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1. 发明申请

US20190057833A1 Charged Particle Source 审中-公开
公开(公告)号：US20190057833A1
公开(公告)日：2019-02-21
申请号：US16042871
申请日：2018-07-23
申请人： Hermes Microvision, Inc.
发明人： Shuai LI
IPC分类号： H01J37/143 , H01J37/28 , H01J37/09 , H01J3/20 , H01J37/065 , H01J37/14 , H01J37/063
CPC分类号： H01J37/143 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/09 , H01J37/14 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/06308 , H01J2237/06375 , H01J2237/0653 , H01J2237/083 , H01J2237/141 , H01J2237/1415 , H01J2237/2806 , H01J2237/2817
摘要： This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

2. 发明授权

US09870893B2 Multi-piece electrode aperture 有权
公开(公告)号：US09870893B2
公开(公告)日：2018-01-16
申请号：US15410707
申请日：2017-01-19
申请人： Axcelis Technologies, Inc.
发明人： Neil K Colvin , Tseh-Jen Hsieh , Paul B. Silverstein
IPC分类号： H01J37/04 , H01J37/05 , H01J37/317 , H01J37/08 , H01J37/09 , H01J37/12 , H01J37/147
CPC分类号： H01J37/045 , H01J37/04 , H01J37/05 , H01J37/08 , H01J37/09 , H01J37/12 , H01J37/147 , H01J37/3171 , H01J2237/083
摘要： An optics plate for an ion implantation system, the optics plate comprising a pair of aperture assemblies. Each pair of aperture assemblies respectively comprises a first aperture member, a second aperture member; and an aperture fastener, wherein the aperture fastener fastens the first aperture member to the second aperture member. An aperture tip may be also fastened to the second aperture member. One or more of the first aperture member, second aperture member, aperture tip, and aperture fastener is made of one or more of a refractory metal, tungsten, lanthanated tungsten alloy, yttrium tungsten alloy, and/or graphite and silicon carbide. The aperture assemblies may define an extraction electrode assembly, a ground electrode assembly, or other electrode assembly in the ion implantation system. The aperture fastener may be a screw and a bevel washer. The first aperture member may be operably coupled to a base plate via an aperture assembly fastener.

3. 发明授权

US09812283B2 Charged particle source 有权
公开(公告)号：US09812283B2
公开(公告)日：2017-11-07
申请号：US15404440
申请日：2017-01-12
申请人： Hermes Microvision Inc.
发明人： Shuai Li
IPC分类号： H01J37/143 , H01J37/28 , H01J3/20 , H01J37/09
CPC分类号： H01J37/143 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/09 , H01J37/14 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/06308 , H01J2237/06375 , H01J2237/0653 , H01J2237/083 , H01J2237/141 , H01J2237/1415 , H01J2237/2806 , H01J2237/2817
摘要： This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

4. 发明申请

US20170207057A1 MULTI-PIECE ELECTRODE APERTURE 有权
公开(公告)号：US20170207057A1
公开(公告)日：2017-07-20
申请号：US15410707
申请日：2017-01-19
申请人： Axcelis Technologies, Inc.
发明人： Neil K. Colvin , Tseh-Jen Hsieh , Paul B. Silverstein
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/045 , H01J37/04 , H01J37/05 , H01J37/08 , H01J37/09 , H01J37/12 , H01J37/147 , H01J37/3171 , H01J2237/083
摘要： An optics plate for an ion implantation system, the optics plate comprising a pair of aperture assemblies. Each pair of aperture assemblies respectively comprises a first aperture member, a second aperture member; and an aperture fastener, wherein the aperture fastener fastens the first aperture member to the second aperture member. An aperture tip may be also fastened to the second aperture member. One or more of the first aperture member, second aperture member, aperture tip, and aperture fastener is made of one or more of a refractory metal, tungsten, lanthanated tungsten alloy, yttrium tungsten alloy, and/or graphite and silicon carbide. The aperture assemblies may define an extraction electrode assembly, a ground electrode assembly, or other electrode assembly in the ion implantation system. The aperture fastener may be a screw and a bevel washer. The first aperture member may be operably coupled to a base plate via an aperture assembly fastener.

