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1. 发明申请

US20120294404A1 Nuclear Power Plant and Method of Operating It 审中-公开
标题翻译：核电厂及其运行方式
公开(公告)号：US20120294404A1
公开(公告)日：2012-11-22
申请号：US13454573
申请日：2012-04-24
申请人： Yoichi WADA , Masaya OHTSUKA , Hideaki NISHIKAWA
发明人： Yoichi WADA , Masaya OHTSUKA , Hideaki NISHIKAWA
IPC分类号： G21C17/00 , G21C19/00
CPC分类号： G21C19/317 , G21C9/06 , Y02E30/40
摘要： A hydrogen treatment facility for treating hydrogen without using a power source is disposed outside a reactor containment vessel and in an upper portion of a reactor building. A hydrogen detector detecting hydrogen in the reactor building is connected to a control apparatus operated by an independent power source activated at the time of a station black-out. A circulation passage for air circulation generated in the reactor building is disposed in the reactor building and outside the reactor containment vessel. A hydrogen treatment duct connects to the circulation passage and a gangway and a room with equipment. During a severe accident and station black-out and when hydrogen concentration detected by the hydrogen detection apparatus exceeds a set concentration, the hydrogen treatment duct is put in use by the control apparatus. Air containing the hydrogen is introduced into the hydrogen treatment facilities through the hydrogen treatment duct and the circulation passage.
摘要翻译：用于在不使用电源的情况下处理氢的氢处理设备设置在反应堆容纳容器的外部和反应堆建筑物的上部。在反应堆建筑物中检测氢的氢检测器连接到由在站点熄灭时激活的独立电源操作的控制装置。用于在反应堆建筑物中产生的用于空气循环的循环通道设置在反应堆建筑物中并在反应堆容纳容器外部。氢气处理管道连接到循环通道和通道和设备的房间。在严重事故和车站熄火期间，当氢检测装置检测到的氢浓度超过设定浓度时，控制装置使用氢处理管道。通过氢处理管道和循环通道将含有氢的空气引入氢处理设备。

2. 发明申请

US20090269490A1 COATING APPARATUS AND COATING METHOD 审中-公开
标题翻译：涂装和涂装方法
公开(公告)号：US20090269490A1
公开(公告)日：2009-10-29
申请号：US12425148
申请日：2009-04-16
申请人： Yoshikazu MORIYAMA , Hideaki NISHIKAWA , Masayoshi YAJIMA , Hiroshi FURUTANI , Shinichi MITANI , Michio NISHIBAYASHI
发明人： Yoshikazu MORIYAMA , Hideaki NISHIKAWA , Masayoshi YAJIMA , Hiroshi FURUTANI , Shinichi MITANI , Michio NISHIBAYASHI
IPC分类号： C23C16/44 , B05C11/00 , B05D3/12
CPC分类号： H01L21/68785 , C23C16/4412 , C23C16/4584 , C23C16/4586 , H01L21/67109 , H01L21/6838 , H01L21/68735
摘要： An object of the present invention is to provide a coating apparatus in which the substrate can be reliably rotated at high speed. Another object of the invention is to provide a coating method of forming a coating on a substrate while reliably rotating it at high speed. A coating apparatus includes a susceptor for supporting a silicon wafer, and a rotating portion for rotating the susceptor. The rotating portion is covered on top with the susceptor to form a P2 region. The contact surface of the susceptor with the silicon wafer has a plurality of holes therein. The silicon wafer is attached to the susceptor by evacuating gas from the P2 region.
摘要翻译：本发明的目的在于提供一种能够高速可靠地旋转基板的涂布装置。本发明的另一个目的是提供一种在可靠地高速旋转基板的同时在基板上形成涂层的涂布方法。涂覆装置包括用于支撑硅晶片的基座和用于旋转基座的旋转部分。旋转部分在顶部被基座覆盖以形成P2区域。具有硅晶片的基座的接触面在其中具有多个孔。通过从P2区域排出气体将硅晶片附接到基座。

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