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1. 发明申请

US20190219934A1 PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY WITH INCREASED THERMAL ROBUSTNESS 审中-公开
公开(公告)号：US20190219934A1
公开(公告)日：2019-07-18
申请号：US16368467
申请日：2019-03-28
申请人： Carl Zeiss SMT GmbH
发明人： Alireza Akbarinia , Alexandre Kemp , Timo Laufer , Amishkumar Panchal
IPC分类号： G03F7/20
CPC分类号： G03F7/70775 , G03F7/70766 , G03F7/708 , G03F7/70825 , G03F7/70833 , G03F7/70858 , G03F7/70891 , G03F7/709 , G03F7/7095
摘要： A projection exposure apparatus for semiconductor lithography includes: a light source for generating optical used radiation by which structures arranged on a reticle can be imaged onto a wafer; a plurality of optical elements for guiding and manipulating the used radiation; and a plurality of position sensors for determining the position of at least some of the optical elements. At least some of the position sensors are arranged on a measurement structure that is at least partially decoupled mechanically and/or thermally from the further components of the projection exposure apparatus. The measurement structure has at least two mechanically decoupled substructures. The first substructure has a lower coefficient of thermal expansion than the second substructure. The second substructure has a greater stiffness than the first substructure.

2. 发明授权

US09921494B2 Lithographic apparatus comprising an actuator, and method for protecting such actuator 有权
公开(公告)号：US09921494B2
公开(公告)日：2018-03-20
申请号：US14395454
申请日：2013-04-12
申请人： ASML Netherlands B.V.
发明人： Theodorus Petrus Maria Cadee , Sander Christiaan Broers , Sven Antoin Johan Hol , Yang-Shan Huang , Antonius Franciscus Johannes De Groot , Bastiaan Lambertus Wilhelmus Marinus Van De Ven
IPC分类号： G03B27/58 , G03F7/20
CPC分类号： G03F7/70766 , G03F7/70533 , G03F7/70758 , G03F7/709
摘要： A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.

3. 发明申请

US20170365502A1 SEMICONDUCTOR DEVICE POSITIONING SYSTEM AND METHOD FOR SEMICONDUCTOR DEVICE POSITIONING 审中-公开
公开(公告)号：US20170365502A1
公开(公告)日：2017-12-21
申请号：US15187162
申请日：2016-06-20
申请人： NEXPERIA B.V.
发明人： Thijs Kniknie , Jozef Petrus Wilhelmus Stokkermans
IPC分类号： H01L21/687 , H01L21/68
CPC分类号： H01L21/68764 , G01D21/00 , G03F7/70716 , G03F7/70725 , G03F7/70766 , G05B19/404 , H01L21/681 , H01L21/68785
摘要： A positioning system and method for positioning a semiconductor device are disclosed. In an embodiment, a positioning system for positioning a semiconductor device includes a long-stroke stage configured to be movable with respect to a supporting structure within a plane and a short-stroke stage attached to the long-stroke stage and configured to carry a semiconductor device and to be rotatable within the plane. The long-stroke stage acts as a balance mass between the short-stroke stage and the supporting structure.

4. 发明申请

US20170357162A1 SILICON WAFER EDGE PROTECTION DEVICE 有权
公开(公告)号：US20170357162A1
公开(公告)日：2017-12-14
申请号：US15541331
申请日：2015-12-27
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
发明人： Xu ZHOU , Haicang CUI , Fei NI , Lili GE
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/20 , G03F7/70733 , G03F7/70758 , G03F7/70766 , G03F7/709
摘要： A silicon wafer edge protection device having: a horizontal motion assembly; vertical motion assembly; speed regulating device, which is in signal connection with the vertical motion assembly and used for regulating vertical motion assembly motion speed; flexible bumper assembly, which is connected to the horizontal motion assembly and vertical motion assembly and used for reducing the amplitude of vibration of the silicon wafer edge protection device when a collision occurs; and control device, which is in signal connection with the speed regulating device and used for sending a control signal to the speed regulating device to control motion of the vertical motion assembly. The silicon wafer edge protection device can prevent a wafer stage from undergoing an instantaneous strong impact and prevent a silicon wafer from being crushed. When a collision occurs, the wafer stage and the silicon wafer can be protected. Production efficiency is also improved.

