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1. 发明授权

US09563134B2 Optical system illuminating surface to be illuminated, exposure apparatus, imprint apparatus, method for manufacturing article, optical element, and method for manufacturing optical system 有权
标题翻译：要照明的光学系统照明面，曝光装置，压印装置，制品制造方法，光学元件以及制造光学系统的方法
公开(公告)号：US09563134B2
公开(公告)日：2017-02-07
申请号：US14558555
申请日：2014-12-02
申请人： CANON KABUSHIKI KAISHA
发明人： Nobuyuki Saito
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20 , G03F7/00
CPC分类号： G03F7/70375 , G02B3/04 , G03F7/0002
摘要： An optical system illuminating a surface to be illuminated includes a wavefront splitting type integrator configured to split the wavefront of incident light to form a plurality of light sources on the exit surface side, and an optical element whose surface is polished in a scanning direction using a polishing tool. The optical element is disposed between the wavefront splitting type integrator and the surface to be illuminated, and has a direction indicating portion indicating the scanning direction. The arrangement direction of the plurality of light sources in a plane perpendicular to the optical axis of the optical system is non-parallel to the scanning direction indicated by the direction indicating portion.
摘要翻译：照射要被照射的表面的光学系统包括：波前分割型积分器，被配置为将入射光的波前分裂以在出射表面侧形成多个光源;以及光学元件，其表面在扫描方向上使用抛光工具。光学元件设置在波前分割型积分器和被照射面之间，具有表示扫描方向的方向指示部。多个光源在与光学系统的光轴垂直的平面中的排列方向与方向指示部所示的扫描方向不平行。

2. 发明申请

US20160096233A1 LASER MICRO/NANO PROCESSING SYSTEM AND METHOD 有权
公开(公告)号：US20160096233A1
公开(公告)日：2016-04-07
申请号：US14930856
申请日：2015-11-03
申请人： Xuanming Duan , Shu Chen , Hongzhong Cao , Xianzi Dong , Zhensheng Zhao
发明人： Xuanming Duan , Shu Chen , Hongzhong Cao , Xianzi Dong , Zhensheng Zhao
IPC分类号： B23K26/0622 , B23K26/06 , B23K26/04
CPC分类号： B23K26/0624 , B23K26/048 , B23K26/0613 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0676 , B81C1/00428 , G03F7/2053 , G03F7/70375 , H01L21/02107
摘要： A laser micro/nano processing system (100, 200, 300, 400) comprises: a laser light source used to provide a first laser beam having a first wavelength and a second laser beam having a second wavelength different from the first wavelength, with the pulse width of the first laser beam being in the range from a nanosecond to a femtosecond; an optical focusing assembly used to focus the first laser beam and the second laser beam to the same focal point; and a micro mobile platform (21) controlled by a computer. Also disclosed are a method for micro/nano-processing photosensitive materials with a laser and a method for fabricating a device with a micro/nano structure using laser two-photon direct writing technology. In the system and methods, spatial and temporal overlapping of two laser beams is utilized, so as to obtain a micro/nano structure with a processing resolution higher than that of a single laser beam, using an average power lower than that of a single laser beam.

3. 发明申请

US20160046070A1 PRODUCTION OF 3D FREE-FORM WAVEGUIDE STRUCTURES 审中-公开
标题翻译： 3D自由形式波形结构的生产
公开(公告)号：US20160046070A1
公开(公告)日：2016-02-18
申请号：US14780134
申请日：2014-03-28
申请人： KARLSRUHER INSTITUT FÜR TECHNOLOGIE
发明人： Timo Mappes , Sebastian Köber , Nicole Lindenmann , Christian Koos
IPC分类号： B29C67/00
CPC分类号： B29C64/135 , B29C71/02 , B29C2071/022 , B29D11/00663 , B29K2105/0002 , B29L2011/0075 , G02B6/1221 , G02B6/138 , G02B6/305 , G03F7/038 , G03F7/70375
摘要： The present invention provides a process for producing an optical waveguide (20) more particularly for integrated photonic systems. This process comprises provision of polymerizable material; local polymerization of the polymerizable material to produce a multiplicity of polymerized structural elements (14); removal of the unpolymerized regions of the polymerizable material; and heating of the polymerized material more particularly above the glass transition temperature thereof in order to fuse the multiplicity of polymerized structural elements (14) together to form the optical waveguide (20).
摘要翻译：本发明提供了一种更特别地用于集成光子系统的光波导（20）的制造方法。该方法包括提供可聚合材料; 可聚合材料的局部聚合以产生多个聚合结构元件（14）; 去除可聚合材料的未聚合区域; 并且聚合材料的加热更特别地高于其玻璃化转变温度，以便将多个聚合的结构元件（14）熔合在一起以形成光波导（20）。

