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1. 发明申请

US20150056574A1 PROCESS FOR PROVIDING A TOPOGRAPHY TO THE SURFACE OF A DENTAL IMPLANT 审中-公开
标题翻译：提供牙体植入物表面的地形图的方法
公开(公告)号：US20150056574A1
公开(公告)日：2015-02-26
申请号：US14484572
申请日：2014-09-12
申请人： Straumann Holding AG
发明人： Frank Homann , Phillippe Habersetzer
IPC分类号： A61C8/00 , A61L27/10 , C23F1/30 , A61C13/20 , A61C13/00
CPC分类号： A61C8/0012 , A61C8/0037 , A61C13/00 , A61C13/206 , A61C2008/0046 , A61K6/024 , A61K6/0255 , A61L27/10 , A61L2430/12 , C04B41/009 , C04B41/5353 , C04B41/91 , C04B2111/00836 , C23F1/30 , C04B35/00 , C04B35/48
摘要： A process for providing a topography to the surface of a dental implant, the surface being made of a ceramic material having yttria-stabilized zirconia, the process including: providing a macroscopic roughness to the surface of the dental implant by a mechanical process and/or injection molding technique; and etching at least a part of the roughened surface, wherein etching is carried out using an etching solution having hydrofluoric acid at a temperature of 70° C. at least, such that discrete grains or agglomerates of grains are removed from the yttria-stabilized zirconia, thereby forming recesses and cavities in the roughened surface is disclosed.
摘要翻译：一种用于向牙齿植入物的表面提供形貌的方法，所述表面由具有氧化钇稳定的氧化锆的陶瓷材料制成，所述方法包括：通过机械过程向所述牙科植入物的表面提供宏观粗糙度和/或注塑技术; 并且蚀刻至少一部分粗糙化表面，其中使用在70℃的温度下使用具有氢氟酸的蚀刻溶液进行蚀刻，至少使离散晶粒或颗粒附聚物从氧化钇稳定的氧化锆中除去从而在粗糙表面中形成凹陷和空腔。

2. 发明申请

US20140345321A1 Biocompatible Sintered Diamond Jewelry 审中-公开
标题翻译：生物相容烧结钻石首饰
公开(公告)号：US20140345321A1
公开(公告)日：2014-11-27
申请号：US13900735
申请日：2013-05-23
申请人： David R. Hall , Ronald B. Crockett , Neil Cannon
发明人： David R. Hall , Ronald B. Crockett , Neil Cannon
IPC分类号： C04B35/52 , C04B41/53 , C04B35/645 , A44C17/00 , A44B5/00
CPC分类号： C04B35/52 , A44B5/00 , A44C17/00 , A44C17/007 , A44C27/001 , C04B41/009 , C04B41/5353 , C04B41/91 , C04B2235/40 , C04B2235/427 , C04B2235/6028 , Y10T24/18
摘要： An article of jewelry for wearing on the body may comprise a sintered polycrystalline diamond compact with substantially no metal catalyst. As many of the metal catalysts commonly used in the art are known to cause skin irritation, such a sintered compact with substantially no metal catalyst may be more biocompatible than previously known. A method for forming such a biocompatible sintered polycrystalline diamond compact comprises mixing diamond powder and metal catalyst powder into a mixture and sintering the mixture under elevated temperature and pressure conditions to form a sintered compact. The sintered compact may then be leached in an acid or other solution to substantially remove the metal catalyst from the sintered compact.
摘要翻译：用于佩戴在身体上的珠宝饰品可以包括基本上没有金属催化剂的烧结多晶金刚石复合体。已知本领域通常使用的许多金属催化剂引起皮肤刺激，这种基本上不含金属催化剂的烧结体可能比以前已知的更具生物相容性。用于形成这种生物相容性烧结多晶金刚石复合体的方法包括将金刚石粉末和金属催化剂粉末混合在混合物中并在高温和高压条件下烧结混合物以形成烧结体。然后可以将烧结体在酸或其它溶液中浸出以从烧结体中基本上除去金属催化剂。

