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1. 发明申请

US20190011370A1 Plasma Spectroscopy Analysis Method 审中-公开
公开(公告)号：US20190011370A1
公开(公告)日：2019-01-10
申请号：US16025482
申请日：2018-07-02
申请人： ARKRAY, Inc.
发明人： Kojiro Honma , Kentaro Kiriyama , Hirofumi Yamada
IPC分类号： G01N21/73 , G01N1/28
CPC分类号： G01N21/73 , G01J3/28 , G01J3/443 , G01J2003/2866 , G01N1/28 , G01N21/67 , G01N21/69 , G01N2001/2893
摘要： The disclosure provides plasma spectroscopy analysis methods using a preparatory process of adding a control metal species that is different from an analyte metal species to a sample so as to have a known concentration; a concentration process of introducing the sample to a measurement container, and applying an electric current across a pair of electrodes disposed in the measurement container to concentrate the analyte metal species and the control metal species in the sample in a vicinity of at least one of the electrodes; a detection process; a correction process; and a quantification process.

2. 发明申请

US20180259393A1 Portable Analyzer Using Optical Emission Spectroscopy 审中-公开
公开(公告)号：US20180259393A1
公开(公告)日：2018-09-13
申请号：US15913199
申请日：2018-03-06
申请人： Hitachi High-Tech Analytical Science Limited
发明人： Tuomas PYLKKANEN , Esa RAIKKONEN
IPC分类号： G01J3/02 , G01N21/71 , G01J3/18
CPC分类号： G01J3/0208 , G01J3/0256 , G01J3/18 , G01J3/2803 , G01J3/36 , G01J3/443 , G01N21/718
摘要： An optical spectrometer arrangement is provided. According to an example, the optical spectrometer arrangement includes a linear array detector for receiving light at a predefined range of wavelengths, a point detector for receiving light at a predefined wavelength that is outside said predefined range of wavelengths, and an arrangement of a collimating optical element, a diffracting optical element, and a focusing optical element that are arranged to provide at least a first optical path that guides incoming light at said predefined range of wavelengths to the linear array detector via the collimating optical element, the diffracting optical element and the focusing optical element, and a second optical path that guides incoming light at said predefined wavelength to the point detector via the collimating optical element, the diffracting optical element and one of the collimating optical element and the focusing optical element.

3. 发明申请

US20180252650A1 Computed Tomography using Intersecting Views of Plasma using Optical Emission Spectroscopy during Plasma Processing 审中-公开
公开(公告)号：US20180252650A1
公开(公告)日：2018-09-06
申请号：US15448069
申请日：2017-03-02
申请人： Tokyo Electron Limited
发明人： Daniel Morvay , Taejoon Han , Mirko Vukovic
IPC分类号： G01N21/73 , H01J37/32 , G06T11/00 , G01J3/443 , H01L21/3065 , H01L21/67
CPC分类号： G01N21/73 , G01J3/443 , G01N21/68 , G01N2021/1787 , G01N2201/1293 , G06T11/003 , H01J37/32422 , H01J37/32972 , H01J2237/334 , H01L21/3065 , H01L21/67069
摘要： Described herein are technologies to facilitate computed tomographic techniques to help identifying chemical species during plasma processing of a substrate (e.g., semiconductor wafer) using optical emission spectroscopy (OES). More particularly, the technology described herein uses topographic techniques to spatially resolves emissions and absorptions in at least two-dimension space above the substrate during the plasma processing (e.g., etching) of the substrate. With some implementations utilize optical detectors positioned along multiple axes (e.g., two or more) to receive incident incoming optical spectra from the plasma chamber during the plasma processing (e.g., etching) of the substrate. Because of the multi-axes arrangement, the incident incoming optical spectra form an intersecting grid.

