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1. 发明申请

US20180218874A1 ELECTRON MICROSCOPE ELECTRON GUN FOR FACILITATING POSITION ADJUSTMENT AND ELECTRON MICROSCOPE INCLUDING SAME 审中-公开
公开(公告)号：US20180218874A1
公开(公告)日：2018-08-02
申请号：US15576687
申请日：2016-01-06
申请人： KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
发明人： Bok Lae CHO , In Yong PARK
IPC分类号： H01J37/065 , H01J37/26
CPC分类号： H01J37/065 , H01J37/06 , H01J37/26 , H01J2237/061 , H01J2237/06341
摘要： The present invention relates to an electron gun for facilitating position adjustment, and an electron microscope including the same, the electron gun improving a vacuum structure so as to easily move a filament block or an electron tip of an electron gun without having bellows for maintaining a vacuum when the center axis of the filament block or the electron tip of the electron gun is mechanically misaligned with the center axis of a anode and a focusing lens.

2. 发明申请

US20180211807A1 COLLISION IONIZATION SOURCE 审中-公开
公开(公告)号：US20180211807A1
公开(公告)日：2018-07-26
申请号：US15874798
申请日：2018-01-18
申请人： FEI Company
发明人： Gregory A. Schwind , Aurelien Philippe Jean Maclou Botman , Sean Kellogg , Leon van Kouwen , Luigi Mele
IPC分类号： H01J27/20 , H01J37/08 , H01J37/26
CPC分类号： H01J27/20 , H01J27/205 , H01J37/08 , H01J37/26 , H01J2237/006 , H01J2237/061 , H01J2237/082
摘要： A collision ionization source is disclosed herein. An example source includes an ionization region arranged to receive a gas and a charged particle beam, the charged particle beam to ionize at least some of the gas, and a supply duct arranged to provide the gas to the ionization region, the supply duct having a non-uniform height decreasing from an input orifice to an output orifice, the output orifice arranged adjacent to the ionization region.

3. 发明授权

US09607805B2 Apparatus of plural charged-particle beams 有权
公开(公告)号：US09607805B2
公开(公告)日：2017-03-28
申请号：US15150858
申请日：2016-05-10
申请人： Hermes Microvision Inc.
发明人： Xuedong Liu , Weiming Ren , Shuai Li , Zhongwei Chen
IPC分类号： H01J37/04 , H01J37/28
CPC分类号： H01J37/147 , H01J37/04 , H01J37/153 , H01J37/28 , H01J2237/061 , H01J2237/083 , H01J2237/1532 , H01J2237/1534 , H01J2237/2817
摘要： One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

4. 发明授权

US09601298B2 Electron gun supporting member and electron gun apparatus 有权
公开(公告)号：US09601298B2
公开(公告)日：2017-03-21
申请号：US14833447
申请日：2015-08-24
申请人： NuFlare Technology, Inc.
发明人： Nobuo Miyamoto
IPC分类号： H01J29/02 , H01J29/48 , H01J3/02 , H01J3/38 , H01J29/92 , H01J29/96 , H01J37/065
CPC分类号： H01J29/025 , H01J3/027 , H01J3/38 , H01J29/02 , H01J29/485 , H01J29/92 , H01J29/96 , H01J37/065 , H01J2237/032 , H01J2237/038 , H01J2237/061 , H01J2237/31776
摘要： An electron gun supporting member includes an insulating supporting member configured such that its one end is connected to a predetermined member having a ground potential and other end is connected to a high-voltage electrode to which a high potential being a negative high potential for emitting electrons from an electron source is applied, so as to support the high-voltage electrode, and a metal film formed in a partial region, which contacts neither the high-voltage electrode nor the predetermined member, on the outer surface of the insulating supporting member.

5. 发明授权

US09520204B2 Cold stripper for high energy ion implanter with tandem accelerator 有权
标题翻译：带有串联加速器的高能离子注入机的冷拔机
公开(公告)号：US09520204B2
公开(公告)日：2016-12-13
申请号：US14140893
申请日：2013-12-26
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Shengwu Chang
IPC分类号： H01J23/00 , G21K1/14 , H05H5/06 , H01J37/317 , H01L21/265 , H05H7/08
CPC分类号： G21K1/14 , H01J37/3171 , H01J2237/002 , H01J2237/0048 , H01J2237/047 , H01J2237/061 , H01J2237/082 , H01L21/265 , H05H5/063 , H05H2007/088
摘要： A cold stripper for a high-energy ion implanter system is provided. The cold stripper including a stripper tube having a hollow cavity, a first aperture in the stripper tube to admit an ion beam of positively charged ions into the hollow cavity and a second aperture in the stripper tube to discharge the ion beam from the hollow cavity, a gas pump coupled to the hollow cavity to introduce a gas into the hollow cavity, one or more cooling passages in the stripper tube, and a coolant pump coupled to the one or more cooling passages to circulate a coolant through the one or more cooling passages.
摘要翻译：提供了一种用于高能离子注入机系统的冷汽提器。所述冷汽提器包括具有中空腔的汽提管，所述汽提管中的第一孔，用于允许带正电荷的离子的离子束进入所述中空腔，并且所述汽提管中的第二孔用于从所述中空腔排出离子束，耦合到所述中空腔的气泵以将气体引入所述中空腔，所述汽提管中的一个或多个冷却通道和联接到所述一个或多个冷却通道的冷却剂泵，以使冷却剂循环通过所述一个或多个冷却通道。