3. 发明授权

US08888879B1 Detection of one or more interstitial constituents in a polycrystalline diamond element by neutron radiographic imaging 有权
标题翻译：通过中子射线成像检测多晶金刚石元件中的一个或多个间隙成分
公开(公告)号：US08888879B1
公开(公告)日：2014-11-18
申请号：US13267026
申请日：2011-10-06
申请人： Debkumar Mukhopadhyay , Kenneth E. Bertagnolli
发明人： Debkumar Mukhopadhyay , Kenneth E. Bertagnolli
IPC分类号： B24D3/00 , B24D11/00 , B24D18/00 , C09K3/14 , C09C1/68
CPC分类号： G01N23/005 , B24D18/0009 , C04B41/009 , C04B41/5353 , C04B41/91 , G01N23/05 , G01N33/385 , G01N33/40 , C04B35/52
摘要： In an embodiment, a method of non-destructively testing a polycrystalline diamond (“PCD”) element includes providing a PCD element including a plurality of bonded diamond grains defining a plurality of interstitial regions, at least a portion of the plurality of interstitial regions including one or more interstitial constituents disposed therein. The method further includes exposing the PCD element to neutron radiation from a neutron radiation source, receiving a portion of the neutron radiation that passes through the PCD element, and determining at least one characteristic of the PCD element at least partially based on the portion of the neutron radiation received. For example, the at least one characteristic may be the presence and distribution of metal-solvent catalyst, residual metal-solvent catalyst, an infiltrant, residual infiltrant, or other interstitial constituents within a PCD element.
摘要翻译：在一个实施例中，一种非破坏性地测试多晶金刚石（“PCD”）元件的方法包括提供包括限定多个间隙区域的多个结合金刚石晶粒的PCD元件，所述多个间隙区域的至少一部分包括设置在其中的一个或多个间质成分。该方法还包括将PCD元件暴露于来自中子辐射源的中子辐射，接收穿过PCD元件的一部分中子辐射，以及至少部分地基于所述PCD元件的一部分来确定PCD元件的至少一个特性收到中子辐射。例如，至少一个特征可以是在PCD元件内金属溶剂催化剂，残余金属溶剂催化剂，浸润剂，残余浸润剂或其它间隙成分的存在和分布。

4. 发明授权

US08586178B2 Ceramic substrate material, method for the production and use thereof, and antenna or antenna array 失效
标题翻译：陶瓷基板材料及其制造方法及天线阵列
公开(公告)号：US08586178B2
公开(公告)日：2013-11-19
申请号：US13008185
申请日：2011-01-18
申请人： Dieter Schwanke , Achim Bittner , Ulrich Schmid , Mirco Harnack
发明人： Dieter Schwanke , Achim Bittner , Ulrich Schmid , Mirco Harnack
IPC分类号： B32B3/00 , B31D3/00 , H01Q1/38
CPC分类号： H05K1/024 , C03C15/00 , C04B41/009 , C04B41/5353 , C04B41/91 , C04B2111/00844 , H01Q1/38 , H05K1/0306 , H05K3/002 , H05K2201/0116 , Y10T428/24479 , Y10T428/24562 , Y10T428/249969 , Y10T428/24997 , C04B35/10 , C04B35/00
摘要： A method for producing a ceramic substrate material having a first layer and possibly a further layer is specified. The first layer comprises at least one first component made of a crystalline ceramic material and/or a glass material as a matrix and a second component made of a further crystalline ceramic material, which is provided in the matrix. An etching step is performed, mantle areas of the crystals and/or crystal agglomerates of the second component being etched selectively in the first layer to generate a cavity structure in the first layer. The present invention also relates to a corresponding ceramic substrate material, an antenna or an antenna array, and the use of the ceramic substrate material for an antenna or an antenna array.
摘要翻译：规定了具有第一层和可能的另一层的陶瓷衬底材料的制造方法。第一层包括至少一种由结晶陶瓷材料和/或作为基质的玻璃材料制成的第一组分和由另外的结晶陶瓷材料制成的第二组分，其被提供在基质中。执行蚀刻步骤，在第一层中选择性地蚀刻第二组分的晶体的覆盖区和/或晶体聚集体，以在第一层中产生空腔结构。本发明还涉及相应的陶瓷衬底材料，天线或天线阵列，以及陶瓷衬底材料用于天线或天线阵列的用途。

