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1. 发明申请

US20030160948A1 Lithography exposure device 失效
标题翻译：光刻曝光装置
公开(公告)号：US20030160948A1
公开(公告)日：2003-08-28
申请号：US10314002
申请日：2002-12-06
申请人： KLEO Halbleitertechnik GmbH & Co KG
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03B027/52
CPC分类号： G03F7/70391 , G03F7/704
摘要： In order to provide a lithography exposure device for producing exposed structures in a layer sensitive to light, comprising an exposure unit with a movement unit for the relative movement between the optical focusing means and a mounting device and a control for controlling intensity and position of the exposure spots in such a manner that a plurality of conversion areas can be produced in the light-sensitive layer by means of the exposure spots, with which work can be carried out with a reduced number of laser radiation sources, it is suggested that with the exposure spot of each laser radiation source all the conversion areas located within a strip area, which has a width amounting to a multiple of the extension of the exposure spot, be generatable within the same due to movement of the exposure spot in a deflection direction extending transversely to the exposure movement direction and that a controllable deflection device be provided between the laser radiation sources and the optical focusing means for the movement of the exposure spot in the deflection direction.
摘要翻译：为了提供用于产生对光敏感的层中的暴露结构的光刻曝光装置，包括具有用于在光聚焦装置和安装装置之间的相对运动的移动单元的曝光单元和用于控制所述光聚焦装置的强度和位置的控制曝光点可以通过曝光点在感光层中产生多个转换区域，通过该曝光点可以减少数量的激光辐射源进行工作，因此建议使用每个激光辐射源的曝光点，位于带区域内的所有转换区域，其具有相当于曝光光斑延伸倍数的宽度，由于曝光光斑在偏转方向上的移动延伸横向于曝光移动方向，并且在激光辐射源和选择之间设置可控偏转装置用于在偏转方向上移动曝光点的光学聚焦装置。

2. 发明授权

US08027018B2 Method and device for producing exposed structures 失效
标题翻译：用于生产暴露结构的方法和装置
公开(公告)号：US08027018B2
公开(公告)日：2011-09-27
申请号：US11071074
申请日：2005-03-02
申请人： Hans Opower , Stefan Scharl , Dirk Leinenbach
发明人： Hans Opower , Stefan Scharl , Dirk Leinenbach
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70525 , G03F7/704 , G03F7/70425
摘要： In order to improve a method for producing exposed structures on a plurality of components by means of an exposure unit, with which substrate member and the exposure unit are moved relative to one another, wherein identical structures are produced on at least some of the components, in such a manner that this operates as efficiently as possible it is suggested that each of the identical structures be produced by way of exposure of the substrate member in the area of the component respectively provided within a plurality of macrolines, that each of the macrolines comprise a plurality of lines lying next to one another, that during a single pass along a path of exposure all the components covered by this path of exposure be exposed with the exposure unit in the area of the same macroline of the plurality of macrolines, that the exposure unit have a plurality of light sources and a control with a control memory, with which sets of data already stored for the macroline, in the area of which exposure is being carried out, can be read out while sets of data of an additional macroline are being stored.
摘要翻译：为了改进通过曝光单元在多个部件上产生暴露结构的方法，使基板部件和曝光单元相对于彼此移动，其中在至少一些部件上产生相同的结构，以这样的方式，其尽可能有效地进行操作，建议通过在分别设置在多个大环内酯内的组分的区域中暴露基质成分来产生每个相同的结构，每一个大环内酯包含在彼此相邻的多个线中，在沿着曝光路径的单次通过期间，由该曝光路径覆盖的所有部件将曝光单元暴露在多个麦克风的同一宏线的区域中，曝光单元具有多个光源和具有控制存储器的控制，其中已经存储有用于宏线的数据组在whic的区域中 h曝光正在执行，可以在存储附加宏线的数据集的同时读出。

3. 发明授权

US08811665B2 Processing system 有权
标题翻译：处理系统
公开(公告)号：US08811665B2
公开(公告)日：2014-08-19
申请号：US13332467
申请日：2011-12-21
申请人： Hans Opower , Klaus Juenger
发明人： Hans Opower , Klaus Juenger
IPC分类号： G06K9/00 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70791 , G03F9/00
摘要： A processing system for plate-like objects is provided, with an exposure device and an object carrier with an object carrier surface for receiving the object. The exposure device and the carrier are movable relative to one another, such that the exact position of the object relative to the carrier is determinable. An edge detection device is provided which comprises at least one edge illumination unit having an illumination area, within which an object edge located in the respective object edge area has light directed onto it from the side of the carrier. At least one edge image detection unit is provided on a side of the object located opposite the carrier, the edge image detection unit imaging an edge section of the object edges located in the illumination area as an edge image, such that the respective edge image is detectable in its exact position relative to the carrier.
摘要翻译：提供了一种用于板状物体的处理系统，其具有曝光装置和具有用于接收物体的物体载体表面的物体载体。曝光装置和载体可相对于彼此移动，使得物体相对于载体的精确位置是可确定的。提供一种边缘检测装置，其包括具有照明区域的至少一个边缘照明单元，在该边缘照明单元中位于相应物体边缘区域中的物体边缘具有从载体的侧面引导到其上的光。至少一个边缘图像检测单元设置在与载体相对的一侧的物体侧，边缘图像检测单元将位于照明区域中的物体边缘的边缘部分成像为边缘图像，使得各个边缘图像是在其相对于载体的确切位置可检测。

