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1. 发明申请

US20190235222A1 METHOD FOR DETECTING PARTICLES USING STRUCTURED ILLUMINATION 审中-公开
公开(公告)号：US20190235222A1
公开(公告)日：2019-08-01
申请号：US16262429
申请日：2019-01-30
申请人： Optical Biosystems, Inc.
发明人： Jekwan Ryu , Hojin Lee , Ahreum Oh
IPC分类号： G02B21/06 , G02B21/18 , G02B21/36 , G02B27/58 , G03F7/20 , G06K9/00 , G06T7/00
CPC分类号： G02B21/06 , G02B21/18 , G02B21/365 , G02B27/58 , G03F7/70408 , G06K9/0014 , G06T7/0012 , G06T2207/10056 , G06T2207/30072
摘要： A particle detection method detects presence and location of particles on a target using measured signals from a plurality of structured illumination patterns. The particle detection method uses measured signals obtained by illuminating the target with structured illumination patterns to detect particles. Specifically, the degree of variation in these measured signals in raw images is calculated to determine whether a particle is present on the target at a particular area of interest.

2. 发明申请

US20190129312A1 Generation of Vector Partially Coherent Optical Sources Using Phase-Only Spatial Light Modulators 审中-公开
公开(公告)号：US20190129312A1
公开(公告)日：2019-05-02
申请号：US16156656
申请日：2018-10-10
申请人： Government of the United States, as represented by the Secretary of the Air Force
发明人： Milo W. Hyde, IV , Santasri R. Bose-Pillai
IPC分类号： G03F7/20 , G02B27/28 , G01N21/21
CPC分类号： G03F7/70408 , G01N21/21 , G02B27/286
摘要： A VPCS generator that includes a laser that emits coherent light; an interferometer consisting of PBSs to split the laser light into its vertical and horizontal polarization components; first and second SLMs that respectively control the vertical and horizontal polarization components; and a control system communicatively coupled to the first and second SLMs to adjust beam shape and coherence without physically moving or removing optical elements in the apparatus.

3. 发明授权

US09952516B1 System and method for generating a lithographic image with the use of a digital hologram and a reflective concave in curvilinear surface 有权
公开(公告)号：US09952516B1
公开(公告)日：2018-04-24
申请号：US15473363
申请日：2017-03-29
申请人： Vadim Rakhovsky , Mikhail Borisov , Aleksey Shamaev , Dmitry Chelyubeev , Vitaly Chernik , Peter Mikheev
发明人： Vadim Rakhovsky , Mikhail Borisov , Aleksey Shamaev , Dmitry Chelyubeev , Vitaly Chernik , Peter Mikheev
IPC分类号： G03F7/20 , G03H1/04 , G03H1/00 , G02B19/00
CPC分类号： G03F7/70408 , G02B19/0023 , G03H1/0005 , G03H1/0443 , G03H1/2286 , G03H1/2294 , G03H2001/0094 , G03H2001/085 , G03H2222/54 , G03H2223/24 , G03H2225/32
摘要： A system for generating a lithographic image contains a alight source that emits a diverging light beam and a reflective concave curvilinear surface onto which the diverging light beam falls and which reflects the diverging beam in the form of a converging beam. A digital hologram, which is coded in accordance with the initial lithographic image either preliminarily or dynamically with the use of a spatial light modulator, is placed into the converging beam between the reflective surface and the image-receiving object. The image of an initial lithographic image formed on the image-receiving object is subsequently used in the processes of microlithography.

4. 发明申请

US20180039183A1 REAL-TIME VARIABLE PARAMETER MICRO-NANO OPTICAL FIELD MODULATION SYSTEM AND INTERFERENCE LITHOGRAPHY SYSTEM 审中-公开
公开(公告)号：US20180039183A1
公开(公告)日：2018-02-08
申请号：US15310245
申请日：2016-01-06
申请人： Soochow University
发明人： Yan YE , Fengchuan XU , Guojun WEI , Yishen XU , Donglin PU , Linsen CHEN
IPC分类号： G03F7/20 , G02B27/42 , G02B27/09
CPC分类号： G03F7/7045 , G02B27/00 , G02B27/0905 , G02B27/0944 , G02B27/095 , G02B27/0977 , G02B27/0988 , G02B27/4222 , G03F7/70408
摘要： A real-time variable parameter micro-nano optical field modulation system includes a light source, a 4F optical system and a set of light wave modulation optical components. The 4F optical system includes a first optical assembly and a second optical assembly arranged along an optical path in sequence. The light wave modulation optical components are arranged between the first optical assembly and the second optical assembly, and generate optical field distribution with adjustable patterns and structural parameters thereof on a back focal plane of the system by segmented modulation of sub-wavefronts.