5. 发明授权

US08257606B2 Ceramic body and process for the preparation thereof 有权
标题翻译：陶瓷体及其制备方法
公开(公告)号：US08257606B2
公开(公告)日：2012-09-04
申请号：US12667755
申请日：2008-07-07
申请人： Marc Stephan , André Schöne
发明人： Marc Stephan , André Schöne
IPC分类号： B44C1/22
CPC分类号： C04B41/53 , A61L27/105 , C04B41/009 , C04B41/91 , C04B2111/00793 , C04B2111/0081 , C04B2111/00836 , C04B41/0072 , C04B41/5353 , C04B41/5361 , C04B35/00 , C04B35/48
摘要： A process for the preparation of ceramic dental implants having a surface for improving osseointegration, wherein the following process steps are performed for preparing such surface: —preparation of a ceramic blank having a surface; —treating at least one partial area of the surface of the ceramic blank by an ablating process that produces a surface roughness of the surface that corresponds to a treatment by sand blasting under a blasting pressure of from 1.5 bar to 8 bar and with a grain size of the blasting media used for sand blasting of from 30 μm to 250 μm; —followed by a chemical treatment of said at least one partial area of the surface of the ceramic blank treated with the ablating process; —followed by a thermal treatment of the blank whose surface has been subjected to said ablating and chemical treatments at temperatures of >125° C. > A ceramic body obtainable by the process according to the invention is also described.
摘要翻译：一种用于制备具有用于改善骨整合的表面的陶瓷牙植入物的方法，其中进行以下工艺步骤以制备这种表面： - 制备具有表面的陶瓷坯料; 通过烧蚀过程来制造陶瓷坯料的表面的至少一个部分区域，该烧蚀过程产生对应于在1.5bar至8bar的喷砂压力下通过喷砂处理的表面的表面粗糙度，并且具有晶粒尺寸用于喷砂的喷砂介质为30μm至250μm; - 随后通过化学处理用烧蚀过程处理的陶瓷坯料的表面的所述至少一个部分区域; 随后通过在> 125℃的温度下对其表面进行了所述烧蚀和化学处理的坯料进行热处理。还描述了可通过本发明的方法获得的陶瓷体。

6. 发明申请

US20070151581A1 Cleaning method used in removing contaminants from a solid yttrium oxide-containing substrate 有权
标题翻译：用于从含固体含氧化钇的底物中除去污染物的清洁方法
公开(公告)号：US20070151581A1
公开(公告)日：2007-07-05
申请号：US11592905
申请日：2006-11-03
申请人： Xikun Wang , Li Xu , Jennifer Sun
发明人： Xikun Wang , Li Xu , Jennifer Sun
IPC分类号： B08B3/00
CPC分类号： C23C16/45565 , C04B41/009 , C04B41/5353 , C04B41/91 , C23C16/4404 , C23C16/4407 , C30B35/00 , H01J37/3244 , H01J37/32467 , H01J37/32862 , Y10T428/24273 , Y10T428/24314 , C04B35/505
摘要： Disclosed herein is a gas distribution plate for use in a gas distribution assembly for a processing chamber, where the gas distribution plate is fabricated from a solid yttrium oxide-comprising substrate, which may also include aluminum oxide. The gas distribution plate includes a plurality of through-holes, which are typically crescent-shaped. Through-holes which have been formed in the solid yttrium oxide-comprising substrate by ultrasonic drilling perform particularly well. The solid yttrium oxide-comprising substrate typically comprises at least 99.9% yttrium oxide, and has a density of at least 4.92 g/cm3, a water absorbency of about 0.02% or less, and an average grain size within the range of about 10 μm to about 25 μm. Also disclosed herein are methods for fabricating and cleaning the yttrium oxide-comprising gas distribution plate.
摘要翻译：本文公开了一种用于处理室的气体分配组件中的气体分配板，其中气体分配板由可能还包括氧化铝的固体含氧化钇衬底制成。气体分配板包括通常为月牙形的多个通孔。通过超声波钻孔在固体含氧化钇基质中形成的通孔特别好。固体含氧化钇的基材通常包含至少99.9％的氧化钇，并且具有至少4.92g / cm 3的密度，约0.02％或更低的吸水率和平均颗粒尺寸在约10um至约25um的范围内。本文还公开了用于制造和清洁含氧化钇气体分配板的方法。

