会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明申请
    • Inspection system and method for defect analysis of wire connections
    • 电线连接缺陷分析检测系统及方法
    • US20160364854A1
    • 2016-12-15
    • US15180837
    • 2016-06-13
    • WiTrins s.r.o
    • Roman Franz Wieser
    • G06T7/00H04N5/225H04N5/33H04N5/369
    • G06T7/0004G01B11/0608G01B11/24G01N21/956G01N2021/95661G06T2207/10024G06T2207/10048G06T2207/30148H01L2224/48227H01L2224/48472H01L2224/49175H01L2224/859H04N5/2256H04N5/332H04N5/3692
    • The invention relates to an inspection system (10) for defect analysis of a wire connection (11) between a substrate (13) and a semiconductor component (15, 16) of a product (12), the inspection system comprising a first projection device (24), a line scan camera (28) and a processing device, the first projection device having at least one slit projection means (25), the slit projection means being capable of projecting a light slit (33) onto a wire (21, 22) of the wire connection, light of the light slit reflected by the wire in a detection plane (39) of the line scan camera extending perpendicularly, preferably orthogonally to a substrate surface (14) being detectable by means of the line scan camera, analysis image information of the product being derivable from a plurality of line scan image information of the line scan camera by means of the processing device, wherein the slit projection means is arranged in relation to the line scan camera in such a manner that the light slit can be projected onto the product so as to extend within the detection plane, the inspection system comprising a second projection device, the second projection device having at least one illuminating means (27), the illuminating means being capable of projecting diffuse light onto the product, light of the diffuse light reflected by the product in the detection plane being detectable by means of the line scan camera.
    • 本发明涉及一种用于对产品(12)的基板(13)和半导体部件(15,16)之间的导线连接(11)进行缺陷分析的检查系统(10),所述检查系统包括第一投影装置 (24),行扫描照相机(28)和处理装置,所述第一投影装置具有至少一个狭缝投影装置(25),所述狭缝投影装置能够将光狭缝(33)投射到丝线(21)上 ,22),线垂直扫描照相机的检测平面(39)中由线反射的光狭缝的光优选地垂直于衬底表面(14)可以通过线扫描照相机检测到 ,通过所述处理装置从所述行扫描照相机的多个行扫描图像信息导出所述乘积的分析图像信息,其中所述狭缝投影装置相对于所述行扫描照相机被布置成使得所述光 狭缝罐 投影到产品上以便在检测平面内延伸,检查系统包括第二投影装置,第二投影装置具有至少一个照明装置(27),该照明装置能够将漫射光投射到产品上, 由检测平面中的产品反射的漫射光的光可以通过行扫描照相机检测。