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    • 10. 发明申请
    • MANUFACTURE OF NON-RECTILINEAR FEATURES
    • 非特殊特征的制造
    • US20160136899A1
    • 2016-05-19
    • US15002239
    • 2016-01-20
    • Mentor Graphics Corporation
    • Sandeep Koranne
    • B29C67/00G05B19/4099
    • G05B19/4099B29C64/386B33Y50/02G02B6/136G05B2219/35134G05B2219/49007G06F17/175Y02P90/265
    • Methods and apparatus are disclosed for symbolic methods using algebraic geometry (e.g., based on a Gröbner basis of tangent space polynomials of parametric curves). For example, the design, optimization and verification of silicon photonic wave guides using parametric polynomials and/or Gröbner basis functions can be used to perform envelope generation, rectification, manufacturability checking, singularity detection, reticle and etch processing model generation, tapering loss minimization, and bend loss minimization. In one example, a method of analyzing a layout to be manufactured using a photolithographic process includes producing an envelope of a curve representing a layout object based at least in part on a Gröbner basis and performing one or more analysis operations for the envelope to perform verification and manufacturability checks.
    • 公开了使用代数几何的符号方法(例如,基于参数曲线的切线空间多项式的Gröbner基础)的方法和装置。 例如,使用参数多项式和/或Gröbner基函数的硅光子波导的设计,优化和验证可用于执行包络生成,整流,可制造性检查,奇点检测,掩模版和蚀刻处理模型生成,锥度损耗最小化, 和弯曲损耗最小化。 在一个示例中,分析使用光刻工艺制造的布局的方法包括至少部分地基于Gröbner基础产生表示布局对象的曲线的包络线,并对该信封执行一个或多个分析操作以执行验证 和可制造性检查。