4. 发明授权

US09104113B2 Amplification method for photoresist exposure in semiconductor chip manufacturing 有权
标题翻译：半导体芯片制造中光致抗蚀剂曝光的放大方法
公开(公告)号：US09104113B2
公开(公告)日：2015-08-11
申请号：US13735232
申请日：2013-01-07
申请人： International Business Machines Corporation
发明人： Richard S. Wise , Daniel A. Corliss
IPC分类号： G03F7/20
CPC分类号： G03F7/70325 , G03F7/2004 , G03F7/2041 , G03F7/70058 , G03F7/70308 , G03F7/70375
摘要： An electrical field is applied through an extreme ultraviolet (EUV) photoresist layer along a direction perpendicular to an interface between the EUV photoresist layer and an underlying layer. Secondary electrons and thermal electrons are accelerated along the direction of the electrical field, and travel with directionality before interacting with the photoresist material for a chemical reaction. The directionality increases the efficiency of electron photoacid capture, reducing the required EUV dose for exposure. Furthermore, this directionality reduces lateral diffusion of the secondary and thermal electrons, and thereby reduces blurring of the image and improves the image resolution of feature edges formed in the EUV photoresist layer. The electrical field may be generated by applying a direct current (DC) and/or alternating current (AC) bias voltage across an electrostatic chuck and a conductive plate placed over the EUV photoresist layer with a hole for passing the EUV radiation through.
摘要翻译：沿着与EUV光致抗蚀剂层和下层之间的界面垂直的方向通过极紫外（EUV）光致抗蚀剂层施加电场。二次电子和热电子沿着电场的方向被加速，并且在与用于化学反应的光致抗蚀剂材料相互作用之前以方向性行进。方向性增加了电子光酸捕获的效率，降低了暴露所需的EUV剂量。此外，这种方向性减小了二次和热电子的横向扩散，从而减少了图像的模糊并改善了形成在EUV光致抗蚀剂层中的特征边缘的图像分辨率。可以通过在静电卡盘和放置在EUV光致抗蚀剂层上的导电板上施加直流（DC）和/或交流（AC）偏置电压来产生电场，所述导电板具有用于使EUV辐射通过的孔。

5. 发明授权

US08895235B2 Process for production of photoresist pattern 有权
标题翻译：光刻胶图案的生产工艺
公开(公告)号：US08895235B2
公开(公告)日：2014-11-25
申请号：US13582336
申请日：2011-03-01
申请人： Kosei Ueno , Hiroaki Misawa
发明人： Kosei Ueno , Hiroaki Misawa
IPC分类号： G03F7/20 , H01L21/027 , G03F1/50
CPC分类号： H01L21/0274 , G03F1/50 , G03F7/2014 , G03F7/7035 , G03F7/70375 , G03F7/70408
摘要： Disclosed is a process for producing a photoresist pattern, comprising the steps of: preparing a photomask that comprises a metal nano structure having a metal film arranged thereon and can generate a plasmon resonance, on a mask substrate; preparing a photoresist film that is formed on the surface of the resist substrate and is sensible to light having a wavelength (X); bringing the photomask into contact with the photoresist film; and exposing the photoresist film to light having a wavelength (Y) that is longer than the wavelength (X) and is shorter than the peak wavelength of a plasmon resonance band of the metal nano structure, thereby transferring a pattern of the metal film in the photomask onto the photoresist film.
摘要翻译：公开了一种制备光致抗蚀剂图案的方法，包括以下步骤：制备包含金属纳米结构的光掩模，所述金属纳米结构在其上布置有金属膜，并可在掩模基板上产生等离子体共振; 制备形成在抗蚀剂基板的表面上且对具有波长（X）的光敏感的光致抗蚀剂膜; 使光掩模与光致抗蚀剂膜接触; 并且将光致抗蚀剂膜曝光于比波长（X）长的波长（Y）的光并且短于金属纳米结构的等离子体共振带的峰值波长，从而将金属膜的图案转印在光掩模到光刻胶膜上。

