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1. 发明授权

US09546801B2 Solar-thermal conversion member, solar-thermal conversion device, and solar thermal power generation device comprising a β-FeSi2 phase material 有权
标题翻译：太阳能热转换构件，太阳能热转换装置和包含β-FeSi 2相材料的太阳能热发电装置
公开(公告)号：US09546801B2
公开(公告)日：2017-01-17
申请号：US14357777
申请日：2012-11-09
申请人： Akinori Sato , Yoshiki Okuhara , Seiichi Suda , Daisaku Yokoe , Takeharu Kato , Toru Sasatani
发明人： Akinori Sato , Yoshiki Okuhara , Seiichi Suda , Daisaku Yokoe , Takeharu Kato , Toru Sasatani
IPC分类号： F24J2/48 , F24J2/46 , C23C14/06 , C23C14/16 , F03G6/06
CPC分类号： F24S70/10 , C23C14/0682 , C23C14/0688 , C23C14/165 , F03G6/06 , F24S70/20 , F24S70/25 , F24S70/30 , F24S2080/01 , F24S2080/011 , Y02E10/46
摘要： A solar-thermal conversion member includes a β-FeSi2 phase material. The solar-thermal conversion member exhibits a high absorptance for visible light at wavelengths of several hundred nm and a low absorptance for infrared light at wavelengths of several thousand nm and, as a consequence, efficiently absorbs visible light at wavelengths of several hundred nm and converts the same into heat and exhibits little thermal radiation due to thermal emission at temperatures of several hundred ° C. The solar-thermal conversion member may therefore efficiently absorb sunlight, provide heat, and prevent thermal radiation due to thermal emission.
摘要翻译：太阳能热转换构件包括β-FeSi 2相材料。太阳能热转换构件对波长为几百nm的可见光具有高吸收率，对于波长为几千nm的红外光具有低吸收率，因此，有效地吸收波长为几百nm的可见光并转换同样的热量并且由于几百℃的温度下的热发射而表现出很少的热辐射。因此，太阳能 - 热转换构件可以有效地吸收阳光，提供热量并防止由于热发射引起的热辐射。

2. 发明授权

US09528180B2 Sliding component coated with metal-comprising carbon layer for improving wear and friction behavior by tribological applications under lubricated conditions 有权
标题翻译：涂有含金属碳层的滑动部件，用于在润滑条件下通过摩擦学应用改善磨损和摩擦性能
公开(公告)号：US09528180B2
公开(公告)日：2016-12-27
申请号：US14002412
申请日：2012-03-01
申请人： Jürgen Becker , Martin Grischke , Astrid Gies
发明人： Jürgen Becker , Martin Grischke , Astrid Gies
IPC分类号： C23C14/06 , C23C14/14 , C23C14/02 , C23C14/35 , C23C14/50 , F04B1/14 , F04B1/20 , F04B27/08 , F04B27/10
CPC分类号： C23C14/14 , C23C14/021 , C23C14/025 , C23C14/027 , C23C14/0605 , C23C14/0664 , C23C14/067 , C23C14/0682 , C23C14/0688 , C23C14/352 , C23C14/505 , F04B1/146 , F04B1/2078 , F04B27/086 , F04B27/109 , F05C2201/0496 , F05C2203/0808 , F05C2203/086 , F05C2251/14
摘要： The present invention relates to a coating for sliding parts that allows using diamond like carbon (DLC) or DLC-comprising coatings in combination with Molybdenum- and/or Zinc-comprising lubricants in such a manner that enhanced reduction of wear and friction in comparison to the state of the art is attained. The coating system according to the present invention comprises at least a metal-comprising carbon layer of the type Me-C/a)-C:X, whose element composition can be expressed as (MeaC1-a)1-bXb with 0.3≦a≦0.6 and 0
摘要翻译：本发明涉及一种用于滑动部件的涂层，其允许使用类金刚石碳（DLC）或含DLC的涂层与含钼和/或含锌的润滑剂结合使用，以增加磨损和摩擦的降低，相比之下达到了现有技术水平。根据本发明的涂覆体系至少包含Me-C / a）-C：X型金属的碳层，其元素组成可以表示为（MeaC1-a）1-bXb，0.3≤a ≤0.6和0