5. 发明授权

US09791789B2 Magnetically suspended coarse motion and fine motion integrated reticle stage driven by planar motor 有权
公开(公告)号：US09791789B2
公开(公告)日：2017-10-17
申请号：US15307797
申请日：2015-04-17
申请人： TSINGHUA UNIVERSITY , BEIJING U-PRECISION TECH CO., LTD.
发明人： Ming Zhang , Yu Zhu , Fan Zhi , Rong Cheng , Kaiming Yang , Zhao Liu , Li Zhang , Huichao Qin , Yanpo Zhao , Li Tian , Weinan Ye , Jin Zhang , Wensheng Yin , Haihua Mu , Jinchun Hu
IPC分类号： G03F7/20
CPC分类号： G03F7/70758 , G03F7/20 , G03F7/70716 , G03F7/70766 , G03F7/70775
摘要： A magnetically suspended coarse motion and fine motion integrated reticle stage driven by a planar motor comprises a movable platform (100), a balance mass (200), a drive motor, a mask plate (101), a base (001), a vibration isolation system (500), and a measuring system, wherein, the vibration isolation system is located between the balance mass and the base, and the mask plate is mounted on the movable platform. The drive motor of the movable platform is a moving-iron type planar motor (300). The reticle stage can lower the design complexity of the drive motor of the movable platform. Compared with a linear motor, the planar motor can provide push forces in more directions, the number of motors is reduced, the structure of the movable platform is more compact, the inherent frequency and the control bandwidth of the movable platform are improved, and thus control precision is improved.

6. 发明申请

US20170277041A1 VIBRATION-ASSISTED POSITIONING STAGE 审中-公开
公开(公告)号：US20170277041A1
公开(公告)日：2017-09-28
申请号：US15528695
申请日：2015-12-16
申请人： THE REGENTS OF THE UNIVERSITY OF MICHIGAN
发明人： Chinedum E. OKWUDIRE , Xin DONG
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70716 , G03F7/70766 , G03F7/70816 , G03F7/709
摘要： A vibration-assisted positioning stage comprising a stage, a roller bearing, an compliant joint interconnecting the roller bearing to the stage such that the compliant joint is sufficiently compliant in a direction of movement to permit reliable alignment of the stage and further permit dithering, and a dithering force actuator applying a dithering force directly to the roller bearing to permit the dithering of the stage. The dithering forces can be applied out of phase to minimize vibration of the stage. Furthermore, the controller of the stage can be employed to suppress any remnant vibrations of the stage due to dithering. A supervisory control system can intelligently adapt the parameters of the dithering signal to optimize the performance of the stage as friction changes.

7. 发明申请

US20170060002A1 EXPOSURE APPARATUS, EXPOSING METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM 审中-公开
标题翻译：曝光装置，曝光方法，装置制造方法，程序和记录介质
公开(公告)号：US20170060002A1
公开(公告)日：2017-03-02
申请号：US15350952
申请日：2016-11-14
申请人： NIKON CORPORATION
发明人： Shinji SATO
IPC分类号： G03F7/20
CPC分类号： G03F7/70766 , G03F7/70341 , G03F7/709
摘要： An exposure apparatus that exposes a substrate by exposure light via liquid between an optical member and the substrate includes: a liquid immersion member that forms an immersion liquid space on an object and comprises first and second members, the first member disposed at at least a portion of surrounding of the optical member, the second member disposed at at least a portion of surrounding of an optical path of the exposure light below of the first member, being movable with respect to the first member and comprising a second upper surface and a second lower surface, the second upper surface being opposite to a first lower surface of the first member via a gap, the second lower surface being capable of being opposite to the object, the object being movable below the optical member; and a vibration isolator that suppresses vibration of the first member.
摘要翻译：一种曝光装置，其通过在光学构件和基板之间的液体曝光来曝光基板，包括：浸没构件，其在物体上形成浸没液体空间，并且包括第一和第二构件，第一构件设置在至少一部分所述第二构件设置在所述第一构件下方的所述曝光光的光路的周围的至少一部分周围，所述第二构件可相对于所述第一构件移动，并且包括第二上表面和第二下表面表面，所述第二上表面经由间隙与所述第一构件的第一下表面相对，所述第二下表面能够与所述物体相对，所述物体可在所述光学构件下方移动; 以及抑制第一构件的振动的隔振器。

