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    • 5. 发明申请
    • SPUTTERING TARGET AND PROCESS FOR PRODUCING SAME
    • 溅射目标及其生产方法
    • US20150014156A1
    • 2015-01-15
    • US14380610
    • 2013-02-15
    • MITSUBISHI MATERIALS CORPORATION
    • Shoubin ZhangKeita UmemotoMasahiro Shoji
    • H01J37/34B22F3/10C23C14/34
    • H01J37/3429B22F3/10B22F2201/20B22F2301/00B22F2999/00C22C1/0425C22C32/0089C23C14/0623C23C14/08C23C14/087C23C14/3414C23C14/35B22F3/1007
    • Provided is a sputtering target which contains Na in high concentration and, despite this, is inhibited from discoloration, generating spots, and causing abnormal electrical discharge and which has high strength and rarely breaks. Also provided is a method for producing the sputtering target. The sputtering target has a component composition that contains 10 to 40 at % of Ga and 1.0 to 15 at % of Na as metal element components other than F, S, and Se, with the remainder composed of Cu and unavoidable impurities, wherein the Na is contained in the form of at least one Na compound selected from sodium fluoride, sodium sulfide, and sodium selenide. The sputtering target has a theoretical density ratio of 90% or higher, a flexural strength of 100 N/mm2 or higher, and a bulk resistivity of 1 mΩ·cm or less. The number of 0.05 mm2 or larger aggregates of the at least one of sodium fluoride, sodium sulfide, and sodium selenide present per cm2 area of the target surface is 1 or less on average.
    • 提供了含有高浓度的Na的溅射靶,尽管如此,它被抑制变色,产生斑点,引起异常放电,并且具有高强度并且很少破裂。 还提供了一种溅射靶的制造方法。 溅射靶具有含有10〜40at%的Ga和1.0〜15at%的作为F,S,Se以外的金属元素的Na的组成成分,余量由Cu和不可避免的杂质组成,其中Na 含有选自氟化钠,硫化钠和硒化钠中的至少一种Na化合物的形式。 溅射靶的理论密度比为90%以上,弯曲强度为100N / mm 2以上,体积电阻率为1mΩ,OHgr·cm以下。 目标表面的每平方厘米面积存在的氟化钠,硫化钠和硒化钠中的至少一种的0.05mm 2以上聚集体的数量平均为1以下。
    • 8. 发明申请
    • Cu-BASED SINTERED SLIDING MEMBER
    • 基于Cu的烧结滑动构件
    • US20120145284A1
    • 2012-06-14
    • US13390883
    • 2010-08-27
    • Yoshinari IshiiTsuneo MaruyamaYoshiki Tamura
    • Yoshinari IshiiTsuneo MaruyamaYoshiki Tamura
    • C22C9/06
    • B22F3/26B22F1/007B22F3/12B22F5/00B22F2003/248B22F2301/10B22F2302/40B22F2302/45C22C1/0425C22C9/02C22C9/06C22C32/0084C22C32/0089F16C33/121
    • A Cu-based sintered sliding member that can be used under high-load conditions. The sliding member is age-hardened, including 5 to 30 mass % Ni, 5 to 20 mass % Sn, 0.1 to 1.2 mass % P, and the rest including Cu and unavoidable impurities. In the sliding member, an alloy phase containing higher concentrations of Ni, P and Sn than their average concentrations in the whole part of the sliding member, is allowed to be present in a grain boundary of a metallic texture, thereby achieving excellent wear resistance. Hence, without needing expensive hard particles, there can be obtained, at low cost, a Cu-based sintered sliding member usable under high-load conditions. Even more excellent wear resistance is achieved by containing 0.3 to 10 mass % of at least one solid lubricant selected from among graphite, graphite fluoride, molybdenum disulfide, tungsten disulfide, boron nitride, calcium fluoride, talc and magnesium silicate mineral powders.
    • 可在高负荷条件下使用的Cu基烧结滑动件。 滑动构件经时效硬化,其中包括5至30质量%的Ni,5至20质量%的Sn,0.1至1.2质量%的P,其余包括Cu和不可避免的杂质。 在滑动构件中,允许在金属组织的晶界中存在Ni,P和Sn的含量高于其在滑动构件的整个部分中的平均浓度的合金相,从而获得优异的耐磨性。 因此,在不需要昂贵的硬质颗粒的情况下,可以以低成本获得可在高负载条件下使用的Cu系烧结滑动构件。 通过含有0.3〜10质量%的选自石墨,氟化石墨,二硫化钼,二硫化钨,氮化硼,氟化钙,滑石粉和硅酸镁矿物粉末中的至少一种固体润滑剂,可以获得更优异的耐磨性。