5. 发明申请

US20170261847A1 EXPOSURE METHOD, METHOD OF FABRICATING PERIODIC MICROSTRUCTURE, METHOD OF FABRICATING GRID POLARIZING ELEMENT AND EXPOSURE APPARATUS 审中-公开
公开(公告)号：US20170261847A1
公开(公告)日：2017-09-14
申请号：US15310108
申请日：2015-09-24
申请人： USHIO DENKI KABUSHIKI KAISHA
发明人： Daisuke YAJIMA , Kentaro NOMOTO , Yohei NAWAKI
IPC分类号： G03F7/00
CPC分类号： G03F7/0005 , G02B5/3058 , G02B5/3075 , G03F7/201 , G03F7/203 , G03F7/22 , G03F7/70408 , G03F7/70475
摘要： Disclosed herein an exposure apparatus capable of implementing a microfabrication onto a work with a higher throughput and a lower cost. The exposure apparatus generates interfering light by crossing two or more branched light beams branched from output light from a coherent light source at a predetermined interfering angle, and exposes the substrate by repeating an irradiation onto the substrate with the interfering light and a conveyance of the substrate. At this moment, the exposure apparatus shapes in interfering light irradiation region on the substrate onto which the interfering light is irradiated into a predetermined shape. Then, the exposure apparatus disposes a plurality of the interfering light irradiation regions in successive shots to be located adjacent to each other on the substrate in a direction of conveying the substrate without the interfering light irradiation regions being overlapped when exposing the substrate while conveying the substrate in a stepwise manner.

6. 发明申请

US20170212472A1 SYSTEM AND METHOD FOR HOLOGRAPHY-BASED FABRICATION 审中-公开
公开(公告)号：US20170212472A1
公开(公告)日：2017-07-27
申请号：US15482671
申请日：2017-04-07
申请人： Wasatch Photonics, Inc.
发明人： Gerald L. Heidt
IPC分类号： G03H1/20 , G03F7/26 , G03H1/18 , G03F7/20 , G03H1/00 , G03H1/04
CPC分类号： G03H1/20 , B82Y40/00 , G02B5/32 , G03F7/20 , G03F7/26 , G03F7/70283 , G03F7/70408 , G03H1/0005 , G03H1/041 , G03H1/182 , G03H1/2249 , G03H2001/0094 , G03H2001/185 , G03H2223/17 , Y10S977/901
摘要： A system and method may utilize holography to facilitate fabrication techniques such as 3D printing and lithography. The system may include a light source, a hologram of an original object or lithographic pattern recorded in a holographic medium, and a target such as a reservoir of photosensitive material or a photosensitive material attached to a substrate. Illuminating the hologram with the appropriate light source may cause a holographic image of the original object or lithographic pattern to form on the photosensitive material within the reservoir or on the substrate. Formation of the holographic image may result in the formation of a new object from the photosensitive material, or may facilitate removal or retention of photosensitive material as part of a lithographic process.

7. 发明申请

US20170123325A1 INTERFERENCE LITHOGRAPHY DEVICE 有权
公开(公告)号：US20170123325A1
公开(公告)日：2017-05-04
申请号：US15145816
申请日：2016-05-04
申请人： National Sun Yat-sen University , LandMark Optoelectronics Corporation
发明人： Yung-Jr HUNG , Wei LIN
IPC分类号： G03F7/20 , G02B27/10 , G02B26/08 , G02B27/28
CPC分类号： G03F7/70191 , G02B26/0816 , G02B27/106 , G02B27/286 , G03F7/70408
摘要： An interference lithography device is provided with a laser source for providing a laser beam; a base thereon having a beam splitter for dividing the laser beam into a first beam portion and a second beam portion, a beam expander, a first set of reflectors, and a second set of reflectors; a set of lower reflectors; and a sample carrying stage for holding a substrate. The first beam portion and the second beam portion are respectively reflected from the second set of reflectors and then respectively reflected by the set of lower reflectors to form an interference pattern on the substrate.