8. 发明授权

US09529353B2 Methods for limiting counter-mass trim-motor force and stage assemblies incorporating same 有权
标题翻译：限制反质量调节马达力的方法和包含相同质量的马达的阶段组件
公开(公告)号：US09529353B2
公开(公告)日：2016-12-27
申请号：US13228341
申请日：2011-09-08
申请人： Pai-Hsueh Yang , Michael B. Binnard , Scott Coakley
发明人： Pai-Hsueh Yang , Michael B. Binnard , Scott Coakley
IPC分类号： G03B27/58 , G03B27/62 , G05B19/404 , G03F7/20
CPC分类号： G05B19/404 , G03F7/70725 , G03F7/70766
摘要： An exemplary stage assembly has movable stage mass and counter-mass. A stage motor is coupled to the stage mass and counter-mass such that stage-mass motion imparted by the stage motor causes a reactive motion of the counter-mass counter to the motion of the stage mass. At least one trim-motor is coupled to the counter-mass. A control system commands the trim-motor to regulate movement of the counter-mass in reaction to stage-mass motion. A PI feedback controller receives the following-error of the counter-mass and generates corresponding center-of-gravity (CG) force commands and trim-motor force commands to the trim-motor(s) to produce corrective counter-mass motion. A trim-motor force limiter receives trim-motor force commands and produces corresponding limited trim-motor force commands that are fed back as actual CG force commands to the feedback controller to modify integral terms of the feedback controller according to the limited trim-motor force commands.
摘要翻译：示例性的舞台组件具有可移动的舞台质量和反质量。舞台电机被耦合到舞台质量和反质量，使得由舞台电动机施加的舞台质量运动导致反质量计数器对舞台质量的运动的反作用运动。至少一个调整电机与反质量联接。控制系统命令微调电机调节反质量运动反应阶段质量运动。 PI反馈控制器接收反质量的跟随误差，并产生相应的重心（CG）力指令和微调电机力指令给微调电机，以产生校正反质量运动。修剪马达力限制器接收修剪马达力指令并产生相应的有限的修剪马达力命令，作为实际的CG力命令反馈到反馈控制器，以根据限制的修正马达力修改反馈控制器的积分项命令。

9. 发明授权

US09372396B2 Imprint lithography method 有权
标题翻译：印刷光刻法
公开(公告)号：US09372396B2
公开(公告)日：2016-06-21
申请号：US12580097
申请日：2009-10-15
申请人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen
发明人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen
IPC分类号： G03F7/00 , G03F7/20 , B82Y10/00 , B82Y40/00 , B29C59/02
CPC分类号： G03F7/0002 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/70716 , G03F7/70725 , G03F7/70766 , G03F7/70783
摘要： An imprint lithography apparatus and manufacturing method can lead to mechanical stress being formed in a substrate to which an imprint pattern is being applied. This may cause strain within the substrate leading to misalignment of a subsequent pattern with an earlier pattern in a part of the substrate, which is strained. An apparatus and method is disclosed which allows for stress relaxation in the substrate prior to further patterning to reduce, minimize or prevent such misalignment from residual strain. This is achieved by locally unclamping a portion of substrate (including optionally the entire substrate) from a corresponding portion of substrate holder so that mechanical stress leading to local strain may relax prior to further patterning. To overcome residual frictional force between the substrate and substrate holder, the substrate and substrate holder may be physically separated prior to further patterning.
摘要翻译：压印光刻设备和制造方法可能导致在施加印记图案的基板中形成机械应力。这可能导致衬底内的应变导致随后的图案与基片的一部分中的较早的图案的未对准，其被应变。公开了一种装置和方法，其允许在进一步图案化之前在基板中施加应力松弛，以减少，最小化或防止这种从残余应变的偏移。这通过从衬底保持器的对应部分局部松开衬底的一部分（包括可选地整个衬底）来实现，使得导致局部应变的机械应力在进一步构图之前可能松弛。为了克服衬底和衬底保持器之间的残余摩擦力，衬底和衬底保持器可以在进一步构图之前物理分离。

10. 发明授权

US09104121B2 Exposure apparatus having a vibration suppressing feature and method of manufacturing device using the exposure apparatus 有权
标题翻译：具有振动抑制特征的曝光装置和使用该曝光装置的装置的制造方法
公开(公告)号：US09104121B2
公开(公告)日：2015-08-11
申请号：US13546131
申请日：2012-07-11
申请人： Keiji Emoto , Tosiya Asano
发明人： Keiji Emoto , Tosiya Asano
IPC分类号： G03F7/20 , H01L21/67 , H01L21/687
CPC分类号： G03F7/70725 , G03F7/70766 , H01L21/6719 , H01L21/67288 , H01L21/68785
摘要： An exposure apparatus includes: a substrate stage configured to move upon holding the substrate; a structural member configured to support a substrate stage; a first counter mass stage configured to cancel a driving reaction force that is generated due to driving of the substrate stage and acts on the structural member; a substrate stage driver configured to generate a force between the substrate stage and the first counter mass stage; a first counter mass driver configured to generate a force between the structural member and the first counter mass stage; a controller configured to control the first counter mass driver so as to cancel the force that acts on the structural member by generating a force between the structural member and the first counter mass stage using the first counter mass driver.
摘要翻译：曝光装置包括：衬底台，被配置为在保持衬底时移动; 构造成支撑衬底台的结构构件; 构造成抵消由于基板台的驱动而产生的驱动反作用力并作用在所述结构构件上的第一反质量台; 衬底台驱动器，其被配置为在所述衬底台和所述第一对质量台之间产生力; 配置为在所述结构构件和所述第一反质量段之间产生力的第一反质量驱动器; 控制器，其被配置为控制所述第一反质量驱动器，以便通过使用所述第一计数器质量驱动器在所述结构构件和所述第一计数器质量级之间产生力来抵消作用在所述结构构件上的力。

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