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1. 发明申请

US20190204119A1 SCALE AND MANUFACTURING METHOD OF THE SAME 审中-公开
公开(公告)号：US20190204119A1
公开(公告)日：2019-07-04
申请号：US16229992
申请日：2018-12-21
申请人： MITUTOYO CORPORATION
发明人： Toshihiko Aoki
IPC分类号： G01D5/347 , G01D5/38 , G02B5/18
CPC分类号： G01D5/34707 , G01D5/38 , G02B5/1857 , G02B5/1861
摘要： A scale includes: a substrate; a first metal layer formed on the substrate; a second metal layer formed on the first metal layer; and scale gratings that are formed on the second metal layer and have a plurality of metal gratings at a predetermined interval, wherein the first metal layer is made of a first metal, wherein the second metal layer is made of a second metal, wherein adhesion of the first metal with the substrate is higher than adhesion of the second metal with the substrate, and wherein a reflectivity of the second metal with respect to a wavelength of a used light is higher than a reflectivity of the first metal layer with respect to the wavelength of the used light.

2. 发明授权

US10060731B2 Optical position-measuring device 有权
公开(公告)号：US10060731B2
公开(公告)日：2018-08-28
申请号：US15823604
申请日：2017-11-28
申请人： DR. JOHANNES HEIDENHAIN GmbH
发明人： Gotthard Lepperdinger
IPC分类号： G01B11/14 , G01D5/347 , G02B26/10 , G01D5/38
CPC分类号： G01B11/14 , G01D5/34723 , G01D5/38 , G02B26/106
摘要： An optical position-measuring device includes a measuring graduation having a measuring graduation period and a scanner movable relative to the measuring graduation. The scanner projects a light pattern having alternating bright and dark regions with a light pattern period onto the measuring graduation. The measuring graduation period differs from the light pattern period such that interaction of the light pattern with the measuring graduation produces a vernier pattern having bright regions and dark regions. The measuring graduation is a phase grating having a line-to-space ratio different from 1:1 and a phase shift between lines and spaces selected such that the zeroth diffraction order is suppressed. The position-measuring device is configured such that, at a position at which the zeroth diffraction order of a bright region is suppressed, a higher diffraction order is deflected and impinges on a detector array in a bright region of the vernier pattern.

3. 发明申请

US20180209821A1 POSITION-MEASURING DEVICE 审中-公开
公开(公告)号：US20180209821A1
公开(公告)日：2018-07-26
申请号：US15830945
申请日：2017-12-04
申请人： DR. JOHANNES HEIDENHAIN GmbH
发明人： Wolfgang Holzapfel , Christoph Lingk , Johannes Trautner
IPC分类号： G01D5/347
CPC分类号： G01D5/3473 , G01D5/34715 , G01D5/38
摘要： In a position-measuring device for determining the position of a first object with respect to a second object that is displaceable relative to the first object, a measuring standard is connected to the first object and includes at least one periodic scale grating, which is arranged as a transmission grating and has a first periodicity. A scanning unit is connected to the second object and includes at least one light source, at least one periodic scanning grating, which has a second periodicity, and a detector system, which includes detector regions that are sensitive to radiation and are periodically disposed at a third periodicity in a detection plane. The bundles of rays emitted by the light source first impinge upon the scale grating and then pass through the scanning grating. The interaction of the bundles of beams with the scale grating and the scanning grating produces a periodic fringe pattern having the third periodicity in the detection plane which, when scanned with the aid of the detector system, makes it possible to generate a plurality of incremental signals that are phase-shifted relative to one another. The scanning grating is arranged between at least one first and one second transparent, plate-shaped carrier element, and the space between the scanning grating and the detector regions is completely filled with a material that has a refractive index of n>1.3. The clearance between the scale grating and the adjacent boundary surface of the first carrier element is in the range of 10 μm to 200 μm.

