device electrode are high in fluidity, exhibit high adhesion with a current collector, and can provide an electrochemical device electrode which is high in initial capacity, low in internal resistance, an excellent in high temperature storage characteristics are provided.
摘要翻译：提供含有电极活性物质的电化学装置电极用复合颗粒，非水溶性颗粒状聚合物和具有磺酸基的水溶性聚合物。根据本发明，电化学装置用电极用复合粒子的流动性高，与集电体的粘合性高，能够提供初期容量高，内阻低，耐高温性优异的电化学装置电极提供特征。

3. 发明授权

US09685658B2 Composite particles for electrochemical device electrode, material for electrochemical device electrode, and electrochemical device electrode 有权
公开(公告)号：US09685658B2
公开(公告)日：2017-06-20
申请号：US14232838
申请日：2012-07-13
申请人： Taku Matsumura , Yuko Otani
发明人： Taku Matsumura , Yuko Otani
IPC分类号： H01M4/36 , H01M4/13 , H01M4/139 , H01M4/62 , H01M4/04 , H01M4/525 , H01M4/587
CPC分类号： H01M4/362 , H01M4/0419 , H01M4/0435 , H01M4/13 , H01M4/139 , H01M4/525 , H01M4/587 , H01M4/622 , Y02P70/54
摘要： Composite particles for electrochemical device electrode which contain an electrode active material, a non-water soluble particle-shaped polymer, and a water-soluble polymer having a sulfonic acid group are provided. According to the present invention, composite particles for electrochemical device electrode are high in fluidity, exhibit high adhesion with a current collector, and can provide an electrochemical device electrode which is high in initial capacity, low in internal resistance, an excellent in high temperature storage characteristics are provided.

4. 发明授权

US08953156B2 Defect detection method and defect detection device and defect observation device provided with same 有权
公开(公告)号：US08953156B2
公开(公告)日：2015-02-10
申请号：US13510300
申请日：2010-11-12
申请人： Yuko Otani , Takehiro Tachizaki , Masahiro Watanabe , Shunichi Matsumoto
发明人： Yuko Otani , Takehiro Tachizaki , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G01N21/00 , G01N21/95 , G01N21/21 , G01N21/956 , G01N21/88
CPC分类号： G01N21/8806 , G01N21/21 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/8848 , G01N2201/06113 , G01N2201/063
摘要： The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of a smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or by an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.

5. 发明申请

US20120274931A1 DEFECT DETECTION METHOD AND DEFECT DETECTION DEVICE AND DEFECT OBSERVATION DEVICE PROVIDED WITH SAME 有权
标题翻译：缺陷检测方法和缺陷检测装置和缺陷检测装置
公开(公告)号：US20120274931A1
公开(公告)日：2012-11-01
申请号：US13510300
申请日：2010-11-12
申请人： Yuko Otani , Takehiro Tachizaki , Masahiro Watanabe , Shunichi Matsumoto
发明人： Yuko Otani , Takehiro Tachizaki , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G01N21/88
CPC分类号： G01N21/8806 , G01N21/21 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/8848 , G01N2201/06113 , G01N2201/063
摘要： The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of a smaller scale. The electron microscope (5), which observes defects detected by an optical appearance-inspecting device or by an optical defect-inspecting device, has a configuration wherein an optimal microscope (14) that re-detects defects is incorporated, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope (14). The electron microscope (5), which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration wherein an optimal microscope (14) that re-detects defects is incorporated, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope (14).
摘要翻译：所公开的使用电子显微镜等精细观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的装置可以将观察到的缺陷可靠地插入电子显微镜领域或喜欢，可以是一个规模较小的设备。观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜（5）具有结合有重新检测缺陷的最佳显微镜（14），以及空间滤波器当使用该光学显微镜（14）进行暗视场观察时，在瞳平面处插入分布偏振元件。观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜（5）具有结合重新检测缺陷的最佳显微镜（14），并且插入分配滤波器在使用该光学显微镜（14）进行暗视场观察时在瞳孔平面上。

6. 发明授权

US09773641B2 Method and apparatus for observing defects 有权
公开(公告)号：US09773641B2
公开(公告)日：2017-09-26
申请号：US13993838
申请日：2011-11-10
申请人： Yuko Otani , Yuta Urano , Toshifumi Honda
发明人： Yuko Otani , Yuta Urano , Toshifumi Honda
IPC分类号： G01N21/00 , H01J37/26 , G01N21/88 , G01N21/95
CPC分类号： H01J37/261 , G01N21/8806 , G01N21/9501
摘要： Disclosed are a method and an apparatus for observing defects by using an SEM, wherein, in order to observe defects on a wafer at high speed and high sensitivity, positional information of defects on a sample, which has been optically inspected and detected by other inspecting apparatus, and information of the conditions of the optical inspection having been performed by other inspecting apparatus are obtained, and optically detecting the defects on the sample placed on a table, on the basis of the thus obtained information, and on the basis of the detected positional information of the defect on the sample placed on the table, the positional information of the defect having been inspected and detected by other inspecting apparatus is corrected, then, the defects on the sample placed on the table are observed by the SEM using the thus corrected positional information of the defects.