6. 发明授权

US09514912B2 Control of ion angular distribution of ion beams with hidden deflection electrode 有权
标题翻译：控制具有隐藏偏转电极的离子束的离子角分布
公开(公告)号：US09514912B2
公开(公告)日：2016-12-06
申请号：US14523428
申请日：2014-10-24
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Costel Biloiu , Peter F. Kurunczi , Tyler Rockwell , Christopher Campbell , Vikram Singh , Svetlana Radovanov
IPC分类号： H01J37/08 , H01J27/02 , H01J37/32 , H01J37/317
CPC分类号： H01J37/08 , H01J27/024 , H01J37/3171 , H01J37/32357 , H01J2237/061 , H01J2237/30472
摘要： A processing apparatus may include: an extraction plate disposed along a side of a plasma chamber, the extraction plate having a first and second aperture, and middle portion between the first and second aperture, the first and second aperture being configured to define a first and second ion beam when the plasma is present in the plasma chamber and an extraction voltage is applied between the extraction plate and a substrate; a hidden deflection electrode disposed adjacent the middle portion outside of the plasma chamber, and electrically isolated from the extraction plate; and a hidden deflection electrode power supply to apply a bias voltage to the hidden deflection electrode, wherein the bias voltage is configured to modify a mean angle of incidence of ions and/or a range of angles of incidence centered around the mean angle of incidence in the first and second ion beam.
摘要翻译：一种处理设备可以包括：提取板，沿着等离子体室的一侧设置，所述提取板具有第一和第二孔，以及在第一和第二孔之间的中间部分，第一和第二孔被配置为限定第一和第二孔当等离子体存在于等离子体室中并且在提取板和基板之间施加提取电压时的第二离子束; 隐藏的偏转电极，设置在等离子体室外部的中间部分附近，并与提取板电隔离; 以及隐藏的偏转电极电源，用于向隐藏的偏转电极施加偏置电压，其中偏置电压被配置为修改离子的平均入射角和/或以入射角为中心的入射角范围，第一和第二离子束。

7. 发明授权

US09502207B1 Cam actuated filament clamp 有权
标题翻译：凸轮驱动灯丝夹
公开(公告)号：US09502207B1
公开(公告)日：2016-11-22
申请号：US14835780
申请日：2015-08-26
申请人： Axcelis Technologies, Inc.
发明人： John F. Baggett , Jason R. Beringer
IPC分类号： H01J37/20 , H01J37/317 , H01J37/08
CPC分类号： H01J37/08 , H01J3/04 , H01J2237/061 , H01J2237/31701
摘要： An ion source filament clamp has a clamp member having first and second ends. The first end has one of a cam surface and a cam follower, and has first and second portions that are opposed to one another and separated by a slot having a lead opening defined therein to receive a lead of an ion source filament. An actuator pin extends along an actuator pin axis and has first and second sections. The first section is coupled to the first portion of the clamp member. The actuator pin extends through, and is in sliding engagement with, a thru-hole in the second portion of the clamp member. A cam member is operably coupled to the second section of the actuator pin. The cam member has a handle and the other of the cam surface and cam follower and is configured to rotate between a clamped position and an unclamped position. The cam follower slidingly contacts the cam surface. In the clamped position, the cam follower engages the cam surface in a first predetermined manner, thus selectively compressing the first and second portions of the clamp member toward one another and exerting a clamping pressure on the lead within the lead opening while inducing a spring tension between the first and second portions of the clamp member. In the unclamped position, the cam follower engages the cam surface in a second predetermined manner, wherein the spring tension extends the first and second portions of the clamp member apart from one another, therein releasing the clamping pressure on the lead within the lead opening.
摘要翻译：离子源灯丝夹具具有一个具有第一和第二端的夹紧件。第一端具有凸轮表面和凸轮从动件中的一个，并且具有彼此相对并且由其中限定有引线开口的槽分隔开的第一和第二部分，以接收离子源灯丝的引线。执行器销沿致动器销轴线延伸并具有第一和第二部分。第一部分联接到夹紧构件的第一部分。致动器销延伸穿过并且与夹紧构件的第二部分中的通孔滑动接合。凸轮构件可操作地联接到致动器销的第二部分。凸轮构件具有手柄和凸轮表面和凸轮从动件中的另一个，并且构造成在夹紧位置和未夹紧位置之间旋转。凸轮从动件滑动地接触凸轮表面。在夹紧位置中，凸轮从动件以第一预定方式接合凸轮表面，从而选择性地将夹紧构件的第一和第二部分彼此压缩并且在引导开口内的引线上施加夹紧压力，同时引起弹簧张力在夹紧构件的第一和第二部分之间。在松开位置，凸轮从动件以第二预定方式接合凸轮表面，其中弹簧张力将夹紧构件的第一和第二部分彼此分开延伸，从而在引线开口内释放引线上的夹持压力。

