专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20180319178A1 DEVICE FOR PROVIDING MULTIPLE SURFACE TREATMENTS TO THREE-DIMENSIONAL OBJECTS PRIOR TO PRINTING AND SYSTEM USING THE DEVICE 审中-公开
公开(公告)号：US20180319178A1
公开(公告)日：2018-11-08
申请号：US15586444
申请日：2017-05-04
申请人： Xerox Corporation
发明人： Jack T. LeStrange , Anthony S. Condello , Mandakini Kanungo , Peter J. Knausdorf
IPC分类号： B41J11/00 , B41J3/407 , B41J3/00
CPC分类号： B41J11/0015 , B23K7/06 , B23K10/003 , B23K28/02 , B41J3/4073 , H05H1/00
摘要： A surface treatment system includes a holder configured to secure an object within the holder and a surface treatment device that is configured to treat a surface of the object within the holder with two types of surface treatments. The device is capable of producing a plasma or a flame at its nozzle for surface treatment. By controlling the materials supplied to the device and the way in which is operated, either a flame or plasma is produced. Thus, the surface treatment system is capable of treating a wide range of materials for printing by a direct-to-object printer.

2. 发明授权

US09370088B2 Method and apparatus for recycling shield gas in a plasma arc torch 有权
公开(公告)号：US09370088B2
公开(公告)日：2016-06-14
申请号：US14594331
申请日：2015-01-12
申请人： Victor Equipment Company
发明人： Brandon Hebert , Chris Conway
IPC分类号： B23K10/00 , H05H1/34 , H05H1/36
CPC分类号： H05H1/3405 , B23K10/00 , B23K10/003 , B23K10/006 , B23K10/02 , H05H1/34 , H05H1/341 , H05H1/36 , H05H2001/3426 , H05H2001/3489
摘要： A method of operating a plasma arc torch is provided that includes directing a first portion of gas into a plasma chamber, directing a second portion of the gas to initiate a pilot arc in the plasma chamber, and redirecting the second portion of the gas to form a shield gas flow rather than venting the second portion to atmosphere. A plasma arc torch for this method includes a start cartridge disposed between an electrode and a tip for initiating the pilot arc. The start cartridge defines at least one redirect gas passageway in fluid communication with a shield gas passageway. The second portion of gas is redirected through the at least one redirect gas passageway and into the shield gas passageway.

3. 发明申请

US20150163892A1 METHOD AND APPARATUS FOR RECYCLING SHIELD GAS IN A PLASMA ARC TORCH 有权
标题翻译：用于回收等离子弧焊机中的屏蔽气体的方法和装置
公开(公告)号：US20150163892A1
公开(公告)日：2015-06-11
申请号：US14594331
申请日：2015-01-12
申请人： Thermal Dynamics Corporation
发明人： Brandon Hebert , Chris Conway
IPC分类号： H05H1/34 , H05H1/36 , B23K10/00
CPC分类号： H05H1/3405 , B23K10/00 , B23K10/003 , B23K10/006 , B23K10/02 , H05H1/34 , H05H1/341 , H05H1/36 , H05H2001/3426 , H05H2001/3489
摘要： A method of operating a plasma arc torch is provided that includes directing a first portion of gas into a plasma chamber, directing a second portion of the gas to initiate a pilot arc in the plasma chamber, and redirecting the second portion of the gas to form a shield gas flow rather than venting the second portion to atmosphere. A plasma arc torch for this method includes a start cartridge disposed between an electrode and a tip for initiating the pilot arc. The start cartridge defines at least one redirect gas passageway in fluid communication with a shield gas passageway. The second portion of gas is redirected through the at least one redirect gas passageway and into the shield gas passageway.
摘要翻译：提供了一种操作等离子体电弧炬的方法，其包括将气体的第一部分引导到等离子体室中，引导气体的第二部分以在等离子体室中引发导电弧，并且重定向气体的第二部分以形成屏蔽气体流动而不是将第二部分排放到大气中。用于该方法的等离子弧焊炬包括设置在电极和尖端之间的启动盒，用于启动引导电弧。启动盒限定了与屏蔽气体通道流体连通的至少一个重定向气体通道。气体的第二部分被重新引导通过至少一个重定向气体通道并进入保护气体通道。