6. 发明申请

US20130183833A1 LASER MICRO/NANO PROCESSING SYSTEM AND METHOD 有权
标题翻译：激光微/纳米加工系统和方法
公开(公告)号：US20130183833A1
公开(公告)日：2013-07-18
申请号：US13824634
申请日：2011-09-15
申请人： Xuanming Duan , Shu Chen , Hongzhong Cao , Xianzi Dong , Zhensheng Zhao
发明人： Xuanming Duan , Shu Chen , Hongzhong Cao , Xianzi Dong , Zhensheng Zhao
IPC分类号： B81C1/00 , B23K26/08 , B23K26/06 , H01L21/02
CPC分类号： B23K26/0624 , B23K26/048 , B23K26/0613 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0676 , B81C1/00428 , G03F7/2053 , G03F7/70375 , H01L21/02107
摘要： A laser micro/nano processing system (100, 200, 300, 400) comprises: a laser light source used to provide a first laser beam having a first wavelength and a second laser beam having a second wavelength different from the first wavelength, with the pulse width of the first laser beam being in the range from a nanosecond to a femtosecond; an optical focusing assembly used to focus the first laser beam and the second laser beam to the same focal point; and a micro mobile platform (21) controlled by a computer. Also disclosed are a method for micro/nano-processing photosensitive materials with a laser and a method for fabricating a device with a micro/nano structure using laser two-photon direct writing technology. In the system and methods, spatial and temporal overlapping of two laser beams is utilized, so as to obtain a micro/nano structure with a processing resolution higher than that of a single laser beam, using an average power lower than that of a single laser beam.
摘要翻译：激光微/纳米处理系统（100,200,300,400）包括：激光源，用于提供具有第一波长的第一激光束和具有不同于第一波长的第二波长的第二激光束，其中第一激光束的脉冲宽度在从纳秒到飞秒的范围内; 用于将第一激光束和第二激光束聚焦到同一焦点的光学聚焦组件; 和由计算机控制的微型移动平台（21）。还公开了一种用于具有激光的微/纳米处理感光材料的方法和使用激光双光子直写技术制造具有微/纳米结构的器件的方法。在系统和方法中，利用两个激光束的空间和时间重叠，以获得具有比单个激光束高的处理分辨率的微/纳米结构，使用比单个激光器的平均功率更低的平均功率光束。

7. 发明授权

US08465910B2 Hybrid lithographic method for fabricating complex multidimensional structures 失效
标题翻译：用于制造复杂多维结构的混合光刻方法
公开(公告)号：US08465910B2
公开(公告)日：2013-06-18
申请号：US13171954
申请日：2011-06-29
申请人： Jonathan Phillip Singer , Jae-Hwang Lee , Steven E. Kooi , Edwin Lorimer Thomas
发明人： Jonathan Phillip Singer , Jae-Hwang Lee , Steven E. Kooi , Edwin Lorimer Thomas
IPC分类号： G03F7/26
CPC分类号： G03F7/203 , B82Y10/00 , B82Y40/00 , G03F1/20 , G03F7/0002 , G03F7/70375
摘要： Lithographic Method. The method fabricates complex structures and includes depositing a photoresist onto a substrate, the photoresist including a predominantly thermal band of optical absorption possibly due to the incorporation of a doping agent. A three-dimensional pattern is generated within the resist using a first wavelength of light to effect activation of a photoinitiator to produce a latently photostructured resist. Focused laser spike annealing of the photostructured resist with a second wavelength of light selected to be absorbed by the thermally absorbing band to accelerate the photoinduced reaction in the resist is provided. Three-dimensional direct writing may be performed within the resist to define features not part of the interference pattern and the resist is developed to produce the complex structure.
摘要翻译：平版方法。该方法制造复杂结构，并且包括在基板上沉积光致抗蚀剂，光致抗蚀剂包括主要是热吸收带的光吸收，可能是由于引入掺杂剂。使用第一波长的光在抗蚀剂内产生三维图案以实现光引发剂的活化以产生潜在的光结晶抗蚀剂。提供了光结构化抗蚀剂的聚焦激光尖峰退火，其中第二波长的光被选择为由吸热带吸收，以加速抗蚀剂中的光诱导反应。可以在抗蚀剂内进行三维直接写入以限定不是干涉图案的一部分的特征，并且抗蚀剂被开发以产生复杂结构。

