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1. 发明授权

US09746784B2 Lens heating compensation systems and methods 有权
公开(公告)号：US09746784B2
公开(公告)日：2017-08-29
申请号：US14064937
申请日：2013-10-28
申请人： ASML NETHERLANDS B.V.
发明人： Jun Ye , Peng Liu , Yu Cao
IPC分类号： G03B27/52 , G03B27/68 , G03B27/32 , G03F7/20 , G06F17/50
CPC分类号： G03F7/70441 , G03F7/70266 , G03F7/705 , G03F7/70533 , G03F7/706 , G03F7/70891 , G06F17/50
摘要： Methods for calibrating a photolithographic system are disclosed. A cold lens contour for a reticle design and at least one hot lens contour for the reticle design are generated from which a process window is defined. Aberrations induced by a lens manipulator are characterized in a manipulator model and the process window is optimized using the manipulator model. Aberrations are characterized by identifying variations in critical dimensions caused by lens manipulation for a plurality of manipulator settings and by modeling behavior of the manipulator as a relationship between manipulator settings and aberrations. The process window may be optimized by minimizing a cost function for a set of critical locations.

2. 发明申请

US20160133467A1 Method For Improving Critical Dimension Variability 有权
标题翻译：改进关键尺寸变异性的方法
公开(公告)号：US20160133467A1
公开(公告)日：2016-05-12
申请号：US14925438
申请日：2015-10-28
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Steven Robert Sherman , Todd Henry
IPC分类号： H01L21/266 , H01L21/306 , H01L21/66
CPC分类号： H01L21/266 , G03F7/70533 , G03F7/70625 , H01L21/0273 , H01L21/30604 , H01L22/12 , H01L22/20
摘要： Methods of processing a workpiece are disclosed. Variability of the critical dimension of semiconductor structures may be affected by the critical dimension of the patterned mask. Ions may be implanted into the patterned mask to change the critical dimension. The ions may be implanted in accordance with an ion implant map, which determines an appropriate dose, energy and type based on the measured critical dimension of the patterned mask at a plurality of locations.
摘要翻译：公开了处理工件的方法。半导体结构的临界尺寸的变化可能受图案化掩模的临界尺寸的影响。离子可以植入到图案化掩模中以改变临界尺寸。可以根据离子注入图来植入离子，该离子注入图基于在多个位置处的图案化掩模的测量的临界尺寸确定适当的剂量，能量和类型。

3. 发明授权

US09041901B2 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
公开(公告)号：US09041901B2
公开(公告)日：2015-05-26
申请号：US12318574
申请日：2008-12-31
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： A lithographic projection apparatus includes a substrate table by which a substrate is held, a projection system via which a patterned beam is projected onto the substrate to expose the substrate through liquid, and a liquid supply system. The liquid supply system includes a supply flow path, and supplies the liquid via the supply flow path during the exposure. The liquid supply system also includes a device by which the supply flow path is connected with a vacuum system to prevent liquid in the supply flow path from leaking.

4. 发明申请

US20150098074A1 STAGE BRAKING SYSTEM FOR A MOTOR 审中-公开
标题翻译：电机制动系统
公开(公告)号：US20150098074A1
公开(公告)日：2015-04-09
申请号：US14511076
申请日：2014-10-09
申请人： NIKON CORPORATION
发明人： Matthew Rosa , Michael Binnard , Chetan Mahadeswaraswamy , W. Thomas Novak
IPC分类号： G03F7/20
CPC分类号： G03F7/70775 , G03F7/70533 , G03F7/70725
摘要： A stage assembly that moves a device includes a stage that retains the device, a stage mover that moves the stage, a measurement system that provides a measurement signal that relates to the position or movement of the stage, and a control system that control the stage mover. The control system can use an estimator to estimate the position of the stage in the event the measurement signal is lost. Alternatively, the control system can be used to urge the stage against a base assembly when the measurement signal is lost to inhibit the movement of the stage.
摘要翻译：移动设备的舞台组件包括保持装置的舞台，移动舞台的舞台动力，提供与舞台的位置或运动相关的测量信号的测量系统，以及控制舞台的控制系统移动者控制系统可以使用估计器在测量信号丢失的情况下估计平台的位置。或者，当测量信号丢失时，控制系统可用于将台阶推向基座组件以阻止平台的移动。

