会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明授权
    • Ion source
    • 离子源
    • US08653475B1
    • 2014-02-18
    • US13649564
    • 2012-10-11
    • Manuel A. JerezCarlos F. Borges
    • Manuel A. JerezCarlos F. Borges
    • H01J27/00
    • H01J27/00H01J27/022H01J27/08H01J37/04H01J37/08H01J2237/006H01J2237/082
    • An arc chamber assembly for an ion source comprising a housing having a base and at least one pair of side walls extending upwardly from opposite sides of the base to define an arc chamber, the base having a plurality of channels extending to each sidewall; an inlet port connected to the base for delivering a flow of gas into the channels; a bottom liner having at least one pair of notches in each of two opposite side edges thereof and disposed in the housing in spaced parallel relation to the base and opposite the channels for conducting a flow of gas from the inlet port towards the sidewalls, each notch being in communication with a respective channel of the plurality of channels to pass gas upwardly into the arc chamber; and a pair of side liners, each side liner being disposed in the housing in spaced parallel relation to a respective one of the side walls for conducting a flow of gas between the base and the bottom liner, each side liner having at least one pair of slots to horizontally pass gas into the arc chamber.
    • 1.一种用于离子源的电弧室组件,包括壳体,所述壳体具有基部和从所述基部的相对侧向上延伸的至少一对侧壁,以限定电弧室,所述基部具有延伸到每个侧壁的多个通道; 连接到基座的入口端口,用于将气流输送到通道中; 底部衬套在其两个相对的侧边缘中的每一个中具有至少一对凹口,并且以与腔体平行的方式设置在壳体中并与通道相对,用于将气体从入口端口朝向侧壁传导, 与多个通道的相应通道连通以将气体向上流入电弧室; 以及一对侧衬,每个侧衬与所述侧壁中的相应的一个侧壁间隔开设置在所述壳体中,用于在所述底座和所述底衬套之间进行气体流动,每个侧衬里具有至少一对 水槽将气体水平地通入电弧室。