4. 发明授权

US07652750B2 Lithography exposure device having a plurality of radiation sources 失效
标题翻译：具有多个辐射源的平版印刷曝光装置
公开(公告)号：US07652750B2
公开(公告)日：2010-01-26
申请号：US11392970
申请日：2006-03-28
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03B27/52
CPC分类号： G03F7/7005 , G03F7/70383 , G03F7/704
摘要： A lithography exposure device is provided which includes a mounting device for the layer sensitive to light, an exposure unit with several laser radiation sources, an optical focusing means associated with the laser radiation sources, a movement unit for generating a relative movement between the optical focusing means and the mounting device, and a control for controlling intensity and position of exposure spots so that exposed structures which are as precisely structured as possible can be produced. A laser radiation field propagating in the direction of the light-sensitive layer generates each of the exposure spots from respective focal points and has a power density which leads in the conversion area in the light-sensitive layer to formation of a channel penetrating the light-sensitive layer with an index of refraction increased in relation to its surroundings by the Kerr effect and which guides the laser radiation field in a spatially limited manner.
摘要翻译：提供了一种光刻曝光装置，其包括用于对光敏感的层的安装装置，具有若干激光辐射源的曝光单元，与激光辐射源相关联的光学聚焦装置，用于在光学聚焦之间产生相对运动的移动单元装置和安装装置，以及用于控制曝光点的强度和位置的控制，使得可以产生尽可能精确构造的暴露结构。在感光层的方向上传播的激光辐射场从各个焦点产生每个曝光点，并且具有在感光层的转换区域中引起的功率密度，从而形成穿透光敏层的通道，具有折射率的敏感层相对于其周围环境通过克尔效应增加，并以空间有限的方式引导激光辐射场。

5. 发明申请

US20060244943A1 Exposure system 失效
标题翻译：曝光系统
公开(公告)号：US20060244943A1
公开(公告)日：2006-11-02
申请号：US11406049
申请日：2006-04-17
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03B27/58
CPC分类号： G03F7/70391 , G03F7/704 , G03F7/70858
摘要： In an exposure system for substrate members which bear a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier bearing the substrate member and an exposure device, wherein the substrate member and the exposure device can be moved relative to one another such that the photosensitive coating can be exposed as a result of this relative movement, it is suggested for an exposure of the photosensitive coating which is as precise as possible that the exposure device have an optics slide which can be moved in the second direction and on which an optical imaging device for the exposure of the substrate member is arranged, and that the exposure device have a light source unit which is arranged on the machine frame separately from the optics slide and has a plurality of light sources, the radiation of which can be coupled into the optical imaging device.
摘要翻译：在用于在基片表面上承载感光涂层的基片部件的曝光系统中，包括机架，承载基片部件的基片载体和曝光装置，其中基片部件和曝光装置可相对于彼此移动，由于这种相对运动，感光涂层可能被曝光，所以建议使感光涂层的曝光尽可能精确，使得曝光装置具有可沿第二方向移动的光学滑块，并且其上布置用于曝光基板构件的光学成像装置，并且曝光装置具有与光学滑块分开布置在机架上的光源单元，并且具有多个光源，其辐射可以是耦合到光学成像装置中。

6. 发明申请

US20050282087A1 Method and device for producing exposed structures 失效
标题翻译：用于生产暴露结构的方法和装置
公开(公告)号：US20050282087A1
公开(公告)日：2005-12-22
申请号：US11071074
申请日：2005-03-02
申请人： Hans Opower , Stefan Scharl , Dirk Leinenbach
发明人： Hans Opower , Stefan Scharl , Dirk Leinenbach
IPC分类号： G03F7/20 , G03C5/00
CPC分类号： G03F7/70525 , G03F7/704 , G03F7/70425
摘要： In order to improve a method for producing exposed structures on a plurality of components by means of an exposure unit, with which substrate member and the exposure unit are moved relative to one another, wherein identical structures are produced on at least some of the components, in such a manner that this operates as efficiently as possible it is suggested that each of the identical structures be produced by way of exposure of the substrate member in the area of the component respectively provided within a plurality of macrolines, that each of the macrolines comprise a plurality of lines lying next to one another, that during a single pass along a path of exposure all the components covered by this path of exposure be exposed with the exposure unit in the area of the same macroline of the plurality of macrolines, that the exposure unit have a plurality of light sources and a control with a control memory, with which sets of data already stored for the macroline, in the area of which exposure is being carried out, can be read out while sets of data of an additional macroline are being stored.
摘要翻译：为了改进通过曝光单元在多个部件上产生暴露结构的方法，使基板部件和曝光单元相对于彼此移动，其中在至少一些部件上产生相同的结构，以这样的方式，其尽可能有效地进行操作，建议通过在分别设置在多个大环内酯内的组分的区域中暴露基质成分来产生每个相同的结构，每一个大环内酯包含在彼此相邻的多个线中，在沿着曝光路径的单次通过期间，由该曝光路径覆盖的所有部件将曝光单元暴露在多个麦克风的同一宏线的区域中，曝光单元具有多个光源和具有控制存储器的控制，其中已经存储有用于宏线的数据组在whic的区域中 h曝光正在执行，可以在存储附加宏线的数据集的同时读出。