4. 发明授权

US09983028B2 Measurement method and encoder device, and exposure method and device 有权
公开(公告)号：US09983028B2
公开(公告)日：2018-05-29
申请号：US14397312
申请日：2013-03-14
申请人： NIKON CORPORATION
发明人： Zhigiang Liu
IPC分类号： G01B11/00 , G01B11/02 , G01B11/14 , G03B27/32 , G03B27/58 , G03B27/62 , H02K7/00 , H02K41/02 , G01D5/347 , G01D5/38 , G02B5/18 , G03F7/20
CPC分类号： G01D5/347 , G01D5/38 , G02B5/1861 , G03F7/20
摘要： There is provided an encoder device to measure a relative moving amount between a first and second members. The encoder device includes: a reflective-type diffraction grating on the first member; a light source unit to radiate a measuring light; a first optical member on the second member; a first and second reflecting units on the second member that cause first and third diffracted lights generated via diffraction of the measuring light and having orders different from each other to come into the diffraction grating respectively, and cause second and fourth diffracted lights generated via diffraction of the first and third diffracted lights respectively to come into the first optical member; photo-detectors configured to detect interference lights between two diffracted lights and other light beam respectively; and a measuring unit to obtain the relative moving amount by using detection signals from the photo-detectors.

5. 发明申请

US20180128653A1 TRANSPARENT-BLOCK ENCODER HEAD WITH ISOTROPIC WEDGED ELEMENTS 审中-公开
公开(公告)号：US20180128653A1
公开(公告)日：2018-05-10
申请号：US15866696
申请日：2018-01-10
申请人： NIKON CORPORATION
发明人： Eric Peter Goodwin
IPC分类号： G01D5/26 , G01D5/38 , G01D5/347 , G03F7/20
CPC分类号： G01D5/266 , G01D5/34715 , G01D5/38 , G03F7/70775 , H01L21/681
摘要： An encoder head configured for use with a lithographic exposure tool. The head is devoid of a multiplicity of stand-alone optical retroreflectors. The head includes a single, geometrically substantially perfect optically-isotropic cuboid complemented with optically-isotropic prismatic elements to form a contraption that, in combination with a diffraction grating disposed on a wafer-stage of the exposure tool, splits a single input beam of light delivered to the contraption into four measurement (sub-)beams of light (two in xz-plane, two in yz-plane) and causes each of these sub-beams traverse two prismatic elements and be retro-reflected internally within the cuboid to exit the encoder head at a non-zero angle with respect to the input beam of light, thereby solving problems of (i) structural complexity of a conventional encoder head for use in an exposure tool, (ii) burdensome alignment of the multitude of optical prisms in the process of forming such encoder head, and (iii) cyclic non-linear errors associated with measurements involving conventional corner-cubes-based encoder heads while, at the same time, reducing the geometrical footprint of the encoder head (without reducing the cross-section of the single input beam).

6. 发明授权

US09952068B2 Optical element 有权
公开(公告)号：US09952068B2
公开(公告)日：2018-04-24
申请号：US14651495
申请日：2013-10-15
申请人： RENISHAW PLC
发明人： Jason Kempton Slack
IPC分类号： G01D5/38 , G01D5/36
CPC分类号： G01D5/38 , G01D5/366
摘要： An optical element for generating diffraction orders for an encoder apparatus, in which the optical element includes an array of diffraction features arranged such that the spacing between the centers of adjacent diffraction features varies irregularly from one pair of adjacent features to the next.

7. 发明授权

US09885556B2 Dual-frequency grating interferometer displacement measurement system 有权
公开(公告)号：US09885556B2
公开(公告)日：2018-02-06
申请号：US14441828
申请日：2013-10-28
申请人： TSINGHUA UNIVERSITY
发明人： Yu Zhu , Ming Zhang , Leijie Wang , Jinchun Hu , Longmin Chen , Kaiming Yang , Dengfeng Xu , Wensheng Yin , Haihua Mu
IPC分类号： G01B9/02 , G01D5/26 , G01D5/38 , G01B11/14
CPC分类号： G01B9/02007 , G01B9/02049 , G01B11/14 , G01D5/266 , G01D5/38
摘要： A dual-frequency grating interferometer displacement measurement system, comprises a dual-frequency laser, an interferometer, a measurement grating and an electronic signal processing component. The measurement system realizes displacement measurement based on grating diffraction, optical Doppler effect and optical beat frequency theory. Dual-frequency laser light is emitted from the dual-frequency laser and split into reference light and measurement light via a polarization spectroscope. The measurement light is incident to the measurement grating to generate positive and negative first-order diffraction. The diffraction light and the reference light form a beat frequency signal containing displacement information about two directions at a photo-detection unit, and linear displacement output is realized after signal processing. The measurement system can realize sub-nanometer and even higher resolution and accuracy, and is able to measure long horizontal displacement and vertical displacement at the same time.