4. 发明申请

US20180230608A1 Electrolysis Device 审中-公开
公开(公告)号：US20180230608A1
公开(公告)日：2018-08-16
申请号：US15896734
申请日：2018-02-14
申请人： ARKRAY, Inc.
发明人： Tokuo Kasai
IPC分类号： C25B9/16 , C25B11/02
CPC分类号： C25B9/16 , C25B9/06 , C25B11/02 , C25B11/12 , G01J3/443 , G01N21/67 , G01N21/69
摘要： An electrolysis device comprising a cell containing a solution, a pair of electrodes installed in the cell, and a voltage application device connected to the pair of electrodes. One electrode of the pair of electrodes is a small electrode, and another electrode of the pair of electroeds is a large electrode. An area of a liquid-contacting portion of the small electrode with the solution is smaller than an area of a liquid-contacting portion of the large electrode with the solution. In a state in which the solution is contained in the cell, only the solution is present between the liquid-contacting portion of the small electrode and a liquid surface of the solution vertically above the liquid-contacting portion of the small electrode.

5. 发明申请

US20180228012A1 CHAMBERS FOR MICROWAVE PLASMA GENERATION 审中-公开
公开(公告)号：US20180228012A1
公开(公告)日：2018-08-09
申请号：US15749430
申请日：2016-07-20
申请人： Agilent Technologies, Inc.
发明人： Michael Ron Hammer
IPC分类号： H05H1/30 , H01J49/10 , G01J3/443
CPC分类号： H05H1/30 , G01J3/443 , H01J49/105 , H05H1/46 , H05H2001/4622
摘要： A microwave chamber for plasma generation. The microwave chamber comprises a launch structure at a first end of the microwave chamber to accommodate a microwave source for producing microwave energy and a termination section at a second end of the microwave chamber opposite the first end. The termination section is configured to substantially block propagation of the microwave energy from the second end of the chamber. The microwave chamber further comprises an internal wall structure for guiding the microwave energy received within the microwave chamber at the first end toward the second end and defines a cavity. The internal wall structure comprises an impedance matching section intermediate the first end and the second end, and a capacitive loaded section intermediate the impedance matching section and the second end, wherein the capacitive loaded section comprises at least one ridge extending along a longitudinal axis of the chamber. The microwave chamber defines a first opening extending through a first wall of the capacitive loaded section and a second opening extending through a second wall of the capacitive loaded section. The second wall is opposite the first wall. The first opening and second opening are configured to cooperate with one another to receive a plasma torch in the capacitive loaded section along an axis extending through first opening and second opening and substantially perpendicular to the longitudinal axis of the chamber.

6. 发明申请

US20180220520A1 TORCH FOR INDUCTIVELY COUPLED PLASMA 审中-公开
公开(公告)号：US20180220520A1
公开(公告)日：2018-08-02
申请号：US15882415
申请日：2018-01-29
申请人： Sina Alavi , Javad Mostaghimi
发明人： Sina Alavi , Javad Mostaghimi
IPC分类号： H05H1/30 , H01J49/10 , G01N21/73 , G01J3/443
CPC分类号： H05H1/30 , G01J3/443 , G01N21/73 , H01J49/00 , H01J49/105 , H05H1/46
摘要： A torch for use in inductively coupled plasma is described. In the torch, a torch tube has an angular accelerator where a flow of gas experiences an increase in angular velocity. The torch tube also has a conical end where the increased angular velocity of the gas is encouraged to accelerate into a cavity that can support the plasma. In various examples, the conical end of the torch tube comprising a conical gap that accelerates the axial velocity component of the gas flow.

7. 发明申请

US20180172593A1 ANALYZER ALIGNMENT, SAMPLE DETECTION, LOCALIZATION, AND FOCUSING METHOD AND SYSTEM 审中-公开
公开(公告)号：US20180172593A1
公开(公告)日：2018-06-21
申请号：US15900044
申请日：2018-02-20
申请人： SciAps, Inc.
发明人： David R. Day
IPC分类号： G01N21/71 , G01J3/443
CPC分类号： G01N21/718 , G01J3/0218 , G01J3/0264 , G01J3/0272 , G01J3/0291 , G01J3/443 , G01N2201/0221 , G01N2201/0833
摘要： An analysis (e.g., LIBS) system includes a source of radiation, an optical emission path for the radiation from the source of radiation to a sample, and an optical detection path for photons emitted by the sample. A detector fiber bundle transmits photons to the spectrometer subsystem. At least one fiber of the fiber bundle is connected to an illumination source (e.g., an LED) for directing light via at least a portion of the detection path in a reverse direction to the sample for aligning, sample presence detection, localizing, and/or focusing based on analysis of the resulting illumination spot on the sample.

