专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20190107782A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20190107782A1
公开(公告)日：2019-04-11
申请号：US16200971
申请日：2018-11-27
申请人： NIKON CORPORATION
发明人： Yuichi SHIBAZAKI
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70108 , G03F7/70058 , G03F7/70191 , G03F7/70516 , G03F7/70725 , G03F7/70758 , G03F7/70775 , G03F7/70975 , G03F9/70 , G03F9/7046 , Y10T29/49004
摘要： A movement area of a stage includes first-fifth areas. In the first area, three of four heads except for a first head respectively face three of four sections of a scale member except for a first section. In the second area, three of four heads except for a second head respectively face three of four sections except for a second section of the scale member. In the third area, three of four heads except for a third head respectively face three of four sections except for a third section of the scale member. In the fourth area, three of four heads except for a fourth head respectively face three of four sections of the scale member. In the fifth area, the four heads respectively face the four sections. The stage is moved from one of the first-fourth areas to another of those areas via the fifth area.

2. 发明申请

US20190094701A1 EXPOSURE METHOD AND EXPOSURE DEVICE 审中-公开
公开(公告)号：US20190094701A1
公开(公告)日：2019-03-28
申请号：US16138006
申请日：2018-09-21
申请人： Mitutoyo Corporation
发明人： Motonori Ogihara
IPC分类号： G03F7/20
CPC分类号： G03F7/7055 , G03F7/7015 , G03F7/70775 , G03F7/709
摘要： An exposure method for projecting a pattern on an exposure mask onto a work by an exposure control of an exposure light including calculating an exposure position on the work from a relative positional relationship of the exposure mask and the work, setting a range acceptable for projecting the pattern even when the exposure position is off a target exposure position on the work as an exposure position range, and (3) executing an exposure control that irradiates the exposure light to the exposure mask when the exposure position is in the exposure position range, and that stops the exposure light when the exposure position is out of the exposure position range.

3. 发明申请

US20190033057A1 INTERFEROMETER MEASUREMENT DEVICE AND CONTROL METHOD THEREFOR 审中-公开
公开(公告)号：US20190033057A1
公开(公告)日：2019-01-31
申请号：US16067328
申请日：2016-12-28
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
发明人： Xin SHEN
IPC分类号： G01B11/02 , G01B9/02
CPC分类号： G01B11/02 , G01B5/0004 , G01B9/02016 , G01B9/02027 , G01B9/02075 , G01B11/002 , G01B11/026 , G03F7/70775
摘要： An interferometer measuring device is disclosed which includes a workpiece stage (10), a laser interferometer (20) and a measuring reflector (30) mounted on the workpiece stage. The measuring reflector (30) is comprised of a plurality of planar mirrors (31) that are joined together along a horizontal direction. The laser interferometer (20) includes a first interferometer (21) and a second interferometer (22). The first interferometer (21) and the second interferometer (22) are configured such that during a horizontal movement of the workpiece stage (10) with respect to the laser interferometer (20), when light beams emanated from the first interferometer (21) and the second interferometer (22) are incident on a transition section (32) defined by corresponding adjacent two of the planar mirrors (31), the light beam emanated from the first interferometer (21) is incident on one of the adjacent two planar mirrors (31) and the light beam emanated from the second interferometer (22) is incident on the other of the adjacent two planar mirrors (31). Additionally, the first interferometer (21) and the second interferometer (22) alternately provide positional information to the workpiece stage (10). A method for controlling such an interferometer measuring device is also disclosed. The interferometer measuring device and the method enable an extended horizontal measurement range for the workpiece stage (10) by using the plurality of planar mirrors (31) that are joined together as well as by alternating zero-reference updating of the two interferometers (21, 22).

4. 发明申请

US20180323069A1 METHOD AND DEVICE FOR ALIGNING A FIRST SUBSTRATE WITH A SECOND SUBSTRATE 审中-公开
公开(公告)号：US20180323069A1
公开(公告)日：2018-11-08
申请号：US15970303
申请日：2018-05-03
申请人： SUSS MicroTec Lithography GmbH
发明人： Katrin Schindler
IPC分类号： H01L21/20 , H01L21/18 , H01L23/544 , H01L33/00 , C09J9/02
CPC分类号： H01L21/2007 , C09J9/02 , G03F7/70775 , G03F9/70 , G03F9/7088 , G03F9/7092 , H01L21/187 , H01L21/67259 , H01L21/68 , H01L21/681 , H01L23/544 , H01L33/0079
摘要： A method for aligning a first substrate, in particular a mask, with a second substrate, in particular a wafer, comprises inserting the first substrate and the second substrate into a positioning means; capturing at least one joint image of the first substrate and the second substrate; displaying the image; a plurality of image points in the image being marked by a user; and determining a control command for actuating the positioning means on the basis of the marked image points in such a way that the substrates are aligned with one another.