4. 发明申请

US20140191618A1 POLING TREATMENT METHOD, PLASMA POLING DEVICE, PIEZOELECTRIC BODY AND MANUFACTURING METHOD THEREOF, FILM FORMING DEVICE AND ETCHING DEVICE, AND LAMP ANNEALING DEVICE 审中-公开
标题翻译：抛光处理方法，等离子体激光装置，压电体及其制造方法，成膜装置和蚀刻装置以及灯具退火装置
公开(公告)号：US20140191618A1
公开(公告)日：2014-07-10
申请号：US14123138
申请日：2011-06-07
申请人： Takeshi Kijima , Yuuji Honda
发明人： Takeshi Kijima , Yuuji Honda
IPC分类号： H01L41/257 , B23K10/00 , H01L21/324
CPC分类号： H01L41/257 , B23K10/003 , H01L21/324 , Y10T29/42
摘要： A plasma poling device includes a holding electrode (4) which is disposed in a poling chamber (1) and holds a substrate to be poled (2), an opposite electrode (7) which is disposed in the poling chamber and disposed facing the substrate to be poled held on the holding electrode, a power source (6) electrically connected to one electrode of the holding electrode and the opposite electrode, a gas supply mechanism supplying a plasma forming gas into a space between the opposite electrode and the holding electrode, and a control unit controlling the power source and the gas supply mechanism. The control unit controls the power source and the gas supply mechanism so as to form a plasma at a position facing the substrate to be poled and to apply a poling treatment to the substrate to be poled.
摘要翻译：一种等离子体极化装置，包括：保持电极（4），其设置在极化室（1）中并保持待极化的基板（2）;相对电极（7），设置在所述极化室中并面向所述基板被保持在保持电极上，电连接到保持电极和相对电极的一个电极的电源（6），将等离子体形成气体供给到相对电极和保持电极之间的空间中的气体供给机构，以及控制电源和气体供给机构的控制单元。控制单元控制电源和气体供给机构，以在面向要极化的基板的位置处形成等离子体，并对待极化的基板进行极化处理。

5. 发明申请

US20140076861A1 ATMOSPHERIC-PRESSURE PLASMA PROCESSING APPARATUS AND METHOD 审中-公开
标题翻译：大气压力等离子体处理装置和方法
公开(公告)号：US20140076861A1
公开(公告)日：2014-03-20
申请号：US13826089
申请日：2013-03-14
申请人： Carrie E. Cornelius , Gregory A. Roche , David W. Tyner
发明人： Carrie E. Cornelius , Gregory A. Roche , David W. Tyner
IPC分类号： B23K10/00
CPC分类号： D06B19/007 , B23K10/003 , D06B1/02 , D10B2401/021 , H05H1/46 , H05H2001/466 , H05H2240/10 , H05H2245/123
摘要： A plasma processing apparatus including powered electrodes having elongated planar surfaces; grounded electrodes having elongated planar surfaces parallel to and coextensive with the elongated surfaces of the powered electrodes, and spaced-apart a chosen distance therefrom, forming plasma regions, is described. RF power is provided to the at least one powered electrode, both powered and grounded electrodes may be cooled, and a plasma gas is flowed through the plasma regions at atmospheric pressure; whereby a plasma is formed in the plasma regions. The material to be processed may be moved into close proximity to the exit of the plasma gas from the plasma regions perpendicular to the gas flow, and perpendicular to the elongated electrode dimensions, whereby excited species generated in the plasma exit the plasma regions and impinge unimpeded onto the material.
摘要翻译：一种等离子体处理装置，包括具有细长平面的动力电极; 描述了具有与被动电极的细长表面平行并且共同延伸的细长平面的接地电极，并且与其间隔开一定距离，形成等离子体区域。 RF功率被提供给至少一个供电电极，电源和接地电极都可以被冷却，等离子体气体在大气压力下流过等离子体区域; 由此在等离子体区域中形成等离子体。待处理的材料可以被移动到离垂直于气流的等离子体区域等离子体气体的出口附近，并且垂直于细长电极尺寸，由此在等离子体中产生的激发物质离开等离子体区域并且不受阻碍地撞击在材料上。