8. 发明授权

US08455846B2 Method for making structures with improved edge definition 有权
标题翻译：具有改进边缘定义的结构的方法
公开(公告)号：US08455846B2
公开(公告)日：2013-06-04
申请号：US12746888
申请日：2008-11-06
申请人： Brian J. Gates , Robert T. Krasa , Przemyslaw P. Markowicz , Craig R. Sykora , Robert J. DeVoe , Dean Faklis
发明人： Brian J. Gates , Robert T. Krasa , Przemyslaw P. Markowicz , Craig R. Sykora , Robert J. DeVoe , Dean Faklis
IPC分类号： H01L21/027
CPC分类号： G03F7/70375
摘要： A method includes scanning a radiation beam with respect to a multi-photon curable photoreactive composition. The radiation beam includes a power sufficient to at least partially cure a volume of the multiphoton curable photoreactive composition. The method further includes modifying a characteristic of the radiation beam as the radiation beam is scanned.
摘要翻译：一种方法包括相对于多光子可固化光反应组合物扫描辐射束。辐射束包括足以至少部分固化多光子可固化光反应组合物的体积的功率。该方法还包括当辐射束被扫描时修改辐射束的特性。

9. 发明申请

US20130017499A1 PROCESS FOR PRODUCTION OF PHOTORESIST PATTERN 有权
标题翻译：生产光电子图案的工艺
公开(公告)号：US20130017499A1
公开(公告)日：2013-01-17
申请号：US13582336
申请日：2011-03-01
申请人： Kosei Ueno , Hiroaki Misawa
发明人： Kosei Ueno , Hiroaki Misawa
IPC分类号： G03F7/20 , G03B27/54 , B82Y30/00
CPC分类号： H01L21/0274 , G03F1/50 , G03F7/2014 , G03F7/7035 , G03F7/70375 , G03F7/70408
摘要： Disclosed is a process for producing a photoresist pattern, comprising the steps of: preparing a photomask that comprises a metal nano structure having a metal film arranged thereon and can generate a plasmon resonance, on a mask substrate; preparing a photoresist film that is formed on the surface of the resist substrate and is sensible to light having a wavelength (X); bringing the photomask into contact with the photoresist film; and exposing the photoresist film to light having a wavelength (Y) that is longer than the wavelength (X) and is shorter than the peak wavelength of a plasmon resonance band of the metal nano structure, thereby transferring a pattern of the metal film in the photomask onto the photoresist film.
摘要翻译：公开了一种制备光致抗蚀剂图案的方法，包括以下步骤：制备包含金属纳米结构的光掩模，所述金属纳米结构在其上布置有金属膜，并可在掩模基板上产生等离子体共振; 制备形成在抗蚀剂基板的表面上且对具有波长（X）的光敏感的光致抗蚀剂膜; 使光掩模与光致抗蚀剂膜接触; 并且将光致抗蚀剂膜曝光于比波长（X）长的波长（Y）的光并且比金属纳米结构的等离子体共振带的峰值波长短，从而将金属膜的图案转印在光掩模到光刻胶膜上。

10. 发明申请

US20120147722A1 Nanometer Scale Instrument for Biochemically, Chemically, or Catalytically Interacting with a Sample Material 审中-公开
标题翻译：用于与样品材料进行生物化学，化学或催化相互作用的纳米级仪器
公开(公告)号：US20120147722A1
公开(公告)日：2012-06-14
申请号：US13269481
申请日：2011-10-07
申请人： Victor B. Kley
发明人： Victor B. Kley
IPC分类号： G11B11/08 , G01N33/48 , G11B7/085
CPC分类号： G03F1/84 , G01B7/31 , G01Q80/00 , G03F7/70375 , G03F7/70483 , G11B5/232 , G11B5/3116 , G11B9/06 , G11B9/08 , G11B9/14 , G11B9/1409 , G11B9/1418 , G11B9/1427 , G11B9/1436 , G11B9/1445 , G11B9/1454 , G11B9/149 , G11B11/007 , G11B11/05 , G11B11/12 , G11B11/16 , G11B2005/0002 , G11B2005/0021 , H02N1/006 , Y10S977/851 , Y10S977/86 , Y10S977/875 , Y10S977/877
摘要： A data storage system that includes a positioning system for positioning the write/read mechanism and the storage medium of the data storage device with respect to each other in first and second predefined directions. In several embodiments, the read/write mechanism is used to mechanically write data to and electrically read data from the storage medium. In still another embodiment, the read/write mechanism is used to optically write data to and electrically read data from the storage medium. In yet another embodiment, the read/write mechanism is acoustically aided in electrically writing data to and reading data from the storage medium.
摘要翻译：一种数据存储系统，包括用于在第一和第二预定方向上相对于彼此定位数据存储装置的写/读机制和存储介质的定位系统。在几个实施例中，读/写机制用于机械地写入数据并从存储介质电读取数据。在另一个实施例中，读/写机构用于光学写入数据并从存储介质电读取数据。在另一个实施例中，读/写机构被声学辅助以将数据电气地写入和从存储介质读取数据。

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