5. 发明申请

US20170125205A1 Apparatus of Plural Charged-Particle Beams 审中-公开
公开(公告)号：US20170125205A1
公开(公告)日：2017-05-04
申请号：US15403685
申请日：2017-01-11
申请人： Hermes Microvision Inc.
发明人： Xuedong Liu , Weiming Ren , Shuai Li , Zhongwei Chen
IPC分类号： H01J37/147 , H01J37/28 , H01J37/153
CPC分类号： H01J37/147 , H01J37/04 , H01J37/153 , H01J37/28 , H01J2237/061 , H01J2237/083 , H01J2237/1532 , H01J2237/1534 , H01J2237/2817
摘要： One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

6. 发明申请

US20160336142A1 Apparatus of Plural Charged-Particle Beams 有权
标题翻译：多次充电粒子束装置
公开(公告)号：US20160336142A1
公开(公告)日：2016-11-17
申请号：US15150858
申请日：2016-05-10
申请人： Hermes Microvision Inc.
发明人： Xuedong Liu , Weiming Ren , Shuai Li , Zhongwei Chen
IPC分类号： H01J37/147 , H01J37/20 , H01J37/06 , H01J37/10 , H01J37/28 , H01J37/22
CPC分类号： H01J37/147 , H01J37/04 , H01J37/153 , H01J37/28 , H01J2237/061 , H01J2237/083 , H01J2237/1532 , H01J2237/1534 , H01J2237/2817
摘要： One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
摘要翻译：提出了一种改进的源转换单元和一种减少多光束装置中的库仑效应的方法。在修改的源转换单元中，在图像形成功能使每个子束在局部变化之后进行像差补偿功能，因此避免了由于子束倾斜/移位引起的不期望的像差。具有多个库仑效应还原开口的库仑效应降低装置放置在靠近设备的单个电子源的位置，因此可以尽可能早地切断未使用的电子。

7. 发明申请

US20160149123A1 METHOD OF FORMING A PATTERN USING ION BEAMS OF BILATERAL SYMMETRY, A METHOD OF FORMING A MAGNETIC MEMORY DEVICE USING THE SAME, AND AN ION BEAM APPARATUS GENERATING ION BEAMS OF BILATERAL SYMMETRY 有权
标题翻译：使用双边对称离子束形成图案的方法，使用该方法形成磁记录装置的方法以及生成双边对称离子束的离子束装置
公开(公告)号：US20160149123A1
公开(公告)日：2016-05-26
申请号：US14919723
申请日：2015-10-21
申请人： Jongchul PARK , Hyungjoon KWON
发明人： Jongchul PARK , Hyungjoon KWON
IPC分类号： H01L43/12 , H01L21/3065
CPC分类号： H01L43/12 , H01J37/32357 , H01J37/32422 , H01J37/32623 , H01J2237/083 , H01J2237/3174 , H01J2237/334
摘要： A pattern-forming method includes providing a first ion beam at a first incidence angle and a second ion beam at a second incidence angle to a surface of an etch target layer formed on a substrate. Patterns are formed by patterning the etch target layer using the first and second ion beams. The first ion beam and the second ion beam are substantially symmetrical to each other with respect to a normal line that is perpendicular to a top surface of the substrate. Each of the first and second incidence angles is greater than 0 degrees and smaller than an angle obtained by subtracting a predetermined angle from 90 degrees.
摘要翻译：图案形成方法包括以第一入射角提供第一离子束，并以第二入射角提供第二离子束到形成在衬底上的蚀刻目标层的表面。通过使用第一和第二离子束图案化蚀刻目标层来形成图案。第一离子束和第二离子束相对于垂直于衬底顶表面的法线基本上彼此对称。第一入射角和第二入射角中的每一个大于0度并且小于通过从90度减去预定角度而获得的角度。