3. 发明申请

US20160340774A1 METHOD OF COATING A SUBSTRATE SO AS TO PROVIDE A CONTROLLED IN-PLANE COMPOSITIONAL MODULATION 审中-公开
公开(公告)号：US20160340774A1
公开(公告)日：2016-11-24
申请号：US15113099
申请日：2014-02-13
申请人： MIMSI MATERIALS AB
发明人： Konstantinos Sarakinos , Daniel Magnfalt
IPC分类号： C23C14/34 , C23C14/32 , C23C14/06 , C23C14/28
CPC分类号： C23C14/3485 , C23C14/0641 , C23C14/0688 , C23C14/28 , C23C14/325 , C23C14/3464
摘要： The present disclosure provides a method of coating a substrate so as to provide a controlled in-plane compositional modulation. The method comprises providing a first target of a first material or material composition, providing a second target (104, 204, 304) of a second material or material composition, different from the first material or material composition; activating the first and second targets (103, 104; 203 204; 303, 304) to release particles by evaporation, sublimation or sputtering; and causing the released particles to impinge onto the substrate (102, 202, 302) such that the substrate is coated. Activation of one of the targets (103, 104; 203 204; 303, 304) includes providing a series of activation pulses, such that pulsed evaporation, sublimation or sputtering of particles is provided, while the other one of the targets (103, 104; 203 204; 303, 304) is substantially passive. The first and second target materials or material compositions present a respective homologous temperature, defined as a ratio (Ts/Tmi) of the substrate temperature (Ts) to the target material melting temperature (Tmi) of the target material (i) having the lowest melting temperature (Tmi), a miscibility (ΔHmixAB), as defined by a mixing enthalpy of the target materials or material compositions, wherein the mixing enthalpy of the materials greater than zero is defined as immiscible and a mixing enthalpy of the materials less than zero is defined as miscible; and a two-dimensional or three-dimensional growth mode. In the method, the homologous temperature is greater than 0.1 and less than 0.5 and the amount of material deposited per pulse train from each target material is greater than 0.1 monolayer and less than 100 monolayers, preferably less than 50 monolayers, less than 10 monolayers or less than 2 monolayers.

4. 发明申请

US20160289816A1 ELECTROMAGNETIC SHIELD 审中-公开
标题翻译：电磁屏蔽
公开(公告)号：US20160289816A1
公开(公告)日：2016-10-06
申请号：US14778503
申请日：2014-03-20
申请人： NORITAKE CO., LIMITED , NORITAKE ITRON CORPORATION
发明人： Hitoshi TSUJI , Tadami MAEDA , Isamu KANDA
IPC分类号： C23C14/18 , C23C14/00 , C23C14/58 , H05K9/00 , C23C14/24
CPC分类号： C23C14/185 , C23C14/0036 , C23C14/06 , C23C14/0688 , C23C14/24 , C23C14/34 , C23C14/5873 , H05K9/0084 , H05K9/0094 , H05K9/0096
摘要： There is provided an inexpensive electromagnetic shield that can achieve exceptional shielding and display visibility characteristics, and provide high environmental resistance as necessary. In an electromagnetic shield (1), an intermediate layer (3) is formed on a glass substrate (2) comprising soda lime glass, an electroconductive layer (4) of Al is formed thereon, and openings (5) are formed by wet etching on the intermediate layer (3) and the electroconductive layer (4) after these layers have been formed by sputtering or vacuum deposition. Furthermore, an ITO layer (6) is formed on the entire glass surface including the intermediate layer (3) and the electroconductive layer (4) after the openings (5) are formed. In this configuration, the intermediate layer (3) comprises a mixture of at least one metal selected from chromium, molybdenum, and tungsten, and at least one oxide selected from oxides of silicon, oxides of aluminum, and oxides of titanium.
摘要翻译：提供了一种廉价的电磁屏蔽，可以实现卓越的屏蔽和显示可视性，并根据需要提供高耐环境性。在电磁屏蔽（1）中，在包括钠钙玻璃的玻璃基板（2）上形成中间层（3），在其上形成有Al的导电层（4），并且通过湿蚀刻形成开口（5）在通过溅射或真空沉积形成这些层之后，在中间层（3）和导电层（4）上。此外，在形成开口（5）之后，在包括中间层（3）和导电层（4）的整个玻璃表面上形成ITO层（6）。在该构造中，中间层（3）包含选自铬，钼和钨中的至少一种金属和选自硅氧化物，铝的氧化物和钛的氧化物的至少一种氧化物的混合物。