5. 发明申请

US20180321605A1 CONTROL METHOD OF MOVABLE BODY, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, MOVABLE BODY APPARATUS, AND EXPOSURE APPARATUS 审中-公开
公开(公告)号：US20180321605A1
公开(公告)日：2018-11-08
申请号：US16019662
申请日：2018-06-27
申请人： NIKON CORPORATION
发明人： Akihiro UEDA
IPC分类号： G03F9/00 , H01L21/027 , G03F7/20 , G03F7/30 , H01L21/68
CPC分类号： G03F9/7084 , G03F7/20 , G03F7/30 , G03F7/70775 , G03F9/7046 , H01L21/027 , H01L21/68
摘要： In a beam irradiation apparatus in which a movable body holds an object, a mark detection system detects a first mark on the movable body while moving the movable body in a first direction and changing an irradiation position of a measurement beam in the first direction, the mark detection system detects a second mark while moving the movable body in the first direction and changing the irradiation position of the measurement beam in the first direction, a controller controls a position of the movable body in a second direction intersecting the first direction during a time period between the detection of the first mark and the detection of the second mark, and the controller controls the movement of the movable body to adjust a positional relation between the object on the movable body and a processing beam, based on results of the detection of the first and second marks.

6. 发明申请

US20180299783A1 VIBRATION ISOLATION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：US20180299783A1
公开(公告)日：2018-10-18
申请号：US15767524
申请日：2016-10-26
申请人： ASML Netherlands B.V.
发明人： Alexander Petrus Josephus VAN LANKVELT , Ingmar August KERP , Richardus Simon Antonius OOSTVEEN , Marco Hendrikus Hermanus OUDE NIJHUIS , Robertus Mathijs Gerardus RIJS , Olav Johannes SEIJGER , Alexander Maurice STEENHOEK
IPC分类号： G03F7/20 , F16F15/02 , F16J15/52
CPC分类号： G03F7/709 , F16F15/02 , F16J15/52 , G03F7/70341 , G03F7/70775 , G03F7/70825 , G03F7/70833
摘要： The invention relates to a vibration isolation system (VIS) comprising:—a base (10);—a coupling element (20) to be coupled to a vibration sensitive object;—a vibration isolator (30-34) arranged between the base and the coupling element;—a bellows (50) to be arranged between the VIS coupling element or the vibration isolator and a protective housing (40) surrounding the vibration sensitive object; and—one or more separate damping elements to act on convolutions of the bellow,

7. 发明申请

US20180275531A1 CARRYING PLATFORM AND EXPOSURE METHOD 审中-公开
公开(公告)号：US20180275531A1
公开(公告)日：2018-09-27
申请号：US15790775
申请日：2017-10-23
申请人： BOE TECHNOLOGY GROUP CO., LTD. , ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
发明人： Chunlong YAN , Jianjun LI , Xin BAI , Guiqi LIU
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , B24B41/068 , G03F7/707 , G03F7/70758 , G03F7/70775 , G03F7/70783 , H01L21/6719 , H01L21/68
摘要： A carrying platform and an exposure method are provided. The carrying platform includes: a plurality of sub-stands, configured to co-carry an object. Each sub-stand includes: a platform having a first carrying surface; and a position adjusting unit disposed on a side of the platform away from the first carrying surface and configured to adjust at least one of height or inclined angle of the platform.

8. 发明申请

US20180246421A1 MOVABLE BODY DRIVE METHOD AND MOVABLE BODY DRIVE SYSTEM, PATTERN FORMATION METHOD AND APPARATUS, EXPOSURE METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20180246421A1
公开(公告)日：2018-08-30
申请号：US15961061
申请日：2018-04-24
申请人： NIKON CORPORATION
发明人： Yuichi SHIBAZAKI
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/70775 , G03F7/7085 , G03F9/7088
摘要： In an exposure operation, as a second stage is moved in a direction parallel to a predetermined plane, another head different from a plurality of heads faces a grating section instead of one head of the plurality of heads, and positional information of the second stage is measured by multiple heads including remaining heads and the another head, the remaining heads excluding the one head of the plurality of heads, and correction information is acquired for the positional information obtained from the another head, based on the positional information obtained from the plurality of heads including the one head.

9. 发明授权

US10062595B2 Systems and methods for wafer alignment 有权
公开(公告)号：US10062595B2
公开(公告)日：2018-08-28
申请号：US15657298
申请日：2017-07-24
申请人： Micron Technology, Inc.
发明人： Yang Chao , Keith E. Ypma , Steve J. Strauch
IPC分类号： H01L21/68 , G03F9/00 , G01B11/14 , G03F7/20
CPC分类号： H01L21/681 , B65G2203/0233 , B65G2203/041 , B65G2811/0626 , G01B11/14 , G03F7/70633 , G03F7/70775 , G03F9/7003 , G03F9/7007 , G03F9/7015 , G03F9/7088
摘要： Various embodiments of aligning wafers are described herein. In one embodiment, a photolithography system aligns a wafer by averaging individual via locations. In particular, some embodiments of the present technology determine the center locations of individual vias on a wafer and average them together to obtain an average center location of the set of vias. Based on a comparison of the average center location to a desired center location, the present technology adjusts the wafer position. Additionally, in some embodiments, the present technology compares wafer via patterns to a template and adjusts the position of the wafer based on the comparison.

10. 发明申请

US20180239258A1 LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
公开(公告)号：US20180239258A1
公开(公告)日：2018-08-23
申请号：US15959115
申请日：2018-04-20
申请人： ASML Netherlands B.V.
发明人： Günes NAKIBOGLU , Suzanne Johanna Antonetta Geertruda COSIJNS , Anne Willemijn Bertine QUIST , Lukasz SOSNIAK , Frank Johannes Jacobus VAN BOXTEL , Engelbertus Antonius Fransiscus VAN DER PASCH
IPC分类号： G03F7/20
CPC分类号： G03F7/7085 , G03F7/70775 , G03F7/709
摘要： A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式