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1. 发明申请

US20190033733A1 SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：US20190033733A1
公开(公告)日：2019-01-31
申请号：US16072218
申请日：2017-02-09
申请人： ASML NETHERLANDS B.V.
发明人： Michael Johannes VERVOORDELDONK , Joeri LOF
IPC分类号： G03F7/20 , B65G47/24
CPC分类号： G03F9/7011 , B65G47/24 , B65G2203/042 , G03F7/70258 , G03F7/70733 , G03F7/70741 , G03F7/7075 , G03F7/70875
摘要： A substrate handling system for handling a substrate, the substrate handling system including a holder for holding the substrate, a rotation device for rotating the holder around an axis perpendicular to a plane, and a mover for moving the holder along a path in the plane relative to the axis. Further, there is provided a lithographic apparatus including the substrate handling system. The substrate handling system may include a coupling device arranged to couple the holder to the mover or the rotation device in a first situation. The coupling device may be arranged to decouple the holder from the mover or rotation device in a second situation.

2. 再颁专利

USRE46933E1 Dual stage lithographic apparatus and device manufacturing method 有权
公开(公告)号：USRE46933E1
公开(公告)日：2018-07-03
申请号：US14715314
申请日：2015-05-18
申请人： ASML NETHERLANDS B.V.
发明人： Marinus Aart Van Den Brink , Jozef Petrus Henricus Benschop , Erik Roelof Loopstra
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58 , G03F7/20
CPC分类号： G03F7/70733 , G03F7/70341
摘要： The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.

3. 发明授权

US10012913B2 Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method 有权
公开(公告)号：US10012913B2
公开(公告)日：2018-07-03
申请号：US15600174
申请日：2017-05-19
申请人： NIKON CORPORATION
发明人： Yuichi Shibazaki
IPC分类号： G03B27/42 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/70358 , G03F7/70641 , G03F7/70666 , G03F7/70675 , G03F7/70733 , G03F7/70775 , G03F7/7085 , G03F7/70975 , G03F9/7026 , G03F9/7084 , Y10T29/49826
摘要： A partial section of an aerial image measuring unit is arranged at a wafer stage and part of the remaining section is arranged at a measurement stage, and the aerial image measuring unit measures an aerial image of a mark formed by a projection optical system. Therefore, for example, when the aerial image measuring unit measures a best focus position of the projection optical system, the measurement can be performed using the position of the wafer stage, at which a partial section of the aerial image measuring unit is arranged, in a direction parallel to an optical axis of the projection optical system as a datum for the best focus position. Accordingly, when exposing an object with illumination light, the position of the wafer stage in the direction parallel to the optical axis is adjusted with high accuracy based on the measurement result of the best focus position.

4. 发明申请

US20180174884A1 SUBSTRATE HOLDING METHOD, SUBSTRATE HOLDING APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD 审中-公开
公开(公告)号：US20180174884A1
公开(公告)日：2018-06-21
申请号：US15845654
申请日：2017-12-18
申请人： NIKON CORPORATION
发明人： Go ICHINOSE
IPC分类号： H01L21/687 , H01L21/683 , G03F7/20
CPC分类号： H01L21/68742 , G03F7/20 , G03F7/707 , G03F7/70733 , H01L21/6838 , H01L21/6875
摘要： A wafer holding apparatus for holding a wafer including a wafer holder on which the wafer is placed; and a lift pin that is configured to be lifted up and down with respect to the wafer holder in a direction along a normal line of a placement surface of the wafer, the lift pin includes a tip part, the tip part includes: a bottom part that forms a suction region for sucking a rear surface of the wafer; and a convex part that supports the rear surface of the wafer in the suction region. When a substrate is placed on a target position, it is possible to prevent a local deterioration of flatness of the substrate even if the substrate is large.

5. 发明授权

US10001699B2 Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method 有权
公开(公告)号：US10001699B2
公开(公告)日：2018-06-19
申请号：US15275719
申请日：2016-09-26
申请人： HOYA CORPORATION
发明人： Toshihiko Orihara , Kazuhiro Hamamoto , Hirofumi Kozakai , Youichi Usui , Tsutomu Shoki , Junichi Horikawa
IPC分类号： G03F1/22 , C03C3/06 , G03F1/48 , G02B5/08 , B82Y10/00 , B82Y40/00 , G03F7/20 , C03C17/34 , C03C17/36 , C03C23/00 , G03F7/16 , H01L21/308
CPC分类号： G03F1/48 , B82Y10/00 , B82Y40/00 , C03C3/06 , C03C17/3435 , C03C17/3626 , C03C17/3636 , C03C17/3639 , C03C17/3649 , C03C17/3665 , C03C23/0075 , C03C2201/42 , C03C2218/33 , G02B5/08 , G02B5/0816 , G02B5/0891 , G03F1/22 , G03F7/16 , G03F7/2002 , G03F7/2004 , G03F7/70733 , H01L21/3081 , H01L21/3085
摘要： Disclosed is a mask blank substrate for use in lithography, wherein the main surface on which the transfer pattern of the substrate is formed has a root mean square roughness (Rms) of not more than 0.15 nm obtained by measuring an area of 1 μm×1 μm with an atomic force microscope, and has a power spectrum density of not more than 10 nm4 at a spatial frequency of not less than 1 μm−1.

