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    • 5. 发明申请
    • PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS
    • 生产光催化剂聚合物的方法
    • US20100099836A1
    • 2010-04-22
    • US12645842
    • 2009-12-23
    • Hitoshi WATANABEHidetaka HayamizuMasaaki Kishimura
    • Hitoshi WATANABEHidetaka HayamizuMasaaki Kishimura
    • C08F24/00
    • C08F220/18C08F6/00C08F6/02C08F6/06G03F7/0397
    • Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
    • 具有对应于选自具有内酯骨架的单体(a)的单体的重复单元的反应单元的光致抗蚀剂聚合物的制造方法,具有通过用酸去除而变得易溶于碱的单体(b)和具有脂环族骨架的单体(c)具有 羟基。 方法包括(A)含有至少一种选自上述单体(a),(b)和(c)的单体的单体的混合物的聚合,和(B)通过使用有机溶剂和水来分离聚合中形成的聚合物 将形成的聚合物转化为有机溶剂层和金属组分杂质进入水层或通过聚合物溶液,其含有具有对应于上述单体(a),(b)和(c)中的至少一种的重复单元的聚合物和金属含量 其相对于包含具有阳离子交换基团的多孔聚烯烃膜的聚合物通过过滤器为1000ppb以下。 光致抗蚀剂聚合物的金属杂质含量极低。
    • 7. 发明授权
    • Process for the production of high-molecular compounds for photoresist
    • 用于制造光刻胶的高分子化合物的方法
    • US07015291B2
    • 2006-03-21
    • US10476211
    • 2003-03-14
    • Hitoshi WatanabeHidetaka HayamizuMasaaki Kishimura
    • Hitoshi WatanabeHidetaka HayamizuMasaaki Kishimura
    • C08F124/00
    • C08F220/18C08F6/00C08F6/02C08F6/06G03F7/0397
    • Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
    • 具有对应于选自具有内酯骨架的单体(a)的单体的重复单元的反应单元的光致抗蚀剂聚合物的制造方法,具有通过用酸去除而变得易溶于碱的单体(b)和具有脂环族骨架的单体(c)具有 羟基。 方法包括(A)含有至少一种选自上述单体(a),(b)和(c)的单体的单体的混合物的聚合,和(B)通过使用有机溶剂和水来分离聚合中形成的聚合物 将形成的聚合物转化为有机溶剂层和金属组分杂质进入水层或通过聚合物溶液,其含有具有对应于上述单体(a),(b)和(c)中的至少一种的重复单元的聚合物和金属含量 其相对于包含具有阳离子交换基团的多孔聚烯烃膜的聚合物通过过滤器为1000ppb以下。 光致抗蚀剂聚合物的金属杂质含量极低。
    • 9. 发明申请
    • Method for producing poly(p-t-butoxystyrene)
    • 聚(对叔丁氧基苯乙烯)的制备方法
    • US20020026023A1
    • 2002-02-28
    • US09935046
    • 2001-08-23
    • Takanori OkahashiHiroharu TakeshimaSeigo Ito
    • C08F112/02
    • C08F6/06C08L25/00
    • A method for producing poly(p-t-butoxystyrene), which comprise polymerizing p-t-butoxystyrene in a hydrocarbon type reaction solvent in the presence of a polymerization initiator, and, after termination of the polymerization reaction, conducting a separation of the hydrocarbon type reaction solvent layer containing poly(p-t-butoxystyrene) and the water layer in the presence of 1-50 parts by weight of a polar solvent per 100 parts by weight of the hydrocarbon type reaction solvent layer, wherein the separation efficiency, after termination of the polymerization reaction, of the hydrocarbon type reaction solvent layer containing poly(p-t-butoxystyrene) and the water or acidic water layer conspicuously improves.
    • 一种生产聚(对丁氧基苯乙烯)的方法,其包括在烃类反应溶剂中在聚合引发剂的存在下聚合叔丁氧基苯乙烯,并且在聚合反应结束后,进行烃类反应溶剂层 在每100重量份烃类反应溶剂层中,在1-50重量份极性溶剂存在下,含有聚(对丁氧基苯乙烯)和水层,其中分离效率在聚合反应结束后, 含有聚(对丁氧基苯乙烯)和水或酸性水层的烃类反应溶剂层明显改善。