8. 发明申请

US20160291542A1 SYSTEM AND METHOD FOR HOLOGRAPHY-BASED FABRICATION 审中-公开
公开(公告)号：US20160291542A1
公开(公告)日：2016-10-06
申请号：US15037407
申请日：2014-11-22
申请人： WASATCH PHOTONICS, INC.
发明人： Gerald L. Heidt
IPC分类号： G03H1/00 , G03F7/20 , G03H1/20
CPC分类号： G03H1/20 , B82Y40/00 , G02B5/32 , G03F7/20 , G03F7/26 , G03F7/70283 , G03F7/70408 , G03H1/0005 , G03H1/041 , G03H1/182 , G03H1/2249 , G03H2001/0094 , G03H2001/185 , G03H2223/17 , Y10S977/901
摘要： A system and method may utilize holography to facilitate fabrication techniques such as 3D printing and lithography. The system may include a light source, a hologram of an original object or lithographic pattern recorded in a holographic medium, and a target such as a reservoir of photosensitive material or a photosensitive material attached to a substrate. Illuminating the hologram with the appropriate light source may cause a holographic image of the original object or lithographic pattern to form on the photosensitive material within the reservoir or on the substrate. Formation of the holographic image may result in the formation of a new object from the photosensitive material, or may facilitate removal or retention of photosensitive material as part of a lithographic process.

9. 发明授权

US09442387B2 Extreme ultraviolet lithography process 有权
标题翻译：极紫外光刻工艺
公开(公告)号：US09442387B2
公开(公告)日：2016-09-13
申请号：US13757210
申请日：2013-02-01
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Yen-Cheng Lu , Shinn-Sheng Yu , Anthony Yen
IPC分类号： G03F7/20 , G03F1/24 , G21K1/06
CPC分类号： G03F7/70325 , G03F1/24 , G03F7/70033 , G03F7/70091 , G03F7/70125 , G03F7/70191 , G03F7/702 , G03F7/70308 , G03F7/70316 , G03F7/70408 , G21K1/062
摘要： A process of an extreme ultraviolet lithography is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask, an EUV radiation source and an illuminator. The process also includes exposing the EUV mask by a radiation, originating from the EUV radiation source and directed by the illuminator, with a less-than-three-degree chief ray angle of incidence at the object side (CRAO). The process further includes removing most of the non-diffracted light and collecting and directing the diffracted light and the not removed non-diffracted light by a projection optics box (POB) to expose a target.
摘要翻译：公开了一种极紫外光刻技术。该方法包括接收极紫外（EUV）掩模，EUV辐射源和照明器。该方法还包括通过来自EUV辐射源并由照明器引导的辐射暴露EUV掩模，在物体侧具有小于三度的主射线入射角（CRAO）。该方法还包括去除大部分非衍射光并且通过投影光学盒（POB）收集和引导衍射光和未被去除的非衍射光以暴露靶。

10. 发明申请

US20160167165A1 METHOD AND ARRANGEMENT FOR FORMING A STRUCTURING ON SURFACES OF COMPONENTS BY MEANS OF A LASER BEAM 有权
标题翻译：通过激光束形成组分表面结构的方法和装置
公开(公告)号：US20160167165A1
公开(公告)日：2016-06-16
申请号：US14778321
申请日：2014-03-13
申请人： Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.
发明人： Teja ROCH , Dimitri BENKE , Andres Fabian LASAGNI
IPC分类号： B23K26/06 , B23K26/00
CPC分类号： B23K26/0608 , B23K26/0648 , B23K26/0652 , B23K26/355 , G03F7/70408
摘要： The invention relates to a method for forming a structuring at surfaces of components using a laser beam. In the invention, a laser beam is directed onto a diffractive optical element. The diffractive optical element is configured such that the laser beam is split into at least two part beams and the part beams are directed at an angle α with respect to the optical axis of the laser beam onto at least one further optical element which is transparent for the laser radiation. The further optical element(s) has/have a first surface and a second surface which is inclined at an angle to the optical axis of the laser beam at which the beam direction of the part beams is changed by optical refraction. A focusing optical lens is arranged in the optical path of the part beams between the further optical element(s) and a component surface to be processed, and the part beams are focused such that they are incident onto the surface of the component at a common position at an angle of incidence β with respect to the optical axis of the laser beam. The distance d1 between the optical elements is changed to change the interference period.
摘要翻译：本发明涉及一种使用激光束在部件表面形成结构的方法。在本发明中，激光束被引导到衍射光学元件上。衍射光学元件被构造成使得激光束被分裂成至少两个部分光束，并且部分光束相对于激光束的光轴以α角指向至少一个另外的光学元件，该光学元件对于激光辐射。另外的光学元件具有第一表面和第二表面，该第一表面和第二表面以与激光束的光轴成一角度倾斜，在该第二表面处，部分光束的光束方向通过光学折射而改变。聚焦光学透镜被布置在另外的光学元件和待处理的部件表面之间的部分光束的光路中，并且部分光束被聚焦，使得它们以共同的方式入射到部件的表面上位置以入射角＆bgr; 相对于激光束的光轴。改变光学元件之间的距离d1以改变干涉周期。

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