7. 发明授权

US07115212B2 Method for etching 失效
标题翻译：蚀刻方法
公开(公告)号：US07115212B2
公开(公告)日：2006-10-03
申请号：US10455744
申请日：2003-06-06
申请人： Douglas McLean , Bernard Feldman
发明人： Douglas McLean , Bernard Feldman
IPC分类号： C23F1/16
CPC分类号： H01L31/1884 , C03C17/23 , C03C17/3417 , C03C2218/33 , C04B41/5353 , C09K13/04 , Y02E10/50
摘要： A method of etching a metal oxide film includes depositing a metal (M) on the metal oxide film and contacting the metal oxide film and the metal (M) with an etch liquid comprising an acid (A) and a metal dissolution agent (X). The method can avoid patchwise etch.
摘要翻译：蚀刻金属氧化物膜的方法包括在金属氧化物膜上沉积金属（M）并使金属氧化物膜和金属（M）与包含酸（A）和金属溶解剂（X）的蚀刻液接触，。该方法可避免贴片蚀刻。

8. 发明授权

US06916560B2 Silicon nitride based substrate for semi-conductor components 失效
标题翻译：用于半导体部件的氮化硅基基板
公开(公告)号：US06916560B2
公开(公告)日：2005-07-12
申请号：US10433632
申请日：2001-11-22
申请人： Gerhard Wötting , Peter Woditsch , Christian Hässler , Gunther Stollwerck
发明人： Gerhard Wötting , Peter Woditsch , Christian Hässler , Gunther Stollwerck
IPC分类号： C04B35/584 , C04B35/589 , C04B35/591 , C04B35/593 , C04B41/52 , C04B41/89 , H01L31/0392 , H01L31/04 , H01L31/18 , B32B9/04 , B32B18/00 , C04B35/565
CPC分类号： C04B41/009 , C04B35/589 , C04B35/591 , C04B35/5935 , C04B41/52 , C04B41/89 , C04B2111/00844 , H01L31/03921 , H01L31/1804 , Y02E10/547 , Y02P70/521 , C04B41/4531 , C04B41/5035 , C04B41/5066 , C04B41/524 , C04B41/0072 , C04B41/5096 , C04B41/5353 , C04B41/4529 , C04B41/5011 , C04B41/5041 , C04B35/584
摘要： The invention relates to a silicone nitride based substrate for semi-conductor components, said substrate containing silicon nitride (Si3N4), silicon carbide (SIC) and silicon oxynitride(Si2N2O) as crystalline phases. The silicon phase content is less or equal to 5%, the shrinkage during production is less than 5% and the open porosity of the substrate is less than 15% vol. %. The invention also relates to a method for the production and use of said substrate as an element of semi-conductor components, particularly thin film solar cells, and semi-conductor components which contain said substrate.
摘要翻译：本发明涉及一种用于半导体元件的基于硅氮化物的衬底，所述衬底包含作为结晶相的氮化硅（Si 3 N 4），碳化硅（SIC）和氮氧化硅（Si 2 N 2 O）。硅相含量小于或等于5％，生产过程中的收缩率小于5％，底材的开孔率小于15％体积。％。本发明还涉及一种用于生产和使用所述衬底作为半导体部件，特别是薄膜太阳能电池的元件的方法，以及包含所述衬底的半导体部件。