7. 发明申请

US20060170893A1 Lithography exposure device 失效
标题翻译：光刻曝光装置
公开(公告)号：US20060170893A1
公开(公告)日：2006-08-03
申请号：US11392970
申请日：2006-03-28
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03B27/52
CPC分类号： G03F7/7005 , G03F7/70383 , G03F7/704
摘要： In order to design a lithography exposure device comprising a mounting device for the layer sensitive to light, an exposure unit comprising several laser radiation sources and an optical focusing means associated with the laser radiation sources, a movement unit for generating a relative movement between the optical focusing means and the mounting device and a control for controlling intensity and position of the exposure spots in such a manner that exposed structures which are as precisely structured as possible can be produced, it is suggested that the optical focusing means have an end lens which generates focal points of the laser radiation exiting from each of the laser radiation sources close to the light-sensitive layer, that a laser radiation field propagate in the direction of the light-sensitive layer for generating each of the exposure spots from the respective focal points and have a power density which leads in the conversion area in the light-sensitive layer to the formation of a channel which penetrates the light-sensitive layer with an index of refraction increased in relation to its surroundings due to the Kerr effect and guides the respective laser radiation field in a spatially limited manner.
摘要翻译：为了设计包括用于对光敏感的层的安装装置的光刻曝光装置，包括若干激光辐射源和与激光辐射源相关联的光学聚焦装置的曝光单元，用于在光学器件之间产生相对运动的移动单元聚焦装置和安装装置以及用于控制曝光点的强度和位置的控制，使得可以产生尽可能精确地构造的暴露结构，使得光学聚焦装置具有产生激光辐射从靠近感光层的每个激光辐射源射出的焦点，激光辐射场沿着感光层的方向传播，用于从各个焦点产生每个曝光点，以及具有在感光层的转换区域中导致格式的功率密度由于克尔效应，折射率相对于其周围环境增加的透射感光层的通道的离子以空间有限的方式引导相应的激光辐射场。

8. 发明申请

US20050083509A1 Apparatus for exposing substrate materials 失效
标题翻译：用于曝光基材的装置
公开(公告)号：US20050083509A1
公开(公告)日：2005-04-21
申请号：US10941308
申请日：2004-09-14
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03F7/20 , G03B27/58
CPC分类号： G03F7/70383 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70766
摘要： The invention relates to a device for exposing substrate materials comprising: at least one optical exposure device, at least one substrate platform; a device for generating a relative displacement between the exposure device and the substrate platform in two transversal directions, whereby the relative displacement in a primary direction occurs with a greater dynamic response than in a secondary direction; at least one primary drive for generating the relative displacement in the primary direction; and at least one secondary drive for generating the relative displacement in the secondary direction. The aim of the invention is to position the substrate platform with the greatest possible accuarcy and the greatest possible dynamic response. To achieve this, the device comprises two substrate platforms that move substantially in opposition to one another in the primary direction.
摘要翻译：本发明涉及一种用于曝光衬底材料的装置，包括：至少一个光学曝光装置，至少一个衬底平台; 用于在两个横向上产生曝光装置和基板平台之间的相对位移的装置，由此在主方向上的相对位移以比在次方向上更大的动态响应发生; 用于产生主要方向上的相对位移的至少一个主驱动器; 以及用于产生次要方向上的相对位移的至少一个次级驱动器。本发明的目的是以最大可能的准确度和尽可能最大的动态响应来定位衬底平台。为了实现这一点，该装置包括在主要方向上基本上彼此相对移动的两个基板平台。

9. 发明授权

US06859261B2 Lithography exposure device 失效
标题翻译：光刻曝光装置
公开(公告)号：US06859261B2
公开(公告)日：2005-02-22
申请号：US10314002
申请日：2002-12-06
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03F7/20 , G03B27/42 , G03B27/52 , G03B27/54
CPC分类号： G03F7/70391 , G03F7/704
摘要： A lithography exposure device for producing exposed structures in a layer sensitive to light includes an exposure unit with a movement unit for the relative movement between the optical focusing element and a mounting device. A controler is provided for controlling intensity and position of the exposure spots, such that a plurality of conversion areas can be produced in the light-sensitive layer via the exposure spots. A controllable deflection device is provided between the laser radiation sources and the optical focusing means for the movement of the exposure spot in the deflection direction.
摘要翻译：用于在对光敏感的层中产生曝光结构的光刻曝光装置包括具有用于光学聚焦元件和安装装置之间的相对移动的移动单元的曝光单元。提供控制器用于控制曝光点的强度和位置，使得可以在感光层中经由曝光点产生多个转换区域。在激光辐射源和光学聚焦装置之间设置可控偏转装置，用于在偏转方向上移动曝光点。

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