7. 发明申请

US20140204194A1 DEFECT OBSERVATION METHOD AND DEVICE THEREFOR 审中-公开
标题翻译：缺陷观察方法及其设备
公开(公告)号：US20140204194A1
公开(公告)日：2014-07-24
申请号：US14116132
申请日：2012-04-27
申请人： Yuko Otani , Toshifumi Honda , Yuta Urano
发明人： Yuko Otani , Toshifumi Honda , Yuta Urano
IPC分类号： G01N21/95 , G02B26/00
CPC分类号： G01N21/9505 , G01B11/00 , G01B11/02 , G01B15/00 , G01N21/47 , G01N21/9501 , G01N2021/4711 , G01N2021/8822 , G01N2021/8867 , G02B26/008 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： This invention relates to a method for performing an analysis of defective material and the refractive index, and a three-dimensional analysis of very small pattern shapes including the steps of imaging by a scanning electron microscope to acquire an image of the position of a defect under observation using information of inspection results obtained by an optical inspection device, creating a model of the defect by using the acquired image of the defect under observation, calculating the values detected by the detector when reflected and scattered light emitted from a defect model is received by the detector when light is irradiated onto the defect model thus created, comparing the detection values thus calculated and the values detected by the detector, which has received light actually reflected and scattered from the sample, to obtain information relating to the height of the defect under observation, the material, or the refractive index.
摘要翻译：本发明涉及一种用于对缺陷物质进行分析的方法和折射率，以及非常小的图案形状的三维分析，包括以下步骤：通过扫描电子显微镜成像以获得缺陷位置的图像观察使用由光学检查装置获得的检查结果的信息，通过使用获取的观察缺陷图像来产生缺陷的模型，计算当从缺陷模型发射的反射和散射光被反射和检测到的值时检测到的值被接收到当将光照射到如此产生的缺陷模型上时，将检测器与这样计算的检测值进行比较，并将接收到从样品实际反射和散射的光的检测器检测到的值进行比较，以获得与缺陷的高度有关的信息观察，材料或折射率。

8. 发明申请

US20130277553A1 METHOD AND APPARATUS FOR OBSERVING DEFECTS 有权
标题翻译：用于观察缺陷的方法和装置
公开(公告)号：US20130277553A1
公开(公告)日：2013-10-24
申请号：US13993838
申请日：2011-11-10
申请人： Yuko Otani , Yuta Urano , Toshifumi Honda
发明人： Yuko Otani , Yuta Urano , Toshifumi Honda
IPC分类号： H01J37/26
CPC分类号： H01J37/261 , G01N21/8806 , G01N21/9501
摘要： Disclosed are a method and an apparatus for observing defects by using an SEM, wherein, in order to observe defects on a wafer at high speed and high sensitivity, positional information of defects on a sample, which has been optically inspected and detected by other inspecting apparatus, and information of the conditions of the optical inspection having been performed by other inspecting apparatus are obtained, and optically detecting the defects on the sample placed on a table, on the basis of the thus obtained information, and on the basis of the detected positional information of the defect on the sample placed on the table, the positional information of the defect having been inspected and detected by other inspecting apparatus is corrected, then, the defects on the sample placed on the table are observed by the SEM using the thus corrected positional information of the defects.
摘要翻译：公开了通过使用SEM观察缺陷的方法和装置，其中为了以高速和高灵敏度观察晶片上的缺陷，通过其他检查被光学检查和检测的样品上的缺陷的位置信息获取了由其他检查装置执行的光学检查条件的信息，并根据所获得的信息，基于检测到的信息光学地检测放置在工作台上的样品上的缺陷对放置在工作台上的样品上的缺陷的位置信息进行校正，由其他检查装置检查和检测的缺陷的位置信息被校正，然后通过SEM观察放置在工作台上的样品上的缺陷，校正了缺陷的位置信息。

9. 发明授权

US06577587B1 Turntable device and manufacturing method thereof 有权
标题翻译：转台装置及其制造方法
公开(公告)号：US06577587B1
公开(公告)日：2003-06-10
申请号：US09646358
申请日：2000-11-16
申请人： Taro Kishibe , Mikio Hirano , Shigenori Uda , Yuko Otani , Masashi Senoo , Kouji Kuyama , Shuichi Yamane , Akio Ando
发明人： Taro Kishibe , Mikio Hirano , Shigenori Uda , Yuko Otani , Masashi Senoo , Kouji Kuyama , Shuichi Yamane , Akio Ando
IPC分类号： G11B2300
CPC分类号： G11B17/0282 , G11B17/028 , G11B19/2009
摘要： A turntable device includes a disc base on the circumference thereof, and the disc base has a hardness more than a given level. The surface of the disc base is roughened at a given level in order to prevent the disc from slipping and adhesion to the disc base. The disc base can compensate surface wobble caused by the disc base. A manufacturing method of the turntable device includes the steps of: a) dripping liquid resin mixed with fine particles on the circumference of the turntable; and b) hardening the resin to form the disc base. The turntable device is good for e.g. CD players, optical disc driving apparatuses.
摘要翻译：转盘装置包括在其圆周上的盘形基座，并且盘形基座具有大于给定水平的硬度。盘基的表面在给定的水平上被粗糙化，以防止盘滑动并附着在盘基底上。光盘基座可以补偿由光盘基座引起的表面摆动。转盘装置的制造方法包括以下步骤：a）在转盘的圆周上滴落与细颗粒混合的液体树脂; 和b）硬化树脂以形成盘基。转盘装置适用于例如 CD播放机，光盘驱动装置。

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