8. 发明申请

US20180158657A1 METHODS AND SYSTEMS FOR CHAMBER MATCHING AND MONITORING 审中-公开
公开(公告)号：US20180158657A1
公开(公告)日：2018-06-07
申请号：US15832257
申请日：2017-12-05
申请人： Tokyo Electron Limited
发明人： Jun Shinagawa
IPC分类号： H01J37/32 , G01N21/73
CPC分类号： H01L21/3065 , G01J3/443 , G01N21/68 , G01N21/73 , H01J37/32183 , H01J37/32935 , H01J37/32972 , H01J37/32981 , H01J37/3299 , H01J2237/24507 , H01J2237/24585 , H01J2237/334 , H01L21/67069 , H01L21/67248 , H01L21/67253 , H01L22/10 , H01L22/12 , H01L22/20 , H01L22/26
摘要： A method and a system for plasma etching are provided. The method includes measuring a first set of plasma etch processing parameters; determining an etch rate; altering the plasma etch processing chamber hardware configuration if the determined etch rate differs from a standard etch rate by more than a predetermined etch rate difference threshold, thereafter repeating the determining and altering until the determined etch rate differs from the standard etch rate by less than the predetermined etch rate difference threshold. The method further includes measuring a critical dimension of an etched feature and altering the etch processing parameters if the measured critical dimension differs from a standard critical dimension by more than a predetermined critical dimension difference threshold, thereafter repeating the determining and altering until the measured critical dimension differs from the standard critical dimension by less than the predetermined critical dimension difference threshold.

9. 发明申请

US20180143141A1 COMPOSITIONAL OPTICAL EMISSION SPECTROSCOPY FOR DETECTION OF PARTICLE INDUCED ARCS IN A FABRICATION PROCESS 审中-公开
公开(公告)号：US20180143141A1
公开(公告)日：2018-05-24
申请号：US15816674
申请日：2017-11-17
申请人： Tokyo Electron Limited
发明人： Thomas Omstead , Ke-Hung Chen , Deepak Vedhachalam
IPC分类号： G01N21/73 , G01J3/443
CPC分类号： G01N21/73 , G01J3/443
摘要： Described herein are architectures, platforms and methods for detecting and analyzing anomalous events (i.e., arcing events) from spectral data gathered during a wafer fabrication process.

10. 发明申请

US20180130647A1 METHOD AND APPARATUS FOR CALIBRATING OPTICAL PATH DEGRADATION USEFUL FOR DECOUPLED PLASMA NITRIDATION CHAMBERS 审中-公开
公开(公告)号：US20180130647A1
公开(公告)日：2018-05-10
申请号：US15865171
申请日：2018-01-08
申请人： Applied Materials, Inc.
发明人： Sairaju Tallavarjula , Kailash Pradhan , Huy Q. Nguyen , Jian Li
IPC分类号： H01J37/32 , G01J3/443 , G01J3/28 , G01N21/27 , G01N21/66
CPC分类号： H01J37/32972 , G01J3/28 , G01J3/443 , G01N21/274 , G01N21/66 , H01J37/32935 , H01J2237/2482
摘要： Methods for matching semiconductor processing chambers using a calibrated spectrometer are disclosed. In one embodiment, plasma attributes are measured for a process in a reference chamber and a process in an aged chamber. Using a calibrated light source, an optical path equivalent to an optical path in a reference chamber and an optical path in an aged chamber can be compared by determining a correction factor. The correction factor is applied to adjust a measured intensity of plasma radiation through the optical path in the aged chamber. Comparing a measured intensity of plasma radiation in the reference chamber and the adjusted measured intensity in the aged chamber provide an indication of changed chamber conditions. A magnitude of change between the two intensities can be used to adjust the process parameters to yield a processed substrate from the aged chamber which matches that of the reference chamber.

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