5. 发明授权

US08867017B2 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：液体回收装置，曝光装置，曝光方法及装置制造方法
公开(公告)号：US08867017B2
公开(公告)日：2014-10-21
申请号：US13751469
申请日：2013-01-28
申请人： Nikon Corporation
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： A liquid immersion exposure apparatus that exposes a substrate via a projection optical system and liquid includes a movable member having an upper surface, a part of which holds the substrate. A liquid immersion system that has a supply port and a recovery port supplies the liquid to a space between the projection optical system and the upper surface via the supply port of a supply path and recovers the liquid of a liquid immersion region formed in the space via the recovery port of a recovery path. A flow path is connected to the supply path between the supply port and a source of the liquid, the flow path permitting flow therethrough to remove liquid that remains in the supply path, the liquid that remains in the supply path having been supplied from the source of the liquid without being discharged from the supply port.
摘要翻译：通过投影光学系统和液体露出基板的液浸曝光装置包括具有上表面的可动件，其一部分保持基板。具有供给口和回收口的液浸系统经由供给路径的供给口将液体供给到投影光学系统与上表面之间的空间，并回收形成在空间通路中的液浸区域的液体恢复路径的恢复端口。流动路径连接到供应口和液体源之间的供应路径，流动路径允许流过其中以去除剩余在供应路径中的液体，保留在供应路径中的液体已经从源供应的液体，而不从供给口排出。

6. 发明授权

US08836919B2 Management method and system for exposure apparatus having alarm based on inclination amount and deviation from aligned position 有权
标题翻译：曝光装置的管理方法和系统具有基于倾斜量和对准位置偏差的报警
公开(公告)号：US08836919B2
公开(公告)日：2014-09-16
申请号：US13194322
申请日：2011-07-29
申请人： Kenichi Tsujisawa , Hiroshi Matsushita , Takayoshi Otake , Hideyuki Oishi , Akira Ogawa , Koji Washiyama
发明人： Kenichi Tsujisawa , Hiroshi Matsushita , Takayoshi Otake , Hideyuki Oishi , Akira Ogawa , Koji Washiyama
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/7007 , G03F7/70533
摘要： According to one embodiment, a control method for an exposure apparatus is disclosed. The method can include retrieving, from a database, a correction amount of alignment correction at a time of exposure of a wafer and an inclination amount of a wafer stage with respect to an optical axis of an exposure optical system at the time of exposure. The method can include making a determination on the inclination amount based on a predetermined condition. The method can include making a determination on the correction amount based on the predetermined condition. In addition, the method can include issuing an alarm when the inclination amount and the correction amount both satisfy the condition.
摘要翻译：根据一个实施例，公开了一种用于曝光装置的控制方法。该方法可以包括在曝光时从数据库检索在晶片曝光时相对于曝光光学系统的光轴的晶片台的倾斜量的校准量。该方法可以包括基于预定条件来确定倾斜量。该方法可以包括基于预定条件来确定校正量。此外，该方法可以包括当倾斜量和校正量都满足条件时发出报警。

7. 发明申请

US20140100684A1 2D/3D Analysis for Abnormal Tools and Stages Diagnosis 有权
标题翻译：异常工具和阶段的2D / 3D分析诊断
公开(公告)号：US20140100684A1
公开(公告)日：2014-04-10
申请号：US13647643
申请日：2012-10-09
申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO. LTD.
发明人： Chun-Hsien Lin , Jui-Long Chen , Hui-Yun Chao , Jong-I Mou , Chin-Hsiang Lin
IPC分类号： G06F19/00
CPC分类号： G06F17/50 , G03F7/70533 , G03F7/70616 , G05B23/024
摘要： A method for analyzing abnormalities in a semiconductor processing system provides performing an analysis of variance on a production history associated with each of a plurality of tools at each of a plurality of process steps for each of a plurality of processed wafers, and key process steps are identified. A regression analysis on a plurality of measurements of the plurality of wafers at each process step is performed and key measurement parameters are identified. An analysis of covariance on the key measurement parameters and key process steps, and the key process steps are ranked based on an f-ratio, therein ranking an abnormality of the key process steps. Further, the plurality of tools associated with each of the key process steps are ranked based on an orthogonal t-ratio associated with an analysis of covariance, therein ranking an abnormality each tool associated with the key process steps.
摘要翻译：一种用于分析半导体处理系统中的异常的方法，提供了在多个处理晶片中的每一个的多个处理步骤中的每一个处执行与多个工具中的每一个相关联的生产历史上的方差分析，并且关键处理步骤确定。执行在每个处理步骤对多个晶片的多个测量的回归分析，并且识别关键测量参数。关键测量参数和关键过程步骤的协方差分析以及关键过程步骤基于f比进行排序，其中排列关键过程步骤的异常。此外，与关键处理步骤中的每一个相关联的多个工具基于与协方差分析相关联的正交t比进行排序，其中对与关键处理步骤相关联的每个工具进行排序。