6. 发明申请

US20140027419A1 WORKPIECE PROCESSING USING A BEAM 有权
标题翻译：使用光束进行工作处理
公开(公告)号：US20140027419A1
公开(公告)日：2014-01-30
申请号：US14043992
申请日：2013-10-02
申请人： Trumpf, Inc.
发明人： Leonid Zeygerman
IPC分类号： B23K26/16 , B23K26/38
CPC分类号： B23K26/16 , B08B15/007 , B08B15/04 , B23K7/10 , B23K10/003 , B23K26/38 , B23K37/0229 , B23K37/0235 , B23K37/0408 , B23Q11/0046 , Y02P70/171
摘要： A cutting machine includes a suction duct that is movable with a cutting head of the cutting machine, using a common drive. The suction duct is disposed beneath the workpiece support and coupled to the motion unit supporting the cutting head so that it moves with the motion unit while an opening of the suction duct remains positioned below the cutting head during a cutting operation. The suction duct removes cutting debris and dust, and protects underlying machine components from beam damage.
摘要翻译：切割机包括可使用共同的驱动器与切割机的切割头一起移动的抽吸管道。吸入管道设置在工件支撑件下方并且联接到支撑切割头的运动单元，使得其在运动单元的作用下移动，同时在切割操作期间吸入管道的开口保持位于切割头下方。吸入管道可以清除碎片和灰尘，并保护底层机器部件免受光束损坏。

7. 发明申请

US20110062119A1 UNDERWATER MARKING WITH A PLASMA ARC TORCH 审中-公开
标题翻译：水下标记与等离子弧焊
公开(公告)号：US20110062119A1
公开(公告)日：2011-03-17
申请号：US12881608
申请日：2010-09-14
申请人： Joseph V. Warren, JR. , Roger W. Burrows
发明人： Joseph V. Warren, JR. , Roger W. Burrows
IPC分类号： B23K10/00
CPC分类号： B23K10/003 , B23K9/0061 , B23K9/013 , B23K10/00 , H05H1/341 , H05H2001/3457
摘要： A method of marking underwater with a plasma arc torch is provided. The method includes surrounding a plasma arc produced by the plasma arc torch with a flow of gas. The flow of gas may be directed around and/or along the body of the plasma arc torch with an air curtain attachment. Directing the flow of gas in this manner generates a protective air curtain which substantially surrounds the plasma arc. A current between 8 and 35 amperes may be used to mark the workpiece. Thereafter, the workpiece may be cut using the same plasma arc torch with a current between 30 and 750 amperes. The same nozzle and rate of flow of gas may be used for both the marking and cutting operations. Additionally, the workpiece may be kept underwater throughout the marking and cutting operations.
摘要翻译：提供了一种用等离子体电弧焰炬标记水下的方法。该方法包括利用气流围绕由等离子弧焊炬产生的等离子弧。气体流可以用等离子体电弧焰炬的身体围绕和/或沿空气幕附件定向。以这种方式引导气流产生基本上围绕等离子弧的保护性气帘。可以使用8到35安培之间的电流来标记工件。此后，可以使用相同的等离子弧焊炬切割工件，其电流为30至750安培。气体的相同喷嘴和流速可用于标记和切割操作。此外，工件可以在整个标记和切割操作期间保持在水下。

8. 发明申请

US20010008855A1 Method and apparatus for radiated beam marking of a golf club part and such part 审中-公开
标题翻译：用于高尔夫球杆部件和这种部件的辐射束标记的方法和装置
公开(公告)号：US20010008855A1
公开(公告)日：2001-07-19
申请号：US09800295
申请日：2001-03-05
申请人： STURM, RUGER & COMPANY, INC.
发明人： John K. Thorne
IPC分类号： A63B053/04 , B23K026/00
CPC分类号： A63B53/04 , A63B60/00 , B23K10/003 , B23K15/0086
摘要： A method and apparatus for creating a pattern in the surface of a golf club part having a surface area lacking smoothness using a radiated beam to make portions of such surface smoother. The disclosure is also directed to the golf club part created by the operation of such method and apparatus.
摘要翻译：一种使用辐射光束在表面积不足平滑度的高尔夫球杆部件的表面上形成图案以使这种表面更平滑的方法和装置。本公开还涉及通过这种方法和装置的操作产生的高尔夫球杆部分。