5. 发明申请

US20160177430A1 ZR-GROUP AMORPHOUS ALLOY COMPOSITION 审中-公开
标题翻译： ZR族非晶态合金组成
公开(公告)号：US20160177430A1
公开(公告)日：2016-06-23
申请号：US14787030
申请日：2014-06-05
申请人： KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
发明人： Seungyong SHIN , Kyoungil MOON , Juhyun SUN , Changhun LEE
IPC分类号： C22C45/10 , B22D21/06 , H01M8/0208 , B22D21/00
CPC分类号： C23C14/0036 , B22D13/06 , B22D18/00 , B22D21/005 , B22D21/06 , B22F9/082 , B22F2009/0848 , B82B1/00 , B82Y30/00 , C22C1/002 , C22C16/00 , C22C45/10 , C22F1/186 , C23C14/0688 , C23C14/14 , C23C14/165 , C23C14/34 , C23C14/3414 , H01J37/3429 , H01M8/0208
摘要： The purpose of the present invention is to provide a highly corrosion-resistant Zr-group amorphous alloy composition containing a higher Zr content compared to existing amorphous alloys, and comprising only commercial metal elements, and thereby has superior industrial and economic utility and is easily rendered practical. According to one aspect of the present invention, provided is the Zr-group amorphous alloy composition comprising: 67-78 atomic percent of Zr; 4-13 atomic percent of Al and/or Co; 15-24 atomic percent of Cu and/or Ni, wherein glass forming ability of the Zr-group amorphous alloy composition is at least 0.5 mm.
摘要翻译：本发明的目的是提供一种与现有的非晶合金相比含有较高Zr含量的高耐腐蚀性的Zr基非晶合金组合物，并且仅包含商业金属元素，从而具有优异的工业和经济效用并且易于形成实际的。根据本发明的一个方面，提供了Zr基非晶合金组合物，其包含：67-78原子％的Zr; 4-13原子％的Al和/或Co; 15-24原子％的Cu和/或Ni，其中Zr族非晶合金组合物的玻璃形成能力为至少0.5mm。