8. 发明申请

US20170329217A1 POSITION DETECTOR, POSITION DETECTION METHOD, IMPRINT APPARATUS, AND PRODUCT MANUFACTURING METHOD 审中-公开
公开(公告)号：US20170329217A1
公开(公告)日：2017-11-16
申请号：US15583822
申请日：2017-05-01
申请人： CANON KABUSHIKI KAISHA
发明人： Ken Minoda , Takafumi Miyaharu
IPC分类号： G03F7/00 , G01D5/38 , G05B19/19
CPC分类号： G03F7/0002 , G01D5/38 , G03F9/7042 , G05B19/19 , G05B2219/37558
摘要： A position detector includes a detection unit configured to detect light from a first diffraction grating including a first pattern disposed in a first direction, and light from a second diffraction grating including a second pattern disposed in the first direction, and a control unit configured to obtain a relative position between the first and the second diffraction gratings based on the light detected by the detection unit. The position detector has a third pattern formed in a second direction different from the first direction at edges of the first pattern of the first diffraction grating, the third pattern has a width smaller than a width of the first pattern of the first diffraction grating.

9. 发明授权

US09810521B2 Displacement detection apparatus 有权
公开(公告)号：US09810521B2
公开(公告)日：2017-11-07
申请号：US15008086
申请日：2016-01-27
申请人： DMG MORI SEIKI CO., LTD.
发明人： Akinori Suzuki , Masayuki Niiya , Kenji Matsushita , Terukazu Nishida , Hideaki Tamiya , Kayoko Taniguchi
IPC分类号： G01B11/00 , G01B9/02 , G01D5/38
CPC分类号： G01B11/002 , G01B9/0209 , G01D5/38
摘要： A displacement detection apparatus capable of stably and accurately detecting the amount of displacement. The length of a polarization maintaining fiber for transmitting the light from a light source to a displacement detector is set not to be equal to a length obtained by dividing, by the wavelength of the light source, a product of an even integral multiple of a length, which is obtained by multiplying twice the length of a resonator by the refractive index of the resonator, and a beat length obtained by a difference between the propagation constants of two polarization modes. Alternatively, the length of the polarization maintaining fiber is set to be larger than a length, which is obtained by dividing, by the wavelength of the light source, a product of a coherence length and a beat length obtained from a difference between the propagation constants of two polarization modes.

10. 发明授权

US09766098B2 Optical position measuring instrument 有权
公开(公告)号：US09766098B2
公开(公告)日：2017-09-19
申请号：US13068659
申请日：2011-05-16
申请人： Wolfgang Holzapfel , Michael Hermann , Karsten Sändig
发明人： Wolfgang Holzapfel , Michael Hermann , Karsten Sändig
IPC分类号： G01B11/02 , G01N21/41 , G01B11/30 , G01D5/347 , G01D5/38
CPC分类号： G01D5/347 , G01D5/3473 , G01D5/38
摘要： An optical position measuring instrument including a scale and a scanning unit, wherein the scanning unit and the scale are movable with respect to one another. The scanning unit includes a detector unit, and a reflector unit that has a first and second wave front correctors and a beam direction inverter. The reflector unit is disposed so that beams first pass through the scale and the first wave front corrector, then a back-reflection of partial beams is effected in a direction of the scale, and the partial beams then pass through the scale and the second wave front corrector before the partial beams then arrive at the detector unit, wherein it is ensured that wave front deformations of the partial beams are converted into wave front deformations that compensate for resultant wave front deformations of the partial beams upon a second diffraction at the scale.

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