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    • 9. 发明授权
    • 1T1b and 2T2b flash-based, data-oriented EEPROM design
    • 1T1b和2T2b闪存为基础,面向数据的EEPROM设计
    • US09177658B2
    • 2015-11-03
    • US14546294
    • 2014-11-18
    • Peter Wung LeeHsing-Ya Tsao
    • Peter Wung LeeHsing-Ya Tsao
    • G11C11/04G11C16/14G11C16/34G11C16/06G11C16/04G11C16/10G11C16/16G11C16/26
    • G11C16/14G11C16/0425G11C16/0458G11C16/0483G11C16/06G11C16/10G11C16/16G11C16/26G11C16/3459G11C2216/14
    • An one-transistor-one-bit (1T1b) Flash-based EEPROM cell is provided along with improved key operation schemes including applying a negative word line voltage and a reduced bit line voltage for perform erase operation, which drastically reduces the high voltage stress on each cell for enhancing the Program/Erase cycles while reducing cell size. An array made by the 1T1b Flash-based EEPROM cells can be operated with Half-page or Full-page divided programming and pre-charging period for each program cycle. Utilizing PGM buffer made of Vdd devices in the cell array further save silicon area. Additionally, a two-transistor-two-bit (2T2b) EEPROM cell derived from the 1T1b cell is disclosed with additional cell size reduction but with the operation of program and erase the same as that for the 1T1b cells with benefits of no process change but much enhanced storage density, superior Program/Erase endurance cycle, and capability for operating in high temperature environment.
    • 提供了一个单晶体管一位(1T1b)基于闪存的EEPROM单元,以及改进的键操作方案,包括施加负字线电压和降低的位线电压用于执行擦除操作,这大大降低了高压应力 每个单元用于增强编程/擦除周期,同时减小单元大小。 由1T1b闪存的EEPROM单元制成的阵列可以在每个程序周期的半页或全页分割编程和预充电周期下进行操作。 在单元阵列中利用由Vdd器件制成的PGM缓冲器进一步节省了硅面积。 另外,公开了从1T1b单元得到的双晶体二极管2位(2T2b)EEPROM单元,其额外的单元尺寸减小,但是与1T1b单元相同的编程和擦除操作的优点在于没有处理变化, 大大增强了存储密度,卓越的程序/擦除耐久循环,以及在高温环境下运行的能力。