8. 发明申请

US20150144808A1 Plasma Source Apparatus and Methods for Generating Charged Particle Beams 有权
标题翻译：等离子体源装置和产生带电粒子束的方法
公开(公告)号：US20150144808A1
公开(公告)日：2015-05-28
申请号：US14406012
申请日：2013-05-20
申请人： The Welding Institute
发明人： Colin Ribton , Allan Sanderson
IPC分类号： H01J37/077 , H01J37/30
CPC分类号： H01J37/077 , H01J27/18 , H01J37/3002 , H01J2237/061 , H01J2237/063 , H01J2237/0817 , H01J2237/083 , H01J2237/31 , H01J2237/3104
摘要： A plasma source apparatus for generating a beam of charged particles is disclosed. The apparatus comprises: a plasma chamber provided with an inlet for the ingress of gas and an aperture for the extraction of charged particles from the plasma chamber; a radio frequency (RF) plasma generation unit for generating a plasma inside the plasma chamber, the radio frequency plasma generation unit comprising first and second resonant circuits each tuned to resonate at substantially the same resonant frequency, the first resonant circuit comprising a first antenna and a first, RF power source adapted to drive the first resonant circuit at substantially its resonant frequency, and the second resonant circuit comprising a second antenna, whereby in use an RF signal is induced in the second antenna by the first resonant circuit due to resonant coupling, the second resonant circuit being configured to apply the induced RF signal to the plasma chamber to generate a plasma therein; and a particle accelerating unit for extracting charged particles from the plasma and accelerating the charged particles to form a beam, the particle accelerating unit comprising a second power source configured to apply potential between the plasma chamber and an accelerating electrode, the region between the plasma chamber and the accelerating electrode constituting an acceleration column. The second power source is adapted to output a high voltage relative to that output by the first, RF power source.
摘要翻译：公开了一种用于产生带电粒子束的等离子体源装置。该装置包括：等离子体室，其具有用于进入气体的入口和用于从等离子体室抽出带电粒子的孔; 用于在等离子体室内产生等离子体的射频（RF）等离子体产生单元，所述射频等离子体产生单元包括第一和第二谐振电路，每个谐振电路被调谐以基本相同的谐振频率谐振，所述第一谐振电路包括第一天线和第一RF电源，其适于以基本上其谐振频率驱动第一谐振电路，并且第二谐振电路包括第二天线，由此在使用中由于谐振耦合由第一谐振电路在第二天线中感应RF信号所述第二谐振电路被配置为将所述感应RF信号施加到所述等离子体室以在其中产生等离子体; 以及用于从等离子体中提取带电粒子并加速带电粒子以形成束的粒子加速单元，所述粒子加速单元包括构造成在等离子体室和加速电极之间施加电位的第二电源，等离子体室加速电极构成加速柱。第二电源适于通过第一RF电源输出相对于该输出的高电压。

9. 发明授权

US08796649B2 Ion implanter 有权
标题翻译：离子注入机
公开(公告)号：US08796649B2
公开(公告)日：2014-08-05
申请号：US13689148
申请日：2012-11-29
申请人： Manuel A. Jerez , Carlos F. Borges
发明人： Manuel A. Jerez , Carlos F. Borges
IPC分类号： H01J37/317 , H01L21/265 , H01J27/08 , H01J1/88 , H01J7/26
CPC分类号： H01J27/08 , H01J37/08 , H01J37/3171 , H01J2237/002 , H01J2237/045 , H01J2237/083
摘要： The support and electrode assemblies of the ion implanter are cooled by circulating a coolant through these parts during operation. The support for the arc chamber includes a one piece block of aluminum through which coolant passes and a hollow rectangular post on which the arc chamber sits with a space therebetween.
摘要翻译：离子注入机的支撑和电极组件在运行期间通过这些部件循环冷却。电弧室的支撑件包括一块铝制的冷却剂通过的块和一个中空的矩形柱，电弧室在其上放置一个空间。

10. 发明授权

US08389953B2 Focused ion beam apparatus 有权
标题翻译：聚焦离子束装置
公开(公告)号：US08389953B2
公开(公告)日：2013-03-05
申请号：US12931993
申请日：2011-02-15
申请人： Takashi Ogawa , Kenichi Nishinaka , Yoshihiro Koyama
发明人： Takashi Ogawa , Kenichi Nishinaka , Yoshihiro Koyama
IPC分类号： H01J49/10 , H01J37/08 , H01J27/02 , H01J3/14
CPC分类号： H01J37/08 , H01J2237/0451 , H01J2237/0458 , H01J2237/0807 , H01J2237/083 , H01J2237/24535 , H01J2237/28 , H01J2237/31749
摘要： A focused ion beam apparatus includes an ion gun unit having an emitter tip, a gas supply unit that supplies gas to the tip, and an ion source gas supply source. An extracting electrode ionizes the gas adsorbed onto the surface of the tip and extracts ions by applying a voltage between the extracting electrode and the tip. A cathode electrode accelerates the ions toward a sample. An aperture member has an opening that passes therethrough a part of the ion beam ejected from the ion gun unit, and a lens system focuses the ion beam onto the sample.
摘要翻译：聚焦离子束装置包括具有发射极尖端的离子枪单元，向尖端供应气体的气体供应单元和离子源气体供应源。提取电极通过在提取电极和尖端之间施加电压使吸附在尖端表面上的气体电离并提取离子。阴极将离子加速到样品。孔部件具有从离子枪单元喷出的离子束的一部分通过的开口，透镜系统将离子束聚焦到样品上。

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