9. 发明申请

US20010008229A1 Atmospheric pressure inductive plasma apparatus 失效
公开(公告)号：US20010008229A1
公开(公告)日：2001-07-19
申请号：US09768979
申请日：2001-01-23
申请人： TimeDomain CVD, Inc.
发明人： Simon I. Selitser
IPC分类号： B23K010/00
CPC分类号： B23K10/003
摘要： An inductive plasma torch operating at atmospheric pressure is used for wafer or glass substrate processing. Said torch employs a linear type of plasma confinement. This linear torch is particularly suitable for photoresist etching and processes in which it has the advantages of high chemical isotropic etch rate and low plasma damage.

10. 发明授权

US06201208B1 Method and apparatus for plasma processing with control of ion energy distribution at the substrates 有权
标题翻译：用于等离子体处理的方法和装置，通过控制基板上的离子能量分布
公开(公告)号：US06201208B1
公开(公告)日：2001-03-13
申请号：US09433461
申请日：1999-11-04
申请人： Amy Eileen Wendt , Shiang-Bau Wang
发明人： Amy Eileen Wendt , Shiang-Bau Wang
IPC分类号： B23K900
CPC分类号： H01J37/32082 , B23K10/003 , B23K2101/40 , H01J37/32706 , H01L21/31116
摘要： In plasma processing, a bias voltage is provided from a power supply through a DC blocking capacitor to a platform on which a substrate to be treated is supported within a plasma reactor. The periodic bias voltage applied to the DC blocking capacitor has a waveform comprised of a voltage pulse peak followed by a ramp down of voltage from a first level lower than the pulse peak to a second lower level, the period of the bias waveform and the ramp down of voltage in each cycle selected to compensate for and substantially cancel the effect of ion accumulation on the substrate so as to maintain a substantially constant DC self-bias voltage on the substrate between the voltage pulse peaks. The waveform may include a single voltage pulse peak followed by a ramp down in voltage during each cycle of the bias voltage such that the ion energy distribution function at the substrate has a single narrow peak centered at a selected ion energy. The waveform may also comprise two voltage pulse peaks each followed by a ramp down of voltage selected to provide a bias voltage at the substrate comprising two voltage peaks during each cycle with DC self-bias voltages following each pulse peak at two different substantially constant DC levels, resulting in an ion energy distribution function at the substrate that includes two peaks of ion flux centered at two selected ion energies with substantially no ion flux at other ion energies. The ion energy distribution function may thus be tailored to best accommodate the desired plasma treatment process and can be used to reduce the effects of differential charging of substrates.
摘要翻译：在等离子体处理中，从电源通过隔直流电容器向待处理的基板支撑在等离子体反应器内的平台提供偏置电压。施加到隔直电容器的周期性偏置电压具有波形，其包括电压脉冲峰值，随后是从低于脉冲峰值的第一电平到第二较低电平的电压斜坡下降，偏置波形和斜坡的周期选择每个循环中的电压降低以补偿并基本上消除基板上的离子累积的影响，以便在电压脉冲峰值之间保持基板上的基本恒定的DC自偏压。波形可以包括单个电压脉冲峰值，随后在偏置电压的每个周期期间电压下降，使得衬底处的离子能量分布函数具有以所选离子能为中心的单个窄峰值。波形还可以包括两个电压脉冲峰值，每个电压脉冲峰值随后是选择的电压的斜坡下降，以在每个周期期间提供包括两个电压峰值的偏置电压，其中在两个不同的基本恒定的DC电平处的每个脉冲峰值之后的直流自偏压导致在衬底处的离子能量分布函数，其包括以两个选择的离子能量为中心的离子通量的两个峰值，其它离子能量基本上没有离子通量。因此，离子能量分布函数可以被定制以最佳地适应期望的等离子体处理过程，并且可以用于减少衬底的不同充电的影响。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式