6. 发明授权

US09309149B2 Systems, methods, and apparatus for production coatings of low-emissivity glass 有权
标题翻译：低辐射玻璃生产涂料的系统，方法和装置
公开(公告)号：US09309149B2
公开(公告)日：2016-04-12
申请号：US14144828
申请日：2013-12-31
申请人： Intermolecular Inc.
发明人： Guowen Ding , Brent Boyce , Jeremy Cheng , Jose Ferreira , Muhammad Imran , Minh Huu Le , Daniel Schweigert , Yu Wang , Yongli Xu , Guizhen Zhang
IPC分类号： C03C17/36 , C03C17/34 , C03C25/22 , C23C14/08 , C23C14/06 , C23C14/00
CPC分类号： C03C17/366 , C03C17/3435 , C03C17/36 , C03C17/3613 , C03C17/3618 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/3681 , C03C25/226 , C03C2218/155 , C23C14/0036 , C23C14/0652 , C23C14/0688 , C23C14/083 , C23C14/086
摘要： Disclosed herein are systems, methods, and apparatus for forming a low emissivity panel. In various embodiments, a partially fabricated panel may be provided. The partially fabricated panel may include a substrate, a reflective layer formed over the substrate, and a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the substrate and the top dielectric layer. The top dielectric layer may include tin having an oxidation state of +4. An interface layer may be formed over the top dielectric layer. A top diffusion layer may be formed over the interface layer. The top diffusion layer may be formed in a nitrogen plasma environment. The interface layer may substantially prevent nitrogen from the nitrogen plasma environment from reaching the top dielectric layer and changing the oxidation state of tin included in the top dielectric layer.
摘要翻译：本文公开了用于形成低发射率面板的系统，方法和装置。在各种实施例中，可以提供部分制造的面板。部分制造的面板可以包括衬底，在衬底上形成的反射层，以及形成在反射层上的顶部电介质层，使得反射层形成在衬底和顶部电介质层之间。顶部电介质层可以包括具有+4的氧化态的锡。界面层可以形成在顶部介电层上。可以在界面层上形成顶部扩散层。顶部扩散层可以在氮等离子体环境中形成。界面层可以基本上防止来自氮等离子体环境的氮到达顶部电介质层并改变顶部电介质层中包含的锡的氧化态。

7. 发明申请

US20160035569A1 PHYSICAL VAPOR DEPOSITION OF LOW-STRESS NITROGEN-DOPED TUNGSTEN FILMS 有权
标题翻译：低应力氮掺杂膜的物理气相沉积
公开(公告)号：US20160035569A1
公开(公告)日：2016-02-04
申请号：US14445911
申请日：2014-07-29
申请人： Lam Research Corporation
发明人： Michael Rumer , Michael Ng
IPC分类号： H01L21/033 , C23C14/54 , H01L21/027
CPC分类号： C23C14/0084 , C23C14/0036 , C23C14/0641 , C23C14/0688 , C23C14/185 , H01J37/3408 , H01J37/3426 , H01L21/31144 , H01L21/32051 , H01L27/11556 , H01L27/11582
摘要： Nitrogen-doped tungsten films characterized by low stress (e.g. less than 250 MPa) and excellent adhesion to an underlying dielectric layer are deposited by physical vapor deposition (PVD). The films can be used as hardmask layers in fabrication of 3D memory stacks and can be deposited directly onto a top dielectric layer in a stack of layers. The low stress films are characterized by higher concentration of nitrogen at the interface with the dielectric layer than in the bulk of the film, and have a nitrogen content of between about 5-20% atomic. The films having a thickness of between about 300-900 nm can be deposited in a PVD process chamber by forming a plasma in a process gas comprising a noble gas and nitrogen, where the flow rate of nitrogen is between about 10-17% of the total flow rate of the process gas.
摘要翻译：通过物理气相沉积（PVD）沉积特征在于低应力（例如小于250MPa）和对下面的介电层的优异粘附性的氮掺杂钨膜。这些膜可以用作制造3D存储器堆叠的硬掩模层，并且可以直接沉积在层叠的顶部介电层上。低应力膜的特征在于在与介电层的界面处的氮的浓度高于膜的主体中的氮浓度，并且具有约5-20％原子的氮含量。通过在包括惰性气体和氮气的工艺气体中形成等离子体，可以在PVD工艺室中沉积厚度在约300-900nm之间的膜，其中氮气的流量介于约10-17％之间工艺气体的总流量。