6. 发明申请

US20180129142A1 APPARATUS AND METHODS FOR ON -THE-FLY DIGITAL EXPOSURE IMAGE DATA MODIFICATION 审中-公开
公开(公告)号：US20180129142A1
公开(公告)日：2018-05-10
申请号：US15867369
申请日：2018-01-10
申请人： Applied Materials, Inc.
发明人： Benjamin M. JOHNSTON , Thomas L. LAIDIG , Jang Fung CHEN , John WHITE
IPC分类号： G03F7/20 , G01B11/14
CPC分类号： G03F7/70775 , G01B11/14 , G03F7/70275 , G03F7/70733
摘要： Embodiments of the present disclosure generally relate to apparatus and methods for performing photolithography processes. In one embodiment, a system including multiple interferometers for accurately measuring the location of a substrate during operation is provided. The system may include two chucks, and the two chucks are aligned in a first direction. The interferometers are placed along the first direction to measure the location of the substrate with respect to the first direction. The reduced distance between the interferometers and the chuck improves the accuracy of the measurement of the location of the substrate. In another embodiment, mask pattern data is provided to the system, and the mask pattern data is modified based on location and position information of the substrate. By controlling the mask pattern data with the location and position information of the substrate, less positional errors of the pattern formed on the substrate can be achieved.

7. 发明授权

US09921490B2 Substrate holding device, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US09921490B2
公开(公告)日：2018-03-20
申请号：US15033327
申请日：2014-10-29
申请人： NIKON CORPORATION
发明人： Yuichi Shibazaki
IPC分类号： B23B5/34 , G03B27/58 , G03B27/60 , H02K41/02 , G03F7/20 , H01L21/687
CPC分类号： G03F7/70716 , G03F7/707 , G03F7/70733 , H01L21/68742
摘要： A substrate holding device is equipped with a substrate holder that adsorbs and holds a substrate, and a plurality of vertical movement pin units that each have, at one end, an adsorption section to adsorb a rear surface of the substrate, and are movable relative to the substrate holder in a state of adsorbing the rear surface of the substrate with the adsorption section. The plurality of vertical movement pin units each have at least part including the adsorption section that is displaced in at least one direction, by an action of a force received from the adsorbed substrate.

8. 发明授权

US09897927B2 Device and method for positioning a photolithography mask by a contactless optical method 有权
公开(公告)号：US09897927B2
公开(公告)日：2018-02-20
申请号：US15039833
申请日：2014-11-28
申请人： FOGALE NANOTECH
发明人： Gilles Fresquet , Guenael Ribette
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70733 , G03F9/703 , G03F9/7038 , G03F9/7088
摘要： A device for positioning a mask relative to the surface of a wafer with a view to the exposure of the wafer, which includes (i) first positioning structure suitable for holding and moving the mask and the wafer in relation to each other; (ii) imaging structure suitable for producing at least one image of the mask and of the surface of the wafer according to at least one field of view, so as to image positioning marks of the mask and of the wafer simultaneously in the field of view; and (iii) at least one optical distance sensor suitable for producing a distance measurement between the surface of the wafer and the mask in the field(s) of view, with a measurement beam which passes at least partially through the imaging structure.

9. 发明申请

US20180046097A1 SUBSTRATE PRE-ALIGNMENT METHOD 有权
公开(公告)号：US20180046097A1
公开(公告)日：2018-02-15
申请号：US15554177
申请日：2016-02-26
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
发明人： Xiwen ZHOU , Weiwang SUN , Cuixia TIAN , Jiaozeng ZHENG
IPC分类号： G03F9/00 , G03F7/20 , G03F1/42 , H01L21/68
CPC分类号： G03F9/7092 , G03F1/42 , G03F7/20 , G03F7/70733 , G03F9/7011 , H01L21/027 , H01L21/68 , H01L21/681 , H01L21/682
摘要： A method for pre-aligning a substrate includes the steps of: 1) providing a substrate having a plurality of marks are arranged circumferentially on a surface thereof, wherein each of the plurality of marks consists of at least one first stripe extending in a first direction and at least one second stripe extending in a first direction; 2) aligning a center of the substrate with a given point on a substrate carrier stage; 3) illuminating a mark selected from the plurality of marks on the surface of the substrate with light and obtaining an image of the selected mark; 4) processing the image to obtain first projection data corresponding to the first direction and second projection data corresponding to the second direction; 5) identifying a set of first peak values corresponding to the at least one first stripe of the selected mark from the first projection data and a set of second peak values corresponding to the at least one second stripe of the selected mark from the second projection data; 6) selecting first peak values and second peak values that a) correspond to numbers of the at least one first stripe and the at least one second stripe and b) are deemed authentic, from the set of first peak values and the set of second peak values identified in step 5) and proceeding to step 7); otherwise selecting a next mark as the selected mark and returning to step 4); 7) calculating a current position of the selected mark relative to the substrate carrier stage based on the first and second peak values selected in step 6); and 8) rotating the substrate, according to the current position of the selected mark relative to the substrate carrier stage calculated in step 7), a relative position of the selected mark on the substrate and a desired rotation angle of the substrate relative to the substrate carrier stage, until the substrate is oriented at the desired rotation angle.

10. 发明授权

US09766555B2 Exposure apparatus, exposure method, and method for producing device 有权
公开(公告)号：US09766555B2
公开(公告)日：2017-09-19
申请号：US15145467
申请日：2016-05-03
申请人： NIKON CORPORATION
发明人： Hiroyuki Nagasaka , Yasufumi Nishii
IPC分类号： G03B27/52 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/708 , G03F7/7095
摘要： An exposure apparatus includes a projection system having a final element that projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate. A liquid confinement member has a recovery outlet, via which the liquid is removed along with gas, arranged such that the upper surface of the substrate faces the recovery outlet, and the recovery outlet surrounds a path of the exposure light. The liquid confinement member confines the liquid to an area smaller than an area of the upper surface of the substrate by removing the liquid via the recovery outlet from a gap between the liquid confinement member and the upper surface of the substrate. An anti-vibration system is disposed such that transmission of vibrations between the liquid confinement member and the projection system is limited.

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