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    • 5. 发明申请
    • POLYOL COMPOUND FOR PHOTORESIST
    • 用于光电子的聚合物化合物
    • US20110027725A1
    • 2011-02-03
    • US12935537
    • 2009-04-02
    • Kiyoharu TsutsumiYoshinori FunakiArimichi Okumura
    • Kiyoharu TsutsumiYoshinori FunakiArimichi Okumura
    • G03F7/20C08G65/38C08G8/02
    • C09D165/00C08G61/02C08G2261/342C08G2261/45C08L65/00G03F7/0392
    • A polyol compound for photoresists has at least one aliphatic group and at least one aromatic group bound to each other alternately, in which the aromatic group has at least one aromatic ring and two or more hydroxyl groups bound to the aromatic ring. The polyol compound for photoresists can be prepared through an acid-catalyzed reaction, such as a Friedel-Crafts reaction, between an aliphatic polyol and an aromatic polyol. The aliphatic polyol is preferably an alicyclic polyol. The aromatic polyol is preferably hydroquinone.By protecting phenolic hydroxyl group(s) thereof with a protecting group capable of leaving with an acid, the polyol compound for photoresists gives a compound for photoresists. A photoresist composition containing this compound can form a resist pattern which shows less line edge roughness (LER), excels in resolution and etching resistance, and is fine and sharp.
    • 用于光致抗蚀剂的多元醇化合物具有至少一个脂族基团和至少一个彼此结合的芳族基团,其中芳族基团具有至少一个芳族环和两个或更多个与芳环结合的羟基。 用于光致抗蚀剂的多元醇化合物可以通过在脂族多元醇和芳族多元醇之间的酸催化反应如Friedel-Crafts反应来制备。 脂族多元醇优选为脂环族多元醇。 芳族多元醇优选为氢醌。 通过用可与酸离去的保护基保护酚羟基,用于光致抗蚀剂的多元醇化合物得到光致抗蚀剂的化合物。 包含该化合物的光致抗蚀剂组合物可以形成显示较少线边缘粗糙度(LER)的抗蚀剂图案,分辨率和耐蚀刻性优异,并且细腻。