9. 发明申请

US20050056218A1 Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate 有权
标题翻译：由固体含氧化钇基底制成的气体分配板
公开(公告)号：US20050056218A1
公开(公告)日：2005-03-17
申请号：US10918232
申请日：2004-08-13
申请人： Jennifer Sun , Senh Thach , James Dempster , Li Xu , Thanh Pham
发明人： Jennifer Sun , Senh Thach , James Dempster , Li Xu , Thanh Pham
IPC分类号： C23C16/44 , C23C28/00 , C23C16/00
CPC分类号： C23C16/45565 , C04B41/009 , C04B41/5353 , C04B41/91 , C23C16/4404 , C23C16/4407 , C30B35/00 , H01J37/3244 , H01J37/32467 , H01J37/32862 , Y10T428/24273 , Y10T428/24314 , C04B35/505
摘要： Disclosed herein is a gas distribution plate for use in a gas distribution assembly for a processing chamber, where the gas distribution plate is fabricated from a solid yttrium oxide-comprising substrate, which may also include aluminum oxide. The gas distribution plate includes a plurality of through-holes, which are typically crescent-shaped. Through-holes which have been formed in the solid yttrium oxide-comprising substrate by ultrasonic drilling perform particularly well. The solid yttrium oxide-comprising substrate-typically comprises at least 99.9% yttrium oxide, and has a density of at least 4.92 g/cm3, a water absorbency of about 0.02% or less, and an average grain size within the range of about 10 μm to about 25 μm. Also disclosed herein are methods for fabricating and cleaning the yttrium oxide-comprising gas distribution plate.
摘要翻译：本文公开了一种用于处理室的气体分配组件中的气体分配板，其中气体分配板由可能还包括氧化铝的固体含氧化钇衬底制成。气体分配板包括通常为月牙形的多个通孔。通过超声波钻孔在固体含氧化钇基质中形成的通孔特别好。含固体氧化钇的基材通常包含至少99.9％的氧化钇，其密度为至少4.92g / cm 3，吸水率为约0.02％或更低，平均晶粒尺寸为约10毫米至约25毫米。本文还公开了用于制造和清洁含氧化钇气体分配板的方法。

10. 发明授权

US06861122B2 Ceramic member with fine protrusions on surface and method of producing the same 失效
标题翻译：表面具有微细突起的陶瓷构件及其制造方法
公开(公告)号：US06861122B2
公开(公告)日：2005-03-01
申请号：US10059133
申请日：2002-01-31
申请人： Kazuhide Kawai , Shunzo Shimai , Makoto Takahashi , Hiroaki Shitara , Fumio Tokuoka , Masahiko Ichishima , Takashi Suzuki , Toyokazu Matsuyama , Hideo Uemoto
发明人： Kazuhide Kawai , Shunzo Shimai , Makoto Takahashi , Hiroaki Shitara , Fumio Tokuoka , Masahiko Ichishima , Takashi Suzuki , Toyokazu Matsuyama , Hideo Uemoto
IPC分类号： C04B41/00 , C04B35/111 , C04B35/115 , C04B41/53 , C04B41/91 , C23C16/44 , B32B3/00 , C23F1/14
CPC分类号： C04B41/91 , C04B35/111 , C04B35/115 , C04B35/44 , C04B41/009 , C04B41/5353 , C04B2235/3225 , C04B2235/6582 , C04B2235/77 , C04B2235/963 , C23C16/4404 , Y10T428/24355 , Y10T428/24413 , Y10T428/249953 , Y10T428/31 , C04B35/00
摘要： The ceramic member of this invention is formed on the surfaces of crystal grains with a plurality of protrusions having smaller diameter than that of the crystal grain, said crystal grain composing at least the surface or its vicinity of a dense ceramic base material of purity being 95 wt % or higher. Such ceramic members may be produced by performing the surface of a dense ceramic base material with a corrosion treatment in an acid etchant, the dense ceramic base material having purity of 95 wt % or higher and exceeding 90% of a theoretical density, whereby ceramic grains existing on the surface or its vicinity of the base material are formed on the surface thereof with a plurality of protrusions.
摘要翻译：本发明的陶瓷构件形成在具有比晶粒小的直径的多个突起的晶粒表面上，至少构成纯度为95的致密陶瓷基材的表面或其附近的晶粒 wt％以上。这样的陶瓷构件可以通过在酸蚀刻剂中进行腐蚀处理的致密陶瓷基材的表面来制造，致密陶瓷基材的纯度为95重量％以上且超过理论密度的90％，由此陶瓷颗粒存在于基材的表面或其附近的表面上形成有多个突起。

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