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    • 9. 发明申请
    • NOR FLASH MEMORY CELL AND STRUCTURE THEREOF
    • US20130119458A1
    • 2013-05-16
    • US13717725
    • 2012-12-18
    • eMemory Technology Inc.
    • Meng-Yi WuChing-Sung Yang
    • H01L29/792
    • H01L29/792G11C16/0433H01L27/1157H01L29/518
    • The present invention provides a NOR flash memory cell. The NOR flash memory cell includes a a substrate, an active area, a first gate structure, a second gate structure and at least one third gate structure. The first gate structure covers a first partial region of the active area and is formed by a silicon-rich nitride material. The second gate structure covers a second partial region of the active area. The third gate structure covers a third partial region between a first opening and the first gate structure. The active area has the first opening, the first opening disposed on a first side of the first gate structure and the first side is not neighbor to the second gate structure. The NOR flash memory cell further comprises a first conducting structure for covering the first opening to form a bit line signal receiving terminal.
    • 本发明提供了一种NOR闪存单元。 NOR闪存单元包括衬底,有源区,第一栅极结构,第二栅极结构和至少一个第三栅极结构。 第一栅极结构覆盖有源区的第一部分区域并且由富含硅的氮化物材料形成。 第二栅极结构覆盖有源区域的第二部分区域。 第三栅极结构覆盖第一开口和第一栅极结构之间的第三部分区域。 有源区域具有第一开口,第一开口设置在第一栅极结构的第一侧上,第一侧不邻近第二栅极结构。 NOR闪存单元还包括用于覆盖第一开口以形成位线信号接收端的第一导电结构。