8. 发明授权

US08440475B2 Alignment calculation 失效
标题翻译：对齐计算
公开(公告)号：US08440475B2
公开(公告)日：2013-05-14
申请号：US12184798
申请日：2008-08-01
申请人： Boris Habets , Michiel Kupers , Wolfgang Henke
发明人： Boris Habets , Michiel Kupers , Wolfgang Henke
IPC分类号： G01R31/26 , H01L21/66
CPC分类号： G03F7/705 , G03F7/70508 , G03F7/70533 , G03F7/70633 , G03F9/7003
摘要： Alignment data from an exposure tool suitable for exposing a plurality of semiconductor wafers are provided, the alignment data including alignment values applied by the exposure tool to respective ones of the plurality of semiconductor wafers at a plurality of measured positions.
摘要翻译：提供了适用于暴露多个半导体晶片的曝光工具的对准数据，对准数据包括由多个测量位置中的曝光工具施加到多个半导体晶片中的相应半导体晶片的对准值。

9. 发明申请

US20120028192A1 CONTROL METHOD AND CONTROL SYSTEM FOR EXPOSURE APPARATUS 有权
标题翻译：曝光装置的控制方法和控制系统
公开(公告)号：US20120028192A1
公开(公告)日：2012-02-02
申请号：US13194322
申请日：2011-07-29
申请人： Kenichi TSUJISAWA , Hiroshi Matsushita , Takayoshi Otake , Hideyuki Oishi , Akira Ogawa , Koji Washiyama
发明人： Kenichi TSUJISAWA , Hiroshi Matsushita , Takayoshi Otake , Hideyuki Oishi , Akira Ogawa , Koji Washiyama
IPC分类号： H01L21/02 , G03B27/42
CPC分类号： G03F9/7007 , G03F7/70533
摘要： According to one embodiment, a control method for an exposure apparatus is disclosed. The method can include retrieving, from a database, a correction amount of alignment correction at a time of exposure of a wafer and an inclination amount of a wafer stage with respect to an optical axis of an exposure optical system at the time of exposure. The method can include making a determination on the inclination amount based on a predetermined condition. The method can include making a determination on the correction amount based on the predetermined condition. In addition, the method can include issuing an alarm when the inclination amount and the correction amount both satisfy the condition.
摘要翻译：根据一个实施例，公开了一种用于曝光装置的控制方法。该方法可以包括在曝光时从数据库检索在晶片曝光时相对于曝光光学系统的光轴的晶片台的倾斜量的校准量。该方法可以包括基于预定条件来确定倾斜量。该方法可以包括基于预定条件来确定校正量。此外，该方法可以包括当倾斜量和校正量都满足条件时发出报警。

10. 发明申请

US20110273682A1 Lithographic Apparatus and Thermal Optical Manipulator Control Method 有权
标题翻译：光刻设备和热光机械手控制方法
公开(公告)号：US20110273682A1
公开(公告)日：2011-11-10
申请号：US13187751
申请日：2011-07-21
申请人： Bastiaan Stephanus Hendricus JANSEN , Ulrich SCHÖNHOFF , Markus HAUF
发明人： Bastiaan Stephanus Hendricus JANSEN , Ulrich SCHÖNHOFF , Markus HAUF
IPC分类号： G03B27/52 , H05B1/02
CPC分类号： G03F7/70891 , G03F7/70533 , Y10S359/90
摘要： A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.
摘要翻译：提供了一种用于控制热光学元件的加热的控制方法，所述热光学元件具有加热器元件的矩阵。该方法包括用反馈回路来稳定热光学元件的标称温度，以控制加热元件的加热; 通过设定点信号提供所述热光学元件的期望温度曲线; 从所述设定点信号确定所述加热器元件的前馈控制; 并将前馈控制的输出向前馈送到反馈回路中。

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