8. 发明申请

US20140322837A1 Method of Forming Nanocrystals and Method of Manufacturing an Organic Light-Emitting Display Apparatus Including a Thin Film Having Nanocrystals 有权
标题翻译：形成纳米晶体的方法和制造包含具有纳米晶体的薄膜的有机发光显示装置的方法
公开(公告)号：US20140322837A1
公开(公告)日：2014-10-30
申请号：US13975259
申请日：2013-08-23
申请人： Samsung Display Co., Ltd.
发明人： Myung-Soo Huh , Suk-Won Jung , Tae-Wook Kang
IPC分类号： H01L51/56
CPC分类号： H01L51/56 , C23C14/0688 , C23C14/08 , C23C14/3464 , C23C14/352 , H01L51/5253
摘要： A method of forming nanocrystals includes loading a substrate into a chamber, applying a first voltage to a first target to form a thin film including a first metal compound on the substrate by sputtering, and applying a second voltage to a second target and forming nanocrystals in the thin film by sputtering.
摘要翻译：形成纳米晶体的方法包括将衬底加载到腔室中，向第一靶施加第一电压以通过溅射在衬底上形成包括第一金属化合物的薄膜，以及向第二靶施加第二电压并在第该薄膜通过溅射。

9. 发明申请

US20140295128A1 HARD AND LOW FRICTION NITRIDE COATINGS 审中-公开
标题翻译：硬和低摩擦的氮化物涂料
公开(公告)号：US20140295128A1
公开(公告)日：2014-10-02
申请号：US13992466
申请日：2010-12-08
申请人： Frank Sykora , Ali Erdemir , Mustafa Urgen , Osman Levent Eryilmaz
发明人： Frank Sykora , Ali Erdemir , Mustafa Urgen , Osman Levent Eryilmaz
IPC分类号： C23C14/35 , C23C14/06 , C23C14/58
CPC分类号： C23C14/35 , C23C14/0641 , C23C14/0688 , C23C14/3414 , C23C14/5873 , Y10T428/239
摘要： A hard, wear resistant coating and a method of forming the coating on a substrate to be exposed to hydrocarbons is provided. A substrate is provided in a chamber. A film is deposited onto the substrate by physical vapor deposition (PVD), where the film includes a bulk layer and an outer termination layer. The deposition of the termination layer is mitigated. The termination layer is removed from the film, leaving the remaining bulk layer disposed over the substrate. And when the substrate is exposed to hydrocarbons in an environment having wear additives, friction modifiers, or naturally occurring compounds, a durable tribological layer is formed on an outer surface of the bulk layer to create a coating having low friction and anti-wear properties.
摘要翻译：提供了耐磨损的涂层以及在基板上形成待暴露于烃的涂层的方法。衬底设置在腔室中。通过物理气相沉积（PVD）将薄膜沉积在基底上，其中薄膜包括体层和外终端层。终止层的沉积得到缓解。将终止层从膜上除去，留下剩余的体层设置在衬底上。并且当在具有磨损添加剂，摩擦改进剂或天然存在的化合物的环境中将基材暴露于烃类时，在本体层的外表面上形成耐用的摩擦学层，以产生具有低摩擦和抗磨损性能的涂层。

10. 发明申请

US20140127391A1 ULTRAVIOLET ACTIVATED ANTIMICROBIAL SURFACES 有权
标题翻译：超紫外线激活抗微生物表面
公开(公告)号：US20140127391A1
公开(公告)日：2014-05-08
申请号：US14149271
申请日：2014-01-07
申请人： METASCAPE, LLC
发明人： TERRENCE S. MCGRATH , DEIDRE SEWELL , DANIEL M. STOREY
IPC分类号： A61L29/10
CPC分类号： A61L29/16 , A61L29/042 , A61L29/085 , A61L29/106 , A61L2300/102 , A61L2300/104 , A61L2300/404 , A61L2300/606 , C02F1/32 , C23C4/10 , C23C14/0688 , C23C14/18 , C23C14/205 , C23C14/30 , C23C14/325 , C23C14/34 , C23C14/54
摘要： The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultraviolet light significantly improves the antimicrobial properties of the deposited coatings.
摘要翻译：本发明涉及一种适于用高粘附抗微生物膜涂覆聚合物表面的离子等离子体沉积（IPD）方法。使用受控离子等离子体沉积（IPD）方法用选定的金属/金属氧化物涂覆金属或聚合物。将涂覆的表面暴露于紫外光下显着提高了沉积涂层的抗菌性能。

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