8. 发明申请

US20160260575A1 ELECTRON BEAM GENERATOR, IMAGE APPARATUS INCLUDING THE SAME AND OPTICAL APPARATUS 有权
标题翻译：电子束发生器，包括其的图像装置和光学装置
公开(公告)号：US20160260575A1
公开(公告)日：2016-09-08
申请号：US15059199
申请日：2016-03-02
申请人： ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
发明人： Moon Youn JUNG , Dong Hoon SONG , Jin Sun KIM
IPC分类号： H01J37/06 , H01J37/244
CPC分类号： H01J37/06 , H01J3/024 , H01J2237/049 , H01J2237/061 , H01J2237/06325 , H01J2237/06366 , H01J2237/0656 , H01J2237/2482
摘要： Provided may include an electron beam generator, an image apparatus including the same, and an optical apparatus. The optical apparatus includes a first and second laser apparatuses providing a first and second laser beams on a substrate, and a first optical system provided between the first and second laser apparatuses and the substrate to focus the first and second laser beams. The first and second laser beams overlap with each other generating an interference beam, thereby decreasing a spot size of the interference beam to be smaller than a wavelength of each of the first and second laser beams at a focal point.
摘要翻译：可以提供电子束发生器，包括该电子束发生器的图像装置和光学装置。光学装置包括在基板上提供第一和第二激光束的第一和第二激光装置，以及设置在第一和第二激光装置与基板之间以使第一和第二激光束聚焦的第一光学系统。第一和第二激光束彼此重叠，产生干涉光束，从而将干涉光束的光点尺寸减小为小于焦点处的第一和第二激光束的波长的波长。

9. 发明授权

US09343259B2 GCIB nozzle assembly 有权
标题翻译： GCIB喷嘴总成
公开(公告)号：US09343259B2
公开(公告)日：2016-05-17
申请号：US14815265
申请日：2015-07-31
申请人： TEL Epion Inc.
发明人： Matthew C. Gwinn , Avrum Freytsis , Robert K. Becker
IPC分类号： H01J37/08 , H01J37/305
CPC分类号： H01J37/08 , H01J37/305 , H01J2237/006 , H01J2237/0206 , H01J2237/061 , H01J2237/0812 , H01J2237/0822 , H01J2237/3151
摘要： A nozzle assembly used for performing gas cluster ion beam (GCIB) etch processing of various materials is described. In particular, the nozzle assembly includes two or more conical nozzles that are aligned such that they are both used to generate the same GCIB. The first conical nozzle may include the throat that initially forms the GCIB and the second nozzle may form a larger conical cavity that may be appended to the first conical nozzle. A transition region may be disposed between the two conical nozzles that may substantially cylindrical and slightly larger than the largest diameter of the first conical nozzle.
摘要翻译：描述了用于进行各种材料的气体簇离子束（GCIB）蚀刻处理的喷嘴组件。特别地，喷嘴组件包括两个或更多个锥形喷嘴，其被对准，使得它们都用于产生相同的GCIB。第一锥形喷嘴可以包括最初形成GCIB的喉部，并且第二喷嘴可以形成可以附着到第一锥形喷嘴的更大的锥形空腔。过渡区域可以设置在两个锥形喷嘴之间，其可以基本上圆柱形并稍微大于第一锥形喷嘴的最大直径。

10. 发明申请

US20160064174A1 ELECTRON GUN SUPPORTING MEMBER AND ELECTRON GUN APPARATUS 有权
标题翻译：电子枪支持会员和电子枪设备
公开(公告)号：US20160064174A1
公开(公告)日：2016-03-03
申请号：US14833447
申请日：2015-08-24
申请人： NuFlare Technology, Inc.
发明人： Nobuo MIYAMOTO
IPC分类号： H01J29/02 , H01J29/48
CPC分类号： H01J29/025 , H01J3/027 , H01J3/38 , H01J29/02 , H01J29/485 , H01J29/92 , H01J29/96 , H01J37/065 , H01J2237/032 , H01J2237/038 , H01J2237/061 , H01J2237/31776
摘要： An electron gun supporting member includes an insulating supporting member configured such that its one end is connected to a predetermined member having a ground potential and other end is connected to a high-voltage electrode to which a high potential being a negative high potential for emitting electrons from an electron source is applied, so as to support the high-voltage electrode, and a metal film formed in a partial region, which contacts neither the high-voltage electrode nor the predetermined member, on the outer surface of the insulating supporting member.
摘要翻译：电子枪支撑构件包括绝缘支撑构件，其构造成使得其一端连接到具有接地电位的预定构件，并且另一端连接到高电压电极，高电位是用于发射电子的负高电位施加电子源，以便在绝缘支撑构件的外表面上支撑高压电极和形成在部分区域中的金属膜，其也不与高压电极或预定构件接触。

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