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    • 9. 发明申请
    • PRODUCTION OF HIGH-PURITY TANTALUM FLAKE POWDER
    • 生产高纯度粉饼粉
    • US20080233420A1
    • 2008-09-25
    • US11690523
    • 2007-03-23
    • Colin G. McCrackenScott M. Hawkins
    • Colin G. McCrackenScott M. Hawkins
    • C22B34/24B22F9/04
    • C22B34/24B22F1/0055B22F9/023C22B9/14Y10T428/12014
    • The present invention relates to a high-purity tantalum flake powder, produced by a hydride-dehydride process including: (a) cold working tantalum metal into a thin sheet; (b) hydriding the thin sheet, forming a brittle tantalum foil; (c) adjusting the tantalum foil to a desired particle size; and (d) removing hydrogen from the tantalum foil by vacuum sintering, forming a tantalum flake powder. In accordance with the present invention, tantalum flake is produced by sizing ultra-thin tantalum foil via the hydride-dehydride process. Tantalum is an extremely malleable metal and can be cold worked into extremely thin sheets less than 1 micron thick. Once hydrided, this foil is brittle, and can be easily sized by suitable milling processes. The hydrogen is removed by vacuum sintering, resulting in an extremely thin Ta metal flake.
    • 本发明涉及一种通过氢化物 - 脱氢法生产的高纯度钽片粉末,它包括:(a)冷加工钽金属成薄片; (b)使薄片氢化,形成脆性钽箔; (c)将钽箔调节至所需的粒度; 和(d)通过真空烧结从钽箔中除去氢,形成钽片粉末。 根据本发明,通过氢化物 - 脱氢工艺对超薄钽箔进行定型来制造钽片。 钽是一种非常有弹性的金属,可以冷加工成小于1微米厚的极薄片。 一旦氢化,该箔是脆性的,并且可以通过合适的研磨工艺容易地定尺寸。 通过真空烧结除去氢,导致极薄的钽金属薄片。